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公开(公告)号：US10794688B2
公开(公告)日：2020-10-06
申请号：US16293027
申请日：2019-03-05
Applicant: MITUTOYO CORPORATION
Inventor： Ken Motohashi , Johannes Anna Quaedackers , Adriaan Tiemen Zuiderweg
Abstract: An interferometric optical device that measures the curved wall shape of a cylindrical object and includes: an interferometric optical system that emits measurement light at the curved wall of the object, collects the light reflected by the object, and creates a composite wave that combines the reflected light and a reference light; a rotation drive assembly that is connected to the interferometric optical system and rotationally displaces the interferometric optical system centered about a rotation axis that coincides with a center axis of the cylindrical shape of the object; a sensor that acquires a two-dimensional distribution of the intensity of the composite wave using a plurality of photoreceptor elements arrayed two-dimensionally; and a computation device that computes the internal wall shape of the object based on the plurality of two-dimensional distributions acquired in a state where a rotation angle for the rotation drive mechanism varies.
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公开(公告)号：US11466976B2
公开(公告)日：2022-10-11
申请号：US16247765
申请日：2019-01-15
Applicant: MITUTOYO CORPORATION
Inventor： Johannes Anna Quaedackers
Abstract: In a method and system for measuring a height map of a surface of an object, the following steps are carried out. Height maps of different sections of the surface of the object are measured, using an optical profilometer having a field of view covering an individual section, wherein each height map comprises height data. The measured height maps are grouped into different sets of height maps, wherein within each set each one of the height maps of the set has a valid overlap to at least one other height map of the set, and wherein each height map belongs to one set and does not have a valid overlap with any height map of another set. Within each set, the measured height maps are stitched to a sub-composite stitched height map. The sub-composite stitched height maps are combined to a composite height map.
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公开(公告)号：US09881400B2
公开(公告)日：2018-01-30
申请号：US14808230
申请日：2015-07-24
Applicant: MITUTOYO CORPORATION
Inventor： Adriaan Tiemen Zuiderweg , Johannes Anna Quaedackers , Harm Visscher
IPC: G06T11/20 , G01B11/24 , G01B11/245
CPC classification number: G06T11/206 , G01B11/2441 , G01B11/245 , G01B2210/52
Abstract: Method for measuring a height map of a test, including measuring a coarse height map of the test surface with a pre-map sensor provided to an optical profiler with a relatively long working distance and/or a large field of view, storing the coarse height map in a memory, subdividing the coarse height map into sections appropriate for the field of view of a high resolution optical profiler sensor provided to the optical profiler, calculating corresponding X, Y and Z positions for the optical profiler sensor with respect to the test surface, calculating a trajectory in the X, Y, Z-direction for the optical profiler sensor with respect to the test surface using the calculated X, Y, Z-positions, moving the optical profiler in the X, Y, Z-direction with respect to the test surface according to the trajectory, and measuring a high accuracy height map with the high resolution optical profiler sensor.
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公开(公告)号：US10563974B2
公开(公告)日：2020-02-18
申请号：US15198261
申请日：2016-06-30
Applicant: MITUTOYO CORPORATION
Inventor： Johannes Anna Quaedackers , Adriaan Tiemen Zuiderweg
IPC: G01B11/06
Abstract: A method for measuring a height map of multiple fields of view on a surface of a substrate with an optical profilometer and combining them to a composite height map, the method includes: moving the profilometer relative to the surface from field to field along a route; measuring height maps of fields on the surface along the route with the profilometer; and, combining a plurality of height maps of measured fields by normalizing said height maps to each other to produce a composite height map of the surface; wherein the route is configured to minimize sensitivity to height drifting of the profilometer during combining a plurality of the height maps.
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Patent Agency Ranking
公开(公告)号：US10302415B2
公开(公告)日：2019-05-28
申请号：US14737806
申请日：2015-06-12
Applicant: MITUTOYO CORPORATION
Inventor： Johannes Anna Quaedackers
Abstract: Provided is a method for calculating a height map of a sample comprising a body of a transparent material having a refractive index with an inclined or curved surface, the body being provided on an underlying surface extending laterally from underneath the body. The method may include positioning a first area of a body of a transparent material with an inclined or curved surface and a second area of the underlying surface extending laterally from underneath the body under an optical profiler, measuring a height map of the first area and the second area with the optical profiler; and calculating a height map of the inclined or curved surface by using the refractive index, the measured height map of the first area and the second area.
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公开(公告)号：US20170363411A1
公开(公告)日：2017-12-21
申请号：US15622996
申请日：2017-06-14
Applicant: Mitutoyo Corporation
Inventor： Tatsuya Nagahama , Ken Motohashi , Han Haitjema , Johannes Anna Quaedackers
IPC: G01B9/02
CPC classification number: G01B9/02015 , G01B11/2441
Abstract: The present invention provides an interference measuring device with an optical system that can receive light reflected from a measurement object of a surface profile that is not perpendicular to an optical axis. An interference measuring device includes a light source for emitting light and an interferometric objective lens. The interferometric objective lens includes a reference mirror disposed in a reference beam path and a beam splitter that splits the incident light into a beam traveling along the reference beam path and a beam traveling along a measurement beam path. The beam splitter also combines the beam reflected off the reference mirror with the beam reflected off a measurement object disposed in the measurement beam path before emitting the combined beams. The interference measuring device further includes an imaging unit for taking an image of the combined beams forming on the unit and an aperture stop disposed in an optical path linking the interferometric objective lens, the light source, and the imaging unit together. The aperture stop is movable along an optical axis of the interferometric objective lens.
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公开(公告)号：US09103651B2
公开(公告)日：2015-08-11
申请号：US13918134
申请日：2013-06-14
Applicant: MITUTOYO CORPORATION
Inventor： Han Haitjema , Johannes Anna Quaedackers
CPC classification number: G01B9/02088 , G01B9/02087 , G01B9/0209 , G01B11/0675 , G01N21/45 , G01N2021/4126
Abstract: Method of determining a property of a sample from a correlogram obtainable by scanning of a surface of the sample through a focal plane of an objective using broad-band interferometry is provided. The correlogram may be displaying interference radiation intensity as a function of the scanning distance from the surface. The correlogram may be correlated with a secondary correlogram to obtain a cross correlogram or with the same correlogram to obtain an autocorrelogram. A property of the sample may be determined from the auto or cross correlogram.
Abstract translation: 提供了从通过使用宽带干涉测量的物镜的焦平面扫描样品可获得的相关图来确定样品的性质的方法。 相关图可以将干涉辐射强度显示为与表面的扫描距离的函数。 相关图可以与二次相关图相关，以获得交叉相关图或用相同的相关图获得自相关图。 样品的属性可以从自动或交叉相关图确定。
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公开(公告)号：US20180315207A1
公开(公告)日：2018-11-01
申请号：US15946146
申请日：2018-04-05
Applicant: MITUTOYO CORPORATION
Inventor： Johannes Anna Quaedackers
CPC classification number: G01B9/02076 , G01B9/02042 , G01B9/02071 , G01B9/02085 , G01B9/0209 , G01B21/045 , G02B21/002
Abstract: Method and system for calculating a height map of a surface of an object from an image stack in scanning optical 2.5D profiling of the surface by an optical system, a focal plane is scanned at different height positions with respect to the object surface. An image is captured at each height position of the focal plane to form the image stack. The scanning of the focal plane comprises long range sensing and short range sensing a displacement of the focal plane for sensing low and high spatial frequency components. The height position of the focal plane is estimated by combining the low and high spatial frequency components. A height position of each image in the image stack is calculated, based on the estimated height position of each respective focal plane. The images of the image stack are interpolated to equidistant height positions for obtaining a corrected image stack.
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公开(公告)号：US10024648B2
公开(公告)日：2018-07-17
申请号：US15622996
申请日：2017-06-14
Applicant: Mitutoyo Corporation
Inventor： Tatsuya Nagahama , Ken Motohashi , Han Haitjema , Johannes Anna Quaedackers
IPC: G01B9/02
Abstract: The present invention provides an interference measuring device with an optical system that can receive light reflected from a measurement object of a surface profile that is not perpendicular to an optical axis. An interference measuring device includes a light source for emitting light and an interferometric objective lens. The interferometric objective lens includes a reference mirror disposed in a reference beam path and a beam splitter that splits the incident light into a beam traveling along the reference beam path and a beam traveling along a measurement beam path. The beam splitter also combines the beam reflected off the reference mirror with the beam reflected off a measurement object disposed in the measurement beam path before emitting the combined beams. The interference measuring device further includes an imaging unit for taking an image of the combined beams forming on the unit and an aperture stop disposed in an optical path linking the interferometric objective lens, the light source, and the imaging unit together. The aperture stop is movable along an optical axis of the interferometric objective lens.
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