DATA STORAGE
    94.
    发明申请
    DATA STORAGE 审中-公开

    公开(公告)号:US20170223348A1

    公开(公告)日:2017-08-03

    申请号:US15500657

    申请日:2014-07-31

    Abstract: The present subject matter relates to data storage in a computing system. In an example, the computing system includes a projector unit including a projector memory. The projector memory may store calibration data pertaining to a plurality of components of the computing system in the projector memory. The plurality of components may include the projector unit and a display unit. Further, the calibration data corresponds to information pertaining to calibrations performed during factory calibration of each of the plurality of components.

    REUSABLE ZONE
    99.
    发明申请
    REUSABLE ZONE 审中-公开
    可重复使用区域

    公开(公告)号:US20160234257A1

    公开(公告)日:2016-08-11

    申请号:US15024701

    申请日:2013-09-27

    Abstract: Implementations of the disclosed technology may respond to a discovery request according to the origination of the discovery request. In these implementations, a discovery request for a connection to a device assigned to a reusable zone may be obtained. If the discovery request does not originate from a local switch group, the discovery response may indicate that there is no device at the connection.

    Abstract translation: 所公开的技术的实现可以根据发现请求的发起来响应发现请求。 在这些实现中,可以获得与分配给可重用区域的设备的连接的发现请求。 如果发现请求不是源自本地交换机组,则发现响应可能指示连接处没有设备。

    Substrate Etch
    100.
    发明申请
    Substrate Etch 审中-公开
    基板蚀刻

    公开(公告)号:US20160208404A1

    公开(公告)日:2016-07-21

    申请号:US14914068

    申请日:2013-08-30

    CPC classification number: C25F3/12 B81C1/00626 B81C2201/0133 C25F3/14 C25F7/00

    Abstract: An example provides a method including sputtering a metal catalyst onto a substrate, exposing the substrate to a solution that reacts with the metal catalyst to form a plurality of pores in the substrate, and etching the substrate to remove the plurality of pores to form a recess in the substrate.

    Abstract translation: 一个实例提供了一种方法,包括将金属催化剂溅射到衬底上,将衬底暴露于与金属催化剂反应以在衬底中形成多个孔的溶液,以及蚀刻衬底以除去多个孔以形成凹部 在基材中。

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