公开(公告)号：US20210124112A1

公开(公告)日：2021-04-29

申请号：US17077756

申请日：2020-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Patrick Sebastian UEBEL ,  Peter Maximilian GÖTZ ,  Sebastian Thomas BAUERSCHMIDT ,  Coen Hubertus Matheus BALTIS ,  Janneke RAVENSBERGEN

IPC: G02B6/02 ,  G03F7/20 ,  G03F9/00 ,  F21V8/00 ,  C03B37/15

Abstract: Optical components and methods of manufacture thereof. A first optical component has a hollow-core photonic crystal fiber includes internal capillaries for guiding radiation and an outer capillary sheathing the internal capillaries; and at least an output end section having a larger inner cross-sectional dimension over at least a portion of the output end section than an inner cross-sectional dimension of the outer capillary along a central portion of the hollow-core photonic crystal fiber prior to the output end section. A second optical component includes a hollow-core photonic crystal fiber and a sleeve arrangement.

公开(公告)号：US20230075771A1

公开(公告)日：2023-03-09

申请号：US17798354

申请日：2021-01-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Coen Hubertus Matheus BALTIS ,  Nicolaas TEN KATE ,  Marcus Martinus Petrus Adrianus Petrus Adrianus VERMEULEN ,  Siegfried Alexander TROMP ,  Frank Pieter Albert VAN DEN BERKMORTEL ,  Niek Jacobus Johannes ROSET ,  Gijs KRAMER ,  Nicolaas Petrus Marcus BRANTJES ,  Michiel Theodorus Jacobus FONTEYN

IPC: G03F7/20

Abstract: A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.

公开(公告)号：US20210053177A1

公开(公告)日：2021-02-25

申请号：US16963576

申请日：2019-01-24

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Bert Dirk SCHOLTEN ,  Satish ACHANTA ,  Aydar AKCHURIN ,  Pavlo ANTONOV ,  Coen Hubertus Matheus BALTIS ,  Jeroen BOUWKNEGT ,  Ann-Sophie m. FARLE ,  Christopher John MASON ,  Ralph Nicholas PALERMO ,  Thomas POIESZ ,  Yuri Johannes Gabriel VAN DE VIJVER ,  Jimmy Matheus Wilhelmus VAN DE WINKEL

IPC: B24B27/033 ,  B24B1/04 ,  B24B7/07 ,  B24B7/22 ,  G03F7/20 ,  H01L21/304

Abstract: A treatment tool for reconditioning the top surfaces of a plurality of projections of a substrate support in a lithographic tool. The treatment tool includes a reconditioning surface which is rough relative to smoothed top surfaces of the projections and which reconditioning surface has material harder than that of the material of the top surfaces of the projections. A reconditioning method involves causing an interaction between the reconditioning surface of the treatment tool and the top surfaces of the projections of the substrate support, so as to leave these top surfaces rougher than they were prior to the interaction.

公开(公告)号：US20220357675A1

公开(公告)日：2022-11-10

申请号：US17870444

申请日：2022-07-21

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Thomas POIESZ ,  Coen Hubertus Matheus BALTIS ,  Abraham Alexander SOETHOUDT ,  Mehmet Ali AKBAS ,  Dennis VAN DEN BERG ,  Wouter VANESCH ,  Marcel Maria Cornelius Franciscus TEUNISSEN

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.

公开(公告)号：US20190265597A1

公开(公告)日：2019-08-29

申请号：US16407878

申请日：2019-05-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Daan Daniel Johannes Antonius VAN SOMMEREN ,  Coen Hubertus Matheus BALTIS ,  Harold Sebastiaan BUDDENBERG ,  Giovanni Luca GATTOBIGIO ,  Johannes Cornelis Paulus MELMAN ,  Günes NAKIBOGLU ,  Theodorus Wilhelmus POLET ,  Walter Theodorus Matheus STALS ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Josephus Peter VAN LIESHOUT ,  Jorge Alberto VIEYRA SALAS ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F7/20

Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

公开(公告)号：US20230260820A1

公开(公告)日：2023-08-17

申请号：US18305925

申请日：2023-04-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Robby Franciscus Josephus MARTENS ,  Youssef Karel Maria DE VOS ,  Ringo Petrus Cornelis VAN DORST ,  Gerhard Albert TEN BRINKE ,  Dirk Jerome Andre SENDEN ,  Coen Hubertus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Jelmer Mattheüs KAMMINGA ,  Evelyn Wallis PACITTI ,  Thomas POIESZ ,  Arie Cornelis SCHEIBERLICH ,  Bert Dirk SCHOLTEN ,  André SCHREUDER ,  Abraham Alexander SOETHOUDT ,  Siegfried Alexander TROMP ,  Yuri Johannes Gabriël VAN DE VIJVER

IPC: H01L21/683 ,  G03F7/00 ,  H01L21/687 ,  B25B11/00

CPC classification number: H01L21/6838 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/68742 ,  B25B11/005

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

公开(公告)号：US20210141312A1

公开(公告)日：2021-05-13

申请号：US17151291

申请日：2021-01-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Günes NAKIBOGLU ,  Coen Hubertus Matheus BALTIS ,  Siegfried Alexander TROMP ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Bert Dirk SCHOLTEN ,  Daan Daniel Johannes Antonius VAN SOMMERE ,  Mark Johannes Hermanus FRENCKEN

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/687

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.

公开(公告)号：US20190163066A1

公开(公告)日：2019-05-30

申请号：US16097640

申请日：2017-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER ,  Martijn HOUBEN ,  Nicholas Peter WATERSON ,  Thibault Simon Mathieu LAURENT ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Vincentius Fransiscus CLOOSTERMAN ,  Siegfried Alexander TROMP ,  Coen Hubertus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Niek Jacobus Johannes ROSET

IPC: G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.

公开(公告)号：US20210165334A1

公开(公告)日：2021-06-03

申请号：US16770464

申请日：2018-11-22

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Thomas POIESZ ,  Coen Hubertus Matheus BALTIS ,  Abraham Alexander SOETHOUDT ,  Mehmet Ali AKBAS ,  Dennis VAN DEN BERG ,  Wouter VANESCH ,  Marcel Maria Cornelius Franciscus TEUNISSEN

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.

公开(公告)号：US20200183287A1

公开(公告)日：2020-06-11

申请号：US15779804

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Günes NAKIBOGLU ,  Coen Hubertus Matheus BALTIS ,  Siegfried Alexander TROMP ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Bert Dirk SCHOLTEN ,  Daan Daniel Johannes Antonius VAN SOMMEREN ,  Mark Johannes Hermanus FRENCKEN

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/027

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.