公开(公告)号：US20230341325A1

公开(公告)日：2023-10-26

申请号：US18043794

申请日：2021-08-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Lars LOETGERING ,  Stefan Michiel MICHIEL ,  Christina Lynn PORTER ,  Petrus Wilhelmus SMORENBURG

IPC: G01N21/47 ,  G01N23/20025 ,  G01N23/2055 ,  G03F7/20 ,  G03F7/00

CPC classification number: G01N21/4788 ,  G01N23/20025 ,  G01N23/2055 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70681 ,  G01N2201/021

Abstract: Disclosed is a wavefront sensor for measuring a wavefront of a radiation. The wavefront sensor comprises a mask comprising a pattern located in path of the radiation to interact with the radiation. The radiation impinging on the mask forms a radiation detection pattern on a radiation detector subsequent to the mask, and the pattern of the mask is designed at least partly based on a requirement of the radiation detection pattern.

公开(公告)号：US20240324089A1

公开(公告)日：2024-09-26

申请号：US18268122

申请日：2021-11-23

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Jan Otger LUITEN ,  Herman Brian SCHAAP ,  Gerardus, Hubertus Jim FRANSSEN

IPC: H05G2/00

CPC classification number: H05G2/00

Abstract: A method for controlling a density distribution of electrons provided by an electron source for use in hard X-ray, soft X-ray and/or extreme ultraviolet generation, the method comprising generating a plurality of electrons from a pattern of ultracold excited atoms using an ionization laser inside a cavity, wherein the electrons have a density distribution determined by at least one of the patterns of excited atoms and the ionization laser, and accelerating the electrons out of the cavity using a non-static acceleration profile, wherein the acceleration profile controls the density distribution of the electrons as they exit the cavity.

公开(公告)号：US20240272516A1

公开(公告)日：2024-08-15

申请号：US18570289

申请日：2022-05-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Sjoerd Nicolaas Lambertus DONDERS ,  Petrus Wilhelmus SMORENBURG

IPC: G02F1/383

CPC classification number: G02F1/383

Abstract: An assembly for receiving a pump radiation to interact with a gas medium at an interaction space to generate an emitted radiation. The assembly comprising: an object with a hollow core, wherein the hollow core has an elongated volume through the object, wherein the interaction space is located inside the hollow core, and a heat conductive structure that connects at multiple locations of an outside wall of the object for transferring heat generated at the interaction space away from the object.

公开(公告)号：US20180366899A1

公开(公告)日：2018-12-20

申请号：US16060792

申请日：2016-11-29

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Johannes Antonius Gerardus AKKERMANS

IPC: H01S3/09 ,  G03F7/20 ,  H05H7/04 ,  H05H9/04

CPC classification number: H01S3/0903 ,  G03F7/70025 ,  G03F7/70033 ,  H05H7/04 ,  H05H9/00 ,  H05H9/04 ,  H05H2007/041 ,  H05H2007/046

Abstract: A free electron laser FEL comprises an undulator 24 generating coherent EUV radiation receiving an upstream electron beam EB2 and emitting a downstream electron beam EB4 and at least an electron source 21a, 21b operable to produce an upstream electron beam EB1, EB2 comprising bunches of electrons. A beam path is configured to direct the upstream electron beam through: a linear accelerator system (LINAC) comprising at least a first and a second linear accelerators 22a, 22b, a bunch compressor 28b, and said undulator 24. The downstream electron beam EB3, EB4 that leaves the undulator 24 recirculates through the second linear accelerator 22b in parallel with the upstream electron beam with a phase such that the downstream beam is decelerated by the second linear accelerator 22b and then recirculates through the first linear accelerator 22a in parallel with the upstream electron beam with a phase such that the downstream beam is decelerated by the first linear accelerator 22a; and to direct the downstream beam to a beam dump 100. At least a first energy spreader 50a, 50b, 50c imparts a reversible change to the energy distribution of bunches of electrons and is located at a position in the beam path before the bunch compressor 28b and so that it is only passed through by the upstream electron beam EB1. A second energy spreader 50d reverses the change to the energy distribution of bunches of electrons imparted by the at least one first energy spreader 50a, 50b, 50c, the second energy spreader 50d being located at a position in the beam path before the undulator 24 and so that it is only passed through by the upstream electron beam EB2.

公开(公告)号：US20250046570A1

公开(公告)日：2025-02-06

申请号：US18920167

申请日：2024-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Petrus Wilhelmus SMORENBURG

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/153 ,  H01J37/28

Abstract: The embodiments of the present disclosure provide a charged particle optical device for projecting charged particle beams towards a sample position, arranged in a grid. The device comprises: a beam limiting aperture array and strip arrays. In the beam limiting aperture array is defined a plurality of apertures so as to generate the grid of beams. The strip arrays are positioned along beam paths. The strip arrays extend across the path of the plurality of beams to operate on the charged particles that pass along the path between strips of the respective strip array to collimate the path of the beams. The orientation of the strips in the array of two different arrays along the beam path are different. The beam limiting aperture array, the strip arrays or both are configured to mitigate a characteristic of the grid that is induced by passage of the beams through the strip arrays.

公开(公告)号：US20240004312A1

公开(公告)日：2024-01-04

申请号：US18253734

申请日：2021-10-28

Applicant: ASML Netherlands B.V. ,  STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  STICHTING VU ,  UNIVERSITEIT VAN AMSTERDAM

Inventor： Peter Michael KRAUS ,  Sylvianne Dorothea Christina ROSCAM ABBING ,  Filippo CAMPI ,  ZhuangYan ZHANG ,  Petrus Wilhelmus SMORENBURG ,  Nan LIN ,  Stefan Michiel WITTE ,  Arie Jeffrey DEN BOEF

IPC: G03F7/00 ,  G02F1/35 ,  H05G2/00

CPC classification number: G03F7/70641 ,  G03F7/706849 ,  G02F1/353 ,  G02F1/3505 ,  G02F1/3507 ,  H05G2/00

Abstract: Disclosed is a metrology apparatus for measurement of a target formed on a substrate by a lithographic process and associated method. The metrology apparatus comprises a radiation source operable to provide first radiation; a configured solid high harmonic generation medium being configured to receive and be excited by said first radiation to generate high harmonic second radiation from an output surface of the configured solid high harmonic generation medium; and a detection arrangement operable to detect said second radiation, at least a portion of which having been scattered by said target. The configured solid high harmonic generation medium is configured to shape the beam of said second radiation and/or separate said first and second radiation.

公开(公告)号：US20220382124A1

公开(公告)日：2022-12-01

申请号：US17769725

申请日：2020-10-07

Applicant: ASML Netherlands B.V.

Inventor： Wenjie JIN ,  Nan LIN ,  Christina Lynn PORTER ,  Petrus Wilhelmus SMORENBURG

IPC: G02F1/35 ,  G02F1/355 ,  G03F7/20

Abstract: Disclosed is an illumination source comprising a gas delivery system comprising a gas nozzle. The gas nozzle comprises an opening in an exit plane of the gas nozzle. The gas delivery system is configured to provide a gas flow from the opening for generating an emitted radiation at an interaction region. The illumination source is configured to receive a pump radiation having a propagation direction and to provide the pump radiation in the gas flow. A geometry shape of the gas nozzle is adapted to shape a profile of the gas flow such that gas density of the gas flow first increases to a maximum value and subsequently falls sharply in a cut-off region along the propagation direction.

公开(公告)号：US20180368243A1

公开(公告)日：2018-12-20

申请号：US15988119

申请日：2018-05-24

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Gerrit Jacobus Hendrik Brussaard ,  Vadim Yevgenyevich Banine

IPC: H05G2/00 ,  G01N21/956 ,  G03F7/20 ,  G01N21/88

CPC classification number: H05G2/008 ,  G01N21/8806 ,  G01N21/956 ,  G01N2021/95676 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  H05G2/003 ,  H05H1/24

Abstract: Methods and apparatus for generation of radiation by high harmonic generation, HHG. The apparatus comprises: a chamber for holding a vacuum, the chamber comprising a radiation input, a radiation output and an interaction region at which, in use, a medium is present, the chamber being arranged such that, in use, when driving radiation propagates through the radiation input and is incident upon the medium, the medium emits radiation via HHG, the emitted radiation propagating through the radiation output; and at least one plasma generator at the radiation input and/or the radiation output for generating a plasma volume allowing the driving radiation and emitted radiation, respectively, to propagate through the plasma volume.

公开(公告)号：US20240377765A1

公开(公告)日：2024-11-14

申请号：US18286486

申请日：2022-03-31

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Stephen EDWARD ,  Sjoerd Nicolaas Lambertus DONDERS ,  Adrianus Johannes Hendrikus SCHELLEKENS ,  David Q'DWYER ,  Andrey NIKIPELOV ,  Gosse Charies DE VRIES

IPC: G03F7/00 ,  G02F1/35

Abstract: An assembly comprises a space configured for placing a medium to receive a first radiation for generating a second radiation. In operation, the second radiation propagates coaxially with the first radiation after the medium. The assembly further comprises an optical element after the medium for transmitting or reflecting the first radiation with a surface area. The assembly is configured such that, in operation, a cleaning gas is in contact with the surface area. A reactive medium is generated from at least a part of the cleaning gas by the second radiation for removing a contamination from the surface area.

公开(公告)号：US20240168392A1

公开(公告)日：2024-05-23

申请号：US18277188

申请日：2022-01-12

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Johan REININK ,  Marinus Petrus REIJNDERS ,  Han-Kwang NIENHUYS ,  David O'DWYER ,  Sander Bas ROOBOL ,  Christina Lynn PORTER ,  Stephen EDWARD

IPC: G03F7/00 ,  G21K1/10

CPC classification number: G03F7/706849 ,  G03F7/70233 ,  G03F7/70308 ,  G03F7/70316 ,  G21K1/10

Abstract: An assembly and method for separating first radiation and second radiation in the far field, wherein the first radiation and the second radiation have non-overlapping wavelengths, The assembly comprises a capillary structure, wherein the first radiation and the second radiation propagate coaxially along at least a portion of the capillary structure, and an optical structure configured to control the spatial distribution of the first radiation outside of the capillary structure, through interference, such that the intensity of the first radiation in the far field is reduced along an optical axis of the second radiation.