摘要:
Acicular ferromagnetic metal particles having a particle size of 0.1 to 1 .mu.m and a dimension of crystallite-size of not more than about 215 A in the effective thickness of the crystallite in the direction perpendicular to the reflecting plane (110), which have a high coercive force, preferably not less than 1,400 oersteds and are useful for a high-density magnetic recording tape, video mother tape, or permanent magnet material, and a method for the preparation of the ferromagnetic metal particles comprising reducing with heating goethite particles which are prepared by treating a ferrous salt with a large amount of a basic agent, particularly an alkali metal hydroxide.
摘要:
To improve the luminance of light emitted by a light-emitting device, the light-emitting device includes a base (1) that has an opening part (1p) constituted by a light-reflecting surface (1r) and a bottom surface (1u), a light-emitting chip (2) that is mounted on the bottom surface (1u) of the opening part (1p), a transparent member (3) that covers the light-emitting chip (2), and an optical member (4) that is disposed on the transparent member (3). The transparent member (3) is disposed on the bottom surface (1u) of the opening part (1p) in a state where the transparent member (3) is spaced away from the light-reflecting surface (1r) of the opening part (1p).
摘要:
A light emitting device includes a base, a sub-mount substrate, and a frame member. The light emitting device further includes a light emitting element and a wavelength converting member. The sub-mount substrate is disposed on the base, and has an upper surface made of a ceramic sintered body. The frame member has a light reflecting portion made of porous ceramics, is disposed on the base, and surrounds the sub-mount substrate. The light emitting element is mounted on the sub-mount substrate. The wavelength converting member covers the light emitting element and the light reflecting portion of the frame member.
摘要:
A light-emitting device includes a substrate, a pair of electrode layers disposed on the substrate, a light-emitting element disposed between the pair of electrode layers to keep a first space with each of the pair of electrode layers while electrically connecting with each of the pair of electrode layers, and a pair of reflection layers, each extending in overlapping relation from one to the other one of the pair of electrode layers as seen in a transparent plan view. The light-emitting element is disposed between the pair of reflection layers to keep a second space with each of the pair of reflection layers.
摘要:
A method of manufacturing a mirror includes a first step of arranging, on a substrate, a shape adjusting layer having a layer thickness which changes by heat, a second step of arranging, on the shape adjusting layer, a reflection layer including a first layer, a second layer, and a barrier layer which is arranged between the first layer and the second layer, and prevents a diffusion of a material of the first layer and a material of the second layer, and a third step of bringing a shape of the reflection layer close to a target shape by changing a layer thickness profile of the shape adjusting layer after the second step, the third step including a process of partially annealing the shape adjusting layer.
摘要:
A fabrication method of an optical element having a multilayer film includes the steps of forming a multilayer film on a substrate, measuring a secondary radiation radiated from the multilayer film when a light with a wavelength of 2 to 40 nm is irradiated to the multilayer film, determining a phase difference between the light irradiated to the multilayer film and the light reflected from the multilayer film based on a measurement result of the measuring step, and modifying the multilayer film based on the determined phase difference.
摘要:
A multilayer mirror used for EUV light includes a substrate, a reflection layer for reflecting the EUV light, a stress compensation layer, formed between the substrate and the reflection layer, for compensating a deformation of the substrate by the reflection layer, wherein the substrate has a first area, in which the stress compensation layer is layered but no reflection layer is layered.
摘要:
An exposure mirror includes a substrate and an effective region for EUV light including an aperiodic multilayer film formed on the substrate. The exposure mirror is provided with a first evaluation region composed of a periodic multilayer film formed in a region different from the effective region on the substrate.
摘要:
The present invention provides an evaporated fuel gas adsorbent, an evaporated fuel gas trapping apparatus that uses the adsorbent, an activated carbon, and a process for producing the activated carbon. The evaporated fuel gas adsorbent is capable of improving adsorptivity and desorptivity by reliably preventing a temperature rise and a temperature fall caused by heat generated in response to the adsorption and desorption of evaporated fuel gas, is capable of achieving a size reduction of the device, and is capable of being easily produced. The activated carbon has high mechanical strength and high abrasive resistance, has many pores suitable to adsorb an organic solvent, especially, evaporated fuel gas, and has a high packing density. The activated-carbon producing process is industrially advantageous. The evaporated fuel gas adsorbent comprises an adsorptive material and latent heat storage mediums including containers each of which is made of a flexible film and in each of which a substance that absorbs or releases heat in response to a phase change is encased. The activated carbon is characterized in that a specific surface area calculated by a BET method (multipoint method) in a nitrogen adsorption isotherm determined from a nitrogen adsorption amount at liquid nitrogen temperature is 1000 to 2500 m2/g, in that a half-value width of a D-band peak in the neighborhood of 1360 cm−1 in Raman spectroscopic analysis is 120 cm−1 or less, and in that a half-value width of a G-band peak in the neighborhood of 1580 cm−1 in Raman spectroscopic analysis is 100 cm−1 or less.
摘要:
An X-ray generator introducing an X-ray to an illumination optical system includes plural plasma light sources, and a reflector, movably arranged among the plural light sources, for switching light sources and for reflecting the X-ray from one of the plural light sources to the illumination optical system, wherein an angle between a plane determined by an optical axis of the X-ray emitted from the reflector and a line that connects the plural light sources to the reflector, and a polarization plane on which an electric field vector oscillates is between 45° and 135°, the polarization plane maximizing a reflectance to the X-ray of the illumination optical system.