公开(公告)号：US08780321B2

公开(公告)日：2014-07-15

申请号：US12631113

申请日：2009-12-04

申请人： Thijs Egidius Johannes Knaapen ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

发明人： Thijs Egidius Johannes Knaapen ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70925 ,  G03B27/52 ,  G03F7/70341

摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。

公开(公告)号：US20110273679A1

公开(公告)日：2011-11-10

申请号：US13187086

申请日：2011-07-20

申请人： Thijs Egidius Johannes Knaapen ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

发明人： Thijs Egidius Johannes Knaapen ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

IPC分类号： G03B27/52

CPC分类号： G03F7/70925 ,  G03B27/52 ,  G03F7/70341

摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。

公开(公告)号：US20100157260A1

公开(公告)日：2010-06-24

申请号：US12631113

申请日：2009-12-04

申请人： Thijs Egidius Johannes KNAAPEN ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

发明人： Thijs Egidius Johannes KNAAPEN ,  Richard Joseph Bruls ,  Youri Johannes Laurentius Maria Van Dommelen ,  Johannes Henricus Wilhelmus Jacobs ,  Martijn Hendrik Kamphuis ,  Paulus Martinus Maria Liebregts ,  Rudolf Adrianus Joannes Maas ,  Marco Koert Stavenga ,  Coen Cornelis Wilhelmus Verspaget ,  Rudy Jan Maria Pellens ,  Jan Cornelis Van Der Hoeven ,  David Lucien Anstotz ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Marcus Johannes Van Der Zanden ,  Vijay Kumar Badam ,  Casper Roderik De Groot

IPC分类号： G03B27/52

CPC分类号： G03F7/70925 ,  G03B27/52 ,  G03F7/70341

摘要： A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.

摘要翻译： 公开了一种具有包括目标和/或传感器的台面和使用局部气流从目标和/或传感器移置液体的液体移位装置的光刻设备。 液体置换装置可以定位在各种位置，例如， 安装在曝光站处的液体处理装置，在曝光站和测量站之间，在负载/卸载站处或与传感器相邻的传送路径。

公开(公告)号：US08259283B2

公开(公告)日：2012-09-04

申请号：US12408392

申请日：2009-03-20

申请人： Daniël Jozef Maria Direcks ,  Nicolaas Rudolf Kemper ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Danny Maria Hubertus Philips ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

发明人： Daniël Jozef Maria Direcks ,  Nicolaas Rudolf Kemper ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Danny Maria Hubertus Philips ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03B27/52 ,  G03F7/70341

摘要： An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.

摘要翻译： 描述了一种浸没式光刻设备，其中液滴去除装置从基板去除液滴。 在曝光期间，使用来自气刀的倾斜流动的气体。

公开(公告)号：US20090237632A1

公开(公告)日：2009-09-24

申请号：US12408392

申请日：2009-03-20

申请人： Daniel Jozef Maria Direcks ,  Nicolaas Rudolf Kemper ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Danny Maria Hubertus Philips ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

发明人： Daniel Jozef Maria Direcks ,  Nicolaas Rudolf Kemper ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Danny Maria Hubertus Philips ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Marcus Johannes Van Der Zanden ,  Pieter Mulder

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341

摘要： An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.

摘要翻译： 描述了一种浸没式光刻设备，其中液滴去除装置从基板去除液滴。 在曝光期间，使用来自气刀的倾斜流动的气体。

公开(公告)号：US08405817B2

公开(公告)日：2013-03-26

申请号：US12697583

申请日：2010-02-01

申请人： Marco Koert Stavenga ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Jan Willem Cromwijk ,  Ralph Joseph Meijers ,  Fabrizio Evangelista ,  David Bessems ,  Hua Li ,  Marinus Jochemsen ,  Pieter Lein Joseph Gunter ,  Franciscus Wilhelmus Bell ,  Erik Witberg ,  Marcus Agnes Johannes Smits ,  Zhenhua Ma

发明人： Marco Koert Stavenga ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Jan Willem Cromwijk ,  Ralph Joseph Meijers ,  Fabrizio Evangelista ,  David Bessems ,  Hua Li ,  Marinus Jochemsen ,  Pieter Lein Joseph Gunter ,  Franciscus Wilhelmus Bell ,  Erik Witberg ,  Marcus Agnes Johannes Smits ,  Zhenhua Ma

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

摘要翻译： 公开了一种操作光刻设备的方法。 该方法包括移动支撑衬底的衬底台相对于投影系统，并且在衬底的边缘或附近的预定区域内的靶成像期间调整衬底台和投影系统之间的扫描速度，或者调整步进 在基板的边缘处或附近的预定区域中的相邻目标位置之间的速度，或两者。 调整扫描和/或步进速度可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。

公开(公告)号：US20110005603A1

公开(公告)日：2011-01-13

申请号：US12820991

申请日：2010-06-22

申请人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul Petrus Joannes Berkvens ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Matheus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Ruud Hendricus Martinus Johannes Bloks

发明人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul Petrus Joannes Berkvens ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Matheus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Ruud Hendricus Martinus Johannes Bloks

IPC分类号： F03B11/00

CPC分类号： H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

摘要： A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的面对表面之间的空间中。 流体处理结构包括一个供给通道，用于将流体从流体处理结构外部通过到该空间;以及热隔离器，其至少部分地邻近供给通道定位，以将供给通道中的流体与由 流体处理结构。

公开(公告)号：US20100214543A1

公开(公告)日：2010-08-26

申请号：US12697583

申请日：2010-02-01

申请人： Marco Koert Stavenga ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Jan Willem Cromwijk ,  Ralph Joseph Meijers ,  Fabrizio Evangelista ,  David Bessems ,  Hua Li ,  Marinus Jochemsen ,  Pieter Lein Joseph Gunter ,  Franciscus Wilhelmus Bell ,  Erik Witberg ,  Marcus Agnes Johannes Smits ,  Zhenhua Ma

发明人： Marco Koert Stavenga ,  Nicolaas Rudolf Kemper ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Jan Willem Cromwijk ,  Ralph Joseph Meijers ,  Fabrizio Evangelista ,  David Bessems ,  Hua Li ,  Marinus Jochemsen ,  Pieter Lein Joseph Gunter ,  Franciscus Wilhelmus Bell ,  Erik Witberg ,  Marcus Agnes Johannes Smits ,  Zhenhua Ma

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

摘要翻译： 公开了一种操作光刻设备的方法。 该方法包括移动支撑衬底的衬底台相对于投影系统，并且在衬底的边缘或附近的预定区域内的靶成像期间调整衬底台和投影系统之间的扫描速度，或者调整步进 在基板的边缘处或附近的预定区域中的相邻目标位置之间的速度，或两者。 调整扫描和/或步进速度可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。

公开(公告)号：US20080316441A1

公开(公告)日：2008-12-25

申请号：US11812507

申请日：2007-06-19

申请人： Paulus Martinus Maria Liebregts ,  Menno Fien ,  Erik Roelof Loopstra ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens

发明人： Paulus Martinus Maria Liebregts ,  Menno Fien ,  Erik Roelof Loopstra ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens

IPC分类号： G03B27/42

CPC分类号： G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983

摘要： A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.

摘要翻译： 公开了一种光刻设备，其具有在设备的至少一部分上承载涂层的可移除的粘合剂膜。 在一个实施例中，公开了一种液体供应系统，其具有沿着投影系统和基板支撑件之间的空间的边界的至少一部分的边界延伸的液体限制结构，其中承载涂层的膜位于液体限制的至少一部分 结构体。

公开(公告)号：US20080212046A1

公开(公告)日：2008-09-04

申请号：US11987569

申请日：2007-11-30

申请人： Michel Riepen ,  Christiaan Alexander Hoogendam ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Josef Maria Direcks ,  Paul Petrus Joannes Berkvens ,  Eva Mondt ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete

发明人： Michel Riepen ,  Christiaan Alexander Hoogendam ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Josef Maria Direcks ,  Paul Petrus Joannes Berkvens ,  Eva Mondt ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

摘要翻译： 公开了一种用于浸没式光刻术的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉扎特征基本上固定就位。 弯液面钉扎特征包括以多边形形式布置的多个分立出口。