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    OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION
    1.
    发明申请
    OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION 有权
    具有热衰减的光学成像装置

    公开(公告)号：US20090135385A1

    公开(公告)日：2009-05-28

    申请号：US12267074

    申请日：2008-11-07

    申请人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

    发明人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70341 ,  G03F7/70891

    摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.

    摘要翻译： 特别是用于微光刻的光学成像装置包括用于接收具有投影图案的掩模的掩模装置，具有光学元件组的投影装置，用于接收基板的基板装置和浸没区。 光学元件组适于将投影图案投影到基板上并且包括具有浸没元件的多个光学元件，基板在工作期间至少临时定位到该浸没元件。 在操作期间，浸没区域位于浸没元件和基底之间，并且至少暂时填充浸渍介质。 提供一种热衰减装置，该热衰减装置适于减少浸入式介质引起的浸没元件的温度分布内的波动。

    Optical imaging device with thermal attenuation
    2.
    发明授权
    Optical imaging device with thermal attenuation 有权
    具有热衰减的光学成像装置

    公开(公告)号：US08363206B2

    公开(公告)日：2013-01-29

    申请号：US12267074

    申请日：2008-11-07

    申请人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

    发明人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

    IPC分类号： G03B27/52 ,  G03B27/42

    CPC分类号： G03F7/70341 ,  G03F7/70891

    摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.

    摘要翻译： 特别是用于微光刻的光学成像装置包括用于接收具有投影图案的掩模的掩模装置，具有光学元件组的投影装置，用于接收基板的基板装置和浸没区。 光学元件组适于将投影图案投影到基板上并且包括具有浸没元件的多个光学元件，基板在工作期间至少临时定位到该浸没元件。 在操作期间，浸没区域位于浸没元件和基底之间，并且至少暂时填充浸渍介质。 提供一种热衰减装置，该热衰减装置适于减少浸入式介质引起的浸没元件的温度分布内的波动。

    Adjustment Arrangement of an Optical Element
    8.
    发明申请
    Adjustment Arrangement of an Optical Element 有权
    光学元件的调整布置

    公开(公告)号：US20090009892A1

    公开(公告)日：2009-01-08

    申请号：US12211978

    申请日：2008-09-17

    申请人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

    发明人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

    IPC分类号： G02B7/04

    CPC分类号： G03F7/70258 ,  G02B7/023 ,  G03F7/70825

    摘要： A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).

    摘要翻译： 一种布置用于调整光学元件（1），特别是光学系统中的透镜的调整，特别是用于半导体光刻的投影透镜系统中。 光学元件（1）通过分布在光学元件（1）的圆周上的多个轴承脚（2）安装在安装件（3）中，并且可由致动器（5）选择性地变形。 至少一些轴承脚（2）在相应的轴承座（2）的区域中被致动器（5）接合，使得相应的轴承座（2）可以沿着光学方向 轴（7）。