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公开(公告)号：US07400460B2
公开(公告)日：2008-07-15
申请号：US10599784
申请日：2005-04-16
IPC分类号： G02B7/02
CPC分类号： G02B7/021 , G02B13/143 , G03F7/70341 , G03F7/70808 , G03F7/70825
摘要： The invention relates to a method for connection of an optical element to a mount structure, whereby in a first step the optical element is connected to the mount structure and in a second step the optical element is welded to the mount structure in the region of the connection.
摘要翻译： 本发明涉及一种用于将光学元件连接到安装结构的方法，由此在第一步骤中，光学元件连接到安装结构，并且在第二步骤中，光学元件在该区域中被焊接到安装结构 连接。
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公开(公告)号：US20070171552A1
公开(公告)日：2007-07-26
申请号：US10599784
申请日：2005-04-16
IPC分类号： G02B7/02
CPC分类号： G02B7/021 , G02B13/143 , G03F7/70341 , G03F7/70808 , G03F7/70825
摘要： The invention relates to a method for connection of an optical element to a mount structure, whereby in a first step the optical element is connected to the mount structure and in a second step the optical element is welded to the mount structure in the region of the connection.
摘要翻译： 本发明涉及一种用于将光学元件连接到安装结构的方法，由此在第一步骤中，光学元件连接到安装结构，并且在第二步骤中，光学元件在该区域中被焊接到安装结构 连接。
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公开(公告)号：US20090009892A1
公开(公告)日：2009-01-08
申请号：US12211978
申请日：2008-09-17
申请人： Klaus Beck , Bernhard Gellrich , Hubert Holderer , Thomas Petasch , Cornelia Roesch , Alexander Kohl
发明人： Klaus Beck , Bernhard Gellrich , Hubert Holderer , Thomas Petasch , Cornelia Roesch , Alexander Kohl
IPC分类号： G02B7/04
CPC分类号： G03F7/70258 , G02B7/023 , G03F7/70825
摘要： A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).
摘要翻译： 一种布置用于调整光学元件（1），特别是光学系统中的透镜的调整，特别是用于半导体光刻的投影透镜系统中。 光学元件（1）通过分布在光学元件（1）的圆周上的多个轴承脚（2）安装在安装件（3）中，并且可由致动器（5）选择性地变形。 至少一些轴承脚（2）在相应的轴承座（2）的区域中被致动器（5）接合，使得相应的轴承座（2）可以沿着光学方向 轴（7）。
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公开(公告)号：US20080100930A1
公开(公告)日：2008-05-01
申请号：US12002694
申请日：2007-12-17
申请人： Hubert Holderer , Werner Lang , Alexander Kohl , Bernhard Gellrich , Hartmut Brandenburg , Johannes Rau , Armin Schoeppach
发明人： Hubert Holderer , Werner Lang , Alexander Kohl , Bernhard Gellrich , Hartmut Brandenburg , Johannes Rau , Armin Schoeppach
CPC分类号： G03F7/70591 , G02B27/62 , G03F7/70258
摘要： An optical measuring system is provided with a measuring machine that has at least one measuring element for determining locations and at least one measuring element for determining angles. At least one common reference surface is provided for the location-determining measuring element and the angle-determining measuring element.
摘要翻译： 光学测量系统设置有测量机，该测量机具有用于确定位置的至少一个测量元件和用于确定角度的至少一个测量元件。 为位置确定测量元件和角度确定测量元件提供至少一个公共参考表面。
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公开(公告)号：US07570343B2
公开(公告)日：2009-08-04
申请号：US11285283
申请日：2005-11-23
申请人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
发明人： Aurelian Dodoc , Karl Heinz Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.
摘要翻译： 微光投影曝光装置包括用于产生投影光的照明系统和投影透镜，能够将能够布置在投影透镜的物平面中的光罩成像到能够布置的感光层上的投影透镜 在投影透镜的图像平面中。 投影透镜被设计用于浸没模式，其中在图像侧的投影透镜的最终透镜元件浸入浸没液体中。 相对于突起而言透明的端接元件紧固在图像侧的最终透镜元件与感光层之间。
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公开(公告)号：US20060187430A1
公开(公告)日：2006-08-24
申请号：US11285283
申请日：2005-11-23
申请人： Aurelian Dodoc , Karl Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
发明人： Aurelian Dodoc , Karl Schuster , Joerg Mallmann , Wilhelm Ulrich , Hans-Juergen Rostalski , Hubert Holderer , Bernhard Gellrich , Juergen Fischer , Susanne Beder , Andreas Wurmbrand , Ulrich Loering , Albrecht Ranck
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70833 , G03F7/70916 , G03F7/70975 , G03F7/70983
摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.
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公开(公告)号：US06842294B2
公开(公告)日：2005-01-11
申请号：US10118479
申请日：2002-04-08
申请人： Hubert Holderer , Ulrich Weber , Alexander Kohl , Toralf Gruner , Christoph Zaczek , Jens Ullmann , Martin Weiser , Bernhard Gellrich , Hartmut Muenker
发明人： Hubert Holderer , Ulrich Weber , Alexander Kohl , Toralf Gruner , Christoph Zaczek , Jens Ullmann , Martin Weiser , Bernhard Gellrich , Hartmut Muenker
IPC分类号： G02B17/08 , G03F7/20 , H01L21/027 , G02B3/00 , G02B17/00
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225
摘要： A catadioptric objective comprises a plurality of lenses and at least two deflecting mirrors that have reflecting surfaces that are at a specific angle, in particular of 90°, to one another. The two deflecting mirrors are arranged with their reflecting surfaces on a common base member whose position in the objective can be set.
摘要翻译： 反射折射物镜包括多个透镜和至少两个偏转镜，其具有彼此具有特定角度，特别是90°的反射表面。 两个偏转镜被布置成其反射表面位于可以设置物镜中的位置的公共基座构件上。
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公开(公告)号：US06744574B2
公开(公告)日：2004-06-01
申请号：US10247964
申请日：2002-09-20
申请人： Ulrich Weber , Jochen Becker , Hubert Holderer , Bernhard Gellrich , Jens Kugler
发明人： Ulrich Weber , Jochen Becker , Hubert Holderer , Bernhard Gellrich , Jens Kugler
IPC分类号： G02B702
CPC分类号： G02B7/02
摘要： A mount for an optical element in an optical imaging device, in particular in a lens system (4) for semiconductor lithography, has at least one mounting ring (2) which bears the optical element (6). The mounting ring (2) is of at least partially hollow design in cross section.
摘要翻译： 用于光学成像装置中的光学元件的安装件，特别是在用于半导体光刻的透镜系统（4）中，具有至少一个承载光学元件（6）的安装环（2）。 安装环（2）的截面至少部分为中空设计。
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公开(公告)号：US08363206B2
公开(公告)日：2013-01-29
申请号：US12267074
申请日：2008-11-07
申请人： Bernhard Gellrich , Jens Kugler , Thomas Ittner , Stefan Hembacher , Karl-Heinz Schimitzek , Payam Tayebati , Hubert Holderer
发明人： Bernhard Gellrich , Jens Kugler , Thomas Ittner , Stefan Hembacher , Karl-Heinz Schimitzek , Payam Tayebati , Hubert Holderer
CPC分类号： G03F7/70341 , G03F7/70891
摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.
摘要翻译： 特别是用于微光刻的光学成像装置包括用于接收具有投影图案的掩模的掩模装置，具有光学元件组的投影装置，用于接收基板的基板装置和浸没区。 光学元件组适于将投影图案投影到基板上并且包括具有浸没元件的多个光学元件，基板在工作期间至少临时定位到该浸没元件。 在操作期间，浸没区域位于浸没元件和基底之间，并且至少暂时填充浸渍介质。 提供一种热衰减装置，该热衰减装置适于减少浸入式介质引起的浸没元件的温度分布内的波动。
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公开(公告)号：US07656595B2
公开(公告)日：2010-02-02
申请号：US12211978
申请日：2008-09-17
申请人： Klaus Beck , Bernhard Gellrich , Hubert Holderer , Thomas Petasch , Cornelia Roesch , Alexander Kohl
发明人： Klaus Beck , Bernhard Gellrich , Hubert Holderer , Thomas Petasch , Cornelia Roesch , Alexander Kohl
IPC分类号： G02B7/02
CPC分类号： G03F7/70258 , G02B7/023 , G03F7/70825
摘要： A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).
摘要翻译： 一种布置用于调整光学元件（1），特别是调整光学系统中的透镜，特别是在用于半导体光刻的投影透镜系统中。 光学元件（1）通过分布在光学元件（1）的圆周上的多个轴承脚（2）安装在安装件（3）中，并且可由致动器（5）选择性地变形。 至少一些轴承脚（2）在相应的轴承座（2）的区域中被致动器（5）接合，使得相应的轴承座（2）可以沿着光学方向 轴（7）。
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