Laser processing apparatus
    2.
    发明授权

    公开(公告)号:US12050305B2

    公开(公告)日:2024-07-30

    申请号:US17361560

    申请日:2021-06-29

    Abstract: A laser processing apparatus includes a laser source which generates a laser beam; a scanner unit disposed in an optical path of the laser beam from the laser source and which adjusts the optical path of the laser beam from the laser source in a first direction or in a second direction different from the first direction; and a reflector unit disposed in an optical path of the laser beam adjusted by the scanner unit and which reflects the laser beam adjusted by the scanner unit, where the reflector unit includes a first sub-reflector unit which shifts an optical path of the laser adjusted by the scanner unit in the first direction, and a second sub-reflector unit which shifts an optical path of the laser beam adjusted by the scanner unit in a third direction opposite to the first direction.

    Laser processing apparatus
    4.
    发明授权

    公开(公告)号:US11079571B2

    公开(公告)日:2021-08-03

    申请号:US15793698

    申请日:2017-10-25

    Abstract: A laser processing apparatus includes a laser source which generates a laser beam; a scanner unit disposed in an optical path of the laser beam from the laser source and which adjusts the optical path of the laser beam from the laser source in a first direction or in a second direction different from the first direction; and a reflector unit disposed in an optical path of the laser beam adjusted by the scanner unit and which reflects the laser beam adjusted by the scanner unit, where the reflector unit includes a first sub-reflector unit which shifts an optical path of the laser adjusted by the scanner unit in the first direction, and a second sub-reflector unit which shifts an optical path of the laser beam adjusted by the scanner unit in a third direction opposite to the first direction.

    Shearing interferometer using two opposing shearing plates for laser

    公开(公告)号:US10557756B2

    公开(公告)日:2020-02-11

    申请号:US16154807

    申请日:2018-10-09

    Abstract: A shearing interferometer includes first and second shearing plates disposed opposite to each other. The first shearing plate includes a first front surface and a first back surface, and splits an input beam input to the first front surface into first and second beams reflected at the first front and back surfaces, respectively. The second shearing plate includes a second front surface and a second back surface. The second shearing plate splits the first beam into third and fourth beams reflected at the second front and back surfaces, respectively, and splits the second beam into fifth and sixth beams reflected at the second front and back surfaces, respectively. Each of the first and second shearing plates has a thickness which limits a phase delay between the fourth beam and the fifth beam to a degree determined to allow interference to occur between the fourth beam and the fifth beam.

    Window manufacturing method and window manufacturing apparatus

    公开(公告)号:US12162793B2

    公开(公告)日:2024-12-10

    申请号:US17577846

    申请日:2022-01-18

    Abstract: A window manufacturing method includes providing a mother substrate on a moving stage, the mother substrate including a cutting line; irradiating substantially simultaneously a first beam and a second beam to the mother substrate to cut the mother substrate and to form a target substrate; separating the target substrate from the mother substrate; and providing an etchant to the target substrate to chamfer the target substrate. The first beam is irradiated to the cutting line of the mother substrate, the second beam is irradiated to a point spaced apart from the cutting line of the mother substrate by a distance, and a pulse energy of the first beam is different from a pulse energy of the second beam.

    Laser device including lens assembly

    公开(公告)号:US12147020B2

    公开(公告)日:2024-11-19

    申请号:US17239732

    申请日:2021-04-26

    Abstract: Provided is a laser device including a light source generating a laser beam, a stage, and a lens assembly disposed between the light source and the stage and irradiating the laser beam to a substrate disposed on the stage. The laser device is capable of irradiating a uniform laser beam over an entire processing area to which the laser beam is irradiated. Thus, the laser device may irradiate a uniform laser beam to not only a center area, but also the edge area of the processing area.

Patent Agency Ranking