Fluoropolymer composition including at least one oligomer

    公开(公告)号:US10125251B2

    公开(公告)日:2018-11-13

    申请号:US15320544

    申请日:2015-06-25

    Abstract: A composition that includes a blend of a fluoropolymer and an ultraviolet light-absorbing oligomer. The oligomer has a first divalent unit having a pendent ultraviolet absorbing group and a second divalent unit represented by formula (I): At least one of the following limitations is also met: the ultraviolet light-absorbing oligomer further comprises a third divalent unit comprising a pendent 2,2,6,6-tetramethylpiperidinyl group, or the composition further comprises a second oligomer comprising a third divalent unit comprising a pendent 2,2,6,6-tetramethylpiperidinyl group at least one of the second divalent units. Articles including the composition are disclosed. The composition can be an extruded film. A method of making such an extruded film is also disclosed.

    Surfactants and methods of making and using same
    4.
    发明授权
    Surfactants and methods of making and using same 有权
    表面活性剂及其制造和使用方法

    公开(公告)号:US09454082B2

    公开(公告)日:2016-09-27

    申请号:US14763841

    申请日:2014-01-09

    Abstract: Anionic surfactants have a formula: RfSO2N(H)—CH2CH(CH3)OH; or RfSO2N(H)—CH2CH2O)xH, where x is an integer from 2-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula: (a) Rf—SO2N[CH2CH(CH3)OH]2; (b) RfSO2N[CH2CH(CH3)OH][(CH2CH2O)nH], where n is an integer from 1-6; (c) RfSO2N(R)[(CH2CH2O)pH], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or (d) RfSO2N[(CH2CH2O)qH][(CH2CH2O)mH], where q is an integer from 1-6 and m is an integer from 3-6. Rf is a fluoroalkyl group having 3 to 8 carbon atoms.

    Abstract translation: 阴离子表面活性剂具有下式:RfSO 2 N(H)-CH 2 CH(CH 3)OH; 或RfSO 2 N(H)-CH 2 CH 2 O)x H,其中x是2-6的整数。 Rf是碳原子数为3〜8的氟代烷基。 具有下式的中性表面活性剂:(a)Rf-SO 2 N [CH 2 CH(CH 3)OH] 2; (b)RfSO 2 N [CH 2 CH(CH 3)OH] [(CH 2 CH 2 O)n H],其中n是1-6的整数; (c)RfSO 2 N(R)[(CH 2 CH 2 O)pH],其中p是2-6的整数,R是具有1至4个碳原子的烷基; 或(d)RfSO 2 N [(CH 2 CH 2 O)q H] [(CH 2 CH 2 O)m H],其中q是1-6的整数,m是3-6的整数。 Rf是碳原子数为3〜8的氟代烷基。

    PERFLUOROALKYL SULFONAMIDES SURFACTANTS FOR PHOTORESIST RINSE SOLUTIONS
    5.
    发明申请
    PERFLUOROALKYL SULFONAMIDES SURFACTANTS FOR PHOTORESIST RINSE SOLUTIONS 有权
    全氟辛基磺酰胺表面活性剂用于光催化剂溶液

    公开(公告)号:US20140154632A1

    公开(公告)日:2014-06-05

    申请号:US14237193

    申请日:2012-08-01

    CPC classification number: G03F7/40 G03F7/405 H01L21/0273

    Abstract: A method of modifying a surface of a photoresist material including exposing the photoresist material to an aqueous ionic surfactant solution and varying the pH of the aqueous ionic surfactant solution until a fluorochemical layer is formed in or on the photoresist material. The aqueous ionic surfactant solution includes a perfluoroalkyl sulfonamide the formula: RfS02NH—R′ where Rf=CnF2n+1— and n=1 to 6, R′=—H, —CH3, and —CH2CH2OH. The aqueous ionic surfactant solution has a pH of within about 3 pH units of a pKa of the perfluoroalkyl sulfonamide.

    Abstract translation: 一种修饰光致抗蚀剂材料的表面的方法,包括将光致抗蚀剂材料暴露于水性离子表面活性剂溶液并改变离子表面活性剂水溶液的pH,直到在光致抗蚀剂材料中或其上形成含氟化合物层。 所述含水离子表面活性剂溶液包括式RfS02NH-R'的全氟烷基磺酰胺,其中Rf = CnF2n + 1-和n = 1-6,R'= -H,-CH3和-CH2CH2OH。 所述离子表面活性剂水溶液的pH值为所述全氟烷基磺酰胺的pKa的约3个pH单位。

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