公开(公告)号：US06288772B1

公开(公告)日：2001-09-11

申请号：US09500489

申请日：2000-02-09

申请人： Tadaaki Shinozaki ,  Masamitsu Yanagihara

发明人： Tadaaki Shinozaki ,  Masamitsu Yanagihara

IPC分类号： G03B2742

CPC分类号： G03F7/70066 ,  G03F7/70191 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70433 ,  G03F7/70475 ,  G03F9/7076

摘要： In the scanning exposure method of the present invention, a mask and a substrate are moved in a synchronous manner, and first patterns and a second pattern are connectedly exposed on the substrate. At least a portion of the first patterns and at least a portion of the second pattern form a common pattern, and the common pattern and non-common patterns, which differ from the common pattern, are formed in mask as the first patterns and the second pattern. The first patterns and the second pattern are connected by means of the common pattern.

摘要翻译： 在本发明的扫描曝光方法中，掩模和基板以同步方式移动，并且第一图案和第二图案被连接地暴露在基板上。 第一图案的至少一部分和第二图案的至少一部分形成公共图案，并且与公共图案不同的公共图案和非共同图案在掩模中形成为第一图案，第二图案 模式。 第一图案和第二图案通过公共图案连接。

公开(公告)号：US10255491B2

公开(公告)日：2019-04-09

申请号：US13885909

申请日：2011-10-25

申请人： Masakazu Sekiguchi ,  Tetsuya Yamamoto ,  Masahiro Nei ,  Masamitsu Yanagihara ,  Satoshi Hagiwara ,  Isao Totsuka ,  Tomoyuki Matsuyama

发明人： Masakazu Sekiguchi ,  Tetsuya Yamamoto ,  Masahiro Nei ,  Masamitsu Yanagihara ,  Satoshi Hagiwara ,  Isao Totsuka ,  Tomoyuki Matsuyama

IPC分类号： G06K9/00 ,  G08B7/06 ,  B66B3/00

摘要： To appropriately guide a subject person while protecting a privacy of the subject person despite use of an captured image of the subject person, a guidance system includes: an image capturing unit capable of capturing an image containing a subject person from a first direction; a detection unit that detects a size of an image of the subject person from the image captured by the image capturing unit; and a guidance unit that provides guidance for the subject person based on a detection result of the detection unit.

公开(公告)号：US06552775B1

公开(公告)日：2003-04-22

申请号：US09718373

申请日：2000-11-24

申请人： Masamitsu Yanagihara ,  Tomohiro Katsume

发明人： Masamitsu Yanagihara ,  Tomohiro Katsume

IPC分类号： G03B2752

CPC分类号： G03F7/70225 ,  G03F7/70258 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/7003

摘要： An exposure apparatus and a method which make it possible to enhance the fineness of pattern in spite of the trend to enlarge the size of the photosensitive substrate and device. In this apparatus, a mask and the photosensitive substrate are allowed to synchronously scan, and the optical projecting system thereof is provided with a scanning direction adjusting means which is designed to adjust the position of scanning direction of a projected image to be projected onto the substrate, wherein a non-linear component of error is determined in advance and the result thus determined is stored as a correction value for the apparatus, thereby enabling the pattern exposure to be performed while continuously controlling the image-adjusting mechanism on the basis of the correction value.

摘要翻译： 尽管趋向于增大感光基板和装置的尺寸，但是可以提高图案细度的曝光装置和方法。 在该装置中，掩模和感光基板被允许同步扫描，并且其光学投影系统设置有扫描方向调整装置，该扫描方向调整装置被设计成调整要投影到基板上的投影图像的扫描方向的位置 其中，预先确定误差的非线性分量，并且将由此确定的结果存储为装置的校正值，从而能够在基于校正的基础上连续控制图像调整机构的同时执行图案曝光 值。

公开(公告)号：US4687322A

公开(公告)日：1987-08-18

申请号：US931013

申请日：1986-11-17

申请人： Akikazu Tanimoto ,  Shoji Ishizaka ,  Yutaka Endo ,  Hiroyuki Suzuki ,  Masamitsu Yanagihara

发明人： Akikazu Tanimoto ,  Shoji Ishizaka ,  Yutaka Endo ,  Hiroyuki Suzuki ,  Masamitsu Yanagihara

IPC分类号： H01L21/30 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F9/7026

摘要： An apparatus for forming the optical image of a photo-pattern placed on a first plane on a second plane comprises projection means having a projection optical system disposed between the first plane and the second plane to form the optical image, focus detecting means including means for detecting the position of the second plane relative to the projection optical system, the in-focus position corresponding to the position of the second plane when the imaging plane of the projection optical system and the second plane are coincident with each other being preset, the focus detecting means putting out a detection signal when the in-focus position is detected by the detecting means, fluctuation detecting means for determining the amount of fluctuation of the imaging plane of the projection optical system caused correspondingly to a variation in the refractive index of the atmosphere, and means responsive to the fluctuation detecting means to control the focus detecting means so that the in-focus position is re-set correspondingly to the amount of fluctuation of the imaging plane determined by the fluctuation detecting means.

摘要翻译： 用于形成放置在第二平面上的第一平面上的光图案的光学图像的装置包括投影装置，其具有设置在第一平面和第二平面之间的投影光学系统以形成光学图像，焦点检测装置包括： 检测第二平面相对于投影光学系统的位置，当投影光学系统和第二平面的成像平面彼此一致时，对应于第二平面的位置的对焦位置被预设，焦点 检测装置，当由检测装置检测到对焦位置时，放出检测信号;波动检测装置，用于确定投影光学系统的成像面的波动量对应于大气折射率的变化 以及响应于所述波动检测装置来控制所述焦点检测装置的装置， n焦点位置对应于由波动检测装置确定的成像平面的波动量重新设定。

公开(公告)号：US5936712A

公开(公告)日：1999-08-10

申请号：US18558

申请日：1998-02-04

申请人： Masanobu Ito ,  Masamitsu Yanagihara ,  Hideji Goto ,  Yoshiyuki Katamata

发明人： Masanobu Ito ,  Masamitsu Yanagihara ,  Hideji Goto ,  Yoshiyuki Katamata

IPC分类号： H01L21/027 ,  G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G03B27/52 ,  G03B27/32 ,  G01B11/00

CPC分类号： G03F9/7026 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： To improve the focus accuracy during alignment and to improve the alignment accuracy even if a substrate has warpage, during alignment, an approximate focus plane is obtained by using only the detection results at focus points of focus sensors located near the ends of a substrate, close to alignment points, and without using the detection results at focus points of two central focus sensors. The auto-focus operation is performed by using the above operation results. As a result, a substrate is driven so as to be adjusted to the approximate focus plane during alignment.

摘要翻译： 为了提高对准时的聚焦精度，即使基板翘曲，也能够提高对准精度，在对准期间，仅使用位于基板端部附近的聚焦传感器的聚焦点处的检测结果来获得近似聚焦面 到对准点，并且不在两个中央焦点传感器的对焦点处使用检测结果。 通过使用上述操作结果进行自动对焦操作。 结果，基板被驱动以在对准期间被调整到近似的聚焦平面。

公开(公告)号：US5625436A

公开(公告)日：1997-04-29

申请号：US689691

申请日：1996-08-13

申请人： Masamitsu Yanagihara ,  Susumu Mori ,  Tsuyoshi Naraki ,  Masami Seki ,  Seiji Miyazaki ,  Tsuyoshi Narabe ,  Hiroshi Chiba

发明人： Masamitsu Yanagihara ,  Susumu Mori ,  Tsuyoshi Naraki ,  Masami Seki ,  Seiji Miyazaki ,  Tsuyoshi Narabe ,  Hiroshi Chiba

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/70275 ,  G03F7/70241 ,  G03F7/70258 ,  G03F7/70358 ,  G03F7/70858 ,  G03F7/70883 ,  G03F9/70

摘要： In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification.

摘要翻译： 在扫描型曝光装置中，通过以与所述掩模和所述基板相对于所述投影光学系统的倍率相对于投影光学系统沿预定方向扫描所述掩模上的图案区域的整个表面， 提供了多个照明光学系统，用于利用来自各个光源的各个光束照射掩模上的图案区域的各个区域; 多个投影光学系统被布置为对应于各个照明光学系统，所述投影光学系统将由各个照明光学系统照射的区域的各个图像投射到所述基板上的相应的投影区域上; 用于获取和存储基板的形状变化的存储装置; 放大率改变装置，用于根据基板的形状变化来改变至少一个投影光学系统的放大率; 以及成像位置改变装置，用于根据放大率的变化改变经由至少一个投影光学系统投影的所述图像的位置。

公开(公告)号：US5602620A

公开(公告)日：1997-02-11

申请号：US490212

申请日：1995-06-14

申请人： Seiji Miyazaki ,  Kei Nara ,  Masami Seki ,  Masamitsu Yanagihara

发明人： Seiji Miyazaki ,  Kei Nara ,  Masami Seki ,  Masamitsu Yanagihara

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G01B11/00

CPC分类号： G03F9/7003 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70475 ,  G03F7/70791 ,  G03F9/70

摘要： The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction. Then a relative displacement is given by an amount of the orthogonality error between positions of images projected through a first optical system and positions of images projected through a second optical system, and relative positions of the mask and the photosensitive substrate are continuously changed by the amount of the orthogonality error in the first direction in accordance with the position of the mask or photosensitive substrate in the scanning direction.

摘要翻译： 本发明涉及扫描曝光装置和曝光方法，以通过校正掩模或感光基底上的图案的正交性误差来将掩模上的多个区域的图像同时投影到感光基板上。 如果掩模或感光基板上的图案具有在沿着扫描方向进入垂直于扫描方向的第一方向上产生一定角度的偏差的正交性误差，则掩模和感光基板相对于彼此旋转 其平面将每个图案的坐标系中的一个坐标轴与第一方向对齐。 然后通过第一光学系统投影的图像的位置和通过第二光学系统投影的图像的位置之间的正交性误差的量给出相对位移，并且掩模和感光基板的相对位置连续地改变量 根据掩模或感光基板在扫描方向上的位置，在第一方向上的正交性误差。

公开(公告)号：US5581075A

公开(公告)日：1996-12-03

申请号：US446509

申请日：1995-05-22

申请人： Tsuyoshi Naraki ,  Masamitsu Yanagihara ,  Hiroshi Shirasu ,  Tomohide Hamada ,  Tetsuo Kikuchi ,  Noriaki Yamamoto

发明人： Tsuyoshi Naraki ,  Masamitsu Yanagihara ,  Hiroshi Shirasu ,  Tomohide Hamada ,  Tetsuo Kikuchi ,  Noriaki Yamamoto

IPC分类号： G03F7/20 ,  G01J1/32

CPC分类号： G03F7/7005 ,  G03F7/70091 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70475 ,  G03F7/70791

摘要： An exposure apparatus comprises a plurality of illumination optical systems for generating a plurality of light beams, a plurality of projection optical systems disposed corresponding to the plurality of illumination optical systems, respectively, a plurality of light intensity detectors, provided respectively for the plurality of illumination optical systems, for detecting individual intensities of the plurality of light beams, a light intensity changing device for changing the respective intensities of the plurality of light beams, and a control device for controlling the light intensity changing device and uniformizing the intensities of the plurality of light beams to a substantially fixed level.

摘要翻译： 曝光装置包括多个用于产生多个光束的照明光学系统，分别对应于多个照明光学系统设置的多个投影光学系统，分别为多个照明设置的多个光强度检测器 用于检测多个光束的各个强度的光学系统，用于改变多个光束的各个强度的光强度改变装置，以及用于控制光强度改变装置的控制装置，并且使多个光束的强度均匀化 光束达到基本上固定的水平。

公开(公告)号：US5500736A

公开(公告)日：1996-03-19

申请号：US339284

申请日：1994-11-07

申请人： Hideki Koitabashi ,  Masamitsu Yanagihara ,  Junji Hazama

发明人： Hideki Koitabashi ,  Masamitsu Yanagihara ,  Junji Hazama

IPC分类号： G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68 ,  G01B11/00

CPC分类号： G03F9/70

摘要： A position detecting method detects each position of a photosensitive substrate when executing shots of circuit patterns so that the circuit patterns are further superposed on the photosensitive substrate already formed with the circuit patterns. The method comprises the steps of performing a shot of a circuit pattern of a reticle in superposition on liquid crystal pixel segments already formed on a glass plate, registering, in a memory, a circuit pattern as a reference image in the liquid crystal pixel segment and performing pattern matching with other fields of the liquid crystal pixel segments by use of this reference image. An alignment is conducted based on a position of circuit pattern extracted thereby.

摘要翻译： 当执行电路图案的拍摄时，位置检测方法检测感光基板的每个位置，使得电路图案进一步叠加在已经形成有电路图案的感光基板上。 该方法包括以下步骤：在已经形成在玻璃板上的液晶像素段上叠加掩模版的电路图案，在存储器中将作为参考图像的电路图案配置在液晶像素段中，以及 通过使用该参考图像来执行与液晶像素段的其它场的模式匹配。 基于由此提取的电路图案的位置进行对准。

公开(公告)号：US20120250944A1

公开(公告)日：2012-10-04

申请号：US13513704

申请日：2010-12-28

申请人： Tetsuya Yamamoto ,  Masahiro Nei ,  Isao Totsuka ,  Tomoyuki Matsuyama ,  Masamitsu Yanagihara ,  Satoshi Hagiwara ,  Masakazu Sekiguchi

发明人： Tetsuya Yamamoto ,  Masahiro Nei ,  Isao Totsuka ,  Tomoyuki Matsuyama ,  Masamitsu Yanagihara ,  Satoshi Hagiwara ,  Masakazu Sekiguchi

IPC分类号： G06K9/62

CPC分类号： G06K9/00369 ,  G06T7/30 ,  G08B21/0476 ,  H04N7/18 ,  H04N7/181

摘要： To determine the state of a subject person with a simple structure, an image determining device includes: an imaging unit that captures an image from a first direction, the image including the subject person; a first detector that detects size information from the image, the size information being about the subject person in the first direction; a second detector that detects position-related information, the position-related information being different from the information detected by the first detector; and a determining unit that determines the state of the subject person, based on a result of the detection performed by the first detector and a result of the detection performed by the second detector.

摘要翻译： 为了确定具有简单结构的被摄体人的状态，图像确定装置包括：成像单元，其从第一方向捕获图像，所述图像包括被摄体人; 第一检测器，其检测来自图像的尺寸信息，所述尺寸信息是关于所述被摄体在所述第一方向上; 第二检测器，其检测位置相关信息，所述位置相关信息不同于由所述第一检测器检测的信息; 以及确定单元，其基于由第一检测器执行的检测结果和由第二检测器执行的检测结果来确定被检者的状态。