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    Lithographic apparatus and device manufacturing method
    2.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07202934B2

    公开(公告)日：2007-04-10

    申请号：US11015770

    申请日：2004-12-20

    申请人： Johannes Hubertus Josephina Moors ,  Erik Leonardus Ham ,  Gert-Jan Heerens ,  Paulus Martinus Maria Liebregts ,  Erik Roelof Loopstra ,  Henri Gerard Cato Werij

    发明人： Johannes Hubertus Josephina Moors ,  Erik Leonardus Ham ,  Gert-Jan Heerens ,  Paulus Martinus Maria Liebregts ,  Erik Roelof Loopstra ,  Henri Gerard Cato Werij

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/00

    CPC分类号： G03F7/70933 ,  G03F7/70908

    摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.

    摘要翻译： 公开了一种布置成将图案从图案形成装置转印到基底上的光刻设备。 该装置包括光学隔室，其包含图案形成装置的图案化表面和光学元件，以及通过布置成将图案化的辐射束从光学元件传递到衬底的连接部连接到光学隔室的衬底隔室。 该装置还包括第一冲洗气体入口，其布置成将第一冲洗气体供应到连接中，第二冲洗气体入口与图案化表面相邻，并且布置成将第二冲洗气体供应到光学隔室中并且产生邻近图案化的区域 表面，其中第二冲洗气体沿具有垂直于和远离图案化表面的部件的方向流动;以及气泵，其布置成泵送来自光学隔室的冲洗气体。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    5.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：US20060097201A1

    公开(公告)日：2006-05-11

    申请号：US10970733

    申请日：2004-10-22

    申请人： Hendrik Antony Johannes Neerhof ,  Johannes Hubertus Josephina Moors ,  Joost Jeroen Ottens ,  Marco Kluse

    发明人： Hendrik Antony Johannes Neerhof ,  Johannes Hubertus Josephina Moors ,  Joost Jeroen Ottens ,  Marco Kluse

    IPC分类号： G01J3/10

    CPC分类号： G03F7/707 ,  G03F7/70708 ,  G03F7/70783

    摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system arranged to provide a radiation beam, an article support configured to support an article to be placed in a beam path of the radiation beam, a multipolar clamp configured to provide a clamping pressure for clamping the article against the article support, and a bias voltage circuit for biasing at least one electrode of the multipolar clamp, such that the occurrence of ridges that appear due to static charges on the article may be circumvented.

    摘要翻译： 公开了一种光刻设备。 该装置包括布置成提供辐射束的照明系统，被配置为支撑要放置在辐射束的光束路径中的物品的物品支撑件;多极夹具，其构造成提供用于将物品夹持在物品支撑件 以及用于偏置多极夹具的至少一个电极的偏置电压电路，使得可能避免由于在制品上的静电产生而出现的脊的发生。