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    APPARATUS AND METHOD FOR DETECTING AN ENDPOINT IN A VAPOR PHASE ETCH
    91.
    发明申请
    APPARATUS AND METHOD FOR DETECTING AN ENDPOINT IN A VAPOR PHASE ETCH 审中-公开
    用于检测蒸气相蚀刻中的端点的装置和方法

    公开(公告)号：US20070119814A1

    公开(公告)日：2007-05-31

    申请号：US11627026

    申请日：2007-01-25

    Applicant: Satyadev Patel ,  Gregory Schaadt ,  Douglas MacDonald ,  Niles MacDonald ,  Hongqin Shi

    Inventor： Satyadev Patel ,  Gregory Schaadt ,  Douglas MacDonald ,  Niles MacDonald ,  Hongqin Shi

    IPC: C03C25/68 ,  G01L21/30 ,  H01L21/306 ,  H01L21/461 ,  B44C1/22

    CPC classification number: H01J37/32963 ,  B81C1/00476 ,  B81C1/00587 ,  B81C99/0065 ,  B81C2201/0132 ,  B81C2201/0138 ,  H01J37/32449 ,  H01J37/32935

    Abstract: Processes for the removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the ability to accurately determine the endpoint of the removal step. A vapor phase etchant is used to remove a material that has been deposited on a substrate, with or without other deposited structure thereon. By creating an impedance at the exit of an etching chamber (or downstream thereof), as the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored; and the endpoint of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber

    Abstract translation: 通过与制造微结构中的工艺气体接触从工件材料去除层或区域的工艺通过精确地确定去除步骤的终点的能力增强。 气相蚀刻剂用于去除已经沉积在基底上的材料，其上具有或不具有其它沉积结构。 通过在蚀刻室（或其下游）的出口处产生阻抗，当气相蚀刻剂从蚀刻室通过时，监测蚀刻反应的气态产物; 并且可以确定去除过程的终点。 气相蚀刻工艺可以流过，流过和脉冲的组合，或再循环回蚀刻室

    Micromirror array device with a small pitch size
    94.
    发明申请
    Micromirror array device with a small pitch size 有权

    公开(公告)号：US20060177957A1

    公开(公告)日：2006-08-10

    申请号：US11388116

    申请日：2006-03-23

    Applicant: Satyadev Patel ,  Andrew Huibers

    Inventor： Satyadev Patel ,  Andrew Huibers

    IPC: H01L21/00

    CPC classification number: B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

    Abstract: A spatial light modulator is disclosed, along with a method for making such a modulator that comprises an array of micromirror devices. The center-to-center distance and the gap between adjacent micromirror devices are determined corresponding to the light source being used so as to optimize optical efficiency and performance quality. The micromirror device comprises a hinge support formed on a substrate and a hinge that is held by the hinge support. A mirror plate is connected to the hinge via a contact, and the distance between the mirror plate and the hinge is determined according to desired maximum rotation angle of the mirror plate, the optimum gap and pitch between the adjacent micromirrors. In a method of fabricating such spatial light modulator, one sacrificial layer is deposited on a substrate followed by forming the mirror plates, and another sacrificial layer is deposited on the mirror plates followed by forming the hinge supports. The two sacrificial layers are removed via the small gap between adjacent mirror devices with spontaneous vapor phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.

    Micromirrors and hinge structures for micromirror arrays in projection displays
    98.
    发明申请
    Micromirrors and hinge structures for micromirror arrays in projection displays 有权
    投影显示器中微镜阵列的微镜和铰链结构

    公开(公告)号：US20060044519A1

    公开(公告)日：2006-03-02

    申请号：US10927408

    申请日：2004-08-25

    Applicant: Andrew Huibers ,  Satyadev Patel

    Inventor： Andrew Huibers ,  Satyadev Patel

    IPC: G03B21/26 ,  G02B26/00

    CPC classification number: H04N5/7458 ,  G02B26/008 ,  G02B26/0841 ,  G03B21/008

    Abstract: A spatial light modulator is disclosed, along with methods for making such a modulator. The spatial light modulator comprises an array of micromirrors each having a hinge and a micromirror plate held via a hinge on a substrate, the micromirror plate being attached to the hinge such that the micromirror plate can rotate along a rotation axis and the hinge structure is located between the micromirror plate and the light source. The mirror plate is formed between the hinge and the substrate on which the hinge is formed. As a result, the hinge is exposed to the incident light during the operation.

    Abstract translation: 公开了一种空间光调制器以及用于制造这种调制器的方法。 空间光调制器包括微镜阵列，每个微镜具有通过基板上的铰链保持的铰链和微镜板，微镜板附接到铰链，使得微镜板可以沿着旋转轴线旋转并且铰链结构位于 在微镜板和光源之间。 镜板形成在铰链和形成有铰链的基板之间。 结果，铰链在操作期间暴露于入射光。

    Micromirror device
    99.
    发明申请
    Micromirror device 有权
    微镜装置

    公开(公告)号：US20060033977A1

    公开(公告)日：2006-02-16

    申请号：US11256035

    申请日：2005-10-21

    Applicant: Satyadev Patel ,  Andrew Huibers

    Inventor： Satyadev Patel ,  Andrew Huibers

    IPC: G02F1/03 ,  G02F1/07

    CPC classification number: G02B26/0841

    Abstract: A spatial light modulator comprises an array of micromirror devices each of which has a reflective and deflectable mirror plates. The mirror plates are moved between an ON and OFF state during operation, wherein the OFF state is a state wherein the mirror plate is not parallel to the substrate on which the mirror plate is formed. The micromirror device may have an ON state stopper for limiting the rotation of the mirror plate at the ON state angle, but does not have an OFF state angle. The non-zero OFF state is achieved by attaching the mirror plate to a deformable hinge held by a hinge support that is curved at the natural resting state.

    Abstract translation: 空间光调制器包括微镜器件的阵列，每个微镜器件具有反射和可偏转的镜板。 在操作期间，镜板在ON和OFF状态之间移动，其中OFF状态是其中镜板不平行于其上形成有镜板的基板的状态。 微镜装置可以具有用于将镜板的旋转限制在ON状态角但不具有OFF状态角的ON状态止动器。 通过将镜板附接到由在自然静止状态下弯曲的铰链支撑件保持的可变形铰链来实现非零关闭状态。

    Micromirror and post arrangements on substrates
    100.
    发明申请
    Micromirror and post arrangements on substrates 有权

    公开(公告)号：US20060007522A1

    公开(公告)日：2006-01-12

    申请号：US11216594

    申请日：2005-08-30

    Applicant: Andrew Huibers ,  Satyadev Patel

    Inventor： Andrew Huibers ,  Satyadev Patel

    IPC: G02B26/00

    CPC classification number: G02B26/0841

    Abstract: A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.

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