公开(公告)号：US20220406350A1

公开(公告)日：2022-12-22

申请号：US17397414

申请日：2021-08-09

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Meng-Han Lin ,  Sai-Hooi Yeong ,  Chi On Chui

IPC: G11C8/08 ,  G11C29/50 ,  G11C29/12 ,  G11C29/02 ,  H01L21/822

Abstract: A test structure for 3D memory arrays and methods of forming the same are disclosed. In an embodiment, a memory array includes a first word line over a semiconductor substrate and extending in a first direction; a second word line over the first word line and extending in the first direction; a memory film contacting the first word line and the second word line; an oxide semiconductor (OS) layer contacting a first source line and a first bit line, the memory film being between the OS layer and each of the first word line and the second word line; and a test structure over the first word line and the second word line, the test structure including a first conductive line electrically coupling the first word line to the second word line, the first conductive line extending in the first direction.

公开(公告)号：US11532640B2

公开(公告)日：2022-12-20

申请号：US17012848

申请日：2020-09-04

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Han-Jong Chia ,  Chung-Te Lin ,  Feng-Cheng Yang ,  Meng-Han Lin ,  Sheng-Chen Wang

IPC: H01L27/11597 ,  G11C11/56 ,  H01L27/11587 ,  G11C11/22 ,  H01L21/28 ,  H01L27/1159 ,  H01L29/78

Abstract: In an embodiment, a device includes: a first dielectric layer over a substrate; a word line over the first dielectric layer, the word line including a first main layer and a first glue layer, the first glue layer extending along a bottom surface, a top surface, and a first sidewall of the first main layer; a second dielectric layer over the word line; a first bit line extending through the second dielectric layer and the first dielectric layer; and a data storage strip disposed between the first bit line and the word line, the data storage strip extending along a second sidewall of the word line.

公开(公告)号：US20220392889A1

公开(公告)日：2022-12-08

申请号：US17647046

申请日：2022-01-05

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Meng-Han Lin ,  Sai-Hooi Yeong ,  Chi On Chui

IPC: H01L27/06 ,  H01L29/78 ,  H01L49/02 ,  H01L29/66

Abstract: A semiconductor device includes a first device over a substrate, wherein the first device includes a gate stack including a gate electrode material; a source/drain region in the substrate adjacent the gate stack; a first isolation region surrounding the gate stack; a gate contact over and contacting the gate stack, wherein the gate contact includes a gate contact material; and a second isolation region surrounding the gate contact; and a second device over the substrate, wherein the second device includes a first parallel capacitor including first electrodes, wherein the first electrodes include the gate electrode material, wherein the first isolation region separates the first electrodes; and a second parallel capacitor over the first parallel capacitor, wherein the second parallel capacitor includes second electrodes connected to the first electrodes, wherein the second electrodes include the gate contact material, wherein adjacent second electrodes are separated by the second isolation region.

公开(公告)号：US20220367518A1

公开(公告)日：2022-11-17

申请号：US17874908

申请日：2022-07-27

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Feng-Cheng Yang ,  Meng-Han Lin ,  Han-Jong Chia ,  Sheng-Chen Wang ,  Chung-Te Lin

IPC: H01L27/11597 ,  H01L29/78 ,  G11C5/06 ,  G11C11/22 ,  H01L21/822 ,  H01L29/66

Abstract: A semiconductor device and method of manufacture are provided. In embodiments a memory array is formed by manufacturing portions of a word line during different and separate processes, thereby allowing the portions formed first to act as a structural support during later processes that would otherwise cause undesired damage to the structures.

公开(公告)号：US20220359270A1

公开(公告)日：2022-11-10

申请号：US17814626

申请日：2022-07-25

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Han-Jong Chia ,  Meng-Han Lin ,  Sheng-Chen Wang ,  Feng-Cheng Yang ,  Chung-Te Lin

IPC: H01L21/762 ,  G11C7/18 ,  H01L27/11597 ,  H01L21/8239

Abstract: A method of forming a three-dimensional (3D) memory device includes: forming a layer stack over a substrate, the layer stack including alternating layers of a first dielectric material and a second dielectric material; forming trenches extending through the layer stack; replacing the second dielectric material with an electrically conductive material to form word lines (WLs); lining sidewalls and bottoms of the trenches with a ferroelectric material; filling the trenches with a third dielectric material; forming bit lines (BLs) and source lines (SLs) extending vertically through the third dielectric material; removing portions of the third dielectric material to form openings in the third dielectric material between the BLs and the SLs; forming a channel material along sidewalls of the openings; and filling the openings with a fourth dielectric material.

公开(公告)号：US20220285349A1

公开(公告)日：2022-09-08

申请号：US17747694

申请日：2022-05-18

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Meng-Han Lin ,  Han-Jong Chia ,  Sai-Hooi Yeong ,  Chi On Chui ,  Yu-Ming Lin

IPC: H01L27/108 ,  H01L49/02 ,  H01L29/423

Abstract: An improved memory cell architecture including a nanostructure field-effect transistor (nano-FET) and a horizontal capacitor extending at least partially under the nano-FET and methods of forming the same are disclosed. In an embodiment, semiconductor device includes a channel structure over a semiconductor substrate; a gate structure encircling the channel structure; a first source/drain region adjacent the gate structure; and a capacitor adjacent the first source/drain region, the capacitor extending under the first source/drain region and the gate structure in a cross-sectional view.

公开(公告)号：US11264292B2

公开(公告)日：2022-03-01

申请号：US16682210

申请日：2019-11-13

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Meng-Han Lin ,  Chih-Ren Hsieh ,  Ya-Chen Kao ,  Chen-Chin Liu ,  Chih-Pin Huang

IPC: H01L27/11529 ,  H01L27/11524 ,  H01L27/11526 ,  H01L29/423 ,  H01L27/11519 ,  H01L21/66

Abstract: Various embodiments of the present application are directed to an integrated circuit (IC) comprising a floating gate test device with a cell-like top layout, as well as a method for forming the IC. In some embodiments, the IC comprises a semiconductor substrate and the floating gate test device. The floating gate test device is on the semiconductor substrate, and comprises a floating gate electrode and a control gate electrode overlying the floating gate electrode. The floating gate electrode and the control gate electrode partially define an array of islands, and further partially define a plurality of bridges interconnecting the islands. The islands and the bridges define the cell-like top layout and may, for example, prevent process-induced damage to the floating gate test device.

公开(公告)号：US11239313B2

公开(公告)日：2022-02-01

申请号：US16217405

申请日：2018-12-12

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Meng-Han Lin ,  Yong-Shiuan Tsair

IPC: H01L27/112 ,  H01L29/06 ,  H01L21/762 ,  H01L29/66 ,  H01L29/10 ,  H01L21/8238 ,  H01L29/423 ,  H01L27/092 ,  H01L29/08

Abstract: An integrated chip comprises a substrate, an isolation structure and a gate structure. The isolation structure comprises one or more dielectric materials within the substrate and has sidewalls defining an active region in the substrate. The active region has a channel region, a source region, and a drain region separated from the source region by the channel region along a first direction. The source, drain and channel regions respectively have first, second and third widths along a second direction perpendicular to the first direction. The third width is larger than the first and second widths. The gate structure comprises a first gate electrode region having a first composition of one or more materials and a second gate electrode region having a second composition of one or more materials different than the first composition of one or more materials.

公开(公告)号：US20210407848A1

公开(公告)日：2021-12-30

申请号：US16951595

申请日：2020-11-18

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.,

Inventor： Han-Jong Chia ,  Meng-Han Lin ,  Sheng-Chen Wang ,  Feng-Cheng Yang ,  Chung-Te Lin

IPC: H01L21/762 ,  H01L21/8239 ,  H01L27/11597 ,  G11C7/18

Abstract: A method of forming a three-dimensional (3D) memory device includes: forming a layer stack over a substrate, the layer stack including alternating layers of a first dielectric material and a second dielectric material; forming trenches extending through the layer stack; replacing the second dielectric material with an electrically conductive material to form word lines (WLs); lining sidewalls and bottoms of the trenches with a ferroelectric material; filling the trenches with a third dielectric material; forming bit lines (BLs) and source lines (SLs) extending vertically through the third dielectric material; removing portions of the third dielectric material to form openings in the third dielectric material between the BLs and the SLs; forming a channel material along sidewalls of the openings; and filling the openings with a fourth dielectric material.

公开(公告)号：US20210398568A1

公开(公告)日：2021-12-23

申请号：US17015679

申请日：2020-09-09

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Meng-Han Lin ,  Chenchen Jacob Wang ,  Yi-Ching Liu ,  Han-Jong Chia ,  Sai-Hooi Yeong ,  Yu-Ming Lin ,  Yih Wang

IPC: G11C5/06 ,  H01L27/11587 ,  H01L29/24 ,  H01L27/11597 ,  H01L29/78

Abstract: Routing arrangements for 3D memory arrays and methods of forming the same are disclosed. In an embodiment, a memory array includes a ferroelectric (FE) material contacting a first word line; an oxide semiconductor (OS) layer contacting a source line and a bit line, the FE material being disposed between the OS layer and the first word line; a dielectric material contacting the FE material, the FE material being between the dielectric material and the first word line; an inter-metal dielectric (IMD) over the first word line; a first contact extending through the IMD to the first word line, the first contact being electrically coupled to the first word line; a second contact extending through the dielectric material and the FE material; and a first conductive line electrically coupling the first contact to the second contact.