LOW TEMPERATURE LIQUID POLYTHIOETHER POLYMERS
    92.
    发明申请
    LOW TEMPERATURE LIQUID POLYTHIOETHER POLYMERS 有权
    低温液体聚四氟乙烯聚合物

    公开(公告)号:US20040247792A1

    公开(公告)日:2004-12-09

    申请号:US10456138

    申请日:2003-06-05

    CPC classification number: C08G75/12 C08G75/04 C08G75/045 C08L81/02

    Abstract: Polythioether polymers, curable compositions of polythioether polymers, the process of making polythioether polymers, and the use of polythioether polymers in sealants, wherein the polythioether polymers and curable compositions are liquid at a temperature of 20null C. or less, are disclosed.

    Abstract translation: 公开了聚硫醚聚合物,聚硫醚聚合物的可固化组合物,制备聚硫醚聚合物的方法,以及在密封剂中使用聚硫醚聚合物,其中聚硫醚聚合物和可固化组合物在20℃或更低的温度下为液体。

    Insulating glass unit with structural primary sealant system

    公开(公告)号:US20020194813A1

    公开(公告)日:2002-12-26

    申请号:US10215514

    申请日:2002-08-09

    Abstract: An insulating glass unit including a first pane of glass, a second pane of glass, and a spacer system. The spacer system includes (i) a spacer positioned between an inner surface of the first pane of glass and an inner surface of the second pane of glass and (ii) a sealant system for adhering the inner surfaces of the glass panes to the spacer. The sealant system includes at least one sealant having (a) at least one thermoplastic hot-melt material having a melt temperature ranging from about 125null F. (51null C.) to about 250null F. (121null C.), and (b) at least one curable material. The sealant, when cured, forms a covalent bond between the spacer and the panes. The sealant has an initial hardness ranging from about 25 Shore A to about 450 Shore A and a post-cure hardness measured about 48 hours thereafter ranging from about 30 Shore A to about 50 Shore A.

    DERIVATIVES OF CYCLOALIPHATIC DIAMINES AS COSOLVENTS FOR AQUEOUS HYDROPHOBIC AMINES
    94.
    发明申请
    DERIVATIVES OF CYCLOALIPHATIC DIAMINES AS COSOLVENTS FOR AQUEOUS HYDROPHOBIC AMINES 有权
    循环二氧化钛作为水性疏水性氨基甲酸酯的衍生物

    公开(公告)号:US20010052588A1

    公开(公告)日:2001-12-20

    申请号:US09330574

    申请日:1999-06-11

    CPC classification number: C08J3/215 C08G59/5026 C08J2363/00 C08L63/00

    Abstract: The present invention relates to the use of cycloaliphatic diamines as cosolvents for hydrophobic amines in aqueous solution. The cycloaliphatic diamines of the present invention have a formula: 1 where n is 1 or 2, each R is independently selected from a group consisting of: hydrogen, a 1 to 6 carbon aliphatic, and a 0 to 6 carbon containing amine, wherein each R is chosen such that the cosolvent amine comprises at least two amine groups; and a quantity of water to maintain said solution as a homogeneous phase. The cosolvent diatines have particular utility in the formation of water based epoxy resin curing agents. Superior water miscibility is achieved for hydrophobic amines through the use of cycloaliphatic amines as compared to conventional cosolvents.

    Abstract translation: 本发明涉及脂环族二胺作为疏水性胺在水溶液中的助溶剂的用途。 本发明的脂环族二胺具有下式:其中n为1或2,每个R独立地选自氢,1至6个碳脂族和含0至6个碳的胺,其中每个R 所述共溶剂胺包含至少两个胺基团; 和一定量的水以将所述溶液保持为均相。 助溶剂二盐在形成水基环氧树脂固化剂方面具有特殊的用途。 与常规助溶剂相比,通过使用脂环族胺,疏水胺可实现卓越的水混溶性。

    Treated substrates
    96.
    发明授权

    公开(公告)号:US12104272B2

    公开(公告)日:2024-10-01

    申请号:US18169148

    申请日:2023-02-14

    CPC classification number: C25D5/34 C25D9/08 C25D9/10 C25D9/12

    Abstract: Methods for treating a substrate are disclosed. The substrate is deoxidized and then immersed in an electrodepositable pretreatment composition comprising a lanthanide series element and/or a Group IIIB metal, an oxidizing agent, and a metal-complexing agent to deposit a coating from the electrodepositable pretreatment composition onto a surface of the substrate. Optionally, the electrodepositable pretreatment composition may comprise a surfactant. A coating from a spontaneously depositable pretreatment composition comprising a Group IIIB and/or Group IVB metal may be deposited on the substrate surface prior to electrodepositing a coating from the electrodepositable pretreatment composition. Following electrodeposition of the electrodepositable pretreatment composition, the substrate optionally may be contacted with a sealing composition comprising phosphate and a Group IIIB and/or IVB metal. Substrates treated according to the methods also are disclosed.

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