摘要:
A volatile memory element and a nonvolatile memory element, each of which is constituted of a field effect transistor, are formed on a single semiconductor chip. The volatile memory element includes a body region, a gate electrode, and two diffusion layer regions, and varies an amount of a current, flowing between the diffusion layer regions in applying a voltage to a gate electrode, in accordance with an amount of electric charge retained in the body region. The nonvolatile memory element includes diffusion layer regions, a gate electrode, and two memory function sections, and varies an amount of a current, flowing between the diffusion layer regions in applying a voltage to the gate electrode, in accordance with an amount of electric charge retained in the memory function sections. Thus, it is possible to form the volatile memory and the nonvolatile memory on a single chip with a simple process.
摘要:
A semiconductor memory device includes: a memory cell having a gate electrode formed on a semiconductor layer via a gate insulating film, a channel region disposed below the gate electrode, a diffusion region disposed on both sides of the channel region and having a conductive type opposite to that of the channel region, and memory functional units formed on both sides of the gate electrode and having a function of retaining charges; and an amplifier, the memory cell and the amplifier being connected to each other so that an output of the memory cell is inputted to the amplifier.
摘要:
By removing halogen atoms existing on the surface of the silicon layer and in the subsurface thereof so that the concentration of halogen atoms becomes 100 ppm or lower and forming an electrode on the resulting silicon layer, the electrode which has a low resistance can be produced, and a highly reliable semiconductor device can be produces as well.
摘要:
A semiconductor storage device includes a field effect transistor which has a gate insulator, a gate electrode and a pair of source/drain diffusion regions on a semiconductor substrate. The device also includes a coating film made of a dielectric having a function of storing electric charge and formed on the substrate in such a manner as to cover an upper surface and side surfaces of the gate electrode. The device further includes an interlayer insulator formed on and in contact with the coating film. The device still further includes contact members which extend vertically through the interlayer insulator and the coating film on the source/drain diffusion regions and which are electrically connected to the source/drain diffusion regions, respectively. The coating film and the interlayer insulator are made of materials which are selectively etchable to each other. Thus, the issues of overerase and read failures due to the overerase can be solved, and the device reliability can be enhanced.
摘要:
A semiconductor storage device has a semiconductor layer having a first conductivity type region and two second conductivity type regions separated from each other by the first conductivity type region, a memory function body formed on a surface of the semiconductor layer, and a gate electrode. The memory function body has a charge storage insulator and a charge retention insulator positioned between the charge storage insulator and the semiconductor layer, and doubles as a gate insulating film. The charge retention insulator contains such impurity atoms (phosphorus) as would cause an intrinsic semiconductor to be of the second conductivity type.
摘要:
A writing control system providing high-speed writing to a nonvolatile semiconductor storage device, includes (a) a plurality of memory elements each having: a gate electrode provided on a semiconductor layer with an intervening gate insulating film; a channel region provided beneath the gate electrode; a diffusion region provided on both sides of the channel region, having an opposite polarity to the channel region; and a memory functioning member, provided on both sides of the gate electrode, having a function of holding electric charges, (b) a memory array including a page buffer circuit, and (c) CPU controlling writing to the memory array. The CPU loads a first plane of the page buffer circuit with a first byte of data and writes with the first byte of data stored in the first plane. Further, the CPU writes a second byte of data into the second plane and writes the second byte of data having been stored in the second plane while writing the first byte of data having been stored in the first plane into the memory array.
摘要:
The present invention provides a semiconductor memory device including a memory cell array in which a plurality of memory cells are arranged, a user interface circuit including a command queue having a logic circuit for accepting commands issued by an external user and generating a program memory address, and an array control circuit having a microcontroller and a program memory for storing therein an execution code, and executing an operation on the memory cell array, wherein the memory cell includes a gate electrode formed over a semiconductor layer via a gate insulating film, a channel region disposed below the gate electrode, diffusion regions disposed on both sides of the channel region and having a conductive type opposite to that of the channel region, and memory functional elements formed on both sides of the gate electrode and having the function of retaining charges.
摘要:
A semiconductor storage device includes a voltage supply circuit generating a voltage of 5V, a voltage polarity inversion circuit generating a voltage of −5V, a select-and-connect circuit supplying the voltages of 5V and −5V to a memory cell array, a 5 V voltage level detection circuit detecting the voltage derived from the voltage supply circuit, and a −5 V voltage level detection circuit detecting the voltage derived from the voltage polarity inversion circuit. Absolute values of the voltages detected by the voltage level detection circuits are lower than ever before. This allows a gate insulation film to be thinner. A memory-function film is formed on both sides of a gate electrode in the semiconductor storage device. This also make the gate insulation film thinner. The thin gate insulation film suppresses the short-channel effect, so that each memory element of the memory cell array is miniaturized.
摘要:
The present invention provides a semiconductor storage device having: a first conductivity type region formed in a semiconductor layer; a second conductivity type region formed in the semiconductor layer in contact with the first conductivity type region; a memory functional element disposed on the semiconductor layer across the boundary of the first and second conductivity type regions; and an electrode provided in contact with the memory functional element and on the first conductivity type region via an insulation film, and a portable electronic apparatus comprising the semiconductor storage device. The present invention can fully cope with scale-down and high-integration by constituting a selectable memory cell substantially of one device.
摘要:
A semiconductor storage device includes a memory cell array 21 in which a plurality of memory elements are arranged and a program verify circuit 30. The memory element 1, 33 includes a gate electrode 104 formed on a semiconductor layer 102 via a gate insulator 103, a channel region arranged below the gate electrode 104, diffusion regions 107a, 107b that are located on opposite sides of the channel region and have a conductive type opposite to that of the channel region, and memory function bodies 109 that are located on opposite sides of the gate electrode 104 and have a function of retaining electric charge. A program load register 32 of the program verify circuit 30 eliminates a state that a memory element 33 which has initially been verified as having been correctly programmed needs to be further programmed.