System and method for responding to failure of a hardware locus at a communication installation
    2.
    发明授权
    System and method for responding to failure of a hardware locus at a communication installation 有权
    用于响应通信安装处的硬件轨迹的故障的系统和方法

    公开(公告)号:US08074111B1

    公开(公告)日:2011-12-06

    申请号:US11523195

    申请日:2006-09-18

    Applicant: Sandeep Mehta

    Inventor: Sandeep Mehta

    CPC classification number: G06F11/2033 G06F11/2038 G06F2201/805

    Abstract: A method for responding to a failure of hardware locus of at a communication installation having a plurality of control apparatuses for controlling a plurality of processes distributed among a plurality of hardware loci, the hardware loci including at least one spare hardware locus, includes the steps of: (a) Shifting control of a failed process from an initial control apparatus to an alternate control apparatus located at an alternate hardware locus than the failed hardware locus. The failed process is a respective process controlled by the initial control apparatus located at the failed hardware locus. (b) Relocating the respective control apparatuses located at the failed hardware locus to a spare hardware locus. (c) Shifting control of the failed process from the alternate control apparatus to the initial control apparatus relocated at the spare hardware locus.

    Abstract translation: 一种响应于具有多个控制装置的通信装置的硬件轨迹的故障的方法,所述多个控制装置用于控制分布在多个硬件轨迹之间的多个处理,所述硬件轨迹包括至少一个备用硬件轨迹,包括以下步骤: :(a)将故障处理的控制从初始控制装置转移到位于与故障硬件轨迹相比的备用硬件轨迹处的替代控制装置。 失败的过程是由位于故障硬件轨迹处的初始控制装置控制的相应过程。 (b)将位于故障硬件轨迹的各控制装置重定位到备用硬件轨迹。 (c)将故障处理的控制从替代控制装置转移到在备用硬件轨迹上重定位的初始控制装置。

    In situ surface contamination removal for ion implanting
    3.
    发明授权
    In situ surface contamination removal for ion implanting 有权
    用于离子注入的原位表面污染去除

    公开(公告)号:US07544959B2

    公开(公告)日:2009-06-09

    申请号:US12099420

    申请日:2008-04-08

    Abstract: Methods and apparatus that introduce, within the ion implant chamber or an isolated chamber in communication therewith, the capability to remove contaminants and oxide surface layers on a wafer surface prior to ion implantation, are disclosed. The mechanisms for removal of contaminants include conducting: a low energy plasma etch, heating the wafer and application of ultraviolet illumination, either in combination or individually. As a result, implantation can occur immediately after the cleaning/preparation process without the contamination potential of exposure of the wafer to an external environment. The preparation allows for the removal of surface contaminants, such as water vapor, organic materials and surface oxides.

    Abstract translation: 公开了在离子注入室或与之连通的隔离室内引入在离子注入之前去除晶片表面上的污染物和氧化物表面层的能力的方法和装置。 去除污染物的机理包括:组合或单独地进行低能量等离子体蚀刻,加热晶片和施加紫外线照明。 结果,可以在清洁/制备过程之后立即进行植入,而不会使晶片暴露于外部环境的污染潜力。 该制剂允许去除表面污染物,例如水蒸汽,有机材料和表面氧化物。

    Method and apparatus for controlling high speed vehicles
    6.
    发明授权
    Method and apparatus for controlling high speed vehicles 失效
    用于控制高速车辆的方法和装置

    公开(公告)号:US5220497A

    公开(公告)日:1993-06-15

    申请号:US605057

    申请日:1990-10-29

    Abstract: Maneuvers of a controlled vehicle, such as a car, traveling at moderate to high speeds are planned by propagating cost waves in a configuration space using two search strategies referred to as budding and differential budding. Control is achieved by monitoring properties of the controlled vehicle and adjusting control parameters to achieve motion relative to a frame of reference. The frame of reference may change before the transformation to configuration space occurs. The method transforms goals, obstacles, and the position of the controlled vehicle in task space to a configuration space based on the position of these objects relative to a moving frame of reference. The method also determines a local neighborhood of possible motions based on the control capabilities of the vehicle. In one embodiment, the controlled parameters are time derivatives of the monitored properties. A variation of the method provides for the parallel computation of the configuration space. In one embodiment of the parallel computation, the case where two processes are used, a first process and configuration space would be used to plan. A second process and configuration space would be used to read the setpoints which are sent as control directives to the vehicle.

    Abstract translation: 通过使用称为发芽和差异出芽的两种搜索策略在配置空间中传播成本波来计划诸如汽车的受控车辆(以中等到高速)行驶的操纵。 通过监视受控车辆的属性并调整控制参数以实现相对于参考系的运动来实现控制。 在转换到配置空间之前,参考框架可能会改变。 该方法基于这些对象相对于移动的参考系的位置,将目标,障碍物和受控车辆在任务空间中的位置转换到配置空间。 该方法还基于车辆的控制能力确定可能运动的局部邻域。 在一个实施例中,受控参数是被监测属性的时间导数。 该方法的变体提供了配置空间的并行计算。 在并行计算的一个实施例中,使用两个进程的情况,将使用第一进程和配置空间进行计划。 将使用第二个过程和配置空间来读取作为控制指令发送给车辆的设定值。

    Non-uniform ion implantation
    7.
    发明授权
    Non-uniform ion implantation 有权
    非均匀离子注入

    公开(公告)号:US07544957B2

    公开(公告)日:2009-06-09

    申请号:US11441633

    申请日:2006-05-26

    Abstract: A method includes receiving an input signal representative of a desired two-dimensional non-uniform dose pattern for a front surface of a workpiece, driving the workpiece relative to an ion beam to distribute the ion beam across the front surface of the workpiece, and controlling at least one parameter of an ion implanter when the ion beam is incident on the front surface of the workpiece to directly create the desired two-dimensional non-uniform dose pattern in one pass of the front surface of workpiece relative to the ion beam. The beam may be a scanned beam or a ribbon beam. An ion implanter is also provided.

    Abstract translation: 一种方法包括接收表示工件前表面的期望的二维不均匀剂量图案的输入信号,相对于离子束驱动工件以将离子束分布在工件的前表面上,并且控制 离子注入机的至少一个参数,当离子束入射到工件的前表面上,以在工件前表面相对于离子束的一次通过中直接产生所需的二维非均匀剂量图案。 光束可以是扫描光束或带状光束。 还提供了离子注入机。

    Method and system for research and development management in an enterprise
    9.
    发明授权
    Method and system for research and development management in an enterprise 有权
    企业研发管理方法与制度

    公开(公告)号:US08620702B2

    公开(公告)日:2013-12-31

    申请号:US12283121

    申请日:2008-09-09

    Applicant: Sandeep Mehta

    Inventor: Sandeep Mehta

    Abstract: A method and system for capturing research decision flow in a Research and Development (R&D) activity are provided. The method includes defining an objective of the R&D activity and determining one or more requirements for fulfilling the objective of the R&D activity. Further, the method includes identifying a set of risks associated with failure to satisfy the one or more requirements. Furthermore, the method also includes developing a task plan to satisfy the one or more requirements and mitigate one or more risks of the set of risks. Furthermore, the method also includes linking the objective, the one or more requirements, the set of risks and the task plan, to generate a linked information record.

    Abstract translation: 提供了研究与开发(R&D)活动中捕获研究决策流程的方法和系统。 该方法包括定义研发活动的目标,确定实现研发活动目标的一个或多个要求。 此外,该方法包括识别与不能满足一个或多个要求相关联的一组风险。 此外,该方法还包括开发满足一个或多个要求的任务计划,并减轻该组风险的一个或多个风险。 此外,该方法还包括将目标,一个或多个要求,一组风险和任务计划相关联,以生成链接的信息记录。

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