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公开(公告)号：US20100190116A1
公开(公告)日：2010-07-29
申请号：US12754872
申请日：2010-04-06
申请人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
发明人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
CPC分类号： G03F7/70991 , G03F7/70341
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.
摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置被布置成与界面块相邻。 接口块包括干燥处理组，其包括两个干燥处理单元和界面输送机构。 在通过曝光装置对基板进行曝光处理之后，通过界面传送机构将基板输送到干燥处理组中的干燥处理单元，其中对基板进行清洁和干燥处理。
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公开(公告)号：US20060098979A1
公开(公告)日：2006-05-11
申请号：US11273465
申请日：2005-11-10
申请人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
发明人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
IPC分类号： G03D5/00
CPC分类号： G03F7/70991 , G03F7/70341
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.
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公开(公告)号：US20060104635A1
公开(公告)日：2006-05-18
申请号：US11273439
申请日：2005-11-10
申请人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi
发明人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi
IPC分类号： G03D5/00
CPC分类号： G03F7/70991 , Y10S414/135
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An exposure device is arranged adjacent to the interface block. A resist film is formed on a substrate in the resist film processing block. A resist cover film is formed on the resist film in the resist cover film processing block before the substrate is subjected to exposure processing by the exposure device.
摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块和界面块。 曝光装置设置在接口块附近。 在抗蚀剂膜处理块中的基板上形成抗蚀剂膜。 在通过曝光装置对基板进行曝光处理之前，在抗蚀剂覆盖膜处理块的抗蚀剂膜上形成抗蚀剂覆盖膜。
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公开(公告)号：US20100159142A1
公开(公告)日：2010-06-24
申请号：US12719788
申请日：2010-03-08
申请人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Akihiro Hisai , Hiroshi Kobayashi , Tsuyoshi Okumura
发明人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Akihiro Hisai , Hiroshi Kobayashi , Tsuyoshi Okumura
IPC分类号： B05D3/00
CPC分类号： G03F7/70991 , G03F7/7075 , Y10S438/906 , Y10S438/908
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.
摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置设置在接口块附近。 接口块包括洗涤处理单元和接口传送机构。 在通过曝光装置对基板进行曝光处理之前，通过界面传送机构将基板输送到洗涤处理单元。 洗涤基体并通过洗涤处理单元干燥。
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公开(公告)号：US08496761B2
公开(公告)日：2013-07-30
申请号：US12754872
申请日：2010-04-06
申请人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
发明人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
CPC分类号： G03F7/70991 , G03F7/70341
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings.
摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置被布置成与界面块相邻。 接口块包括干燥处理组，其包括两个干燥处理单元和界面输送机构。 在通过曝光装置对基板进行曝光处理之后，通过界面传送机构将基板输送到干燥处理组中的干燥处理单元，其中对基板进行清洁和干燥处理。
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公开(公告)号：US08034190B2
公开(公告)日：2011-10-11
申请号：US12719788
申请日：2010-03-08
申请人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kasuhito Shigemori , Toru Asano , Akihiro Hisai , Hiroshi Kobayashi , Tsuyoshi Okumura
发明人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kasuhito Shigemori , Toru Asano , Akihiro Hisai , Hiroshi Kobayashi , Tsuyoshi Okumura
CPC分类号： G03F7/70991 , G03F7/7075 , Y10S438/906 , Y10S438/908
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.
摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置设置在接口块附近。 接口块包括洗涤处理单元和接口传送机构。 在通过曝光装置对基板进行曝光处理之前，通过界面传送机构将基板输送到洗涤处理单元。 洗涤基体并通过洗涤处理单元干燥。
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公开(公告)号：US07726891B2
公开(公告)日：2010-06-01
申请号：US11273439
申请日：2005-11-10
申请人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi
发明人： Koji Kaneyama , Akihiro Hisai , Toru Asano , Hiroshi Kobayashi
CPC分类号： G03F7/70991 , Y10S414/135
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An exposure device is arranged adjacent to the interface block. A resist film is formed on a substrate in the resist film processing block. A resist cover film is formed on the resist film in the resist cover film processing block before the substrate is subjected to exposure processing by the exposure device.
摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块和界面块。 曝光装置设置在接口块附近。 在抗蚀剂膜处理块中的基板上形成抗蚀剂膜。 在通过曝光装置对基板进行曝光处理之前，在抗蚀剂覆盖膜处理块的抗蚀剂膜上形成抗蚀剂覆盖膜。
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公开(公告)号：US20060098978A1
公开(公告)日：2006-05-11
申请号：US11273463
申请日：2005-11-10
申请人： Schuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Akihiro Hisai , Hiroshi Kobayashi , Tsuyoshi Okumura
发明人： Schuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Akihiro Hisai , Hiroshi Kobayashi , Tsuyoshi Okumura
IPC分类号： G03D5/00
CPC分类号： G03F7/70991 , G03F7/7075 , Y10S438/906 , Y10S438/908
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.
摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块和界面块。 曝光装置设置在接口块附近。 接口块包括洗涤处理单元和接口传送机构。 在通过曝光装置对基板进行曝光处理之前，通过界面传送机构将基板输送到洗涤处理单元。 洗涤基体并通过洗涤处理单元干燥。
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公开(公告)号：US08040488B2
公开(公告)日：2011-10-18
申请号：US11294727
申请日：2005-12-06
申请人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
发明人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
CPC分类号： G03F7/70991 , H01L21/67051 , H01L21/67173 , H01L21/67178
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a processing block for liquid immersion exposure processing, and an interface block. An exposure device is arranged adjacent to the interface block. The processing block for liquid immersion exposure processing comprises a coating processing group for resist cover film and a removal processing group for resist cover film. The resist cover film is formed in the processing block for liquid immersion exposure processing before the exposure processing. The resist cover film is removed in the processing block for liquid immersion exposure processing after the exposure processing.
摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，用于液浸曝光处理的处理块和界面块。 曝光装置设置在接口块附近。 用于液浸曝光处理的处理块包括用于抗蚀剂覆盖膜的涂覆处理组和抗蚀剂覆盖膜的去除处理组。 在曝光处理之前，在用于液浸曝光处理的处理块中形成抗蚀剂覆盖膜。 在曝光处理之后，在用于液浸曝光处理的处理块中去除抗蚀剂覆盖膜。
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公开(公告)号：US20100129526A1
公开(公告)日：2010-05-27
申请号：US12698876
申请日：2010-02-02
申请人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
发明人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
IPC分类号： B05D5/12
CPC分类号： H01L21/67034 , G03F7/38 , H01L21/67028 , H01L21/67051 , H01L21/67178 , H01L21/67207
摘要： A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of forming a film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device. The method also includes applying drying processing to the substrate by said second processing unit after the exposure processing by said exposure device and applying development processing to the substrate by said third processing unit after the drying processing by said second processing unit
摘要翻译： 一种在与曝光装置相邻并且包括第一，第二和第三处理单元的基板处理装置中处理基板的方法，包括以下步骤：在所述基板上由所述第一处理单元形成由感光材料制成的膜， 曝光装置的曝光处理。 该方法还包括在所述曝光装置的曝光处理之后通过所述第二处理单元对所述基板进行干燥处理，并且在所述第二处理单元进行干燥处理之后，通过所述第三处理单元对所述基板施加显影处理
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