利索-全球专利检索

  1. Login
  2. Sign Up

Search Results

713 records (took 0.065 seconds)

    Scanning electron microscope and system for inspecting semiconductor device
    91.
    发明申请
    Scanning electron microscope and system for inspecting semiconductor device 有权
    扫描电子显微镜和半导体器件检测系统

    公开(公告)号：US20060108525A1

    公开(公告)日：2006-05-25

    申请号：US11268568

    申请日：2005-11-08

    Applicant: Ryo Nakagaki ,  Toshifumi Honda

    Inventor： Ryo Nakagaki ,  Toshifumi Honda

    IPC: G21K7/00

    CPC classification number: H01J37/222 ,  G03F7/7065 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/24592 ,  H01J2237/2817

    Abstract: A scanning electron microscope has an electron source for illuminating a primary electron beam on a specimen wafer, an accelerating electrode, a condenser lens, a deflector, an objective lens, a detector for acquiring a digital image by sampling a signal of emissive electrons generated from the specimen wafer, a digitizing means, an image memory for storing, displaying or processing the acquired digital image, an input/output unit, an image creation unit and an image processor. The scanning electron microscope is provided with a sampling unit for sampling the emissive electron signal at intervals each smaller than the pixel size of the digital image to be stored, displayed or processed and an image creation process means for enlarging the pixel size on the basis of the sampled emissive electron signal to create a digital image.

    Abstract translation: 扫描电子显微镜具有用于照射样品晶片上的一次电子束的电子源，加速电极，聚光透镜，偏转器，物镜，用于通过对从...产生的发射电子的信号进行采样来获取数字图像的检测器 样本晶片，数字化装置，用于存储，显示或处理所获取的数字图像的图像存储器，输入/输出单元，图像创建单元和图像处理器。 该扫描电子显微镜设置有采样单元，用于以比要存储，显示或处理的数字图像的像素大小更小的间隔对发射电子信号进行采样，以及图像创建处理装置，用于基于 采样发射电子信号以产生数字图像。

    Broad spectrum ultraviolet inspection systems employing catadioptric imaging
    94.
    发明授权
    Broad spectrum ultraviolet inspection systems employing catadioptric imaging 失效
    使用反射折射成像的广谱紫外检测系统

    公开(公告)号：US06956694B2

    公开(公告)日：2005-10-18

    申请号：US10005732

    申请日：2001-11-06

    Applicant: David R. Shafer ,  Yung-Ho Chuang ,  Bin-Ming B. Tsai

    Inventor： David R. Shafer ,  Yung-Ho Chuang ,  Bin-Ming B. Tsai

    IPC: G01N21/33 ,  G02B13/14 ,  G02B17/08 ,  G02B21/16 ,  G03C5/16 ,  G03F1/84 ,  G03F3/00 ,  G03F7/20 ,  H04N5/225 ,  G03B27/42

    CPC classification number: G03F7/70225 ,  G02B13/143 ,  G02B17/0808 ,  G02B17/0856 ,  G02B17/0892 ,  G02B21/16 ,  G03F1/84 ,  G03F7/70216 ,  G03F7/70275 ,  G03F7/70616 ,  G03F7/7065

    Abstract: An ultraviolet (UV) catadioptric imaging system, with broad spectrum correction of primary and residual, longitudinal and lateral, chromatic aberrations for wavelengths extending into the deep UV (as short as about 0.16 μm), comprises a focusing lens group with multiple lens elements that provide high levels of correction of both image aberrations and chromatic variation of aberrations over a selected wavelength band, a field lens group formed from lens elements with at least two different refractive materials, such as silica and a fluoride glass, and a catadioptric group including a concave reflective surface providing most of the focusing power of the system and a thick lens providing primary color correction in combination with the focusing lens group. The field lens group is located near the intermediate image provided by the focusing lens group and functions to correct the residual chromatic aberrations. The system is characterized by a high numerical aperture (typ. greater than 0.7) and a large flat field (with a size on the order of 0.5 mm). The broad band color correction allows a wide range of possible UV imaging applications at multiple wavelengths.

    Abstract translation: 紫外线（UV）反折射成像系统具有对延伸到深紫外（短至约0.16μm）的波长的初级和残留，纵向和横向色差的广谱校正，包括具有多个透镜元件的聚焦透镜组， 提供对所选波长带上的像差的两个像差和色度变化的高水平校正，由具有至少两种不同折射材料的透镜元件形成的场透镜组，例如二氧化硅和氟化物玻璃，以及包括 提供系统的大部分聚焦功能的凹面反射表面以及与聚焦透镜组组合提供原色校正的厚透镜。 场透镜组位于由聚焦透镜组提供的中间图像附近，并且用于校正残余色差。 该系统的特征在于高数值孔径（典型值大于0.7）和大平坦场（尺寸约为0.5毫米）。 宽带色彩校正允许在多个波长下的广泛范围的可能的UV成像应用。

    Automatic alignment of integrated circuit and design layout of integrated circuit to more accurately assess the impact of anomalies
    97.
    发明申请
    Automatic alignment of integrated circuit and design layout of integrated circuit to more accurately assess the impact of anomalies 有权
    集成电路的自动对准和集成电路的设计布局更准确地评估异常的影响

    公开(公告)号：US20050198602A1

    公开(公告)日：2005-09-08

    申请号：US10793956

    申请日：2004-03-05

    Applicant: Keith Brankner

    Inventor： Keith Brankner

    IPC: G06F17/50

    CPC classification number: G03F7/7065

    Abstract: A method, computer program product and system for assessing the impact of anomalies in a physical device. An anomaly may be detected in an integrated circuit. Upon detecting an anomaly, an image of the anomaly may be captured. A design layout of the image may be obtained. The image coordinates of the detected anomaly may be transformed into a common reference system, such as the design layout. By using a common unit of reference instead of different reference systems, automatic coordination of the integrated circuit and the design layout may have to be performed once instead of multiple times for multiple tools. The image coordinates of the detected anomaly may be transformed to the coordinates of a common reference system by vectorizing the image, matching polygons in both the image and the design layout and aligning the image of the anomaly with the design layout of the image.

    Abstract translation: 用于评估物理设备中异常的影响的方法，计算机程序产品和系统。 在集成电路中可能检测到异常。 当检测到异常时，可以捕获异常的图像。 可以获得图像的设计布局。 检测到的异常的图像坐标可以被变换为公共参考系统，例如设计布局。 通过使用通用的参考单位而不是不同的参考系统，集成电路和设计布局的自动协调可能必须对多个工具执行一次而不是多次。 检测到的异常的图像坐标可以通过矢量化图像，在图像和设计布局中匹配多边形并​​将异常图像与图像的设计布局对齐来变换到公共参考系的坐标。

    Feature targeted inspection
    98.
    发明授权
    Feature targeted inspection 失效
    特征针对性检查

    公开(公告)号：US06931297B1

    公开(公告)日：2005-08-16

    申请号：US10794225

    申请日：2004-03-05

    Applicant: Robert Madge

    Inventor： Robert Madge

    IPC: G03F7/20 ,  G06F19/00

    CPC classification number: G03F7/7065

    Abstract: A method of inspecting a subject integrated circuit. A set of historical integrated circuits is inspected to detect defects and produce historical data. Features of the historical integrated circuits that have an occurrence of defects that is greater than a given limit are designated as high risk features, based on the historical data. Locations of the high risk features are identified on the subject integrated circuit. The locations of the high risk features are input into an inspection tool, and the locations of the high risk features on the integrated circuit are inspected to at least one of detect defects and measure critical dimensions, and produce subject data.

    Abstract translation: 一种检查对象集成电路的方法。 检查一组历史集成电路，检测缺陷并产生历史数据。 基于历史数据，具有大于给定限制的缺陷发生的历史集成电路的特征被指定为高风险特征。 主题集成电路识别高风险特征的位置。 将高风险特征的位置输入到检查工具中，并且检查集成电路上的高风险特征的位置至少检测缺陷中的一个并测量关键尺寸，并产生主题数据。

    Method and system for controlling the quality of a reticle
    99.
    发明申请
    Method and system for controlling the quality of a reticle 有权
    用于控制光罩质量的方法和系统

    公开(公告)号：US20050166171A1

    公开(公告)日：2005-07-28

    申请号：US10767358

    申请日：2004-01-28

    Applicant: Avishay Bartov

    Inventor： Avishay Bartov

    IPC: G01N21/956 ,  G03F1/00 ,  G06F17/50 ,  G03F9/00

    CPC classification number: G03F1/84 ,  G01N21/95607 ,  G03F7/7065

    Abstract: A method and system are presented for use in controlling the quality of a reticle. The method includes processing and analyzing reference data and test data, and generating output data indicative of the current condition of the reticle. The reference data is indicative of at least a portion of a reference pattern, which is produced on a reference article by using said reticle, when in a satisfied condition. The test data is indicative of a test pattern produced on an identical article using said reticle when in the current condition, a certain time period after said reticle has been in use or stored.

    Abstract translation: 提出了一种用于控制掩模版质量的方法和系统。 该方法包括处理和分析参考数据和测试数据，以及产生指示掩模版当前状态的输出数据。 参考数据表示在满足条件时通过使用所述掩模版在参考制品上产生的参考图案的至少一部分。 测试数据表示当在当前状态下，在所述掩模版已被使用或存储之后的特定时间段内使用所述掩模版的相同制品上产生的测试图案。

Patent Agency Ranking