摘要:
A method for processing a substrate by plasma CVD includes: (i) forming a film on a substrate placed on a susceptor by applying RF power between the susceptor and a shower plate in the presence of a film-forming gas in a reactor; and (ii) upon completion of step (i), without unloading the substrate, applying amplitude-modulated RF power between the susceptor and the shower plate in the absence of a film-forming gas but in the presence of a non-film-forming gas to reduce a floating potential of the substrate.
摘要:
A circuit for measuring DC bias voltage occurring in an ungrounded electrode of a plasma processing apparatus, includes: a first terminal connected between the ungrounded electrode and the RF power source; a second terminal for determining a value of the DC bias voltage; a first resistance connected between the first terminal and the second terminal; a second resistance connected between the second terminal and a ground; and a condenser disposed in parallel to the second resistance between the second terminal and the ground. The sum of the first resistance value and the second resistance value is about 50 MΩ or greater.
摘要:
A semiconductor substrate supporting apparatus for supporting a single semiconductor substrate in a plasma CVD apparatus comprises a placing block having a substrate placing area on which the substrate is placed. The substrate placing area is anodized and has as an outermost film an anodic oxide film having a thickness of about 30 μm to about 60 μm and/or a dielectric breakdown voltage of about 300 V or higher.
摘要:
An impedance matching apparatus adapted to be connected between a reaction chamber and a power source for plasma processing includes a transformer, a coil unit, and a capacitor connected in series. A primary side of the transformer is adapted to be connected to the power source, and a secondary side of the transformer has multiple taps positioned at different windings; and the coil unit is comprised of multiple coils having different inductances and arranged in parallel, wherein each tap is connected to a different coil or coils. The impedance matching circuit further includes a switch unit provided between the coil unit and the capacitor.
摘要:
A circuit for measuring DC bias voltage occurring in an ungrounded electrode of a plasma processing apparatus, includes: a first terminal connected between the ungrounded electrode and the RF power source; a second terminal for determining a value of the DC bias voltage; a first resistance connected between the first terminal and the second terminal; a second resistance connected between the second terminal and a ground; and a condenser disposed in parallel to the second resistance between the second terminal and the ground. The sum of the first resistance value and the second resistance value is about 50 MΩ or greater.
摘要:
A method for processing a substrate by plasma CVD includes: (i) forming a film on a substrate placed on a susceptor by applying RF power between the susceptor and a shower plate in the presence of a film-forming gas in a reactor; and (ii) upon completion of step (i), without unloading the substrate, applying amplitude-modulated RF power between the susceptor and the shower plate in the absence of a film-forming gas but in the presence of a non-film-forming gas to reduce a floating potential of the substrate.
摘要:
A plasma CVD apparatus for forming a thin film on a substrate includes: a vacuum chamber; an upper electrode; a susceptor as a lower electrode; and a ring-shaped insulation plate disposed in a gap between the susceptor and an inner wall of the chamber in the vicinity of or in contact with the susceptor to minimize a floating potential charged on the substrate while processing the substrate.
摘要:
An actuating mechanism for a switching device includes a plurality of electromagnets used in combination. Each electromagnet includes a coil, a movable iron core adapted to move on the center axis of the coil, and a stationary iron core provided so as to cover the upper and lower surfaces and the outer peripheral surface of the coil. A permanent magnet is arranged in a gap surrounded by the movable iron core and the stationary core.
摘要:
A regulator for a power window having a safety function for preventing an object from being caught in a closing power window includes a driving unit for raising and lowering the window glass of a vehicle and a driven unit which receives power from the driving unit. When frictional resistance corresponding to relative displacement between the driving and driven units is less than a fixed value during descent of the window glass and exceeds this fixed during ascent of the window glass, the ascending window glass is reversed and made to descend. When the amount of an increase in current to the driving unit during ascent of the window glass increases in a case where the sliding resistance has exceeded a fixed value even once during descent of the window glass, the ascending window glass is reversed and made to descend.
摘要:
A lid lock apparatus is comprised of an opening formed in a vehicle-body, a lid pivotally mounted to the vehicle-body, a locking mechanism is connected to the plate and has a shaft which engages and disengages the lid when operated to its closed and opened condition, respectively. A driving mechanism which is arranged for releasing the engagement between the shaft and the lid when in the closed condition, is mounted on the locking mechanism and positioned in such a manner that the driving mechanism is set to be in close relationship to the plate while being perpendicular to the axis of the shaft.