Contingency analysis information for utility service network
    1.
    发明授权
    Contingency analysis information for utility service network 有权
    公用事业服务网络应急分析信息

    公开(公告)号:US08583405B2

    公开(公告)日:2013-11-12

    申请号:US12777803

    申请日:2010-05-11

    IPC分类号: G06F11/30 G21C17/00 G06Q10/00

    CPC分类号: G06Q10/06 G06Q10/063

    摘要: A system and computer-implemented method of providing contingency analysis information for a utility service network that includes obtaining contingency analysis information from a plurality of external sources, integrally combining the contingency analysis information obtained from each of the plurality of external sources into a single application and prioritizing the contingency analysis information in a predetermined order, dynamically updating, the contingency analysis information obtained from each of the plurality of external sources and the prioritization of the contingency analysis information based on status information, and displaying the contingency analysis information to a user via a graphical user interface.

    摘要翻译: 一种用于为公用事业服务网络提供应急分析信息的系统和计算机实现的方法,包括从多个外部源获得应急分析信息,将从多个外部源中的每个获得的应急分析信息整合到单个应用中, 以预定顺序对应急分析信息进行优先排序,动态地更新从多个外部源中的每一个获得的应急分析信息和基于状态信息的应急分析信息的优先化,并且经由以下操作向用户显示应急分析信息 图形用户界面。

    Apparatus temperature control and pattern compensation
    3.
    发明授权
    Apparatus temperature control and pattern compensation 有权
    设备温度控制和模式补偿

    公开(公告)号:US08372203B2

    公开(公告)日:2013-02-12

    申请号:US11242299

    申请日:2005-09-30

    摘要: A film formation system 10 includes a processing chamber 15 bounded by sidewalls 18 and a top cover 11. In one embodiment, a susceptor 16 is rotatably disposed in the system 10, and overlaps with a first peripheral member 205 disposed around the sidewalls 18. A radiant heating system 313 is disposed under the susceptor 305 to heat the substrate 19. In another embodiment, the top cover 11 has equally spaced pyrometers 58 for measuring the temperature of the substrate 19 across a number of zones. The temperature of the substrate 19 is obtained from pyrometric data from the pyrometers 58.

    摘要翻译: 成膜系统10包括由侧壁18和顶盖11限定的处理室15.在一个实施例中,基座16可旋转地设置在系统10中,并且与设置在侧壁18周围的第一周边构件205重叠。 辐射加热系统313设置在基座305下方以加热基板19.在另一个实施例中,顶盖11具有相等间隔的高温计58,用于测量跨越多个区域的基板19的温度。 基板19的温度由来自高温计58的高温测量数据获得。

    Systems and methods for martingale boosting in machine learning
    4.
    发明授权
    Systems and methods for martingale boosting in machine learning 有权
    机器学习中跆拳道增压的系统和方法

    公开(公告)号:US08036996B2

    公开(公告)日:2011-10-11

    申请号:US12045458

    申请日:2008-03-10

    IPC分类号: G06F15/18 G06F17/18 G06F19/24

    CPC分类号: G06N99/005 G06K9/6256

    摘要: Boosting algorithms are provided for accelerated machine learning in the presence of misclassification noise. In an exemplary embodiment, a machine learning method having multiple learning stages is provided. Each learning stage may include partitioning examples into bins, choosing a base classifier for each bin, and assigning an example to a bin by counting the number of positive predictions previously made by the base classifier associated with the bin.

    摘要翻译: 提供增强算法用于在存在错误分类噪声的情况下加速机器学习。 在一个示例性实施例中,提供了具有多个学习阶段的机器学习方法。 每个学习阶段可以包括将示例分割成分区,为每个分组选择一个基本分类器,并且通过对与该分组相关联的基本分类器先前做出的肯定预测的数量进行计数,将一个示例分配给一个分组。

    Silicon carbide sleeve for substrate support assembly
    6.
    发明授权
    Silicon carbide sleeve for substrate support assembly 失效
    用于基板支撑组件的碳化硅套筒

    公开(公告)号:US06315833B1

    公开(公告)日:2001-11-13

    申请号:US09346657

    申请日:1999-07-01

    IPC分类号: C23C1600

    摘要: An apparatus for and method of supporting a substrate such as a semiconductor wafer. Silicon carbide sleeves cover substrate support members such as upwardly extending arms of a substrate carrier which is part of a substrate support assembly. The substrate carrier including the upwardly extending arms holds the substrate spaced apart from a platform such as a susceptor during loading and unloading of a processing chamber. The platform defines apertures through which the arms extend. The arms are vertically movable through the apertures with respect to the platform and engage the substrate at the substrate's edge or alternatively, inwardly from the edge.

    摘要翻译: 用于支撑诸如半导体晶片的衬底的装置和方法。 碳化硅套筒覆盖衬底支撑构件,例如作为衬底支撑组件的一部分的衬底载体的向上延伸臂。 包括向上延伸的臂的衬底载体在加工和卸载处理室期间保持衬底与诸如基座的平台间隔开。 平台限定了臂延伸通过的孔。 臂可以相对于平台垂直移动穿过孔,并且在衬底的边缘处或者从边缘向内接合衬底。

    Gas inlets for wafer processing chamber
    7.
    发明授权
    Gas inlets for wafer processing chamber 失效
    晶圆处理室气体入口

    公开(公告)号:US5916369A

    公开(公告)日:1999-06-29

    申请号:US485058

    申请日:1995-06-07

    摘要: A system of supplying processing fluid to a substrate processing apparatus having walls, the inner surfaces of which define a processing chamber in which a substrate supporting susceptor is located. The system consists of a number of fluid storages, each which stores a separate processing fluid, at least two fluid conduits along which processing fluid flows from the fluid storages to the processing apparatus and a fluid inlet which connects the fluid conduits to the processing chamber. The inlet has a separate fluid passage, corresponding to each of the fluid conduits, formed along it. Each fluid passage opens at or near an inner surface of a wall to together define a fluid mixing zone, so that fluid moving along one fluid passage is prevented from mixing with fluid moving along any other passage until reaching the mixing zone.

    摘要翻译: 向具有壁的基板处理装置供给处理流体的系统,其内表面限定了处理室,基板支撑基座位于该处理室中。 该系统由许多流体储存器组成,每个流体存储器存储单独的处理流体,至少两个流体管道,处理流体从该流体流体流过流体储存器至处理装置;以及流体入口,其将流体导管连接到处理室。 入口具有与沿其形成的每个流体管道相对应的单独的流体通道。 每个流体通道在壁的内表面处或附近开口以一起限定流体混合区域,从而防止沿着一个流体通道移动的流体与沿着任何其它通道移动的流体混合直到到达混合区域。

    Method and apparatus for controlling the temperature of reaction chamber
walls
    8.
    发明授权
    Method and apparatus for controlling the temperature of reaction chamber walls 失效
    用于控制反应室壁温度的方法和装置

    公开(公告)号:US5855677A

    公开(公告)日:1999-01-05

    申请号:US831797

    申请日:1997-04-08

    摘要: An apparatus and a concomitant method for controlling coolant (air) flow proximate a reaction chamber within a workpiece processing system such that the temperature of a wall of the reaction chamber is maintained at a predefined target temperature. The target temperature is typically a temperature that optimizes a process concurrently being accomplished within the chamber, e.g., utilizing one temperature during deposition processes and a different temperature during cleaning processes. The apparatus contains a temperature measuring device to measure the temperature of the chamber wall. The measured temperature is compared to the predefined target temperature. A closed loop system controls the air flow proximate the chamber walls such that the measured temperature becomes substantially equal to the target temperature. Air flow control is provided by an air flow control device located within an inlet conduit that supplies air to a shroud for channeling the air past the reaction chamber. The shroud forms a portion of a housing which supports and encloses the reaction chamber.

    摘要翻译: 一种用于控制工件处理系统内的反应室附近的冷却剂(空气)流的装置和并发方法,使得反应室的壁的温度保持在预定的目标温度。 目标温度通常是优化室内同时进行的过程的温度,例如在沉积过程期间利用一个温度和在清洁过程期间不同的温度。 该装置包含用于测量室壁温度的温度测量装置。 将测量的温度与预定的目标温度进行比较。 闭环系统控制靠近室壁的空气流,使得测量的温度基本上等于目标温度。 空气流量控制由位于入口管道内的空气流量控制装置提供,该进气管道将空气供给到护罩,以将空气引导通过反应室。 护罩形成支撑并包围反应室的壳体的一部分。

    Apparatus for the turbulent mixing of gases
    10.
    发明授权
    Apparatus for the turbulent mixing of gases 失效
    用于气体湍流混合的装置

    公开(公告)号:US5523063A

    公开(公告)日:1996-06-04

    申请号:US984403

    申请日:1992-12-02

    申请人: Roger N. Anderson

    发明人: Roger N. Anderson

    CPC分类号: B01F5/0256 B01F5/0057

    摘要: The present invention discloses an apparatus and method for the turbulent mixing of gases. The invention has particular application when it is desired to produce a gas mixture including a very small quantity (ppm or less) of at least one component gas and/or wherein there is a substantial density difference between the component gases to be used to make up the gas mixture. The apparatus comprises: a tubular housing; at least two orifices or jets located near one end of the housing, through which gases to be mixed can enter the interior of the housing, the orifices or jets being oriented so that a first portion of gas flowing from a first orifice or jet will directly impact a second portion of gas flowing from a second orifice or jet, whereby frictional mixing of the gas components is achieved, further, the centerline of the first orifice or jet is offset from the centerline of the second, opposing orifice or jet, so as to produce a swirling action within the tubular interior of the gas mixer; and an exit opening at the opposite end of the tubular housing.

    摘要翻译: 本发明公开了一种用于气体湍流混合的装置和方法。 当希望产生包含非常少量(ppm或更少)至少一种组分气体的气体混合物和/或其中用于组成的组分气体之间存在实质密度差时,本发明具有特殊应用 气体混合物。 该装置包括:管状壳体; 位于壳体一端附近的至少两个孔或喷嘴,待混合的气体可以通过该孔或喷嘴进入壳体的内部,所述孔或射流被定向成使得从第一孔或射流流动的第一部分气体将直接 撞击从第二孔或射流流出的气体的第二部分,从而实现气体组分的摩擦混合,此外,第一孔或射流的中心线偏离第二相对的孔或射流的中心线,以便 以在气体混合器的管状内部产生旋动作用; 以及在管状壳体的相对端处的出口。