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1.发明申请System for Attachment of an Electrode into an Inductively Coupled Plasma Source 有权将电极连接到电感耦合等离子体源的系统公开(公告)号：US20130134855A1
公开(公告)日：2013-05-30
申请号：US13307830
申请日：2011-11-30
申请人： Sean Kellogg , Anthony Graupera , N. William Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Shouyin Zhang , Noel Smith
发明人： Sean Kellogg , Anthony Graupera , N. William Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Shouyin Zhang , Noel Smith
CPC分类号： H01J37/32605 , H01J9/02 , H01J27/16 , H01J37/04 , H01J37/08 , H01J2237/032
摘要： An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
摘要翻译： 用于聚焦离子束系统的电感耦合等离子体带电粒子源包括具有可拆卸地附接的源电极的等离子体反应室。 紧固机构将源电极与等离子体反应室连接，并形成导热的真空密封。 使用可移动的源电极，现在可以提高等离子体源管的可用性和再利用。
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公开(公告)号：US08928210B2
公开(公告)日：2015-01-06
申请号：US13307830
申请日：2011-11-30
申请人： Sean Kellogg , Anthony Graupera , N. William Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Shouyin Zhang , Noel Smith
发明人： Sean Kellogg , Anthony Graupera , N. William Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Shouyin Zhang , Noel Smith
IPC分类号： H01J1/02
摘要： An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
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公开(公告)号：US09053895B2
公开(公告)日：2015-06-09
申请号：US13307830
申请日：2011-11-30
申请人： Sean Kellogg , Anthony Graupera , N. William Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Shouyin Zhang , Noel Smith
发明人： Sean Kellogg , Anthony Graupera , N. William Parker , Andrew B. Wells , Mark W. Utlaut , Walter Skoczylas , Gregory A. Schwind , Shouyin Zhang , Noel Smith
CPC分类号： H01J37/32605 , H01J9/02 , H01J27/16 , H01J37/04 , H01J37/08 , H01J2237/032
摘要： An inductively coupled plasma charged particle source for focused ion beam systems includes a plasma reaction chamber with a removably attached source electrode. A fastening mechanism connects the source electrode with the plasma reaction chamber and allows for a heat-conductive, vacuum seal to form. With a removable source electrode, improved serviceability and reuse of the plasma source tube are now possible.
摘要翻译： 用于聚焦离子束系统的电感耦合等离子体带电粒子源包括具有可拆卸地附接的源电极的等离子体反应室。 紧固机构将源电极与等离子体反应室连接，并形成导热的真空密封。 使用可移动的源电极，现在可以提高等离子体源管的可用性和再利用。
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4.发明授权Encapsulation of electrodes in solid media for use in conjunction with fluid high voltage isolation 有权固体介质中的电极封装，与流体高压隔离结合使用公开(公告)号：US08642974B2
公开(公告)日：2014-02-04
申请号：US13165556
申请日：2011-06-21
申请人： Sean Kellogg , Andrew B. Wells , James B. McGinn , N. William Parker , Mark W. Utlaut , Anthony Graupera
发明人： Sean Kellogg , Andrew B. Wells , James B. McGinn , N. William Parker , Mark W. Utlaut , Anthony Graupera
IPC分类号： H01J3/14
CPC分类号： H05H1/24 , H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/46 , H05H2001/4652
摘要： An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.
摘要翻译： 用于聚焦带电粒子束系统的电感耦合等离子体源包括提供改进的电隔离和减小的电容RF耦合的导电屏蔽以及绝缘和冷却等离子体室的介电流体。 导电屏蔽可以封闭在固体电介质中。 电介质流体可以由泵循环或不被泵循环。 热管可用于冷却介电流体。
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5.发明申请Encapsulation of Electrodes in Solid Media for use in conjunction with Fluid High Voltage Isolation 有权固体介质中的电极封装，与流体高压隔离结合使用公开(公告)号：US20110272592A1
公开(公告)日：2011-11-10
申请号：US13165556
申请日：2011-06-21
申请人： Sean Kellogg , Andrew B. Wells , James B. McGinn , N. William Parker , Mark W. Utlaut , Anthony Graupera
发明人： Sean Kellogg , Andrew B. Wells , James B. McGinn , N. William Parker , Mark W. Utlaut , Anthony Graupera
IPC分类号： H01J3/14
CPC分类号： H05H1/24 , H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/46 , H05H2001/4652
摘要： An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.
摘要翻译： 用于聚焦带电粒子束系统的电感耦合等离子体源包括提供改进的电隔离和减小的电容RF耦合的导电屏蔽以及绝缘和冷却等离子体室的介电流体。 导电屏蔽可以封闭在固体电介质中。 电介质流体可以由泵循环或不被泵循环。 热管可用于冷却介电流体。
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6.发明申请High Voltage Isolation of an Inductively Coupled Plasma Ion Source with a Liquid that is not Actively Pumped 审中-公开具有不积极泵送的液体的电感耦合等离子体离子源的高压隔离公开(公告)号：US20150102230A1
公开(公告)日：2015-04-16
申请号：US14128030
申请日：2012-06-21
IPC分类号： H05H1/24
CPC分类号： H05H1/24 , H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/46 , H05H2001/4652
摘要： An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.
摘要翻译： 用于聚焦带电粒子束系统的电感耦合等离子体源包括等离子体腔室和不被主动地泵送在等离子体室周围的流体，以在等离子体室和处于地电位的附近部件之间提供高电压隔离，例如 导电屏蔽。 一个或多个冷却装置通过使用蒸发冷却和热管将等离子体室的热量散发到周围环境中来冷却等离子体室。
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7.发明授权High voltage isolation of an inductively coupled plasma ion source with a liquid that is not actively pumped 有权电感耦合等离子体离子源与未被主动泵送的液体进行高压隔离公开(公告)号：US09591735B2
公开(公告)日：2017-03-07
申请号：US14128030
申请日：2012-06-21
CPC分类号： H05H1/24 , H01J27/16 , H01J37/08 , H01J37/321 , H01J2237/002 , H01J2237/061 , H01J2237/0817 , H01J2237/31749 , H05H1/46 , H05H2001/4652
摘要： An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment.
摘要翻译： 用于聚焦带电粒子束系统的电感耦合等离子体源包括等离子体腔室和不被主动地泵送在等离子体室周围的流体，以在等离子体室和处于地电位的附近部件之间提供高电压隔离，例如 导电屏蔽。 一个或多个冷却装置通过使用蒸发冷却和热管将等离子体室的热量散发到周围环境中来冷却等离子体室。
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8.发明申请Lamella creation method and device using fixed-angle beam and rotating sample stage 有权薄片创建方法和使用固定角度光束和旋转样品台的装置公开(公告)号：US20130328246A1
公开(公告)日：2013-12-12
申请号：US13493735
申请日：2012-06-11
CPC分类号： G01N1/32 , H01J37/3023 , H01J37/3056 , H01J2237/31745
摘要： A system for creating a substantially planar face in a substrate, the system including directing one or more beams at a first surface of a substrate to remove material from a first location, the beam being offset from a normal to the first surface by a curtaining angle; sweeping the one or more beams in a plane that is perpendicular to the first surface to mill one or more initial cuts, the initial cuts exposing a second surface that is substantially perpendicular to the first surface; rotating the substrate about an axis other than an axis normal to the first beam or parallel to the first beam; directing the first beam at the second surface to remove additional material from the substrate without changing the curtaining angle; and scanning the one or more beams in across the second surface to mill one or more finishing cuts.
摘要翻译： 一种用于在基板中产生基本上平坦的面的系统，所述系统包括在基板的第一表面处引导一个或多个光束以从第一位置移除材料，所述光束从第一表面的法线偏移一个展示角 ; 在垂直于第一表面的平面中扫掠一个或多个光束以研磨一个或多个初始切割，初始切割暴露基本上垂直于第一表面的第二表面; 围绕除了垂直于第一光束的轴的轴线或平行于第一光束的轴线旋转基板; 在所述第二表面处引导所述第一光束以从所述衬底移除附加材料而不改变所述观察角度; 并且扫描穿过第二表面的一个或多个光束以研磨一个或多个精加工切割。
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公开(公告)号：US09733164B2
公开(公告)日：2017-08-15
申请号：US13493735
申请日：2012-06-11
IPC分类号： H01J37/26 , H01J37/20 , G01N1/32 , H01J37/302 , H01J37/305
CPC分类号： G01N1/32 , H01J37/3023 , H01J37/3056 , H01J2237/31745
摘要： A system for creating a substantially planar face in a substrate, the system including directing one or more beams at a first surface of a substrate to remove material from a first location, the beam being offset from a normal to the first surface by a curtaining angle; sweeping the one or more beams in a plane that is perpendicular to the first surface to mill one or more initial cuts, the initial cuts exposing a second surface that is substantially perpendicular to the first surface; rotating the substrate about an axis other than an axis normal to the first beam or parallel to the first beam; directing the first beam at the second surface to remove additional material from the substrate without changing the curtaining angle; and scanning the one or more beams in across the second surface to mill one or more finishing cuts.
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公开(公告)号：US07880151B2
公开(公告)日：2011-02-01
申请号：US12039535
申请日：2008-02-28
申请人： Andrew B. Wells
发明人： Andrew B. Wells
IPC分类号： G01N23/00
CPC分类号： H01J37/3045 , B82Y10/00 , B82Y40/00 , H01J37/3056
摘要： An improved method and apparatus of beam processing corrects for beam drift while a beam is processing a sample. The beam position is aligned using a fiducial that is sufficiently near the working area so that the fiducial can be imaged and the sample processed without a stage moving. During processing, the beam positioning is corrected for drift using a model that predicts the drift.
摘要翻译： 一种改进的光束处理方法和装置在光束处理样品时校正光束漂移。 使用足够靠近工作区域的基准来对准光束位置，使得可以对基准进行成像，并且样品在没有阶段移动的情况下进行处理。 在处理期间，使用预测漂移的模型来校正波束定位以进行漂移。
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