公开(公告)号：US10384407B2

公开(公告)日：2019-08-20

申请号：US15564083

申请日：2016-04-08

申请人： Osaka University

发明人： Akira Harada ,  Yoshinori Takashima ,  Masaki Nakahata

IPC分类号： C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  B29C73/18 ,  C08F2/10 ,  C08F4/40 ,  C08F220/58 ,  C08F16/02 ,  C08F22/10 ,  C08F22/38 ,  C08L33/26

摘要： The present invention provides a self-repairing material having self-repairing properties and shape memory properties, as well as high dynamic strength, and also provides a method for manufacturing the same. The self-repairing material of the present invention comprises a polymer comprising specific monomer units in specific ratios, and the concentration of the monomer units is within a specific range.

公开(公告)号：US10377913B2

公开(公告)日：2019-08-13

申请号：US15699493

申请日：2017-09-08

申请人： Corning Incorporated

发明人： Jennifer Lynn Lyon ,  Pamela Arlene Maurey ,  Wageesha Senaratne ,  Arlin Lee Weikel ,  Ying Zhang

IPC分类号： C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  C09D133/02 ,  C09D4/00 ,  G02B1/04 ,  C09D133/04 ,  G02B6/122 ,  G02B6/124

摘要： A composite coating having a high refractive index, high Abbe number, low haze and high transmittance, suitable for fabricating nanoscale optical surface features includes a resin with a crosslinked polymer matrix having polymers with repeat units derived from acrylic or methacrylic monomers or oligomers and inorganic nanoparticles disposed within the resin, wherein the composite coating has a refractive index equal to or greater than 1.7 and a glass transition temperature equal to or greater than 60° C.

公开(公告)号：US10370558B2

公开(公告)日：2019-08-06

申请号：US15717314

申请日：2017-09-27

申请人： DONGWOO FINE-CHEM CO., LTD.

发明人： Seungwoo Lee ,  Min Kyung Kang ,  Seunghee Kim

IPC分类号： C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  C09D135/02

摘要： The present invention provides a hard coating composition comprising a dendrimer compound having a terminal (meth)acrylate group, a polyhedral oligomeric silsesquioxane compound, a photoinitiator and a solvent; a hard coating film formed using the same; and an image display device having the hard coating film. The hard coating film according to the present invention can minimize the occurrence of curling while having excellent hardness, scratch resistance and bending resistance.

公开(公告)号：US10364363B2

公开(公告)日：2019-07-30

申请号：US15544794

申请日：2015-01-30

申请人： Hewlett-Packard Development Company, L.P.

发明人： Tienteh Chen ,  Bin Huang ,  George Sarkisian

IPC分类号： C08G18/00 ,  C08G61/04 ,  C09D11/101 ,  C09D11/30 ,  C09D11/102 ,  C09D11/54 ,  C09D11/40 ,  C08F290/06 ,  C09D11/033 ,  C09D11/107 ,  C09D11/322 ,  C09D11/38

摘要： An example of a radiation curable binder dispersion includes water and a radiation curable binder dispersed therein. The radiation curable polyurethane is formed from a polyisocyanate; an acrylate or methacrylate having at least two hydroxyl functional groups and having an acrylate functional group or a methacrylate functional group; another acrylate or methacrylate having one hydroxyl functional group or one amino functional group; and one of i) a homopolymer or copolymer of poly(ethylene glycol) having one or two hydroxyl functional groups or one or two amino functional groups at one end of its chain; or ii) a combination of i and a compound including a carboxylic functional group.

公开(公告)号：US20190203027A1

公开(公告)日：2019-07-04

申请号：US16330034

申请日：2017-08-09

申请人： FUJIMI INCORPORATED

发明人： Jingzhi CHEN

IPC分类号： C08L29/04 ,  C08G61/04 ,  H01L21/02

CPC分类号： C08L29/04 ,  C08G61/04 ,  C08G2261/1452 ,  C11D7/22 ,  H01L21/02065 ,  H01L21/304

摘要： To provide a composition for surface treatment capable of treating a surface of a polished object to be polished having both of a silicon-silicon bond and a nitrogen-silicon bond by sufficiently removing defects on the surface of the polished object to be polished. The composition for surface treatment contains a nonionic water-soluble polymer (A) having a main chain including only a carbon atom or a main chain consisting of a carbon atom and a nitrogen atom, and an anionic water-soluble polymer (B) having a main chain including only a carbon atom and a side chain having a sulfonic acid group or a group having a salt thereof or a carboxyl group or a group having a salt thereof, and being bonded to the main chain including only a carbon atom, and the composition is used for surface treatment of a polished object to be polished containing a silicon-silicon bond and a nitrogen-silicon bond and a pH of the composition is less than 9.0.

公开(公告)号：US10308768B2

公开(公告)日：2019-06-04

申请号：US15534392

申请日：2015-12-09

申请人： Joanneum Research Forschungsgesellschaft mbH

发明人： Dieter Nees ,  Markus Leitgeb ,  Barbara Stadlober ,  Stephan Ruttloff ,  Andre Lintschnig ,  Valentin Satzinger

IPC分类号： C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  C08G75/045 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027 ,  G03F7/029 ,  G03F7/031 ,  G03F7/075

摘要： With a prepolymer composition containing at least one mono or oligomer component with at least one polymerizable C—C double bond as well as at least one multifunctional monomer component, the multifunctional monomer component a multifunctional monomer component is contained with at least two thiol groups selected from the group: 3-Mercaptopropionates, 3-Mercaptoacetates, thioglycolates, and alkylthiols, wherein the mono or oligomer component with at least one polymerizable double bond is selected from the group acrylates, methyl acrylates, vinyl ethers, allyl ethers, propenyl ethers, alkenes, dienes, unsaturated esters, allyl triazines, allyl isocyanates, and N-vinyl amides, and wherein at least one surface-active anti-adhesive additive selected from the group alkyl (meth)acrylates, polysiloxane (meth)acrylates, perfluoroalkyl (meth)acrylates, perfluoropolyether (meth)acrylates, alkyl vinyl ethers, polysiloxane vinyl ethers, perfluoroalkyl vinyl ethers, and perfluoropolyether vinyl ethers, as well as a photoinitiator are contained, as well as the use thereof.

公开(公告)号：US20190144410A1

公开(公告)日：2019-05-16

申请号：US16179296

申请日：2018-11-02

申请人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE

发明人： Kuei-Yi CHUANG ,  Kuo-Chan CHIOU ,  Feng-Po TSENG

IPC分类号： C07D307/52 ,  C08G18/02 ,  C08G18/83 ,  C08G65/331 ,  C08G61/04 ,  C08G61/12 ,  C08G61/10 ,  C07D307/42 ,  C07D407/06

摘要： The invention provides a furan-modified compound or oligomer. The compound has a structure represented by Formula I: When formula I represents a compound, x is an integer of 1˜5; A including a group formed of ketone, amido, imide, imido, phenyl ether or enol ether group; G is a direct bond, —O—, —N—, —Ar—NH—(CH2)b—, —Ar—O—(CH2)b—, —Ar—O—(CH2)a—NH—(CH2)b—, —(CH2)a—NH—(CH2)b—, —(CH2)a—O—(CH2)b— or —(CH2)a—CH(OH)—(CH2)b—NH—; Ar is substituted or unsubstituted arylene group; a is an integer of 1 to 5; and b is an integer of 0 to 5.

公开(公告)号：US10266709B2

公开(公告)日：2019-04-23

申请号：US15311631

申请日：2015-05-19

申请人： SUN CHEMICAL CORPORATION

发明人： Ramasamy Krishnan ,  Mark Schneider ,  Dan Rubik ,  Kacy Schultz ,  Juanita Parris

IPC分类号： C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  C09D11/101 ,  C09D5/24 ,  H05K1/09 ,  C09D11/03 ,  C09D11/037 ,  H05K1/03 ,  C09D11/104 ,  C09D11/52 ,  H05K3/12

摘要： The present invention is directed to energy curable offset conductive inks and hybrid offset conductive ink compositions that contain an oxidative curable ink and the energy curable offset conductive ink. The conductive inks and ink compositions exhibit low levels of resistance and hence have superior conductivity.

公开(公告)号：US20190088880A1

公开(公告)日：2019-03-21

申请号：US16082907

申请日：2017-03-13

申请人： Toray Industries, Inc.

发明人： Keisuke Asaka ,  Shuhei Yamamoto ,  Daisuke Kitazawa

IPC分类号： H01L51/00 ,  H01L51/50 ,  H01L51/44 ,  C08G61/12 ,  C08G61/04

摘要： A photovoltaic element includes at least a cathode, a photoelectric conversion layer, a hole extraction layer, and an anode in this order, the hole extraction layer containing a hole transporting material and a compound represented by formula (1) or (2): wherein, in formula (1), R1 represents an alkyl group having 8 to 14 carbon atoms or an alkanoyl group having 8 to 14 carbon atoms, and n represents a natural number of 1 to 9; and in formula (2), R2 represents an alkenyl group, and m represents a natural number.

公开(公告)号：US10195121B2

公开(公告)日：2019-02-05

申请号：US15127428

申请日：2015-03-19

申请人： Ivoclar Vivadent AG

发明人： Norbert Moszner ,  Peter Burtscher ,  Alexandros Gianasmidis

IPC分类号： C08F2/46 ,  C08F2/50 ,  C08G61/04 ,  A61K6/00 ,  A61K6/083

摘要： Radically polymerizable dental material which contains as initiator for the radical polymerization a combination of a thiourea derivative and a bisacyldialkylgermanium compound.