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1.发明申请公开(公告)号：US20240377752A1
公开(公告)日：2024-11-14
申请号：US18781567
申请日：2024-07-23
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu CHEN , Heng-Hsin LIU , Li-Jui CHEN , Shang-Chieh CHIEN
Abstract: A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. An array of sensors sense the extreme ultraviolet radiation and charged particles emitted by the droplets. A control system analyses sensor signals from the sensors and adjusts plasma generation parameters responsive to the sensor signals.
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公开(公告)号：US20230367225A1
公开(公告)日：2023-11-16
申请号：US18361254
申请日：2023-07-28
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu CHEN , Sagar Deepak KHIVSARA , Kuo-An LIU , Chieh HSIEH , Shang-Chieh CHIEN , Gwan-Sin CHANG , Kai Tak LAM , Li-Jui CHEN , Heng-Hsin LIU , Chung-Wei WU , Zhiqiang WU
IPC: G03F7/00
CPC classification number: G03F7/70033 , G03F7/70166 , G03F7/705 , G03F7/70916 , G03F7/70933
Abstract: A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. The photolithography system senses contamination of a collector mirror by the tin droplets and adjusts the flow of a buffer fluid to reduce the contamination.
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公开(公告)号：US20240361708A1
公开(公告)日：2024-10-31
申请号：US18766165
申请日：2024-07-08
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Chieh HSIEH , Tai-Yu CHEN , Cho-Ying LIN , Heng-Hsin LIU , Li-Jui CHEN , Shang-Chieh CHIEN
CPC classification number: G03F7/70925 , G02B17/0663 , G03F7/70033 , G03F7/70491 , G03F7/70808 , G03F7/70916 , H05G2/008
Abstract: A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.
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公开(公告)号：US20230065403A1
公开(公告)日：2023-03-02
申请号：US17462563
申请日：2021-08-31
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu CHEN , Cho-Ying LIN , Sagar Deepak KHIVSARA , Hsiang CHEN , Chieh HSIEH , Sheng-Kang YU , Shang-Chieh CHIEN , Kai Tak LAM , Li-Jui CHEN , Heng-Hsin LIU , Zhiqiang WU
Abstract: A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.
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5.发明申请公开(公告)号：US20220229371A1
公开(公告)日：2022-07-21
申请号：US17150685
申请日：2021-01-15
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu CHEN , Heng-Hsin LIU , Li-Jui CHEN , Shang-Chieh CHIEN
Abstract: A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. An array of sensors sense the extreme ultraviolet radiation and charged particles emitted by the droplets. A control system analyses sensor signals from the sensors and adjusts plasma generation parameters responsive to the sensor signals.
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Patent Agency Ranking
公开(公告)号：US20250123555A1
公开(公告)日：2025-04-17
申请号：US18487881
申请日：2023-10-16
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Jia-Lin SYU , Tai-Yu CHEN , Yi-Zhen CHEN , Yen-Hsun CHEN , Shang-Chieh CHIEN , Li-Jui CHEN
IPC: G03F1/84 , G01N21/88 , G01N21/956
Abstract: A method for operating a reticle inspection system includes training an analysis model of the reticle inspection system with a machine learning process, generating a difference threshold based on the machine learning process, storing a reference image, and generating a scan image of a reticle with the reticle inspection system. The method includes generating a relative difference value by comparing the scan image to the reference image. The method includes, if the relative difference value is less than the difference threshold, determining that the reticle is not defective. The method includes, if the relative difference value is greater than the difference threshold, determining that the reticle is defective.
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公开(公告)号：US20220350257A1
公开(公告)日：2022-11-03
申请号：US17867318
申请日：2022-07-18
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu CHEN , Sagar Deepak KHIVSARA , Kuo-An LIU , Chieh HSIEH , Shang-Chieh CHIEN , Gwan-Sin CHANG , Kai Tak LAM , Li-Jui CHEN , Heng-Hsin LIU , Chung-Wei WU , Zhiqiang WU
IPC: G03F7/20
Abstract: A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. The photolithography system senses contamination of a collector mirror by the tin droplets and adjusts the flow of a buffer fluid to reduce the contamination.
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公开(公告)号：US20250085215A1
公开(公告)日：2025-03-13
申请号：US18404762
申请日：2024-01-04
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu CHEN , Hsiao-Lun CHANG , Shang-Chieh CHIEN
Abstract: A method includes positioning a substrate in an optical path of a multiwavelength light source; generating a first detection result by exposing a first region of the substrate to a first light having a first wavelength band selected by the light source; and generating a second detection result by exposing a second region of the substrate to a second light having a second wavelength band selected by the multiwavelength light source. A system includes a multiwavelength light source including a light source and a wavelength selector in an optical path of light generated by the light source. The system further includes a spectrometer operable to measure a spectrum of a first light selected by the wavelength selector; a mask stage operable to position a mask in the optical path; and a controller operable to adjust a parameter of the multiwavelength light source responsive to the spectrum of the first light.
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公开(公告)号：US20230284366A1
公开(公告)日：2023-09-07
申请号：US18298927
申请日：2023-04-11
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tai-Yu CHEN , Cho-Ying LIN , Sagar Deepak KHIVSARA , Hsiang CHEN , Chieh HSIEH , Sheng-Kang YU , Shang-Chieh CHIEN , Kai Tak LAM , Li-Jui CHEN , Heng-Hsin LIU , Zhiqiang WU
CPC classification number: H05G2/008 , H05G2/006 , G03F7/7055 , G03F7/7085 , G03F7/70033
Abstract: A light source is provided capable of maintaining the temperature of a collector surface at or below a predetermined temperature. The light source in accordance with various embodiments of the present disclosure includes a processor, a droplet generator for generating a droplet to create extreme ultraviolet light, a collector for reflecting the extreme ultraviolet light into an intermediate focus point, a light generator for generating pre-pulse light and main pulse light, and a thermal image capture device for capturing a thermal image from a reflective surface of the collector.
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公开(公告)号：US20230273534A1
公开(公告)日：2023-08-31
申请号：US18311795
申请日：2023-05-03
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Chieh HSIEH , Tai-Yu CHEN , Cho-Ying LIN , Heng-Hsin LIU , Li-Jui CHEN , Shang-Chieh CHIEN
CPC classification number: G03F7/70925 , G03F7/70033 , G02B17/0663 , G03F7/70491 , H05G2/008 , G03F7/70808
Abstract: A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.
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