公开(公告)号：US20130162966A1

公开(公告)日：2013-06-27

申请号：US13687524

申请日：2012-11-28

Applicant: ASML Netherlands B.V.

Inventor： Ruud Antonius Catharina Maria BEERENS ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Theodorus Petrus Maria Cadee ,  Raymond Wilhelmus Louis Lafarre

IPC: G01B11/14 ,  G03F7/20

CPC classification number: G01B11/14 ,  G03F7/70008 ,  G03F7/70775

Abstract: A displacement measurement system comprising at least one retro reflector and a diffraction grating. Said displacement measurement system is constructed and arranged to measure a displacement by providing a first beam of radiation to the measurement system, wherein the diffraction grating is arranged to diffract the first beam of radiation a first time to form diffracted beams. The at least one retro reflector is arranged to subsequently redirect the diffracted beams to diffract a second time on the diffraction grating. The at least one retro reflector is arranged to redirect the diffraction beams to diffract at least a third time on the diffraction grating before the diffracted beams are being recombined to form a second beam. And the displacement system is provided with a sensor configured to receive the second beam and determine the displacement from an intensity of the second beam.

Abstract translation: 一种位移测量系统，包括至少一个回射反射器和衍射光栅。 所述位移测量系统被构造和布置成通过向测量系统提供第一辐射束来测量位移，其中衍射光栅被布置成第一次衍射第一辐射束以形成衍射光束。 所述至少一个回射反射器被布置成随后重定向衍射光束以在衍射光栅上第二次衍射。 所述至少一个回射反射器被布置成在衍射光束被重新组合以形成第二光束之前将衍射光束重定向至少在衍射光栅上衍射至少三次。 并且位移系统设置有被配置为接收第二光束并且从第二光束的强度确定位移的传感器。

公开(公告)号：US20220206397A1

公开(公告)日：2022-06-30

申请号：US17600763

申请日：2020-04-03

Applicant: ASML Netherlands B.V. ,  Trumpf Lasersystems For Semiconductor Manufacturing GmbH

Inventor： Ruud Antonius Catharina Maria BEERENS ,  Nico Johannes Antonius BOONEN ,  Stefan Michael Bruno BÄUMER ,  Tolga Mehmet ERGIN ,  Andreas Kristian HOPF ,  Derk Jan Wilfred KLUNDER ,  Martin Anton LAMBERT ,  Stefan PIEHLER ,  Manisha RANJAN ,  Frank Bernhard SPERLING ,  Andrey Sergeevich TYCHKOV ,  Jasper WITTE ,  Jiayue YUAN

IPC: G03F7/20 ,  H05G2/00 ,  H01S3/00

Abstract: A laser focusing system (330) for use in an EUV radiation source is described, the laser focusing system comprising: •—a first curved mirror (330.1) configured to receive a laser beam from a beam delivery system (320) and generate a first reflected laser beam (316); •—a second curved mirror (330.2) configured to receive the first reflected laser beam (316) and generate a second reflected laser beam (317), wherein the laser focusing system (330) is configured to focus the second reflected laser beam (317) to a target location (340) in a vessel (350) of the EUV radiation source (360).

公开(公告)号：US20160026091A1

公开(公告)日：2016-01-28

申请号：US14775263

申请日：2014-02-26

Applicant: ASML NETHERLANDS B.V. ,  CARL ZEISS SMT GMBH

Inventor： Erik Roelof LOOPSTRA ,  Olav Waldemar Vladimir FRIJNS ,  Stig BIELING ,  Antonius Theodorus Wilhelmus KEMPEN ,  Ivo VANDERHALLEN ,  Nicolaas TEN KATE ,  Ruud Antonius Catharina Maria BEERENS ,  Richard Henricus Adrianus VAN LIESHOUT ,  Theodorus Petrus Maria CADEE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Alexander Matthijs STRUYCKEN ,  Marcus Petrus SCHEEPERS

IPC: G03F7/20 ,  G21K1/06 ,  G02B5/08 ,  H05G2/00 ,  G02B19/00

CPC classification number: G03F7/70033 ,  G02B5/0891 ,  G02B19/0095 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/067 ,  H05G2/003 ,  H05G2/008

Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.

Abstract translation: 一种辐射收集器，包括第一收集器段，该第一收集器段包括多个掠入射反射器壳体，所述多个入射反射器壳体被配置为引导辐射在离辐射收集器一定距离处的第一位置会聚;第二收集器部分，其包括多个入射入射反射器壳体， 以在距离辐射收集器的所述距离处会聚在第二位置，其中第一位置和第二位置彼此分离。

公开(公告)号：US20220390850A1

公开(公告)日：2022-12-08

申请号：US17775361

申请日：2020-10-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Ruud Antonius Catharina Maria BEERENS ,  Koen Gerhardus WINKELS ,  Dirk Willem HARBERTS ,  Lucas Henricus Johannes STEVENS ,  Dennis Dominic VAN DER VOORT ,  Edwin Johannes Cornelis BOS ,  George Alois Leonie LEENKNEGT ,  Nicolaas TEN KATE

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/67

Abstract: A substrate support is configured to support a substrate. The substrate support comprises a plurality of burls protruding from a base surface of the substrate support. The burls have distal ends in a plane for supporting a lower surface of the substrate with a gap between the base surface of the substrate support and the lower surface of the substrate. The substrate support comprises a liquid supply channel for supplying a conductive liquid to the gap so as to bridge the gap between the base surface of the substrate support and the lower surface of the substrate, thereby allowing charge to pass between the substrate support and the substrate. The substrate support has a controlled electrical potential such that charge distribution at the lower surface of the substrate can be manipulated.

公开(公告)号：US20170277042A1

公开(公告)日：2017-09-28

申请号：US15505885

申请日：2015-07-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Antonius Gerardus AKKERMANS ,  Ruud Antonius Catharina Maria BEERENS ,  Sander Christiaan BROERS ,  Jeroen Johannes Theodorus Hendrikus DE BEST ,  Adrianus Marinus Wouter HEEREN ,  George Alois Leonie LEENKNEGT ,  Bo LENSSEN ,  Hendrikus Johannes SCHELLENS ,  Peter VAN DER KRIEKEN ,  Theodorus Petrus Maria CADEE ,  Jan VAN EIJK ,  Richard Henricus Adrianus VAN LIESHOUT

IPC: G03F7/20 ,  G01L1/16

CPC classification number: G03F7/70775 ,  G01L1/16 ,  G01P15/0915 ,  G01P15/18 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/7085

Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.

公开(公告)号：US20160349628A1

公开(公告)日：2016-12-01

申请号：US15235542

申请日：2016-08-12

Applicant: ASML Netherlands B.V.

Inventor： Arno Jan BLEEKER ,  Thomas Josephus Maria CASTENMILLER ,  Pieter Willem Herman DEJAGER ,  Heine Melle MULDER ,  Koen Jacobus Johannes ZAAL ,  Theodorus Petrus Maria CADEE ,  Danny Maria Hubertus PHILIPS ,  Ruud Antonius Catharina Maria BEERENS ,  Roger Anton Marie TIMMERMANS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/20 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70366 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70425 ,  G03F7/70475

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.

Abstract translation: 配置成将辐射束投影到目标上的投影系统包括可旋转框架，其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在仅切向 或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。