Abstract:
A method for fabricating a thin film transistor includes providing a substrate (100); forming a semiconductor layer (105) over the substrate (100); forming a source-drain metal layer (106) over the semiconductor layer (105); applying one patterning process to the semiconductor layer (105) and the source-drain metal layer (106) to form an active layer (1), a source electrode (2), and a drain electrode (3); forming a gate insulating layer (101) and an interlayer insulating layer (102) that cover the active layer (1), the source electrode (2), and the drain electrode (3); applying a patterning process to the interlayer insulating layer (102) to form a first window (10) in the interlayer insulating layer (102) to expose a portion of the gate insulating layer (101); and forming a gate electrode (4) in the first window (10). An orthogonal projection of the gate electrode (4) on the substrate (100) is in an orthogonal projection of the active layer (1) on the substrate (100).
Abstract:
An opposite substrate, a method for manufacturing the opposite substrate, an organic light-emitting display panel and a display device are provided by the embodiments of the present disclosure. The opposite substrate includes a base substrate, an auxiliary electrode on the base substrate, a planarization layer on a side of the auxiliary electrode facing away from the base substrate, a spacer on a side of the planarization layer facing away from the base substrate, and a conductive layer on a side of the spacer facing away from the base substrate. The conductive layer at least covers a surface of the spacer facing away from the base substrate, and the conductive layer is electrically connected with the auxiliary electrode through a via hole structure passing through the planarization layer.
Abstract:
A method for forming a mask pattern is provided, comprising forming a negative photoresist on a substrate; in an environment without oxygen, to performing a first exposure on the negative photoresist by use of a first ordinary mask plate, so that a fully-cured portion of the negative photoresist is exposed to light and a semi-cured portion and a removed portion of the negative photoresist are not exposed to light; in an environment with oxygen, performing a second exposure on the negative photoresist by use of a second ordinary mask plate, so that the semi-cured portion of the negative photoresist is exposed to light and the removed portion of the negative photoresist not exposed to light; removing the uncured negative photoresist and forming the mask pattern.
Abstract:
A light emitting device, a fabricating method thereof, and a display device are disclosed. In the light emitting device, a light emitting functional layer includes at least two QD light emitting layers which emit light of different colors, and a transparent insulating layer which is arranged between any two neighboring QD light emitting layers. The light emitting device has a reduced power consumption, and the problem of shift in color of the emitted light due to high-energy excitons transfer is overcome.
Abstract:
The invention relates to a light emitting device, a manufacturing method thereof and a display device. The light emitting device comprises: a substrate, and a first electrode layer, a second electrode layer and a light emitting layer arranged above the substrate, the light emitting layer being disposed between the first electrode layer and the second electrode layer, the light emitting layer comprises a hole transport layer having a first thickness which is capable of avoiding performance degradation of the light emitting device.
Abstract:
This disclosure provides an array substrate, comprising a substrate plate, and a thin film transistor and a pixel electrode formed on the substrate plate, said thin film transistor comprising a source/drain electrode, an active region and a gate electrode stacked sequentially on said substrate plate, wherein said source/drain electrode and said pixel electrode are arranged in the same layer on the substrate plate. According to this disclosure, while the properties of a high reflectivity and a high aperture ratio are guaranteed, the times of the patterning process are decreased and the process steps are saved, resulting in an improved production tempo and an effectively controlled cost. This disclosure also provides a method for fabricating an array substrate, a liquid crystal display panel comprising said array substrate and a reflective liquid crystal display.
Abstract:
A manufacturing method of an array substrate, an array substrate and a display device are provided. The method includes the following operations: forming a light shielding layer formed of a metal blacken production on a base substrate, wherein the metal blacken production is a product by blackening a metal; forming a preset film layer on the base substrate which is provided with the light shielding layer; forming both a pattern of the light shielding layer and a pattern of the preset film layer through one patterning process. The method of forming a pattern of the light shielding layer and a pattern of the preset film layer through one patterning process saves one patterning process.
Abstract:
The present disclosure provides a COA substrate, a display device and a method for manufacturing the COA substrate. The COA substrate includes a base substrate, a TFT array arranged on the base substrate, a protective layer covering the TFT array, and a color filter including a color pixel and a white pixel, wherein the white pixel is made of a photoresist material.
Abstract:
The present disclosure relates to a sheet resistance measuring method, comprising the following steps: connecting at least one to-be-measured thin film having a predetermined shape to two separate electrodes in at least one pair of electrodes; measuring the resistance between the two electrodes in each pair of electrodes; and determining the sheet resistance of the to-be-measured thin film based on the measured resistance and the shape of the corresponding to-be-measured thin film.
Abstract:
An array substrate, a display device comprising the array substrate and a method of manufacturing the array substrate are provided. The array substrate include a substrate (1) and a plurality of sub-pixel units on the substrate (1), and each of the sub-pixel units includes a thin film transistor main body layer (2) and a color filter layer (5) disposed above the thin film transistor main body layer (2), and the thin film transistor main body layer (2) includes a gate layer (21), a source layer, a drain layer (24) and a passivation layer (25), an additional layer (7) is further disposed on an upper surface of the thin film transistor main body layer (2), a hollow photoresist material containing part (50) is disposed in a region of the additional layer corresponding to each of the sub-pixel units, a color film material is disposed within the photoresist material containing part (50), and a pixel electrode via hole (6) is formed in the additional layer (7) and the passivation layer (25) at a region corresponding to the drain layer (24). The thin film transistor in the array substrate has a more stable performance, the array substrate has a simpler manufacturing process and lower cost, and the display devices comprising the array substrate has a more stable performance.