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公开(公告)号：US20190155172A1
公开(公告)日：2019-05-23
申请号：US16313816
申请日：2017-06-16
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
IPC: G03F7/20 , G01N21/47 , G01N21/956
CPC classification number: G03F7/70625 , G01N21/47 , G01N21/956 , G02B5/005 , G02B26/0833 , G02B27/283 , G03F7/70633
Abstract: An illumination system for a metrology apparatus that can achieve illumination spatial profile flexibility, high polarization extinction ratio, and high contrast. The illumination system includes a polarizing beam splitter (PBS), an illumination mode selector (IMS), and a reflective spatial light modulator (SLM). The PBS divides an illumination beam into sub-beams. The IMS has a plurality of apertures that transmits at least one sub-beam and may be arranged in multiple illumination positions corresponding to illumination modes. A pixel array of the reflective SLM and reflects a portion of the sub-beam transmitted by the IMS back to the IMS and PBS. The PBS, IMS, SLM collectively generates a complex amplitude or intensity spatial profile of the transmitted sub-beam.
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公开(公告)号：US20170191944A1
公开(公告)日：2017-07-06
申请号：US15387610
申请日：2016-12-21
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Yevgeniy Konstantinovich SHMAREV , Stanislav SMIRNOV , Chien-Hung TSENG , Armand Eugene Albert KOOLEN
IPC: G01N21/88 , G01N21/95 , G03F7/20 , G01N21/956
CPC classification number: G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/8822 , G01N2021/95676 , G01N2201/0638 , G03F7/70625 , G03F7/70641
Abstract: An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.
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公开(公告)号：US20240302164A1
公开(公告)日：2024-09-12
申请号：US18580062
申请日：2022-07-18
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G01B11/272 , G03F7/70633 , G03F7/706849 , G03F7/706851
Abstract: An optical element, and a metrology tool or system employing the optical element for measurements of structures on a substrate. The optical element includes a first portion configured to reflect the light received from an illumination source towards the substrate, and a second portion configured to transmit the light redirected from the substrate or a desired location, the first portion having a higher coefficient of reflectivity than the second portion, and the second portion having a higher coefficient of transmissivity than the first portion. A metrology tool may include the optical elements and a sensor configured to receive a diffraction pattern caused by radiation redirected from a substrate, and a processor configured to receive a signal relating to the diffraction pattern from the sensor, and determine overlay associated with the substrate by analyzing the signal.
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公开(公告)号：US20230059471A1
公开(公告)日：2023-02-23
申请号：US17796640
申请日：2021-01-21
Applicant: ASML Holding N.V.
Inventor： Mohamed SWILLAM , Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Stephen ROUX , Yevgeniy Konstantinovich SHMAREV
Abstract: A compact sensor apparatus having an illumination beam, a beam shaping system, a polarization modulation system, a beam projection system, and a signal detection system. The beam shaping system is configured to shape an illumination beam generated from the illumination system and generate a flat top beam spot of the illumination beam over a wavelength range from 400 nm to 2000 nm. The polarization modulation system is configured to provide tenability of linear polarization state of the illumination beam. The beam projection system is configured to project the flat top beam spot toward a target, such as an alignment mark on a substrate. The signal detection system is configured to collect a signal beam comprising diffraction order sub-beams generated from the target, and measure a characteristic (e.g., overlay) of the target based on the signal beam.
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公开(公告)号：US20180067057A1
公开(公告)日：2018-03-08
申请号：US15683473
申请日：2017-08-22
Applicant: ASML HOLDING N.V.
Inventor： Yevgeniy Konstantinovich SHMAREV , Stanislav SMIRNOV
Abstract: An inspection apparatus includes an inspection optical system configured to a direct an inspection beam onto a surface of a substrate, the inspection optical system having an objective, a focus measurement optical system configured to receive a focus measurement beam, redirected by the substrate, from the objective, the focus measurement optical system having a movable reflective element configured to receive the focus measurement beam, and a control system configured to cause movement of the reflective element with a direction component along a beam path of the focus measurement beam and configured to determine whether the substrate surface is in the focus of the objective based on the focus measurement beam.
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Patent Agency Ranking
公开(公告)号：US20190179162A1
公开(公告)日：2019-06-13
申请号：US16217424
申请日：2018-12-12
Applicant: ASML Holding N.V.
Inventor： Douglas C. CAPPELLI , Stanislav SMIRNOV , Richard Carl ZIMMERMAN , Joshua ADAMS , Alexander Kenneth RAUB , Yevgeniy Konstantinovich SHMAREV
Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.
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公开(公告)号：US20130170049A1
公开(公告)日：2013-07-04
申请号：US13687630
申请日：2012-11-28
Applicant: ASML Holding N.V.
Inventor： Stanislav Y. SMIRNOV , Adel JOOBEUR , Yevgeniy Konstantinovich SHMAREV , Arun Mahadevan VENKATARAMAN
IPC: G02B17/08
CPC classification number: G02B17/08 , G02B17/0856 , G02B17/0892 , G03F7/70625 , G03F7/70633
Abstract: A system and method is described for correcting aberrations caused by field curvature with a catadioptric objective. In one example, a catadioptric optical system includes a first catadioptric element and a second catadioptric element. The first catadioptric element includes a first surface positioned to reflect a beam and a second surface positioned to focus the beam reflected by the first surface. The second catadioptric element is configured to receive the beam reflected by the second surface of the first catadioptric element. The second catadioptric element includes a third surface positioned to reflect the beam, and a fourth reflective surface positioned to focus the beam reflected by the third reflective surface. A curvature of the third or fourth surfaces of the second catadioptric element is chosen to apply a positive contribution to a field curvature associated with the first catadioptric element.
Abstract translation: 描述了一种系统和方法，用于校正由反射折射物镜由场曲率引起的像差。 在一个示例中，反射折射光学系统包括第一反射折射元件和第二反射折射元件。 第一反射折射元件包括被定位成反射光束的第一表面和被定位成聚焦由第一表面反射的光束的第二表面。 第二反射折射元件被配置为接收由第一反射折射元件的第二表面反射的光束。 第二反射折射元件包括被定位成反射光束的第三表面和被定位成聚焦由第三反射表面反射的光束的第四反射表面。 选择第二反射折射元件的第三或第四表面的曲率以对与第一反射折射元件相关联的场曲率施加正贡献。
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公开(公告)号：US20160209755A1
公开(公告)日：2016-07-21
申请号：US14970247
申请日：2015-12-15
Applicant: ASML Holding N.V.
Inventor： Yevgeniy Konstantinovich SHMAREV , Stanislav SMIRNOV
CPC classification number: G03F7/70133 , G01N21/4738 , G01N2201/061 , G01N2201/06113 , G01N2201/068 , G02B5/04 , G02B27/106 , G03F7/70091 , G03F7/70191 , G03F7/70208
Abstract: An inspection apparatus may determine precise OV measurements of a target on a substrate using an optical pupil symmetrizer to reduce the inspection apparatus's sensitivity to asymmetry and non-uniformity of the illumination beam in the pupil plane. The inspection apparatus includes an illumination system that forms a symmetrical illumination pupil by (1) splitting an illumination beam into sub-beams, (2) directing the sub-beams along different optical branches, (3) inverting or rotating at least one of the sub-beams in two dimensions, and recombining the sub-beams along the illumination path to symmetrize the intensity distribution. The illumination system is further configured such that the first and second sub-beams have an optical path difference that is greater than a temporal coherence length of the at least one light source and less than a depth of focus in the pupil plane of the objective optical system.
Abstract translation: 检查装置可以使用光瞳对称器来确定基板上的目标物的精确的OV测量，以减小检查装置对瞳孔平面中的照明束的不对称性和不均匀性的敏感度。 检查装置包括：（1）将照明光束分成子光束形成对称的照明光瞳的照明系统，（2）沿着不同的光分支引导子光束，（3）反转或旋转至少一个 子光束在二维中，并且沿着照明路径重新组合子光束以使强度分布对称化。 该照明系统被进一步配置成使得第一和第二子光束的光程差大于至少一个光源的时间相干长度，并且小于物镜光瞳面中的焦深 系统。
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公开(公告)号：US20200326556A1
公开(公告)日：2020-10-15
申请号：US16913698
申请日：2020-06-26
Applicant: ASML Holding N.V.
Inventor： Douglas C. CAPPELLI , Stanislav SMIRNOV , Richard Carl ZIMMERMAN , Joshua ADAMS , Alexander Kenneth RAUB , Yevgeniy Konstantinovich SHMAREV
IPC: G02B27/28 , G01N21/47 , G03F7/20 , G01N21/956
Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.
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公开(公告)号：US20150116719A1
公开(公告)日：2015-04-30
申请号：US14592755
申请日：2015-01-08
Applicant: ASML HOLDING N.V.
Inventor： Stanislav Y. SMIRNOV , Yevgeniy Konstantinovich SHMAREV
IPC: G01N21/47 , G02B17/08 , G01N21/956
CPC classification number: G03F7/70225 , G01N21/4738 , G01N21/4788 , G01N21/9501 , G01N21/956 , G01N2201/062 , G01N2201/0636 , G01N2201/0638 , G02B17/08 , G02B17/0876 , G02B21/0016 , G02B21/04 , G03F7/70625
Abstract: A catadioptric optical system operates in a wide spectral range. In an embodiment, the catadioptric optical system includes a first reflective surface positioned and configured to reflect radiation; a second reflective surface positioned and configured to reflect radiation reflected from the first reflective surface as a collimated beam, the second reflective surface having an aperture to allow transmission of radiation through the second reflective surface; and a channel structure extending from the aperture toward the first reflective surface and having an outlet, between the first reflective surface and the second reflective surface, to supply radiation to the first reflective surface.
Abstract translation: 反射折射光学系统在宽光谱范围内工作。 在一个实施例中，反折射光学系统包括定位和配置成反射辐射的第一反射表面; 第二反射表面，被定位和配置为反射从第一反射表面反射的辐射作为准直光束，第二反射表面具有孔，以允许辐射透过第二反射表面; 以及从所述孔向所述第一反射表面延伸并且在所述第一反射表面和所述第二反射表面之间具有出口的通道结构，以向所述第一反射表面提供辐射。
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