公开(公告)号：US20130233883A1

公开(公告)日：2013-09-12

申请号：US13867521

申请日：2013-04-22

Applicant: Steven Nielsen ,  Jeffrey Farr ,  Curtis Chambers

Inventor： Steven Nielsen ,  Jeffrey Farr ,  Curtis Chambers

IPC: B05B12/00

CPC classification number: B05B12/004 ,  A63C19/065 ,  A63C2019/067 ,  B05B12/081 ,  B05B12/082 ,  B05C11/00 ,  B65D83/203 ,  E01C23/227 ,  G01G17/06 ,  G01G19/18 ,  G01G23/3735

Abstract: Marking devices for dispensing a marking substance on the ground and marking methods are provided. The marking devices and marking methods use one or more detection mechanisms to detect one or more characteristics of the marking substance. In some embodiments, the detection mechanism may be, but is not limited to, an optical sensor, an olfactory sensor, a weight sensor, a switch device, and any combination thereof. The one or more detection mechanisms may provide, for example, the capability to: (1) determine the type of marking substance that is installed in the marking device; (2) determine in advance of or during a marking operation the amount of marking substance within the marking dispenser; and (3) determine when the marking dispenser is becoming empty.

Abstract translation: 提供了用于在地面上分配标记物质的标记装置和标记方法。 标记装置和标记方法使用一个或多个检测机构来检测标记物质的一个或多个特征。 在一些实施例中，检测机构可以是但不限于光学传感器，嗅觉传感器，重量传感器，开关装置及其任何组合。 一个或多个检测机构可以提供例如以下能力：（1）确定安装在标记装置中的标记物质的类型; （2）在标记操作之前或期间确定标记分配器内的标记物质的量; 和（3）确定标记分配器何时变空。

公开(公告)号：US08522714B2

公开(公告)日：2013-09-03

申请号：US13037624

申请日：2011-03-01

Applicant: Naofumi Kishita ,  Kouji Fujimura ,  Yoshitaka Hara

Inventor： Naofumi Kishita ,  Kouji Fujimura ,  Yoshitaka Hara

IPC: B05C11/00 ,  B05C11/02 ,  B05B7/06

CPC classification number: B05D1/02 ,  B05C11/00 ,  B05D1/00 ,  B05D1/30

Abstract: A wet processing apparatus for wet-processing substrates can suppress the reduction of throughput when some component part thereof becomes unserviceable. The wet processing apparatus includes a first nozzle unit and a second nozzle unit. When the wet processing apparatus operates in a normal mode, a substrate carrying mechanism is controlled so as to deliver substrates alternately to processing units of a first group and those of a second group so that the substrates are processed sequentially in order. When the processing units of the first group (the second group) are unserviceable due to the inoperativeness of the substrate holders, a processing liquid supply system or a nozzle support mechanism, the nozzle unit for the processing units of the second group (the first group) is moved to process substrates by the serviceable ones of the first group (the second group).

Abstract translation: 用于湿处理基板的湿式处理装置可以抑制当其一部分成为不可用时的吞吐量的降低。 湿式处理装置包括第一喷嘴单元和第二喷嘴单元。 当湿法处理装置以正常模式操作时，控制基板承载机构以将基板交替地传送到第一组和第二组的处理单元，使得依次顺序地处理基板。 当第一组（第二组）的处理单元由于衬底保持器的不操作而不能使用时，处理液体供应系统或喷嘴支撑机构，用于第二组（第一组）的处理单元的喷嘴单元 ）被移动到由第一组（第二组）中可用的基板处理衬底。

公开(公告)号：US20130206061A1

公开(公告)日：2013-08-15

申请号：US13761580

申请日：2013-02-07

Applicant: Satoshi SHIMAO ,  Katsunori TAKAHASHI ,  Kenji TAMAKI ,  Kenichi HAYASHI ,  Yumiko IZUMIYA ,  Kazutoshi YOSHIMURA

Inventor： Satoshi SHIMAO ,  Katsunori TAKAHASHI ,  Kenji TAMAKI ,  Kenichi HAYASHI ,  Yumiko IZUMIYA ,  Kazutoshi YOSHIMURA

IPC: B05C11/00

CPC classification number: B05C11/00 ,  G03G7/00 ,  G03G7/0006 ,  G03G8/00

Abstract: A sheet of paper is set on a paper-supplying portion of a top surface gloss processing apparatus while its top surface is faced upward. A gloss level sensor measures gloss level of the top surface of the sheet of paper. Data of this measurement is compared with a previously set threshold value. Based on this comparison, it is determined whether or not the gloss processing has been performed on the top surface thereof. When determining that the gloss processing has been already performed, a warning message such that the gloss processing has been already performed on the top surface of the sheet, of paper is displayed on a screen. On the other hand, when determining that the gloss processing has not performed, the top surface gloss processing apparatus performs the gloss processing on the top surface thereof.

Abstract translation: 在上表面光泽处理装置的纸供给部分上面设置有一张纸，同时其顶面朝上。 光泽度传感器测量纸张顶表面的光泽度。 将该测量的数据与先前设定的阈值进行比较。 基于该比较，确定在其顶表面上是否进行光泽处理。 当确定已经执行光泽处理时，在屏幕上显示纸张的表面上已经执行了光泽处理的警告消息。 另一方面，当确定没有进行光泽处理时，顶面光泽处理装置在其顶表面上进行光泽处理。

公开(公告)号：US20130205568A1

公开(公告)日：2013-08-15

申请号：US13850915

申请日：2013-03-26

Applicant: Jung-Woo KO ,  Sang-Shin LEE ,  Taek-Kyo KANG ,  Seung-Ju HONG

Inventor： Jung-Woo KO ,  Sang-Shin LEE ,  Taek-Kyo KANG ,  Seung-Ju HONG

IPC: B05C11/00

CPC classification number: B05C11/00 ,  C23C14/042 ,  H01L51/0011 ,  H01L51/56 ,  Y10T29/49826 ,  Y10T29/49885 ,  Y10T156/10

Abstract: A mask frame assembly for thin film deposition including a frame having an opening portion and a support portion, and a mask having a deposition area in a position corresponding to the opening portion, wherein the mask includes a first layer including the deposition area and a peripheral portion disposed outside the deposition area and a second layer including a first surface and a second surface opposite to the first surface, at least a part of the first surface of the second layer faces the first layer and contacts the peripheral portion, and the second surface is welded to the support portion of the frame.

Abstract translation: 一种用于薄膜沉积的掩模框架组件，包括具有开口部分和支撑部分的框架，以及具有在与开口部分相对应的位置中的沉积区域的掩模，其中所述掩模包括包括沉积区域的第一层和外围 设置在所述沉积区域外部的第二层和包括与所述第一表面相对的第一表面和第二表面的第二层，所述第二层的所述第一表面的至少一部分面向所述第一层并接触所述周边部分，并且所述第二表面 被焊接到框架的支撑部分。

公开(公告)号：US20130107369A1

公开(公告)日：2013-05-02

申请号：US13454025

申请日：2012-04-23

Applicant: KEN SEKI ,  TOSHIMASA NISHI ,  HIROTO ISHIKAWA

Inventor： KEN SEKI ,  TOSHIMASA NISHI ,  HIROTO ISHIKAWA

IPC: B05C11/00 ,  G02B5/22

CPC classification number: B05C11/00 ,  C23C14/243 ,  C23C14/30 ,  G02B5/22 ,  Y10T428/24479 ,  Y10T428/24628

Abstract: In a hearth liner wherein an evaporation material is adhered to a substrate to form an optical thin film thereon, the present invention is directed to prevent bumping (splashing) when the evaporation material is irradiated by an electron beam from an electron gun to melt and vaporize thereof. A hearth liner of a vacuum evaporation apparatus wherein the electron beam from the electron gun is irradiated on the evaporation material to form an optical thin film on a substrate, wherein the cross-section shape of an evaporation material storage part of the hearth liner is a shallow semicircular (spherical) shape (bowl shape).

Abstract translation: 在其中蒸发材料粘附到基底以在其上形成光学薄膜的炉底衬里中，本发明涉及当蒸发材料被来自电子枪的电子束照射以熔化和蒸发时防止碰撞（飞溅） 其中。 一种真空蒸发装置的炉床衬里，其中来自电子枪的电子束照射在蒸发材料上，以在衬底上形成光学薄膜，其中炉床衬里的蒸发材料储存部分的横截面形状为 浅半圆形（球形）（碗形）。

公开(公告)号：US20130036973A1

公开(公告)日：2013-02-14

申请号：US13603693

申请日：2012-09-05

Applicant: Benjamin Y.H. Liu ,  Thuc M. Dinh ,  William D. Dick ,  Aaron M. Collins ,  Francisco J. Romay

Inventor： Benjamin Y.H. Liu ,  Thuc M. Dinh ,  William D. Dick ,  Aaron M. Collins ,  Francisco J. Romay

IPC: C23C16/52 ,  C23C16/455

CPC classification number: B05C11/00 ,  G01N15/065

Abstract: The present disclosure describes a method and apparatus for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber with walls that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super-saturated with vapor and causing said super-saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector.

Abstract translation: 本公开内容描述了一种用于通过用气体使气体饱和来检测气体中的颗粒并使气体流过室的方法和装置，其中壁的温度不同于进入气体的温度，该温度在内部产生气体湍流 导致气体被蒸汽过饱和，并使所述超饱和蒸汽冷凝在所述颗粒上并形成液滴，然后通过光学散射检测器检测和计数。

公开(公告)号：US20120279441A1

公开(公告)日：2012-11-08

申请号：US13442201

申请日：2012-04-09

Applicant: Kevin Creehan ,  Jeffrey Patrick Schultz

Inventor： Kevin Creehan ,  Jeffrey Patrick Schultz

IPC: B05C11/00 ,  B23K20/12

CPC classification number: B05C11/00 ,  B22F2998/00 ,  B23K20/12 ,  B23K20/122 ,  B23K20/1275 ,  B23K20/128 ,  B23K2101/34 ,  B23K2103/02 ,  B23K2103/10 ,  B23K2103/12 ,  B23K2103/14 ,  B23K2103/15 ,  B23K2103/18 ,  B23K2103/20 ,  B23K2103/26 ,  B23K2103/42 ,  B23K2103/52 ,  B33Y30/00 ,  C21D9/50 ,  C21D2251/00 ,  C23C24/045 ,  C23C24/06 ,  C23C26/00 ,  C22C29/00 ,  C22C32/00

Abstract: The present invention relates to tools and methods for disposing, coating, repairing, or otherwise modifying the surface of a metal substrate using frictional heating and compressive/shear loading of a consumable metal against the substrate. Embodiments of the invention include friction-based fabrication tooling comprising a non-consumable member with a throat and a consumable member disposed in the throat, wherein consumable filler material is capable of being introduced to the throat in a continuous manner during deposition using frictional heating and compressive/shear loading of the filler material onto the substrate. Preferred embodiments according to the invention include such tools operably configured for applying a force or displacement to the filler material during deposition. Especially preferred embodiments can include using various powder-type consumable materials or combinations during the deposition process to obtain a continuous compositional gradient in the filler material yielding a functionally graded coating on the substrate.

Abstract translation: 本发明涉及使用消耗性金属相对于基底的摩擦加热和压缩/剪切加载来设置，涂覆，修复或以其它方式改变金属基底的表面的工具和方法。 本发明的实施例包括基于摩擦的制造工具，其包括具有喉部的非消耗性构件和设置在喉部中的可消耗构件，其中消耗性填充材料能够在使用摩擦加热的沉积期间以连续的方式引入喉部， 填料在基材上的压缩/剪切载荷。 根据本发明的优选实施例包括可操作地构造用于在沉积期间向填充材料施加力或位移的这种工具。 特别优选的实施方案可以包括在沉积工艺期间使用各种粉末型可消耗材料或组合，以获得填充材料中连续的组成梯度，从而在基材上产生功能梯度的涂层。

公开(公告)号：US20120187083A1

公开(公告)日：2012-07-26

申请号：US13353962

申请日：2012-01-19

Applicant: Akio HASHIZUME

Inventor： Akio HASHIZUME

IPC: B05D3/10 ,  B05C5/00

CPC classification number: B05C9/06 ,  B05C11/00 ,  B05C13/00 ,  B05C15/00 ,  C01B21/0687 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/3105 ,  H01L21/31111 ,  H01L21/31116 ,  H01L21/67028 ,  H01L21/67063 ,  H01L21/67115 ,  H01L21/67126 ,  H01L21/6719 ,  H01L21/67207 ,  H01L21/68742

Abstract: An inventive substrate treatment method includes a silylation step of supplying a silylation agent to a substrate, and an etching step of supplying an etching agent to the substrate after the silylation step. The method may further include a repeating step of repeating a sequence cycle including the silylation step and the etching step a plurality of times. The cycle may further include a rinsing step of supplying a rinse liquid to the substrate after the etching step. The cycle may further include a UV irradiation step of irradiating the substrate with ultraviolet radiation after the etching step. The method may further include a pre-silylation or post-silylation UV irradiation step of irradiating the substrate with the ultraviolet radiation before or after the silylation step.

Abstract translation: 本发明的基板处理方法包括向基板供给甲硅烷化剂的甲硅烷化步骤，以及在甲硅烷化步骤之后向基板供给蚀刻剂的蚀刻步骤。 该方法可以进一步包括多次重复包括甲硅烷化步骤和蚀刻步骤的序列循环的重复步骤。 该循环可以进一步包括在蚀刻步骤之后将漂洗液体供应到基底的冲洗步骤。 该循环可以进一步包括在蚀刻步骤之后用紫外线照射衬底的UV照射步骤。 该方法可进一步包括在甲硅烷化步骤之前或之后用紫外线照射基质的预甲硅烷基化或甲硅烷基化后UV照射步骤。

公开(公告)号：US08020273B2

公开(公告)日：2011-09-20

申请号：US12692529

申请日：2010-01-22

Applicant: Stephen Dirk Pacetti

Inventor： Stephen Dirk Pacetti

IPC: B23P11/00 ,  B23P25/00 ,  A61F2/82

CPC classification number: A61F2/958 ,  A61F2/06 ,  A61F2/07 ,  A61F2/82 ,  A61F2002/9522 ,  A61F2240/001 ,  A61L31/022 ,  A61L31/048 ,  A61L31/16 ,  A61L2300/416 ,  A61L2420/06 ,  B05C11/00 ,  B21D39/048 ,  Y10T29/49863 ,  Y10T29/49865 ,  Y10T29/49925 ,  Y10T29/49927 ,  Y10T29/53996

Abstract: A method of producing a stent-balloon assembly is disclosed which includes providing a stent having a polymeric component; exposing the stent to a relative humidity of 20% to 100%; and crimping the stent on a balloon of a catheter assembly. The polymeric component could be at least part of the material from which the stent is made or could be a constituent of a coating for the stent, such as a drug delivery coating. In lieu of or in addition to the application of humidity, a plasticizing agent can be applied to the polymeric component. A crimping device is also disclosed which allows the stent to be exposed to humidity during the crimping process.

Abstract translation: 公开了一种制造支架 - 球囊组件的方法，其包括提供具有聚合物组分的支架; 将支架暴露于20％至100％的相对湿度; 并将支架卷曲在导管组件的气球上。 聚合物组分可以是制造支架的材料的至少一部分，或者可以是用于支架的涂层的成分，例如药物递送涂层。 除了施加湿度之外，还可以将增塑剂施加到聚合物组分上。 还公开了压接装置，其允许支架在压接过程期间暴露于湿度。

公开(公告)号：US20110185966A1

公开(公告)日：2011-08-04

申请号：US12980511

申请日：2010-12-29

Applicant: Il Hyun LEE ,  Tae Hyung Kim ,  Chong Hyun Park

Inventor： Il Hyun LEE ,  Tae Hyung Kim ,  Chong Hyun Park

IPC: B05C11/00

CPC classification number: B05C11/00

Abstract: A mask assembly capable of improving organic material deposition efficiency is disclosed. The mask assembly comprises: a plurality of deposition masks; a frame coupled to the plurality of deposition masks arranged continuously; and a bonding portion for joining adjacent deposition masks.

Abstract translation: 公开了一种能够提高有机材料沉积效率的面罩组件。 掩模组件包括：多个沉积掩模; 耦合到连续布置的多个沉积掩模的框架; 以及用于连接相邻的沉积掩模的接合部分。