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1.发明申请公开(公告)号：US20170320279A1
公开(公告)日：2017-11-09
申请号：US15523212
申请日：2015-10-28
Applicant: DEXERIALS CORPORATION
Inventor： Yutaka MURAMOTO , Masanao KIKUCHI
CPC classification number: B29D7/01 , B29C35/10 , B29C59/04 , B29C59/046 , B29C2035/0827 , B29C2059/023 , B29D11/00596 , B29D11/00788 , B29K2105/16 , B32B3/28 , G02B27/2292 , H01L23/49816
Abstract: There is provided a filler-filled film, a sheet film, a stacked film, a bonded body, and a method for producing a filler-filled film, the filler-filled film including: a film main body; a plurality of concavities formed on a surface of the film main body; and a filler put in each of the concavities. A diameter of an opening surface of the concavity is at least larger than a visible light wavelength, an arrangement pattern of the concavities has periodicity along a length direction of the film main body, and the difference between the rate of filling of the fillers in one end portion of the film main body and the rate of filling of the fillers in another portion of the film main body is less than 0.5%.
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公开(公告)号：US20160214282A1
公开(公告)日：2016-07-28
申请号：US15026509
申请日：2014-12-04
Applicant: DEXERIALS CORPORATION
Inventor： Yutaka MURAMOTO , Masanao KIKUCHI , Shunichi KAJIYA , Takaaki OTOWA , Yasuhiro TAKAHASHI
CPC classification number: B29D11/0074 , B29C33/38 , B29C33/3842 , B29C33/424 , B29C35/0805 , B29C35/0888 , B29C41/28 , B29C59/04 , B29C59/046 , B29K2909/08 , B29L2011/00 , C03C15/00 , C03C2218/34 , G03F7/0002 , G03F7/24 , G11B7/261
Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.
Abstract translation: 提供了一种圆柱形基座，主机和用于制造能够均匀转移精细图案的主机的方法。 使用具有双折射小于70nm / cm的内部应变的石英玻璃的圆柱形基座。 将抗蚀剂层沉积到该圆筒形基底的外圆周表面上，在抗蚀剂层上形成潜像，将形成在抗蚀剂层上的潜像显影，并将显影的抗蚀剂层的图案用作蚀刻掩模 以形成在圆筒形基座的外圆周表面上设置成多排的凹凸的结构。
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公开(公告)号：US20230228915A1
公开(公告)日：2023-07-20
申请号：US18021315
申请日：2021-09-29
Applicant: DEXERIALS CORPORATION
Inventor： Yutaka MURAMOTO
CPC classification number: G02B1/14 , G02B1/111 , G03F7/0005
Abstract: Visibility of an optical film at the time of handling can be improved, and an antireflection region and a visible region can be easily formed on a surface of the optical film in an identical processing step. An optical film 1 includes a base material 11 having flexibility and a resin layer 12 laminated on at least one of surfaces of the base material 11. The resin layer 12 includes a concave-convex pattern region 2 in which a micro concave-convex structure 20 composed of a plurality of convexities 21 or concavities 22 arrayed at a pitch P less than or equal to a wavelength of visible light are formed and a strip-shaped line marker region 3 in which a plurality of ridge portions 31 arrayed at intervals from one another at a track pitch Pt more than or equal to the wavelength of visible light are formed.
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公开(公告)号：US20180281239A1
公开(公告)日：2018-10-04
申请号：US15950596
申请日：2018-04-11
Applicant: DEXERIALS CORPORATION
Inventor： Yutaka MURAMOTO , Masanao KIKUCHI , Shunichi KAJIYA , Takaaki OTOWA , Yasuhiro TAKAHASHI
IPC: B29C33/42 , G11B7/26 , B29C33/38 , G03F7/00 , G03F7/24 , B29C35/08 , B29C41/28 , B29C59/04 , C03C15/00 , B29D11/00 , B29L11/00
Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.
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公开(公告)号：US20210387429A1
公开(公告)日：2021-12-16
申请号：US17393963
申请日：2021-08-04
Applicant: DEXERIALS CORPORATION
Inventor： Yutaka MURAMOTO , Masanao KIKUCHI , Shunichi KAJIYA , Takaaki OTOWA , Yasuhiro TAKAHASHI
IPC: B29D11/00 , B29C41/28 , G11B7/26 , B29C33/38 , G03F7/00 , G03F7/24 , C03C15/00 , B29C59/04 , B29C33/42 , B29C35/08
Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.
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Patent Agency Ranking
公开(公告)号：US20210132493A1
公开(公告)日：2021-05-06
申请号：US17144670
申请日：2021-01-08
Applicant: DEXERIALS CORPORATION
Inventor： Yutaka MURAMOTO , Masanao KIKUCHI
Abstract: There is provided an embossed film in which the frequency of loss of concavities is smaller, the embossed film including: a film main body; and a plurality of concavities formed on a surface of the film main body. A diameter of an opening surface of the concavity is larger than a visible light wavelength, an arrangement pattern of the concavities has periodicity along a length direction of the film main body, and the difference between the rate of loss of concavities in one end portion of the film main body and the rate of loss of concavities in the other end portion of the film main body is 10 ppm or less.
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公开(公告)号：US20220003897A1
公开(公告)日：2022-01-06
申请号：US17470339
申请日：2021-09-09
Applicant: DEXERIALS CORPORATION
Inventor： Shunichi KAJIYA , Hideki TERASHIMA , Yutaka MURAMOTO , Masanao KIKUCHI , Takaaki OTOWA
Abstract: There is provided an optical body with improved antireflection capability, a display device, and a method for manufacturing an optical body, the optical body including: a first concave-convex structure formed on a surface of a base material;
and a second concave-convex structure superimposed on the first concave-convex structure. An average concave-convex period of the first concave-convex structure is larger than a wavelength in a visible light region, an average concave-convex period of the second concave-convex structure is less than or equal to the wavelength in the visible light region, and projecting parts of the second concave-convex structure extend in a direction normal to a flat plane of the base material.-
公开(公告)号：US20170299778A1
公开(公告)日：2017-10-19
申请号：US15508050
申请日：2015-08-31
Applicant: DEXERIALS CORPORATION
Inventor： Shunichi KAJIYA , Hideki TERASHIMA , Yutaka MURAMOTO , Masanao KIKUCHI , Takaaki OTOWA
CPC classification number: G02B1/118 , B29C33/42 , B29C59/046 , B29C2059/023 , G02B1/12 , G02B5/0273 , G02F1/133502 , G02F2201/38
Abstract: There is provided an optical body with improved antireflection capability, a display device, and a method for manufacturing an optical body, the optical body including: a first concave-convex structure formed on a surface of a base material; and a second concave-convex structure superimposed on the first concave-convex structure. An average concave-convex period of the first concave-convex structure is larger than a wavelength in a visible light region, an average concave-convex period of the second concave-convex structure is less than or equal to the wavelength in the visible light region, and projecting parts of the second concave-convex structure extend in a direction normal to a flat plane of the base material.
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公开(公告)号：US20170205707A1
公开(公告)日：2017-07-20
申请号：US15326163
申请日：2015-07-14
Applicant: DEXERIALS CORPORATION
Inventor： Yutaka MURAMOTO , Masanao KIKUCHI
CPC classification number: G03F7/0002 , B29C33/3857 , C23C14/083 , C23C14/34 , C23C16/27 , C23C16/44 , C23C16/56 , C23C28/046 , G03F7/0043 , G03F7/11 , G03F7/2053 , G03F7/24 , G03F7/70025
Abstract: There is provided a method for manufacturing a master on which an arbitrary pattern is formed, the method including: forming a thin-film layer on an outer circumferential surface of a base material in a round cylindrical or round columnar shape; generating a control signal corresponding to an object on the basis of an input image in which the object is depicted; irradiating the thin-film layer with laser light on the basis of the control signal and thereby forming a thin-film pattern corresponding to the object on the thin-film layer; and forming a pattern corresponding to the object on the outer circumferential surface of the base material using, as a mask, the thin-film layer on which the thin-film pattern is formed.
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公开(公告)号：US20230182349A1
公开(公告)日：2023-06-15
申请号：US18106749
申请日：2023-02-07
Applicant: DEXERIALS CORPORATION
Inventor： Yutaka MURAMOTO , Masanao KIKUCHI
CPC classification number: B29C33/3878 , B29C33/424 , B29C59/04 , B29C59/16 , G03F7/00 , B29C59/046 , B29C2035/0827
Abstract: There are provided a master and a method for manufacturing the master, the master having, on its outer peripheral surface, a concave-convex structure in which concavities or convexities are continuously arranged with high precision. The master includes: a substrate with a hollow cylindrical shape or cylindrical shape; and a concave-convex structure on an outer peripheral surface of the substrate. The concave-convex structure has concavities or convexities continuously arranged at a predetermined pitch in a circumferential direction of the substrate. The concavities or convexities are arranged with a predetermined phase difference between circumferential rows adjacent in an axial direction of the substrate.
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