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    Apparatus for detecting defects using multiple coordinate systems
    91.
    发明授权
    Apparatus for detecting defects using multiple coordinate systems 失效
    使用多坐标系检测缺陷的装置

    公开(公告)号：US08045149B2

    公开(公告)日：2011-10-25

    申请号：US12946555

    申请日：2010-11-15

    申请人： Minoru Yoshida ,  Shunji Maeda

    发明人： Minoru Yoshida ,  Shunji Maeda

    IPC分类号： G01N21/00

    CPC分类号： G01N21/9501 ,  G01N21/4738

    摘要： An apparatus is disclosed for detecting defects on a sample inspected by different inspection apparatuses. A data processing unit receives position information of a first defects group in a first coordinate system, based on inspection of the sample under a first condition using a first defect inspection apparatus. The data processing unit receives position information of a second defects group in a second coordinate system, after least one processing step has been performed on the sample. Position information of the second defects group is obtained by inspecting the sample under a second condition using a second defect inspection apparatus which is different from the first defect inspection apparatus. A position correction unit corrects error of relative position information on the first defects group and the second defects group, and the first and second defects groups are checked.

    摘要翻译： 公开了一种用于检测由不同检查装置检查的样品上的缺陷的装置。 数据处理单元使用第一缺陷检查装置，基于第一条件下的样本检查，接收第一坐标系中的第一缺陷组的位置信息。 在对样本进行了至少一个处理步骤之后，数据处理单元接收第二坐标系中的第二缺陷组的位置信息。 使用与第一缺陷检查装置不同的第二缺陷检查装置，在第二条件下检查样品，获得第二缺陷组的位置信息。 位置校正单元校正第一缺陷组和第二缺陷组的相对位置信息的误差，并且检查第一和第二缺陷组。

    METHOD AND ITS APPARATUS FOR DETECTING DEFECTS
    92.
    发明申请
    METHOD AND ITS APPARATUS FOR DETECTING DEFECTS 失效
    检测缺陷的方法及其设备

    公开(公告)号：US20110057649A1

    公开(公告)日：2011-03-10

    申请号：US12946555

    申请日：2010-11-15

    申请人： Minoru YOSHIDA ,  Shunji Maeda

    发明人： Minoru YOSHIDA ,  Shunji Maeda

    IPC分类号： G01R33/12

    CPC分类号： G01N21/9501 ,  G01N21/4738

    摘要： In the present invention, to make corrective matching thereof, it is designed as follows; position effect of defects coordinates, which are output from an inspection apparatus, is allowed, coordinates of inspected data are mutually corrected, and a state of coincidence or non-coincidence among a plurality sets of inspected data is output or displayed. Inspection data is designed to include kinds, kinds difference and dimension of defects. A state of coincidence or non-coincidence between inspected data is designed to be output or displayed appropriately, by kinds or dimensions, or by a grouping thereof, of a defects object. The same sample is inspected by every time of passing a production step, and a state of data increase or decrease, or coincidence or non-coincidence between the inspected data is designed to be output or displayed.

    摘要翻译： 在本发明中，为了进行校正匹配，设计如下： 允许从检查装置输出的缺陷坐标的位置效果，相互校正被检查数据的坐标，并且输出或显示多组检查数据之间的一致或不一致的状态。 检验数据旨在包括缺陷的种类，种类差异和尺寸。 被检查数据之间的重合或不一致的状态被设计为通过种类或尺寸或其分组来输出或显示缺陷对象。 通过每次通过生产步骤检查相同的样品，并且被设计为输出或显示检查数据之间的数据增加或减少或一致或不一致的状态。

    Ultraviolet laser-generating device and defect inspection apparatus and method therefor
    96.
    发明授权
    Ultraviolet laser-generating device and defect inspection apparatus and method therefor 有权
    紫外线激光发生装置及缺陷检查装置及其方法

    公开(公告)号：US07305015B2

    公开(公告)日：2007-12-04

    申请号：US10888980

    申请日：2004-07-13

    申请人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

    发明人： Sachio Uto ,  Minoru Yoshida ,  Toshihiko Nakata ,  Shunji Maeda

    IPC分类号： H01S3/10

    CPC分类号： G01N21/956 ,  G01N21/33 ,  G02F2001/3505 ,  G02F2001/3542 ,  H01S3/0092

    摘要： An ultraviolet laser-generating device, for use in a defect inspection apparatus and a method thereof, etc., comprising: a laser ray source for irradiating and emitting a basic wave of laser ray therefrom; a wavelength converter device for receiving the basic wave of laser ray emitted from the laser ray source and for converting it into an ultraviolet laser ray composed of a multiplied high harmonic light of the basic wave of laser ray; and a container having an inlet window, upon which the basic wave of laser ray emitted from the laser ray source is incident upon, and an outlet window for emitting the ultraviolet laser ray composed of the multiplied high harmonic light of the basic wave of laser ray, and installing the wavelength converter device therein, wherein the container is hermetically sealed and is filled up with an inert gas, such as nitrogen or argon gas, therein.

    摘要翻译： 一种用于缺陷检查装置及其方法的紫外线激光发生装置，包括：用于从其照射和发射激光光线的基本波的激光束源; 波长转换器装置，用于接收从激光射线源发射的激光的基波，并将其转换为由激光的基波的相乘的高次谐波构成的紫外激光; 以及具有入射窗的容器，从激光射线源发射的激光的基波入射到该入口窗口，以及用于发射由激光的基波的倍增的高次谐波构成的紫外线激光的出射窗 并且在其中安装波长转换器装置，其中容器被气​​密密封，并在其中填充有惰性气体，例如氮气或氩气。

    Defect inspection method and apparatus
    97.
    发明申请
    Defect inspection method and apparatus 有权
    缺陷检查方法和装置

    公开(公告)号：US20060038987A1

    公开(公告)日：2006-02-23

    申请号：US11204181

    申请日：2005-08-16

    申请人： Shunji Maeda ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

    发明人： Shunji Maeda ,  Kenji Oka ,  Yukihiro Shibata ,  Minoru Yoshida ,  Chie Shishido ,  Yuji Takagi ,  Atsushi Yoshida ,  Kazuo Yamaguchi

    IPC分类号： G01N21/88

    CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T7/0004 ,  G06T2207/30148

    摘要： A method of inspecting defects of a plurality of patterns that are formed on a substrate to have naturally the same shape. According to this method, in order to detect very small defects of the patterns with high sensitivity without being affected by irregular brightness due to the thickness difference between the patterns formed on a semiconductor wafer, a first pattern being inspected is detected to produce a first image of the first pattern, the first image is stored, a second pattern being inspected is detected to produce a second image of said second pattern, the stored first image and the second image are matched in brightness, and the brightness-matched first and second images are compared with each other so that the patterns can be inspected.

    摘要翻译： 检查在基板上形成的具有自然相同形状的多个图案的缺陷的方法。 根据该方法，为了以高灵敏度检测图案的非常小的缺陷，不受由于在半导体晶片上形成的图案之间的厚度差而引起的不规则亮度的影响，检测出被检查的第一图案以产生第一图像 第一图案被存储，检测出被检查的第二图案以产生所述第二图案的第二图像，所存储的第一图像和第二图像的亮度相匹配，并且亮度匹配的第一和第二图像 彼此进行比较，从而可以检查图案。

    Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns on an object to be inspected
    98.
    发明授权
    Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns on an object to be inspected 失效
    半导体基板的制造方法以及检查被检体的图案的缺陷的方法和装置

    公开(公告)号：US06404498B1

    公开(公告)日：2002-06-11

    申请号：US09588201

    申请日：2000-06-06

    申请人： Shunji Maeda ,  Yasuhiko Nakayama ,  Minoru Yoshida ,  Hitoshi Kubota ,  Kenji Oka

    发明人： Shunji Maeda ,  Yasuhiko Nakayama ,  Minoru Yoshida ,  Hitoshi Kubota ,  Kenji Oka

    IPC分类号： G01B1100

    CPC分类号： G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/95615 ,  G01N2201/0618 ,  G01N2201/0634

    摘要： A pattern detection method and apparatus for inspecting, with high resolution, a micro fine defect of a pattern on an inspected object, and a semiconductor substrate manufacturing method and system with a high yield. A micro fine pattern on the inspected object is inspected by annular-looped illumination through an objective lens onto a wafer, the wafer having micro fine patterns thereon. The illumination may be polarized and controlled according to an image detected on the pupil of the objective lens, and image signals are obtained by detecting a reflected light from the wafer. The image signals are compared with reference image signals and a part of the pattern showing inconsistency is detected as a defect. Simultaneously, micro fine defects on the micro-fine pattern are detected with high resolution. Further, process conditions of a manufacturing line are controlled by analyzing a cause of defect and a factor of defect.

    摘要翻译： 用于以高分辨率检查被检查物体上的图案的微细缺陷的图案检测方法和装置，以及高产率的半导体基板制造方法和系统。 被检查物体上的微细图案通过物镜通过环形照明被检查到晶片上，晶片上具有微细精细图案。 照明可以根据在物镜的光瞳上检测到的图像进行偏振和控制，并且通过检测来自晶片的反射光来获得图像信号。 将图像信号与参考图像信号进行比较，并且检测出显示不一致的图案的一部分作为缺陷。 同时，以高分辨率检测微细图案上的微细缺陷。 此外，通过分析缺陷的原因和缺陷因素来控制生产线的工艺条件。

    Defect inspection method and apparatus therefor
    99.
    发明授权
    Defect inspection method and apparatus therefor 有权
    缺陷检查方法及其设备

    公开(公告)号：US06169282A

    公开(公告)日：2001-01-02

    申请号：US09181851

    申请日：1998-10-29

    申请人： Shunji Maeda ,  Kenji Oka ,  Hiroshi Makihira ,  Yasuhiko Nakayama ,  Minoru Yoshida ,  Yukihiro Shibata ,  Chie Shishido

    发明人： Shunji Maeda ,  Kenji Oka ,  Hiroshi Makihira ,  Yasuhiko Nakayama ,  Minoru Yoshida ,  Yukihiro Shibata ,  Chie Shishido

    IPC分类号： H01J3728

    CPC分类号： G06T7/001 ,  G01R31/308 ,  G01R31/311 ,  G03F7/7065 ,  G06T7/0004 ,  G06T2207/10061 ,  G06T2207/30121 ,  G06T2207/30148

    摘要： A defect inspection method and apparatus therefor for a pattern to be inspected having a plurality of chips formed so as to be identical detect an image signal of a pattern to be inspected and when the image signal is to be compared with a detected image signal of an adjacent or separated pattern to be inspected on the substrate, convert the gray level so that the brightness of each of two image signals for comparing one or both of the detected image signals is almost identical in the local region by linear conversion having a gain and offset, and when a pattern is inspected using it, highly sensitive defect inspection for a pattern to be inspected for detecting a defect of a semiconductor wafer can be realized.

    摘要翻译： 对于要检查的图案的缺陷检查方法及其装置，其具有形成为相同的多个芯片，以检测待检查图案的图像信号，并且当图像信号要与检测到的图像信号进行比较时 要在基板上检查的相邻或分离的图案，转换灰度级，使得用于比较检测到的图像信号中的一个或两个的两个图像信号中的每一个的亮度在局部区域中通过具有增益和偏移的线性转换几乎相同 ，并且当使用它来检查图案时，可以实现用于检测半导体晶片的缺陷的待检查图案的高灵敏度缺陷检查。