Thermally and electrically conductive interconnects

    公开(公告)号:US11637068B2

    公开(公告)日:2023-04-25

    申请号:US17121810

    申请日:2020-12-15

    Abstract: Processing forms an integrated circuit structure having first and second layers on opposite sides of an insulator, and an interconnect structure extending through the insulator between the first layer and the second layer. The interconnect structure is formed in an opening extending through the insulator between the first layer and the second layer and has an electrical conductor in the opening extending between the first layer and the second layer and a thermally conductive electrical insulator liner along sidewalls of the opening extending between the first layer and the second layer. The electrical conductor is positioned to conduct electrical signals between the first layer and the second layer, and the thermally conductive electrical insulator liner is positioned to transfer heat between the first layer and the second layer.

    THERMALLY AND ELECTRICALLY CONDUCTIVE INTERCONNECTS

    公开(公告)号:US20220189877A1

    公开(公告)日:2022-06-16

    申请号:US17121810

    申请日:2020-12-15

    Abstract: Processing forms an integrated circuit structure having first and second layers on opposite sides of an insulator, and an interconnect structure extending through the insulator between the first layer and the second layer. The interconnect structure is formed in an opening extending through the insulator between the first layer and the second layer and has an electrical conductor in the opening extending between the first layer and the second layer and a thermally conductive electrical insulator liner along sidewalls of the opening extending between the first layer and the second layer. The electrical conductor is positioned to conduct electrical signals between the first layer and the second layer, and the thermally conductive electrical insulator liner is positioned to transfer heat between the first layer and the second layer.

    Junction field effect transistor (JFET) structure and methods to form same

    公开(公告)号:US11094834B2

    公开(公告)日:2021-08-17

    申请号:US16790084

    申请日:2020-02-13

    Abstract: A junction field effect transistor (JFET) structure includes a doped polysilicon gate over a channel region of a semiconductor layer. The doped polysilicon gate has a first doping type. A raised epitaxial source is on the source region of the semiconductor layer and adjacent a first sidewall of the doped polysilicon gate, and has a second doping type opposite the first doping type. A raised epitaxial drain is on the drain region of the semiconductor layer and adjacent a second sidewall of the doped polysilicon gate, and has the second doping type. A doped semiconductor region is within the channel region of the semiconductor layer and extending from the source region to the drain region, and a non-conductive portion of the semiconductor layer is within the channel region to separate the doped semiconductor region from the doped polysilicon gate.

    HETEROJUNCTION BIPOLAR TRANSISTORS WITH AIRGAP ISOLATION

    公开(公告)号:US20210091213A1

    公开(公告)日:2021-03-25

    申请号:US16748055

    申请日:2020-01-21

    Abstract: Structures for a heterojunction bipolar transistor and methods of forming a structure for a heterojunction bipolar transistor. A collector layer includes an inclined side surface, and a dielectric layer is positioned in a lateral direction adjacent to the inclined side surface of the collector layer. An intrinsic base is disposed over the collector layer, and an emitter is disposed over the intrinsic base. An airgap is positioned between the dielectric layer and the inclined side surface of the collector layer in the lateral direction, and an extrinsic base is positioned in the lateral direction adjacent to the intrinsic base. The extrinsic base is positioned over the airgap.

    HETEROJUNCTION BIPOLAR TRANSISTORS WITH A CUT STRESS LINER

    公开(公告)号:US20240170561A1

    公开(公告)日:2024-05-23

    申请号:US17990931

    申请日:2022-11-21

    CPC classification number: H01L29/7378 H01L29/0817 H01L29/66242

    Abstract: Structures for a heterojunction bipolar transistor and methods of forming a structure for a heterojunction bipolar transistor. The structure comprises an emitter, a collector including a first section, a second section, and a third section positioned in a first direction between the first section and the second section, and an intrinsic base disposed in a second direction between the emitter and the third section of the collector. The structure further comprises a stress layer including a section positioned to overlap with the emitter, the intrinsic base, and the collector. The section of the stress layer is surrounded by a perimeter, and the first and second sections of the collector are each positioned adjacent to the perimeter of the stress layer.

    STRUCTURES FOR A VERTICAL VARACTOR DIODE AND RELATED METHODS

    公开(公告)号:US20240072180A1

    公开(公告)日:2024-02-29

    申请号:US17896711

    申请日:2022-08-26

    CPC classification number: H01L29/93 H01L29/1095 H01L29/66174

    Abstract: Structures for a varactor diode and methods of forming same. The structure comprises a first semiconductor layer including a section on a substrate, a second semiconductor layer on the section of the first semiconductor layer, a third semiconductor layer on the second semiconductor layer, and a doped region in the section of the first semiconductor layer. The section of the first semiconductor layer and the doped region have a first conductivity type, and the second semiconductor layer comprises silicon-germanium having a second conductivity type opposite to the first conductivity type, and the third semiconductor layer has the second conductivity type. The doped region contains a higher concentration of a dopant of the first conductivity type than the section of the first semiconductor layer. The second semiconductor layer abuts the first section of the first semiconductor layer along an interface, and the doped region is positioned adjacent to the interface.

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