-
公开(公告)号：US20090136683A1
公开(公告)日：2009-05-28
申请号：US11946022
申请日：2007-11-27
IPC分类号： H05H1/24
CPC分类号： H01J37/32146 , C23C16/505 , H01J37/32091
摘要： A method for processing a substrate by plasma CVD includes: (i) forming a film on a substrate placed on a susceptor by applying RF power between the susceptor and a shower plate in the presence of a film-forming gas in a reactor; and (ii) upon completion of step (i), without unloading the substrate, applying amplitude-modulated RF power between the susceptor and the shower plate in the absence of a film-forming gas but in the presence of a non-film-forming gas to reduce a floating potential of the substrate.
摘要翻译： 通过等离子体CVD处理衬底的方法包括：（i）在反应器中的成膜气体存在下，通过在基座和喷淋板之间施加RF功率，在放置在基座上的衬底上形成膜; 和（ii）在步骤（i）完成后，在不卸载基板的情况下，在不存在成膜气体的情况下，在基膜和喷淋板之间施加幅度调制的RF功率，但是在非成膜 气体以降低衬底的浮动电位。
-
2.发明授权DC bias voltage measurement circuit and plasma CVD apparatus comprising the same 失效直流偏置电压测量电路和等离子体CVD装置公开(公告)号：US07514934B2
公开(公告)日：2009-04-07
申请号：US11232532
申请日：2005-09-22
申请人： Mitsutoshi Shuto , Yasuaki Suzuki
发明人： Mitsutoshi Shuto , Yasuaki Suzuki
CPC分类号： G01R19/0061 , H01J37/32091 , H01J37/32174 , H01J37/32706
摘要： A circuit for measuring DC bias voltage occurring in an ungrounded electrode of a plasma processing apparatus, includes: a first terminal connected between the ungrounded electrode and the RF power source; a second terminal for determining a value of the DC bias voltage; a first resistance connected between the first terminal and the second terminal; a second resistance connected between the second terminal and a ground; and a condenser disposed in parallel to the second resistance between the second terminal and the ground. The sum of the first resistance value and the second resistance value is about 50 MΩ or greater.
摘要翻译： 一种用于测量等离子体处理装置的未接地电极中产生的直流偏置电压的电路，包括：连接在未接地电极和RF电源之间的第一端子; 用于确定所述DC偏置电压的值的第二端子; 连接在第一端子和第二端子之间的第一电阻器; 连接在第二端子和地之间的第二电阻; 以及与第二端子和地之间的第二电阻平行设置的电容器。 第一电阻值和第二电阻值之和约为50MΩ以上。
-
公开(公告)号：US20050037626A1
公开(公告)日：2005-02-17
申请号：US10911813
申请日：2004-08-05
申请人： Mitsutoshi Shuto , Yasuaki Suzuki
发明人： Mitsutoshi Shuto , Yasuaki Suzuki
IPC分类号： H01L21/683 , C23C16/458 , C23C16/509 , H01L21/205 , H01L21/469 , H01L21/68
CPC分类号： C23C16/4581 , C23C16/5096
摘要： A semiconductor substrate supporting apparatus for supporting a single semiconductor substrate in a plasma CVD apparatus comprises a placing block having a substrate placing area on which the substrate is placed. The substrate placing area is anodized and has as an outermost film an anodic oxide film having a thickness of about 30 μm to about 60 μm and/or a dielectric breakdown voltage of about 300 V or higher.
摘要翻译： 用于在等离子体CVD装置中支撑单个半导体衬底的半导体衬底支撑装置包括具有其上放置衬底的衬底放置区域的放置块。 基板放置区域被阳极氧化，并且具有厚度为约30μm至约60μm和/或约300V或更高的介电击穿电压的阳极氧化膜作为最外膜。
-
公开(公告)号：US20100085129A1
公开(公告)日：2010-04-08
申请号：US12246410
申请日：2008-10-06
申请人： Mitsutoshi Shuto , Yasuaki Suzuki
发明人： Mitsutoshi Shuto , Yasuaki Suzuki
IPC分类号： H03H7/38
CPC分类号： H03H7/38
摘要： An impedance matching apparatus adapted to be connected between a reaction chamber and a power source for plasma processing includes a transformer, a coil unit, and a capacitor connected in series. A primary side of the transformer is adapted to be connected to the power source, and a secondary side of the transformer has multiple taps positioned at different windings; and the coil unit is comprised of multiple coils having different inductances and arranged in parallel, wherein each tap is connected to a different coil or coils. The impedance matching circuit further includes a switch unit provided between the coil unit and the capacitor.
摘要翻译： 适于连接在反应室和用于等离子体处理的电源之间的阻抗匹配装置包括串联连接的变压器，线圈单元和电容器。 变压器的初级侧适于连接到电源，并且变压器的次级侧具有定位在不同绕组处的多个抽头; 并且线圈单元由具有不同电感并且并联布置的多个线圈组成，其中每个抽头连接到不同的线圈或线圈。 阻抗匹配电路还包括设置在线圈单元和电容器之间的开关单元。
-
公开(公告)号：US20060063284A1
公开(公告)日：2006-03-23
申请号：US11232532
申请日：2005-09-22
申请人： Mitsutoshi Shuto , Yasuaki Suzuki
发明人： Mitsutoshi Shuto , Yasuaki Suzuki
IPC分类号： H01L21/66
CPC分类号： G01R19/0061 , H01J37/32091 , H01J37/32174 , H01J37/32706
摘要： A circuit for measuring DC bias voltage occurring in an ungrounded electrode of a plasma processing apparatus, includes: a first terminal connected between the ungrounded electrode and the RF power source; a second terminal for determining a value of the DC bias voltage; a first resistance connected between the first terminal and the second terminal; a second resistance connected between the second terminal and a ground; and a condenser disposed in parallel to the second resistance between the second terminal and the ground. The sum of the first resistance value and the second resistance value is about 50 MΩ or greater.
-
公开(公告)号：US08021723B2
公开(公告)日：2011-09-20
申请号：US11946022
申请日：2007-11-27
CPC分类号： H01J37/32146 , C23C16/505 , H01J37/32091
摘要： A method for processing a substrate by plasma CVD includes: (i) forming a film on a substrate placed on a susceptor by applying RF power between the susceptor and a shower plate in the presence of a film-forming gas in a reactor; and (ii) upon completion of step (i), without unloading the substrate, applying amplitude-modulated RF power between the susceptor and the shower plate in the absence of a film-forming gas but in the presence of a non-film-forming gas to reduce a floating potential of the substrate.
摘要翻译： 通过等离子体CVD处理衬底的方法包括：（i）在反应器中的成膜气体存在下，通过在基座和喷淋板之间施加RF功率，在放置在基座上的衬底上形成膜; 和（ii）在步骤（i）完成后，在不卸载基板的情况下，在不存在成膜气体的情况下，在基膜和喷淋板之间施加幅度调制的RF功率，但是在非成膜 气体以降低衬底的浮动电位。
-
7.发明申请公开(公告)号：US20070266945A1
公开(公告)日：2007-11-22
申请号：US11748263
申请日：2007-05-14
申请人： Mitsutoshi Shuto , Yasushi Fukasawa , Ryu Nakano , Yasuaki Suzuki
发明人： Mitsutoshi Shuto , Yasushi Fukasawa , Ryu Nakano , Yasuaki Suzuki
CPC分类号： C23C16/4585 , C23C16/5096 , H01J37/32091 , H01J37/32623 , H01J37/32642
摘要： A plasma CVD apparatus for forming a thin film on a substrate includes: a vacuum chamber; an upper electrode; a susceptor as a lower electrode; and a ring-shaped insulation plate disposed in a gap between the susceptor and an inner wall of the chamber in the vicinity of or in contact with the susceptor to minimize a floating potential charged on the substrate while processing the substrate.
摘要翻译： 用于在基板上形成薄膜的等离子体CVD装置包括：真空室; 上电极; 作为下电极的感受体; 以及环形绝缘板，设置在基座与基座附近或与基座接触的基座和内壁之间的间隙中，以最小化在处理衬底时在衬底上充电的浮置电位。
-
8.发明申请公开(公告)号：US20060208841A1
公开(公告)日：2006-09-21
申请号：US11436691
申请日：2006-05-19
申请人： Ayumu Morita , Yasuaki Suzuki , Masato Yabu , Tooru Tanimizu , Yozo Shibata , Takashi Kadowaki
发明人： Ayumu Morita , Yasuaki Suzuki , Masato Yabu , Tooru Tanimizu , Yozo Shibata , Takashi Kadowaki
IPC分类号： H01F7/08
CPC分类号： H01H33/6662 , H01F7/122 , H01F7/1615 , H01F7/1623 , H01H51/2209
摘要： An actuating mechanism for a switching device includes a plurality of electromagnets used in combination. Each electromagnet includes a coil, a movable iron core adapted to move on the center axis of the coil, and a stationary iron core provided so as to cover the upper and lower surfaces and the outer peripheral surface of the coil. A permanent magnet is arranged in a gap surrounded by the movable iron core and the stationary core.
摘要翻译： 用于开关装置的致动机构包括组合使用的多个电磁体。 每个电磁体包括线圈，适于在线圈的中心轴线上移动的可动铁芯和设置成覆盖线圈的上表面和下表面以及外周表面的固定铁芯。 永久磁铁布置在由可动铁芯和固定铁芯包围的间隙中。
-
公开(公告)号：US5749173A
公开(公告)日：1998-05-12
申请号：US803244
申请日：1997-02-20
CPC分类号： H02K7/1166 , E05F15/41 , H01H35/006 , E05F15/697 , E05Y2201/49 , E05Y2400/552 , E05Y2900/55 , H02K11/00
摘要： A regulator for a power window having a safety function for preventing an object from being caught in a closing power window includes a driving unit for raising and lowering the window glass of a vehicle and a driven unit which receives power from the driving unit. When frictional resistance corresponding to relative displacement between the driving and driven units is less than a fixed value during descent of the window glass and exceeds this fixed during ascent of the window glass, the ascending window glass is reversed and made to descend. When the amount of an increase in current to the driving unit during ascent of the window glass increases in a case where the sliding resistance has exceeded a fixed value even once during descent of the window glass, the ascending window glass is reversed and made to descend.
摘要翻译： 具有用于防止物体被卡在关闭动力窗中的安全功能的动力窗的调节器包括用于升高和降低车辆的窗玻璃的驱动单元和从驱动单元接收动力的从动单元。 当对应于驱动单元和从动单元之间的相对位移的摩擦阻力小于窗玻璃下降期间的固定值并且在窗玻璃上升期间超过该固定值时，上升的窗玻璃被倒转并下降。 当在窗玻璃下降期间滑动阻力一旦超过固定值的情况下，当窗玻璃上升期间向驱动单元的电流增加量增加时，上升的窗玻璃被反转并使其下降 。
-
公开(公告)号：US5222774A
公开(公告)日：1993-06-29
申请号：US858589
申请日：1992-03-27
CPC分类号： E05B81/14 , E05B79/20 , E05B63/0069 , E05B77/34 , E05B83/34 , Y10S292/22 , Y10T292/1021
摘要： A lid lock apparatus is comprised of an opening formed in a vehicle-body, a lid pivotally mounted to the vehicle-body, a locking mechanism is connected to the plate and has a shaft which engages and disengages the lid when operated to its closed and opened condition, respectively. A driving mechanism which is arranged for releasing the engagement between the shaft and the lid when in the closed condition, is mounted on the locking mechanism and positioned in such a manner that the driving mechanism is set to be in close relationship to the plate while being perpendicular to the axis of the shaft.
摘要翻译： 盖锁装置包括形成在车体中的开口，可枢转地安装到车身的盖，锁定机构连接到板上，并且具有在操作到其关闭时接合和脱离盖的轴， 开放条件。 一种驱动机构，其设置成在处于关闭状态时释放所述轴和所述盖之间的接合，并且被安装在所述锁定机构上并且被定位成使得所述驱动机构被设置为与所述板紧密相关，同时 垂直于轴的轴线。
-
-
-
-
-
-
-
-
-
搜索结果
39 条记录 (耗时 0.019 秒)