公开(公告)号：US07847280B2

公开(公告)日：2010-12-07

申请号：US12189038

申请日：2008-08-08

申请人： Hisashi Yamada ,  Kenji Iso ,  Shuji Nakamura

发明人： Hisashi Yamada ,  Kenji Iso ,  Shuji Nakamura

IPC分类号： H01L31/00

CPC分类号： H01L33/06 ,  H01L33/16 ,  H01L33/32

摘要： A III-nitride film, grown on an m-plane substrate, includes multiple quantum wells (MQWs) with a barrier thickness of 27.5 nm or greater and a well thickness of 8 nm or greater. An emission wavelength can be controlled by selecting the barrier thickness of the MQWs. Device fabricated using the III-nitride film include nonpolar III-nitride light emitting diodes (LEDs) with a long wavelength emission.

摘要翻译： 在m面衬底上生长的III族氮化物膜包括势垒厚度为27.5nm或更大的阱量子阱和8nm或更大的阱的多个量子阱（MQW）。 可以通过选择MQW的阻挡层厚度来控制发射波长。 使用III族氮化物膜制造的器件包括具有长波长发射的非极性III族氮化物发光二极管（LED）。

公开(公告)号：US07795558B2

公开(公告)日：2010-09-14

申请号：US11660698

申请日：2006-04-05

申请人： Yoji Nakajima ,  Hisakatsu Kawarai ,  Syuichiro Ishihara ,  Hisashi Yamada

发明人： Yoji Nakajima ,  Hisakatsu Kawarai ,  Syuichiro Ishihara ,  Hisashi Yamada

IPC分类号： B23H1/10

CPC分类号： B23H1/10 ,  B23H7/36 ,  C02F2001/422 ,  C02F2001/425 ,  C02F2001/427

摘要： In an electric discharge machining apparatus that machines a workpiece (1) by using a water-based dielectric fluid as a dielectric fluid while a voltage is being applied to a machining gap between an electrode (2) and the workpiece (1), the electric discharge machine includes:an anticorrosive power source section (26) that applies a predetermined voltage by taking the workpiece (1) as a cathode and taking as an anode an anticorrosive electrode (25) opposing the workpiece (1) with an insulator (24) therebetween;a dielectric fluid quality measuring instrument (22) that measures a quality of the dielectric fluid; anda dielectric fluid quality control section (16, 17, 18, 19, 20, 21, 23) that controls a pH level of the dielectric fluid to be within a range from 8.5 to 10.5 on the basis of the measured result of the dielectric fluid quality measuring instrument (22).

摘要翻译： 在一种放电加工装置中，通过在电极（2）和工件（1）之间的加工间隙施加电压的同时，通过使用水性介电流体作为介质流体对工件（1）进行加工， 放电机包括：通过将工件（1）作为阴极施加预定电压的防腐电源部分（26），并用绝缘体（24）作为与工件（1）相对的防腐蚀电极（25）作为阳极， 之间; 电介质流体质量测量仪器（22），其测量介电流体的质量; 以及介电液质量控制部（16,17,18,19,20,21,23），其基于所述电介质的测定结果，将所述介质流体的pH值控制在8.5〜10.5的范围内 流体质量测量仪（22）。

公开(公告)号：US20090277876A1

公开(公告)日：2009-11-12

申请号：US11910581

申请日：2006-10-18

申请人： Hisakatsu Kawarai ,  Syuichiro Ishihara ,  Yoji Nakajima ,  Hisashi Yamada

发明人： Hisakatsu Kawarai ,  Syuichiro Ishihara ,  Yoji Nakajima ,  Hisashi Yamada

IPC分类号： B23H1/08

CPC分类号： B23H1/10 ,  B23H1/02 ,  B23H1/08 ,  B23H11/003

摘要： An electrical-discharge machining apparatus for machining a workpiece (1), using an aqueous machining fluid as a machining fluid, while applying voltage across a machining gap formed between an electrode (2) and the workpiece (1), includes: an insulating means (12) for electrically insulating from the workpiece (1) a machine platen (11) where the workpiece is placed; a machining-fluid-property measuring instrument (22) for measuring a state of the machining fluid; and a machining-fluid-property control means (106,107,108,109,110,111,113) for controlling, based on a measured result from the machining-fluid-property measuring instrument (112), the pH of the machining fluid so as to be kept within 8.5 through 10.5.

摘要翻译： 1.一种放电加工装置，其特征在于，在电极（2）与所述工件（1）之间形成的加工间隙上施加电压的同时，使用水性加工液作为机械加工液加工工件（1） （12），用于与工件（1）电绝缘放置工件的机器压板（11）; 用于测量加工流体的状态的加工液体性质测量仪器（22）; 以及用于基于来自所述机械液体性质测量仪器（112）的测量结果控制所述加工液体的pH以保持在8.5至10.5中的加工液性质控制装置（106,107,108,109,110,111,113）。

公开(公告)号：US07550786B2

公开(公告)日：2009-06-23

申请号：US10554706

申请日：2004-04-07

申请人： Hisashi Yamada ,  Takenori Osada ,  Noboru Fukuhara

发明人： Hisashi Yamada ,  Takenori Osada ,  Noboru Fukuhara

IPC分类号： H01L29/739 ,  H01L31/072

CPC分类号： H01L29/66318 ,  H01L29/0821 ,  H01L29/207 ,  H01L29/7371

摘要： A compound semiconductor epitaxial substrate including a substrate, and a sub-collector layer, a collector layer, a base layer, an emitter layer and a contact layer(s) formed in this order on the substrate, the compound semiconductor epitaxial substrate having an oxygen-containing layer between the substrate and the sub-collector layer.

摘要翻译： 一种化合物半导体外延基板，包括在基板上依次形成的基板，副集电极层，集电极层，基极层，发射极层和接触层，具有氧的化合物半导体外延基板 在基板和副集电极层之间。

公开(公告)号：US07259213B2

公开(公告)日：2007-08-21

申请号：US10504272

申请日：2003-02-10

申请人： Masashi Kaji ,  Hisashi Yamada

发明人： Masashi Kaji ,  Hisashi Yamada

IPC分类号： C08G12/26 ,  C08G59/02 ,  C08G63/00 ,  C08L61/06 ,  C07D209/04

CPC分类号： C08G73/0672 ,  C07D209/08 ,  C08G59/506 ,  C08G61/122 ,  C08G61/124 ,  C08L61/04 ,  C08L63/00 ,  C08L65/00 ,  H05K1/0326

摘要： This invention relates to epoxy resins containing indole as structural unit, indole resins and resin compositions containing said epoxy resins and indole resins useful for applications such as laminating, molding, casting and adhesion on account of their excellent fire retardance, adhesiveness, moisture resistance and heat resistance.The indole resins of this invention and the epoxy resins obtained therefrom are represented by the following general formulas I and II wherein R1 is H, alkyl or the like, X is a crosslinking group represented by —C(R2R3)— or C(R4R5)—Ar—C(R4R5)— (wherein R2-R5 are H, alkyl or the like and Ar is a benzene or biphenyl ring), G is glycidyl group and n is an integer of 1-20.

摘要翻译： 本发明涉及含有吲哚作为结构单元的环氧树脂，吲哚树脂和含有所述环氧树脂和吲哚树脂的树脂组合物，由于其优异的阻燃性，粘合性，耐湿性和热性，它们可用于层压，模塑，铸造和粘合等应用 抵抗性。 本发明的吲哚树脂和由其获得的环氧树脂由以下通式I和II表示，其中R 1是H，烷基等，X是由-C（ R 2 R 3） - 或C（R 4 R 5） - Ar-C（R a SUB >其中R 2〜R 5是H，烷基等，Ar是苯 或联苯环），G为缩水甘油基，n为1-20的整数。

公开(公告)号：US07078645B2

公开(公告)日：2006-07-18

申请号：US10499946

申请日：2002-03-28

申请人： Hisashi Yamada ,  Ryogo Koba ,  Takuji Magara ,  Masao Akiyoshi

发明人： Hisashi Yamada ,  Ryogo Koba ,  Takuji Magara ,  Masao Akiyoshi

IPC分类号： B23H7/10

CPC分类号： B23H7/101

摘要： A machining-fluid ejection device for a wire electric discharge machining apparatus includes a nozzle for ejecting machining-fluid into an inter-electrode gap between a workpiece (W) and a wire electrode (E), a casing (16) fixed to a machining head (15) disposed above or below the workpiece (W), a coupling member (18) for coupling the casing (16) and a nozzle (17), having a predetermined elastic coefficient, and deforming according to the machining-fluid pressure; an assemblage of the coupling member (18) and the nozzle (17) has hollow portions, formed with an inlet side internal diameter (D2) and an outlet side internal diameter (D1) on a machining-fluid inlet side and outlet side respectively, whose sectional areas do not change, and a hollow portion, formed with a minimum internal diameter (D0) between the machining-fluid inlet side and the outlet side, whose sectional area does not change. Machining productivity may be raised for nozzle contact machining and nozzle separation machining.

摘要翻译： 一种用于线材放电加工设备的机加工液喷射装置，包括：用于将加工流体喷射到工件（W）和线电极（E）之间的电极间间隙中的喷嘴;固定到加工 设置在工件（W）的上方或下方的头部（15），用于联接壳体（16）的联接构件（18）和具有预定弹性系数的喷嘴（17），并根据加工液压力变形; 联接构件（18）和喷嘴（17）的组合具有在机械流体入口侧和出口侧形成有入口侧内径（D 2）和出口侧内径（D 1）的中空部 分别具有截面积不变的中空部分和在切削面积不变的加工流体入口侧和出口侧之间形成有最小内径（D 0）的中空部。 可以提高喷嘴接触加工和喷嘴分离加工的加工生产率。

公开(公告)号：US20060120259A1

公开(公告)日：2006-06-08

申请号：US11293366

申请日：2005-12-05

申请人： Toshihiro Sugaya ,  Hisashi Yamada

发明人： Toshihiro Sugaya ,  Hisashi Yamada

IPC分类号： G11B7/24

CPC分类号： G11B7/24038

摘要： A single-sided dual layer optical disc of the invention comprises a first light transmission layer, a first recording layer which is accessed with a first laser beam, a second light transmission layer, and a second recording layer which is accessed with a second laser beam, these layers being arranged in that order from an incidence plane in the direction of incidence, the distance from the incidence plane to the second recording layer being 570 to 630 Am, and the areal recording density of the first recording layer being five times or more as high as that of the second recording layer.

摘要翻译： 本发明的单面双层光盘包括第一光透射层，用第一激光束访问的第一记录层，第二光透射层和第二记录层，其被第二激光束 这些层以入射方向从入射面依次排列，从入射面到第二记录层的距离为570〜630Am，第一记录层的面积记录密度为五倍以上 与第二记录层的高度一样高。

公开(公告)号：US20060001044A1

公开(公告)日：2006-01-05

申请号：US10524013

申请日：2003-08-01

申请人： Hisashi Yamada ,  Noboru Fukuhara

发明人： Hisashi Yamada ,  Noboru Fukuhara

IPC分类号： H01L29/47 ,  H01L21/336 ,  H01L29/739 ,  H01L21/331 ,  H01L29/74

CPC分类号： H01L29/7371 ,  H01L21/02395 ,  H01L21/02463 ,  H01L21/02546 ,  H01L21/02579 ,  H01L21/0262 ,  H01L29/66318

摘要： A method for producing a compound semiconductor wafer used for production of HBT by vapor growth of a sub-collector layer, a collector layer, a base layer and an emitter layer in this turn on a compound semiconductor substrate using MOCVD method wherein the base layer is grown as a p-type compound semiconductor thin film layer containing at least one of Ga, Al and In as a Group III element and As as a Group V element under such growth conditions that the growth rate gives a growth determined by a Group V gas flow rate-feed.

摘要翻译： 使用MOCVD法在化合物半导体衬底上通过副集电极层，集电极层，基极层和发射极层的蒸气生长来制造用于生产HBT的化合物半导体晶片的方法，其中基底层是 在作为V族元素的Ga，Al和In中的至少一种含有III族元素的As和作为V族元素的p型化合物半导体薄膜层中生长，生长速率为V族气体 流量进料。

公开(公告)号：US06815630B1

公开(公告)日：2004-11-09

申请号：US10380948

申请日：2003-03-20

申请人： Shuichiro Ishihara ,  Hisashi Yamada ,  Yoichi Otomo

发明人： Shuichiro Ishihara ,  Hisashi Yamada ,  Yoichi Otomo

IPC分类号： B23H710

CPC分类号： B23H7/10 ,  B23H7/108

摘要： Wire electric discharge machine in which traveling direction of wire electrode is changed by lower roller arranged at lower portion of a workpiece, wire electrode is held and pulled by capstan roller and pinch roller, and electric power is supplied between wire electrode and workpiece while wire electrode is traveling so that workpiece is machined by electric discharge energy, capstan roller and pinch roller are arranged so that angle &thgr; by which the traveling direction of wire electrode is changed by capstan roller and pinch roller, can be 0°

摘要翻译： 电线放电机，其中线电极的行进方向由布置在工件下部的下辊改变，线电极被绞盘辊和夹送辊保持和拉动，并且线电极和工件之间供电，而线电极 正在行进，使得工件由放电能量加工，绞盘辊和夹送辊被布置成使得绞线辊的行进方向由绞盘辊和夹送辊改变的角度θ可以为0°<90°指向 向上相对于线电极的行进方向，其方向由下辊改变。 线电极破损可以被忽略。 线电极的进给可以自动化。 当使用切线机时，可以防止加工液进入切线机。 当不使用线切割器时，可以提高所使用的线电极的调节。

公开(公告)号：US06793982B1

公开(公告)日：2004-09-21

申请号：US09462631

申请日：2000-01-11

申请人： Hisashi Yamada ,  Akihiro Goto

发明人： Hisashi Yamada ,  Akihiro Goto

IPC分类号： C25B1102

CPC分类号： B23H1/06 ,  B23H1/04 ,  Y10T29/49194

摘要： A green-compact electrode (1) for discharge surface treatment for use in a discharge surface treatment operation for forming a hard coating film (9) on the surface of an object (2) which must be machined by performing a discharging operation in working fluid (4) is structured such that powder (11) made of metal, such as W or Ti, and fluid (12) which is the same as working fluid are mixed with each other, and the mixed substance is compression-molded so that the green-compact electrode (1) for the discharge surface treatment is obtained.

摘要翻译： 一种用于在用于在物体（2）的表面上形成硬涂层（9）的放电表面处理操作中用于放电表面处理的生坯致密电极（1），其必须通过在工作流体中进行放电操作来加工 （4）的结构使得由诸如W或Ti的金属制成的粉末（11）和与工作流体相同的流体（12）彼此混合，并且将混合物压缩成型，使得 得到用于放电表面处理的生坯电极（1）。