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公开(公告)号：US11896934B2
公开(公告)日：2024-02-13
申请号：US17115054
申请日：2020-12-08
CPC分类号： B01D67/0034 , B01D69/02 , B01D71/64 , B01D2323/24 , B01D2323/28 , B01D2323/34 , B01D2325/021 , B01D2325/24
摘要： Porous liquid-filtering membranes are provided having a boundary region substantially surrounding the pore region and having greater tear resistance than the pore region.
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公开(公告)号：US20230398502A1
公开(公告)日：2023-12-14
申请号：US18452813
申请日：2023-08-21
CPC分类号： B01D69/02 , B01D71/64 , B01D67/0034 , G03F7/0015 , B01D2325/021 , B01D2323/24 , B01D2323/42
摘要： Porous liquid-filtering membranes having a repeatable distribution of pores of a small dimension are provided, as well as pillar templates that are used to produce such liquid filtering membranes. Also disclosed are methods of making and using the pillar templates to make porous liquid filtering membranes.
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公开(公告)号：US11826709B2
公开(公告)日：2023-11-28
申请号：US17333499
申请日：2021-05-28
发明人： Chwen Yu , En Tian Lin , Chih-Chiang Tseng , Tzu-Sou Chuang
CPC分类号： B01D67/0034 , B01D63/08 , B01D67/0037 , B01D67/0088 , B01D69/02 , B01D69/06 , H01L21/67017 , B01D2323/34 , B01D2325/02 , B01D2325/04
摘要： A filter device includes one or more filter membranes, and a filter housing enclosing the one or more filter membranes. Each of the filter membranes includes a base membrane and a plurality of through holes.
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公开(公告)号：US11786869B2
公开(公告)日：2023-10-17
申请号：US16842448
申请日：2020-04-07
CPC分类号： B01D67/0034 , B01D69/02 , B01D71/64 , B01D2325/04 , B01D2325/08
摘要： Porous membranes are provided according to the invention having desirable coefficient of thermal expansion and large surface area, for example at least about 4,000 mm2. These porous membranes may be made according to an exemplary process employing lithographic patterning of a photoresist followed by development of the photoresist and etching. In one aspect, the etch barrier layer is chosen from a material that does not react with or incorporate metal or other contaminants into the membrane layer.
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公开(公告)号：US11648514B2
公开(公告)日：2023-05-16
申请号：US17056809
申请日：2019-05-31
IPC分类号： B01D71/40 , B01D67/00 , B01D69/02 , C02F1/44 , C02F103/08
CPC分类号： B01D71/40 , B01D67/0025 , B01D67/0034 , B01D69/02 , C02F1/447 , B01D2325/021 , B01D2325/38 , C02F2103/08
摘要： A perfluorocarbon-free membrane composed of a non-perfluorocarbon material having a first side and a second side opposite of the first side. The perfluorocarbon-free membrane also includes a plurality of pores, each having an inlet and outlet and each passing through the non-perfluorocarbon material so that each pore provides fluidic communication between the first and second sides of the non-perfluorocarbon material. A portion of the non-perfluorocarbon material extends over the inlet and outlet of each the plurality of pores so that a cross-sectional area of the inlets and outlets in a direction of the extension of the non-perfluorocarbon material is smaller than a cross-sectional area of the respective pore in the direction of the extension of the non-perfluorocarbon material. The perfluorocarbon-free membrane does not include a hydrophobic perfluorocarbon coating.
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公开(公告)号：US20170282127A1
公开(公告)日：2017-10-05
申请号：US15507198
申请日：2015-08-28
发明人： Seung Yun YANG , Seunghyun LEE , Sang-Gu YIM
IPC分类号： B01D67/00
CPC分类号： B01D67/0034 , B01D67/0079 , B01D71/022 , B01D71/024 , B01D2323/34 , Y02P20/582
摘要： The present disclosure provides an etching mask, a method for manufacturing the same, a method for manufacturing a porous membrane using the same, a porous membrane, a fine dust blocking mask including the same, and a method for manufacturing a surface enhanced Raman scattering active substrate. In this connection, the etching mask includes an organic film; and a pattern layer disposed on the organic film, wherein the pattern layer has openings defined therein having a uniform size, wherein each of the openings includes a micro-scale or nano-scale hole.
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公开(公告)号：US09733235B2
公开(公告)日：2017-08-15
申请号：US13118332
申请日：2011-05-27
申请人： Yu-Chong Tai , Bo Lu
发明人： Yu-Chong Tai , Bo Lu
CPC分类号： G01N33/5011 , B01D63/087 , B01D65/10 , B01D67/0034 , B01D2325/021 , C12M47/04
摘要： The present invention provides methods for designing a filtration systems for capturing viable tumor cells, such as circulating tumor cells at high efficiency and high viability. The methods involve development of a set of “key engineering design parameters” that are crucial to achieve high tumor cell viability. These important design parameters include the filter geometry design, fluid delivery method, transfilter pressure and total filtration time.
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公开(公告)号：US09522566B2
公开(公告)日：2016-12-20
申请号：US14221990
申请日：2014-03-21
CPC分类号： A61B5/150282 , A61B5/1411 , A61B5/150022 , A61B5/150358 , A61B5/150419 , A61B5/150519 , A61B5/157 , B01D67/0034 , B01D67/0058 , B44C1/227 , C23F1/02
摘要： A method is disclosed for the mask-etching of a piercing element having an elongate shaft, a distally protruding tip, a proximal holding part, and a laterally open collecting channel that collects bodily fluid and extends along the shaft as far as the area of the tip, wherein a side of a double-sided etching mask is applied respectively to the two sides of a substrate and, under the action of an etching agent, the piercing element is formed as a part made by chemical blanking, wherein a channel side of the etching mask is provided with a channel etching slit for unilateral etching of the collecting channel.
摘要翻译： 公开了一种用于穿孔元件的掩模蚀刻的方法，所述穿孔元件具有细长轴，远端突出尖端，近侧保持部分和侧向开放的收集通道，该收集通道收集体液并且沿轴延伸至该区域 尖端，其中双面蚀刻掩模的一侧分别施加到基板的两侧，并且在蚀刻剂的作用下，穿孔元件形成为通过化学消隐制成的部分，其中通道侧为 蚀刻掩模设置有用于单向蚀刻收集通道的沟道蚀刻狭缝。
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公开(公告)号：US09387444B2
公开(公告)日：2016-07-12
申请号：US14543298
申请日：2014-11-17
申请人： Sandia Corporation
CPC分类号： B01D69/02 , B01D67/0034 , B01D67/0093 , B01D71/50 , B01D2325/021 , B01D2325/42
摘要： A pressure-based chemical etch method is used to shape polymer nanopores into cones. By varying the pressure, the pore tip diameter can be controlled, while the pore base diameter is largely unaffected. The method provides an easy, low-cost approach for conically etching high density nanopores.
摘要翻译： 使用基于压力的化学蚀刻方法将聚合物纳米孔成形为锥体。 通过改变压力，可以控制孔尖直径，而孔基径在很大程度上不受影响。 该方法提供了一种简单，低成本的方法，用于锥形蚀刻高密度纳米孔。
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公开(公告)号：US20150306547A1
公开(公告)日：2015-10-29
申请号：US14438203
申请日：2013-10-25
CPC分类号： B01D69/12 , B01D67/0034 , B01D67/0062 , B01D67/0079 , B01D71/02 , B01D71/021 , B01D71/022 , B01D71/024 , B01D71/025 , B01D71/027 , B01D71/06 , B01D2325/028
摘要： The invention is directed to a nanosieve composite and a method for preparing a nanosieve composite membrane. The nanosieve composite of the invention comprises—an inorganic nanosieve layer having an average pore diameter of 200 nm or less, and—two or more porous layers having an average pore diameter of mm or more, wherein at least one porous layer is at a first side of said inorganic nanosieve layer and at least one porous layer is at a second side of said inorganic nanosieve layer.
摘要翻译： 本发明涉及一种纳米合金复合材料及其制备方法。 本发明的纳米尺寸复合材料包含平均孔径为200nm以下的无机纳米尺寸层和平均孔径为mm以上的两层以上的多孔层，其中，至少一层多孔层为第一层 所述无机纳米筛层的至少一面和至少一个多孔层位于所述无机纳米级层的第二侧。
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