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公开(公告)号：US08080461B2
公开(公告)日：2011-12-20
申请号：US12688083
申请日：2010-01-15
申请人： Der-Chyang Yeh , Hsun-Chung Kuang , Ming Chyi Liu , Chung-Yi Yu , Chih-Ping Chao , Alexander Kalnitsky
发明人： Der-Chyang Yeh , Hsun-Chung Kuang , Ming Chyi Liu , Chung-Yi Yu , Chih-Ping Chao , Alexander Kalnitsky
IPC分类号： H01L21/20 , H01L21/4763
CPC分类号： H01L28/20 , H01L21/76801 , H01L21/76843 , H01L21/76864 , H01L21/76865 , H01L27/016 , H01L28/24
摘要： A method of making a thin film resistor includes: forming a doped region in a semiconductor substrate; forming a dielectric layer over the substrate; forming a thin film resistor over the dielectric layer; forming a contact hole in the dielectric layer before annealing the thin film resistor, wherein the contact hole exposes a portion of the doped region; and performing rapid thermal annealing on the thin film resistor after forming the contact hole.
摘要翻译： 制造薄膜电阻器的方法包括：在半导体衬底中形成掺杂区域; 在所述衬底上形成介电层; 在介电层上形成薄膜电阻; 在退火所述薄膜电阻器之前，在所述电介质层中形成接触孔，其中所述接触孔暴露所述掺杂区域的一部分; 并且在形成接触孔之后对薄膜电阻器进行快速热退火。
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公开(公告)号：US09123671B2
公开(公告)日：2015-09-01
申请号：US12982275
申请日：2010-12-30
IPC分类号： H01L21/322
CPC分类号： H01L21/3225
摘要： Provided is a method of fabricating a semiconductor device. The method includes: receiving a silicon wafer that contains oxygen; forming a zone in the silicon wafer, the zone being substantially depleted of oxygen; causing a nucleation process to take place in the silicon wafer to form oxygen nuclei in a region of the silicon wafer outside the zone; and growing the oxygen nuclei into defects. Also provided is an apparatus that includes a silicon wafer. The silicon wafer includes: a first portion that is substantially free of oxygen, the first portion being disposed near a surface of the silicon wafer; and a second portion that contains oxygen; wherein the second portion is at least partially surrounded by the first portion.
摘要翻译： 提供一种制造半导体器件的方法。 该方法包括：接收含有氧的硅晶片; 在硅晶片中形成区域，该区域基本上耗尽氧气; 导致在硅晶片中发生成核过程，以在区域外的硅晶片的区域中形成氧核; 并将氧原子生长成缺陷。 还提供了一种包括硅晶片的装置。 硅晶片包括：基本上不含氧的第一部分，第一部分设置在硅晶片的表面附近; 和含有氧的第二部分; 其中所述第二部分至少部分地被所述第一部分包围。
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公开(公告)号：US20120168911A1
公开(公告)日：2012-07-05
申请号：US12982275
申请日：2010-12-30
IPC分类号： H01L29/30 , H01L29/20 , H01L21/322
CPC分类号： H01L21/3225
摘要： Provided is a method of fabricating a semiconductor device. The method includes: receiving a silicon wafer that contains oxygen; forming a zone in the silicon wafer, the zone being substantially depleted of oxygen; causing a nucleation process to take place in the silicon wafer to form oxygen nuclei in a region of the silicon wafer outside the zone; and growing the oxygen nuclei into defects. Also provided is an apparatus that includes a silicon wafer. The silicon wafer includes: a first portion that is substantially free of oxygen, the first portion being disposed near a surface of the silicon wafer; and a second portion that contains oxygen; wherein the second portion is at least partially surrounded by the first portion.
摘要翻译： 提供一种制造半导体器件的方法。 该方法包括：接收含有氧的硅晶片; 在硅晶片中形成区域，该区域基本上耗尽氧气; 导致在硅晶片中发生成核过程，以在区域外的硅晶片的区域中形成氧核; 并将氧原子生长成缺陷。 还提供了一种包括硅晶片的设备。 硅晶片包括：基本上不含氧的第一部分，第一部分设置在硅晶片的表面附近; 和含有氧的第二部分; 其中所述第二部分至少部分地被所述第一部分包围。
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4.发明授权Method of manufacturing junction barrier schottky diode with dual silicides 有权制造具有双重硅化物的结型肖特基二极管的方法公开(公告)号：US08647971B2
公开(公告)日：2014-02-11
申请号：US13356624
申请日：2012-01-23
CPC分类号： H01L29/872 , H01L27/0629 , H01L29/456 , H01L29/47 , H01L29/7833
摘要： An integrated circuit, including a junction barrier Schottky diode, has an N type well, a P-type anode region in the surface of the well, and an N-type Schottky region in the surface of the well and horizontally abutting the anode region. A first silicide layer is on and makes a Schottky contact to the Schottky region and is on an adjoining anode region. A second silicide layer of a different material than the first silicide is on the anode region. An ohmic contact is made to the second silicide on the anode region and to the well.
摘要翻译： 包括结势垒肖特基二极管的集成电路具有N型阱，阱表面中的P型阳极区域和阱表面中的N型肖特基区域，并且水平地邻接阳极区域。 第一硅化物层在肖特基区域上并与其相邻的阳极区域形成肖特基接触。 与第一硅化物不同的第二硅化物层位于阳极区上。 对阳极区域和阱的第二硅化物进行欧姆接触。
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公开(公告)号：US07960766B2
公开(公告)日：2011-06-14
申请号：US12817101
申请日：2010-06-16
申请人： Alexander Kalnitsky , Dong Zheng , Joy Jones , Xijian Lin , Gregory Cestra
发明人： Alexander Kalnitsky , Dong Zheng , Joy Jones , Xijian Lin , Gregory Cestra
IPC分类号： H01L31/062
CPC分类号： H01L31/103 , H01L27/1443 , H01L31/02162
摘要： Embodiments of the present invention are directed to light sensors, that primarily respond to visible light while suppressing infrared light. Such sensors are especially useful as ambient light sensors because such sensors can be used to provide a spectral response similar to that of a human eye. Embodiments of the present invention are also directed to methods of providing such light sensors, and methods for using such light sensors.
摘要翻译： 本发明的实施例涉及在抑制红外光的同时主要响应于可见光的光传感器。 这种传感器作为环境光传感器是特别有用的，因为这样的传感器可用于提供类似于人眼的光谱响应。 本发明的实施例还涉及提供这种光传感器的方法，以及使用这种光传感器的方法。
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公开(公告)号：US20110116319A1
公开(公告)日：2011-05-19
申请号：US13012381
申请日：2011-01-24
申请人： Hosam Haggag , Alexander Kalnitsky , Edgardo Laber , Michael D. Church , Yun Yue
发明人： Hosam Haggag , Alexander Kalnitsky , Edgardo Laber , Michael D. Church , Yun Yue
IPC分类号： G11C16/26
CPC分类号： G11C16/0433
摘要： A memory array comprises a plurality of memory cells organized in a matrix of rows and columns. Each of the memory cells includes a high voltage access transistor, a floating gate memory transistor electrically connected to the access transistor, and a coupling capacitor electrically connected to the memory transistor. A first set of word lines are each electrically connected to the capacitor in each of the memory cells in a respective row. A second set of word lines are each electrically connected to the access transistor in each of the memory cells in a respective row. A first set of bit lines are each electrically connected to the access transistor in each of the memory cells in a respective column. A second set of bit lines are each electrically connected to the memory transistor in each of the memory cells in a respective column. Various combinations of voltages can be applied to the word lines and bit lines in operations to program, erase, read, or inhibit a logic state stored by the memory transistor in one or more of the memory cells.
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公开(公告)号：US20100149879A1
公开(公告)日：2010-06-17
申请号：US12711520
申请日：2010-02-24
IPC分类号： G11C16/04
CPC分类号： G11C16/0416
摘要： A flash memory array comprises a plurality of memory cells organized in a matrix of rows and columns. Each of the memory cells includes a floating gate memory transistor having a source region and a drain region, and a coupling capacitor electrically connected to the memory transistor. A plurality of word lines are each electrically connected to the capacitor in each of the memory cells in a respective row. A first set of bit lines are each electrically connected to the drain region of the memory transistor in each of the memory cells in a respective column. A plurality of high voltage access transistors are each electrically connected to a bit line in the first set of bit lines. A second set of bit lines are each electrically connected to the source region of the memory transistor in each of the memory cells in a respective column. Various combinations of voltages can be applied to the word lines and the first and second sets of bit lines in operations to erase, program, inhibit, or read the logic state stored by the memory transistor in one or more of the memory cells.
摘要翻译： 闪存阵列包括以行和列的矩阵组织的多个存储单元。 每个存储单元包括具有源极区和漏极区的浮动栅极存储晶体管，以及电连接到存储晶体管的耦合电容。 多个字线各自电连接到相应行中的每个存储器单元中的电容器。 第一组位线分别电连接到相应列中的每个存储单元中的存储晶体管的漏极区。 多个高压存取晶体管分别电连接到第一组位线中的位线。 第二组位线分别电连接到相应列中的每个存储器单元中的存储晶体管的源极区域。 在操作中可以对字线和第一和第二组位线施加电压的各种组合，以擦除，编程，禁止或读取存储器晶体管存储在一个或多个存储器单元中的逻辑状态。
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公开(公告)号：US07688627B2
公开(公告)日：2010-03-30
申请号：US11861102
申请日：2007-09-25
CPC分类号： G11C16/0416
摘要： A flash memory array comprises a plurality of memory cells organized in a matrix of rows and columns. Each of the memory cells includes a floating gate memory transistor having a source region and a drain region, and a coupling capacitor electrically connected to the memory transistor. A plurality of word lines are each electrically connected to the capacitor in each of the memory cells in a respective row. A first set of bit lines are each electrically connected to the drain region of the memory transistor in each of the memory cells in a respective column. A plurality of high voltage access transistors are each electrically connected to a bit line in the first set of bit lines. A second set of bit lines are each electrically connected to the source region of the memory transistor in each of the memory cells in a respective column. Various combinations of voltages can be applied to the word lines and the first and second sets of bit lines in operations to erase, program, inhibit, or read the logic state stored by the memory transistor in one or more of the memory cells.
摘要翻译： 闪存阵列包括以行和列的矩阵组织的多个存储单元。 每个存储单元包括具有源极区和漏极区的浮动栅极存储晶体管，以及电连接到存储晶体管的耦合电容。 多个字线各自电连接到相应行中的每个存储器单元中的电容器。 第一组位线分别电连接到相应列中的每个存储单元中的存储晶体管的漏极区。 多个高压存取晶体管分别电连接到第一组位线中的位线。 第二组位线分别电连接到相应列中的每个存储器单元中的存储晶体管的源极区域。 在操作中可以对字线和第一和第二组位线施加电压的各种组合，以擦除，编程，禁止或读取存储器晶体管存储在一个或多个存储器单元中的逻辑状态。
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公开(公告)号：US20090174021A1
公开(公告)日：2009-07-09
申请号：US12365141
申请日：2009-02-03
IPC分类号： H01L31/0232
CPC分类号： H01L27/1462 , H01L27/1463 , H01L31/02165
摘要： A photodiode includes a substrate having a first semiconductor type surface region on at least a portion thereof, and a second semiconductor type surface layer formed in a portion of the surface region. A multi-layer anti-reflective coating (ARC) is on the second semiconductor type surface layer, wherein the multi-layer ARC comprises at least two different dielectric layers. A layer resistant to oxide etch is above a peripheral portion the multi-layer ARC. Further layers are above the layer resistant to oxide etch, and thereby above the peripheral portion the multi-layer ARC. A window extends down to the multi-layer ARC. A photodiode region is formed by a pn-junction of the first semiconductor type surface region and the second semiconductor type surface layer.
摘要翻译： 光电二极管包括在其至少一部分上具有第一半导体型表面区域的基板和形成在表面区域的一部分中的第二半导体型表面层。 多层抗反射涂层（ARC）在第二半导体型表面层上，其中多层ARC包括至少两个不同的电介质层。 耐氧化物蚀刻的层在多层ARC的外围部分之上。 另外的层在耐氧化物蚀刻层上方，并且因此在多层ARC的周边部分之上。 一个窗口向下延伸到多层ARC。 光电二极管区域由第一半导体型表面区域和第二半导体型表面层的pn结形成。
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公开(公告)号：US20080315329A1
公开(公告)日：2008-12-25
申请号：US12037569
申请日：2008-02-26
申请人： MICHAEL DAVID CHURCH , Alexander Kalnitsky , Lawrence George Pearce , Michael Ray Jayne , Thomas Andrew Jochum
发明人： MICHAEL DAVID CHURCH , Alexander Kalnitsky , Lawrence George Pearce , Michael Ray Jayne , Thomas Andrew Jochum
IPC分类号： H01L27/06
CPC分类号： H01L27/0629 , H01L27/0255 , H01L27/0814
摘要： An integrated circuit includes a first and second diode connected in parallel. The first diode has a first breakdown voltage and has first P type region and first N type region adjacent to each other at the surface of the substrate of a substrate to form a lateral diode. The second diode has a second breakdown voltage less than the first breakdown voltage and has a second P type region and second N type region lateral adjacent to each other in the substrate to form a lateral diode below the surface The first and second N type regions overlap and the first and second P type region being electrically connected whereby the first and second diodes are in parallel.
摘要翻译： 集成电路包括并联连接的第一和第二二极管。 第一二极管具有第一击穿电压，并且在衬底的衬底的表面处具有彼此相邻的第一P型区域和第一N型区域，以形成横向二极管。 第二二极管具有小于第一击穿电压的第二击穿电压，并且在衬底中具有彼此相邻的第二P型区域和第二N型区域，以在表面下方形成横向二极管。第一和第二N型区域重叠 并且第一和第二P型区域电连接，由此第一和第二二极管是并联的。
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