摘要:
To provide a connection structure having improved joint life and excellent reliability by preventing generation of cracks or peeling. Provided is a connection structure in which a object to be connected (C) is joined onto a object to be connected (B) by a porous metal layer (A) which is a connector, in which a porosity of the porous metal layer (A) is from 2 volume% to 38 volume%, the porous metal layer (A) includes an approximately ellipsoidal hole (h), an average circularity of an ellipsoidal shape of the hole (h) in a cross section (V) of the porous metal layer (A) in a thickness direction is from 0.80 to 0.90, an average value of inclination angles of a long axis of an ellipsoidal shape of the hole (h) with respect to the normal to the thickness direction of the cross section (V) is equal to or smaller than 57 degrees, and an average long axis length of the ellipsoidal shape of the hole (h) in the cross section (V) is from 30 nm to 500 nm.
摘要:
The invention concerns a method of fusing and electrically contacting a first insulating substrate (28A) having at least one first conductive layer (29A) thereon with at least one second insulating substrate (28B) having at least one second conductive layer (29B) thereon, the method comprising: stacking the first and second substrates (28A, 28B) such that an interface zone is formed between them, the interface zone comprising an electrical contacting zone where at least one first conductive layers (29A) faces and is at least partially aligned with at least one second conductive layer (29B), and a substrate fusing zone where the insulating substrates (28A, 28B) directly face each other; focusing to the interface zone of the substrates (28A, 28B) through one of the substrates (28A, 28B) a plurality of sequential focused laser pulses from a laser source, the pulse duration, pulse frequency and pulse power of the laser light being chosen to provide local melting the substrate (28A, 28B) materials and the conductive layers (29A, 29B); and moving the laser source and the substrate with respect to each other at a predetermined velocity and path so that a structurally modified zone is formed to the interface zone, the structurally modified zone overlapping with said electrical contacting zone and said substrate fusing zone. The invention provides a convenient way of manufacturing well-sealed joints and electrical contacts for multifunction electronic devices, for example.
摘要:
To provide a connection structure having improved joint life and excellent reliability by preventing generation of cracks or peeling. Provided is a connection structure in which a object to be connected (C) is joined onto a object to be connected (B) by a porous metal layer (A) which is a connector, in which a porosity of the porous metal layer (A) is from 2 volume% to 38 volume%, the porous metal layer (A) includes an approximately ellipsoidal hole (h), an average circularity of an ellipsoidal shape of the hole (h) in a cross section (V) of the porous metal layer (A) in a thickness direction is from 0.80 to 0.90, an average value of inclination angles of a long axis of an ellipsoidal shape of the hole (h) with respect to the normal to the thickness direction of the cross section (V) is equal to or smaller than 57 degrees, and an average long axis length of the ellipsoidal shape of the hole (h) in the cross section (V) is from 30 nm to 500 nm.
摘要:
A method for joining a silicon plate to a second plate, a laser beam being directed through the silicon plate at the second plate. In the process, the wavelength of the laser beam is selected in such a way that only a negligibly small amount of energy is absorbed in the silicon plate. A strongly absorbent material is hotmelted by the laser beam's energy and then produces a bond between the silicon plate and the second plate.