Clamping Mechanism
    91.
    发明申请
    Clamping Mechanism 审中-公开
    夹紧机构

    公开(公告)号:US20080164396A1

    公开(公告)日:2008-07-10

    申请号:US11621937

    申请日:2007-01-10

    申请人: Hui Chen

    发明人: Hui Chen

    IPC分类号: B25B5/10

    摘要: A clamp for holding two cylindrical devices together is described.

    摘要翻译: 描述了用于将两个圆柱形装置保持在一起的夹具。

    Clock frequency doubler method and apparatus for serial flash testing
    92.
    发明申请
    Clock frequency doubler method and apparatus for serial flash testing 有权
    用于串行闪存测试的时钟倍频器方法和装置

    公开(公告)号:US20080080276A1

    公开(公告)日:2008-04-03

    申请号:US11526124

    申请日:2006-09-22

    摘要: Method and apparatus for memory device testing at a higher clock rate than the clock rate provided by a memory tester. The method includes providing a memory tester capable of generating a first clock signal characterized by a first clock frequency, and applying the first clock signal to the memory device. The method also includes receiving a command for activating a high-clock-frequency test mode. The method generates a second clock signal in the memory device in response to the first clock signal. The second clock signal is characterized by a second clock frequency which is higher than the first clock frequency. The method then tests the memory device at the second clock frequency. In a specific embodiment, the method is applied to a serial flash memory device. The invention can also be applied to testing and operating other memory devices or systems that include synchronized circuits.

    摘要翻译: 用于以比由存储器测试器提供的时钟速率更高的时钟速率测试存储器件的方法和装置。 该方法包括提供能够产生以第一时钟频率为特征的第一时钟信号并将第一时钟信号施加到存储器件的存储器测试器。 该方法还包括接收用于激活高时钟频率测试模式的命令。 该方法响应于第一时钟信号在存储器件中产生第二时钟信号。 第二时钟信号的特征在于高于第一时钟频率的第二时钟频率。 然后该方法以第二个时钟频率测试存储器件。 在具体实施例中,该方法被应用于串行闪存设备。 本发明还可以应用于测试和操作包括同步电路的其它存储器件或系统。

    Two Cards Combo 21
    94.
    发明申请
    Two Cards Combo 21 审中-公开
    两张卡组合21

    公开(公告)号:US20070069468A1

    公开(公告)日:2007-03-29

    申请号:US11237460

    申请日:2005-09-27

    申请人: Hui Chen Brian Wong

    发明人: Hui Chen Brian Wong

    IPC分类号: A63F1/00

    CPC分类号: A63F1/00 A63F2001/003

    摘要: Two Cards Combo 21 is a card game in convention with the playing method of Blackjack (twenty-one) that multiple players engage in taking turns to play their own hand against to dealer's hand. A method of playing Two Cards Combo 21 card game comprises a dealer and at least one player. It uses a shoe with six decks or eight decks of standard playing card without jokers, queens and kings (44 cards of each deck). In conjunction with standard rules of Blackjack, there are one mandatory bet which is Ante (Two cards Combo 21) and five side bets, such as, Dealer Bust, Any Pair of 2, 3, 4, 5, 6, 7, 8, 9, 10, jack, and ace, Blackjack or Combo 21, Any Even number, and Any Odd number.

    摘要翻译: 两张卡组合21是与二十一点(二十一)的玩法一样的纸牌游戏,多名玩家轮流对自己的手进行自己的手。 玩二卡组合21纸牌游戏的方法包括经销商和至少一个玩家。 它使用的鞋子有六个甲板或八个标准扑克牌,没有小丑,皇后和国王(每张甲板上的44张卡)。 结合二十一点的标准规则,有一个强制性赌注是安特(两张牌组合21)和五个侧注,如经销商胸围,任何一对2,3,4,5,6,7,8, 9,10,jack和ace,21点或者组合21,任意偶数,任意奇数。

    Jokers 21
    97.
    发明申请
    Jokers 21 审中-公开
    小丑21

    公开(公告)号:US20060027967A1

    公开(公告)日:2006-02-09

    申请号:US10914591

    申请日:2004-08-09

    申请人: Hui Chen

    发明人: Hui Chen

    IPC分类号: A63F1/00

    CPC分类号: A63F3/00157 A63F2001/003

    摘要: Jokers 21 is a blend card game with the playing method of Casino War and Blackjack (twenty-one) that multiple players engage in taking turns to play their own hand against to dealer's hand. A method of playing Jokers 21 card game comprises a dealer and at least one player. It uses a shoe with six decks or eight decks of standard playing card with jokers (54 cards of each deck). In conjunction with standard rules of both Casino War and Blackjack card game, the jokers serve as a winning card. Any hand with a joker is automatically won. The Jokers 21 also allows players to wager on four different betting choices, One Card bet, One Card Tie bet, Jokers 21 bet, and Jokers 21 Tie bet.

    摘要翻译: 小丑21是一个混合纸牌游戏,赌场战争和二十一点(二十一)的玩法,多个玩家轮流玩自己的手反对经销商的手。 一种玩小丑21纸牌游戏的方法包括经销商和至少一个玩家。 它使用一个带有六个甲板的鞋子或八个牌子的标准扑克牌(每张牌的54张)。 结合赌场战争和二十一点卡牌游戏的标准规则,小丑作为获奖卡。 任何带小丑的手都会自动获胜。 小丑21还允许玩家投注四种不同的投注选择,一张牌下注,一张牌打赌,小丑21投注和小丑21打赌。

    Fluorescent microarray analyzer
    98.
    发明申请
    Fluorescent microarray analyzer 失效
    荧光微阵列分析仪

    公开(公告)号:US20050179894A1

    公开(公告)日:2005-08-18

    申请号:US10777720

    申请日:2004-02-13

    IPC分类号: G01N21/64

    CPC分类号: G01N21/6452 G01N2021/6417

    摘要: A fluorescent microarray analyzer includes a light source for emitting a light beam, a light processing unit for focusing the light beam on the biochip and exciting fluorescent targets on the biochip to produce fluorescence, a focusing lens for focusing the fluorescence on a spectrophotometer, a spectrophotometer for detecting signal of the fluorescence, and an output device for selectively outputting/displaying the signal detected by the spectrophotometer. The resulting signal of the output device does not need to be converted into image data for analysis. For acquiring a more accurate result of detection of signal of fluorescence from the fluorescent targets, the photomultiplier tube of the conventional biochip scanner device is replaced with the spectrophotometer of fluorescent microarray analyzer of the present invention and the filter is removed. Without converting the signal into an image, no errors arise as what happened in process of converting an electrical signal into image data in the conventional biochip. Also, a real-time analysis of the signal proceeds while scanning samples on the biochip.

    摘要翻译: 荧光微阵列分析仪包括用于发射光束的光源,用于将光束聚焦在生物芯片上并激发生物芯片上的荧光靶产生荧光的光处理单元,用于将荧光聚焦在分光光度计上的聚焦透镜,分光光度计 用于检测荧光信号;以及输出装置,用于选择性地输出/显示由分光光度计检测的信号。 输出装置的结果信号不需要转换为图像数据进行分析。 为了从荧光靶获得更准确的荧光信号结果,用本发明的荧光微阵列分析仪的分光光度计代替常规生物芯片扫描器装置的光电倍增管,并除去滤光片。 在不将信号转换为图像的情况下,在传统生物芯片中将电信号转换为图像数据的过程中没有发生错误。 此外,在生物芯片上扫描样品时,信号的实时分析进行。

    Method of etching carbon-containing silicon oxide films
    99.
    发明授权
    Method of etching carbon-containing silicon oxide films 失效
    蚀刻含碳氧化硅膜的方法

    公开(公告)号:US06607675B1

    公开(公告)日:2003-08-19

    申请号:US09650975

    申请日:2000-08-29

    IPC分类号: H01L21027

    CPC分类号: H01L21/31116

    摘要: We have discovered a method for plasma etching a carbon-containing silicon oxide film which provides excellent etch profile control, a rapid etch rate of the carbon-containing silicon oxide film, and high selectivity for etching the carbon-containing silicon oxide film preferentially to an overlying photoresist masking material. When the method of the invention is used, a higher carbon content in the carbon-containing silicon oxide film results in a faster etch rate, at least up to a carbon content of 20 atomic percent. In particular, the carbon-containing silicon oxide film is plasma etched using a plasma generated from a source gas comprising NH3 and CxFy. It is necessary to achieve the proper balance between the relative amounts of NH3 and CxFy in the plasma source gas in order to provide a balance between etch by-product polymer deposition and removal on various surfaces of the substrate being etched. The NH3 gas functions to “clean up” deposited polymer on the photoresist surface, on the etched surface, and on process chamber surfaces. The atomic ratio of carbon:nitrogen in the plasma source gas typically ranges from about 0.3:1 to about 3:1. We have found that C2F6 and C4F8 provide excellent etch rates during etching of carbon-containing silicon oxide films.

    摘要翻译: 我们已经发现了一种用于等离子体蚀刻含碳氧化硅膜的方法,其提供优异的蚀刻轮廓控制,含碳氧化硅膜的快速蚀刻速率,以及优选将含碳氧化硅膜蚀刻到 覆盖光致抗蚀剂掩模材料。 当使用本发明的方法时,含碳氧化硅膜中较高的碳含量导致更快的蚀刻速率,至少达到20原子百分比的碳含量。 特别地,使用由包含NH 3和C x F y的源气体产生的等离子体对含碳氧化硅膜进行等离子体蚀刻。 为了提供等离子体源气体中NH 3和C x F y的相对量之间的适当平衡,为了提供蚀刻副产物聚合物沉积和被蚀刻的衬底的各种表面上的去除之间的平衡。 NH 3气体用于“清除”沉积的聚合物在光致抗蚀剂表面,蚀刻表面和处理室表面上。 等离子体源气体中的碳:氮的原子比通常为约0.3:1至约3:1。 我们发现C2F6和C4F8在含碳氧化硅膜的蚀刻过程中提供了优异的蚀刻速率。

    Method for enhancing plasma processing performance
    100.
    发明授权
    Method for enhancing plasma processing performance 失效
    提高等离子体处理性能的方法

    公开(公告)号:US06569775B1

    公开(公告)日:2003-05-27

    申请号:US09506065

    申请日:2000-02-17

    IPC分类号: H01L2100

    CPC分类号: H01J37/32339 H01L21/32136

    摘要: A method of improving plasma processing of a semiconductor wafer by exposing the wafer or the plasma to photons while the wafer is being processed. One embodiment of the method comprises the steps of etching an aluminum layer and, during the etching, exposing the semiconductor wafer containing the aluminum layer to photons that photodesorb copper chloride from the surface of the layer thus improving the etch process performance.

    摘要翻译: 一种通过在晶片被处理期间将晶片或等离子体暴露于光子来改善半导体晶片的等离子体处理的方法。 该方法的一个实施方案包括以下步骤:蚀刻铝层,并且在蚀刻期间,将包含铝层的半导体晶片暴露于从层的表面去除氯化铜的光子,从而改善蚀刻工艺性能。