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    Methods of forming fine patterns using a nanoimprint lithography
    3.
    发明授权
    Methods of forming fine patterns using a nanoimprint lithography 失效
    使用纳米压印光刻形成精细图案的方法

    公开(公告)号：US08287792B2

    公开(公告)日：2012-10-16

    申请号：US12657750

    申请日：2010-01-27

    申请人： Jeong-Hoon Lee ,  Jeong-Ho Yeo ,  Joo-On Park ,  In-Sung Kim ,  Doo-Hoon Goo ,  Jin-Hong Park ,  Chang-Min Park

    发明人： Jeong-Hoon Lee ,  Jeong-Ho Yeo ,  Joo-On Park ,  In-Sung Kim ,  Doo-Hoon Goo ,  Jin-Hong Park ,  Chang-Min Park

    IPC分类号： B29C59/00

    CPC分类号： G03F7/0002 ,  B29C43/003 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00

    摘要： In a method of forming fine patterns, a photocurable coating layer is formed on a substrate. A first surface of a template makes contact with the photocurable coating layer. The first surface of the template includes at least two first patterns having a first dispersion degree of sizes, and at least one portion of the first surface of the template includes a photo attenuation member. A light is irradiated onto the photocurable coating layer through the template to form a cured coating layer including second patterns having a second dispersion degree of sizes. The second patterns are generated from the first patterns and the second dispersion degree is less than the first dispersion degree. The template is separate from the cured coating layer. A size dispersion degree of the patterns used in a nanoimprint lithography process may be adjusted by the light attenuation member, so that the fine patterns may be formed to have an improved size dispersion degree.

    摘要翻译： 在形成精细图案的方法中，在基板上形成光固化涂层。 模板的第一表面与光固化涂层接触。 模板的第一表面包括具有第一分散度大小的至少两个第一图案，并且模板的第一表面的至少一部分包括光衰减构件。 通过模板将光照射到可光固化涂层上，以形成具有第二分散度尺寸的第二图案的固化涂层。 从第一图案生成第二图案，第二色散度小于第一色散度。 模板与固化涂层分开。 可以通过光衰减部件调整在纳米压印光刻工艺中使用的图案的尺寸分散度，使得精细图案可以形成为具有改进的尺寸分散度。

    Stencil mask having main and auxiliary strut and method of forming the same
    4.
    发明授权
    Stencil mask having main and auxiliary strut and method of forming the same 失效
    具有主支柱和辅助支柱的模板掩模及其形成方法

    公开(公告)号：US07635547B2

    公开(公告)日：2009-12-22

    申请号：US12114946

    申请日：2008-05-05

    申请人： In-Sung Kim ,  Ho-Chul Kim

    发明人： In-Sung Kim ,  Ho-Chul Kim

    IPC分类号： G03F9/00

    CPC分类号： G03F1/20 ,  Y10S430/143

    摘要： A stencil mask includes a membrane forming thin layer having membrane areas and a border area that limits the membrane areas. The membrane areas have a plurality of pattern areas which include an aperture through which particle beams can permeate and non-pattern areas interposed between the pattern areas. A main strut supports the membrane areas and is formed on the border area of the membrane forming thin layer. An auxiliary strut is formed in the non-pattern areas inside the membrane pattern area such that the auxiliary strut divides the membrane areas into plural divided membrane areas. The auxiliary strut supports the divided membrane areas.

    摘要翻译： 模板掩模包括具有膜区域的膜形成薄层和限制膜区域的边界区域。 膜区域具有多个图案区域，其包括孔径，颗粒束可穿过该孔，并且插入在图案区域之间的非图案区域。 主支柱支撑膜区域并形成在膜形成薄层的边界区域上。 在膜图案区域内的非图案区域中形成辅助支柱，使得辅助支柱将膜区域分成多个分隔的膜区域。 辅助支柱支撑分隔膜区域。

    Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same
    5.
    发明申请
    Photomask for forming photoresist patterns repeating in two dimensions and method of fabricating the same 有权
    用于形成二维重复的光刻胶图案的光掩模及其制造方法

    公开(公告)号：US20050003278A1

    公开(公告)日：2005-01-06

    申请号：US10827556

    申请日：2004-04-19

    申请人： Chan Hwang ,  In-Sung Kim ,  Young-Seog Kang

    发明人： Chan Hwang ,  In-Sung Kim ,  Young-Seog Kang

    IPC分类号： H01L21/027 ,  G03C5/00 ,  G03F1/00 ,  G03F1/36 ,  G03F9/00

    CPC分类号： G03F1/36

    摘要： A photomask includes a transparent substrate, and a plurality of light-shielding patterns repeatedly aligned on the transparent substrate in two dimensions. Each of the light-shielding patterns has length and width measurements that differ from each other. Further, the photomask includes at least one through hole penetrating a portion of each of the light-shielding patterns to expose the transparent substrate.

    摘要翻译： 光掩模包括透明基板和在二维上在透明基板上重复对准的多个遮光图案。 每个遮光图案具有彼此不同的长度和宽度测量值。 此外，光掩模包括贯穿每个遮光图案的一部分的至少一个通孔，以露出透明基板。

    Stencil mask having main and auxiliary strut and method of forming the same
    7.
    发明授权
    Stencil mask having main and auxiliary strut and method of forming the same 失效
    具有主支柱和辅助支柱的模板掩模及其形成方法

    公开(公告)号：US07384711B2

    公开(公告)日：2008-06-10

    申请号：US10827513

    申请日：2004-04-19

    申请人： In-Sung Kim ,  Ho-Chul Kim

    发明人： In-Sung Kim ,  Ho-Chul Kim

    IPC分类号： G03F9/00

    CPC分类号： G03F1/20 ,  Y10S430/143

    摘要： A stencil mask includes a membrane forming thin layer having membrane areas and a border area that limits the membrane areas. The membrane areas have a plurality of pattern areas which include an aperture through which particle beams can permeate and non-pattern areas interposed between the pattern areas. A main strut supports the membrane areas and is formed on the border area of the membrane forming thin layer. An auxiliary strut is formed in the non-pattern areas inside the membrane pattern area such that the auxiliary strut divides the membrane areas into plural divided membrane areas. The auxiliary strut supports the divided membrane areas.

    摘要翻译： 模板掩模包括具有膜区域的膜形成薄层和限制膜区域的边界区域。 膜区域具有多个图案区域，其包括孔径，颗粒束可穿过该孔，并且插入在图案区域之间的非图案区域。 主支柱支撑膜区域并形成在膜形成薄层的边界区域上。 在膜图案区域内的非图案区域中形成辅助支柱，使得辅助支柱将膜区域分成多个分隔的膜区域。 辅助支柱支撑分隔膜区域。

    Flare evaluation methods
    8.
    发明授权
    Flare evaluation methods 有权
    火炬评估方法

    公开(公告)号：US08158958B2

    公开(公告)日：2012-04-17

    申请号：US12732960

    申请日：2010-03-26

    申请人： In-Sung Kim ,  Jooon Park ,  Doo-Hoo Goo ,  Jeong-Hoon Lee ,  Chang-Min Park

    发明人： In-Sung Kim ,  Jooon Park ,  Doo-Hoo Goo ,  Jeong-Hoon Lee ,  Chang-Min Park

    IPC分类号： G01T1/04

    CPC分类号： G03F7/70941 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/44 ,  G03F1/70 ,  G03F7/70433

    摘要： A flare evaluation method includes: extracting DC flare reference data using a preliminary measurement pattern mask and a dummy mask having an open region in which a preliminary measurement pattern is formed; providing a plurality of flare gauge sets including an opaque pad, a measurement pattern, and a flare pattern, the measure pattern being disposed at an inside of the opaque pad to measure strength of a flare, the flare pattern being disposed at an outside of the opaque pad to generate the flare; and detecting a change of a photo resist measurement pattern caused by the flare pattern and the measurement pattern for each of the flare gauge sets, wherein an outer radius of the flare pattern increases by a predetermined amount depending on the flare gauge set.

    摘要翻译： 闪光评估方法包括：使用初步测量图案掩模和具有形成初步测量图案的开放区域的虚拟掩模来提取DC闪光参考数据; 提供多个包括不透明衬垫，测量图案和耀斑图案的扩口仪，所述测量图案设置在所述不透明衬垫的内侧，以测量耀斑的强度，所述耀斑图案设置在所述不透明衬垫的外侧 不透明垫产生耀斑; 并且检测由每个所述火炬仪的所述火炬图案和所述测量图案引起的光致抗蚀剂测量图案的变化，其中所述耀斑图案的外半径根据所述张力计集合而增加预定量。

    Flare Evaluation Methods
    10.
    发明申请
    Flare Evaluation Methods 有权
    火炬评估方法

    公开(公告)号：US20100258744A1

    公开(公告)日：2010-10-14

    申请号：US12732960

    申请日：2010-03-26

    申请人： In-Sung Kim ,  Jooon Park ,  Doo-Hoo Goo ,  Jeong-Hoon Lee ,  Chang-Min Park

    发明人： In-Sung Kim ,  Jooon Park ,  Doo-Hoo Goo ,  Jeong-Hoon Lee ,  Chang-Min Park

    IPC分类号： G01T1/00

    CPC分类号： G03F7/70941 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/44 ,  G03F1/70 ,  G03F7/70433

    摘要： A flare evaluation method includes: extracting DC flare reference data using a preliminary measurement pattern mask and a dummy mask having an open region in which a preliminary measurement pattern is formed; providing a plurality of flare gauge sets including an opaque pad, a measurement pattern, and a flare pattern, the measure pattern being disposed at an inside of the opaque pad to measure strength of a flare, the flare pattern being disposed at an outside of the opaque pad to generate the flare; and detecting a change of a photo resist measurement pattern caused by the flare pattern and the measurement pattern for each of the flare gauge sets, wherein an outer radius of the flare pattern increases by a predetermined amount depending on the flare gauge set.

    摘要翻译： 闪光评估方法包括：使用初步测量图案掩模和具有形成初步测量图案的开放区域的虚拟掩模来提取DC闪光参考数据; 提供多个包括不透明衬垫，测量图案和耀斑图案的扩口仪，所述测量图案设置在所述不透明衬垫的内侧，以测量耀斑的强度，所述耀斑图案设置在所述不透明衬垫的外侧 不透明垫产生耀斑; 并且检测由每个所述火炬仪的所述火炬图案和所述测量图案引起的光致抗蚀剂测量图案的变化，其中所述耀斑图案的外半径根据所述张力计集合而增加预定量。