公开(公告)号：US20070070316A1

公开(公告)日：2007-03-29

申请号：US11458216

申请日：2006-07-18

申请人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

发明人： Albrecht Ehrmann ,  Ulrich Wegmann ,  Rainer Hoch ,  Joerg Mallmann ,  Karl-Heinz Schuster ,  Ulrich Loering ,  Toralf Gruner ,  Bernhard Kneer ,  Bernhard Geuppert ,  Franz Sorg ,  Jens Kugler ,  Norbert Wabra

IPC分类号： G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70591 ,  G03F7/70691 ,  G03F7/7085 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/70991

摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

摘要翻译： 微光刻投影曝光装置包括配置为浸没操作的投影透镜。 为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。 为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度 在浸液中的分布。

公开(公告)号：US20070019305A1

公开(公告)日：2007-01-25

申请号：US11479574

申请日：2006-06-30

申请人： Wilhelm Ulrich ,  Thomas Okon ,  Norbert Wabra ,  Toralf Gruner ,  Boris Bittner ,  Volker Graeschus

发明人： Wilhelm Ulrich ,  Thomas Okon ,  Norbert Wabra ,  Toralf Gruner ,  Boris Bittner ,  Volker Graeschus

IPC分类号： G02B17/00 ,  G02B3/00

CPC分类号： G03F7/70308 ,  G02B17/08 ,  G02B27/0025 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70258 ,  G03F7/70266

摘要： A method for correcting at least one image defect of a projection objective of a lithography projection exposure machine, the projection objective comprising an optical arrangement composed of a plurality of lenses and at least one mirror, the at least one mirror having an optically operative surface that can be defective and is thus responsible for the at least one image defect, comprises the steps of: at least approximately determining a ratio VM of principal ray height hMH to marginal ray height hMR at the optically operative surface of the at least one mirror, at least approximately determining at least one optically operative lens surface among the lens surfaces of the lenses, at which the magnitude of a ratio VL of principal ray height hLH to marginal ray height hLR comes at least closest to the ratio VM, and selecting the at least one determined lens surface for the correction of the image defect.

摘要翻译： 一种用于校正光刻投影曝光机的投影物镜的至少一个图像缺陷的方法，所述投影物镜包括由多个透镜和至少一个反射镜构成的光学装置，所述至少一个反射镜具有光学操作表面， 可能是有缺陷的，并且因此对至少一个图像缺陷负责，包括以下步骤：至少近似地确定主光线高度h M H的比率VM与边缘光线高度h M 在至少一个反射镜的光学操作表面处至少近似地确定透镜的透镜表面中的至少一个光学透镜表面，其中主光线高度h的比值VL的大小， 对于边缘射线高度h L L至少最接近比率VM，并且选择至少一个确定的透镜表面用于校正图像缺陷。

公开(公告)号：US20060146304A1

公开(公告)日：2006-07-06

申请号：US11294860

申请日：2005-12-05

申请人： Markus Schwab ,  Aksel Goehnermeier ,  Toralf Gruner ,  Tammo Uitterdijk

发明人： Markus Schwab ,  Aksel Goehnermeier ,  Toralf Gruner ,  Tammo Uitterdijk

IPC分类号： G03B27/42

CPC分类号： G03B27/42 ,  G03F7/70258

摘要： A lithographic method of manufacturing a miniaturized device using a projection exposure system comprises illuminating the object plane of an imaging optics of the projection exposure system with measuring light; detecting, for each of a plurality of locations on an image plane of the imaging optics, an angular distribution of an intensity of the measuring light traversing the image plane at the respective location; adjusting a telecentricity of the projection exposure system based on a selected patterning structure to be imaged and on the plurality of the detected angular distributions; disposing the selected pattern structure to be imaged in a region of the object plane of the imaging optics; disposing a substrate carrying a resist in a region of the image plane of the imaging optics and exposing the resist with imaging light using the projection exposure system with the adjusted telecentricity; and developing the exposed resist and processing the substrate with the developed resist.

摘要翻译： 使用投影曝光系统制造小型化装置的光刻方法包括用测量光照射投影曝光系统的成像光学元件的物平面; 针对所述摄像光学元件的像平面上的多个位置中的每一个检测在相应位置处穿过所述图像平面的测量光的角度分布; 基于要成像的所选择的图案化结构和所述多个所检测的角度分布来调整所述投影曝光系统的远心度; 将要成像的所选择的图案结构设置在成像光学器件的物平面的区域中; 在所述成像光学元件的像面的区域中设置携带抗蚀剂的基板，并且利用所述投影曝光系统以调节的远心度将成像光曝光; 并显影出曝光的抗蚀剂并用显影的抗蚀剂处理衬底。

公开(公告)号：US20060066764A1

公开(公告)日：2006-03-30

申请号：US11251300

申请日：2005-10-14

申请人： Vladimir Kamenov ,  Toralf Gruner

发明人： Vladimir Kamenov ,  Toralf Gruner

IPC分类号： G02F1/1335

CPC分类号： G03F7/70225 ,  G02B5/3091 ,  G02B17/02 ,  G02B17/08 ,  G02B17/0892 ,  G03F7/70241 ,  G03F7/70958 ,  G03F7/70966

摘要： An optical system, for example a lens for a photolithography tool, includes a group of optical elements (L1, L2) that each comprise a birefringent cubic crystal such as CaF2. The crystal lattices of the crystals have different orientations, e.g. for reducing the overall retardance of the group by mutual compensation. The [110] crystal axis of at least one optical element (L1, L2) is tilted with respect to an optical axis (34) of the system (10) by a predefined tilting angle (θ1, θ2) having an absolute value between 1° and 20°. This reduces the magnitude, but not significantly changes the orientation of intrinsic birefringence. By selecting an appropriate tilting angle it is possible to achieve a better performance of the optical system. For example, the overall retardance of the optical system may be reduced, or the angular retardance distribution may be symmetrized.

摘要翻译： 光学系统，例如用于光刻工具的透镜，包括一组各自包括诸如CaF 2 2的双折射立方晶体的光学元件（L 1，L 2）。 晶体的晶格具有不同的取向，例如 通过相互补偿减少集团的整体延迟。 至少一个光学元件（L 1，L 2）的[110]晶轴相对于系统（10）的光轴（34）倾斜预定倾斜角（θ1 >，θ2> 2），其绝对值在1°和20°之间。 这降低了幅度，但并没有显着地改变固有双折射的取向。 通过选择适当的倾斜角度，可以实现光学系统的更好的性能。 例如，可以减小光学系统的总体延迟，或者可以对角度延迟分布进行对称化。

公开(公告)号：US20050170748A1

公开(公告)日：2005-08-04

申请号：US10983569

申请日：2004-11-08

申请人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

发明人： Birgit Enkisch ,  Hartmut Enkisch ,  Toralf Gruner

IPC分类号： G02B17/08 ,  B24B49/00 ,  G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70966 ,  B24B13/00 ,  G02B1/02 ,  G02B3/00

摘要： As a preliminary stage in manufacturing a lens or lens part for an objective, in particular a projection objective for a microlithography projection system, an optical blank is made from a crystal material. As a first step in manufacturing the optical blank, one determines the orientation of a first crystallographic direction that is defined in the crystallographic structure of the material. The material is then machined into an optical blank so that the first crystallographic direction is substantially perpendicular to an optical blank surface of the optical blank. Subsequently, a marking is applied to the optical blank or to a mounting element of the optical blank. The marking has a defined relationship to a second crystallographic direction which is oriented at a non-zero angle relative to the first crystallographic direction.

摘要翻译： 作为用于物镜的透镜或透镜部件的制造的初步阶段，特别是用于微光刻投影系统的投影物镜，光学坯料由晶体材料制成。 作为制造光学坯料的第一步，确定在材料的晶体结构中限定的第一晶体方向的取向。 然后将该材料加工成光学坯料，使得第一结晶方向基本上垂直于光学坯料的光学坯料表面。 随后，将标记施加到光学毛坯或光学毛坯的安装元件。 标记与第二结晶方向具有定义的关系，其相对于第一结晶方向定向成非零角度。

公开(公告)号：US20050122594A1

公开(公告)日：2005-06-09

申请号：US11029788

申请日：2005-01-05

申请人： Daniel Krahmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christoph Zaczek

发明人： Daniel Krahmer ,  Toralf Gruner ,  Wilhelm Ulrich ,  Birgit Enkisch ,  Michael Gerhard ,  Martin Brunotte ,  Christian Wagner ,  Winfried Kaiser ,  Manfred Maul ,  Christoph Zaczek

IPC分类号： G02B13/24 ,  G02B1/02 ,  G02B5/30 ,  G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  G02B27/28

CPC分类号： G03F7/70966 ,  G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  Y10S359/90

摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.

摘要翻译： 微光刻投影系统的目的在于至少有一个氟化物晶体透镜。 如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。 如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个 其他。 通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。 通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

公开(公告)号：US20050094268A1

公开(公告)日：2005-05-05

申请号：US10922380

申请日：2004-08-19

申请人： Damian Fiolka ,  Olaf Dittmann ,  Michael Totzeck ,  Nils Dieckmann ,  Jess Koehler ,  Toralf Gruner ,  Daniel Kraehmer

发明人： Damian Fiolka ,  Olaf Dittmann ,  Michael Totzeck ,  Nils Dieckmann ,  Jess Koehler ,  Toralf Gruner ,  Daniel Kraehmer

IPC分类号： G02B17/08 ,  G02B27/09 ,  G02B27/28 ,  G03F7/20 ,  G02F1/1335

CPC分类号： G03F7/70241 ,  G02B27/0994 ,  G02B27/286 ,  G03F7/70191 ,  G03F7/70966

摘要： An optical system (1) includes a first optical subsystem (3) with at least a first birefringent optical element (7), and further includes a second optical subsystem (5) with at least a second birefringent optical element (9). Between the first optical subsystem and the second optical subsystem, an optical retarding system (13) with at least a first optical retarding element (15) is arranged, which introduces a retardation of one-half of a wavelength between two mutually orthogonal states of polarization.

摘要翻译： 光学系统（1）包括具有至少第一双折射光学元件（7）的第一光学子系统（3），并且还包括具有至少第二双折射光学元件（9）的第二光学子系统（5）。 在第一光学子系统和第二光学子系统之间布置有至少具有第一光学延迟元件（15）的光学延迟系统（13），其引入两个相互正交的极化状态之间的波长的一半的延迟 。

公开(公告)号：US20050002111A1

公开(公告)日：2005-01-06

申请号：US10831293

申请日：2004-04-26

申请人： Toralf Gruner ,  Manfred Maul ,  Rudolf Von Buenau

发明人： Toralf Gruner ,  Manfred Maul ,  Rudolf Von Buenau

IPC分类号： G03F7/20 ,  G02B26/08 ,  G02B3/00 ,  G02B9/00

CPC分类号： G03F7/70058 ,  G03F7/70225 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

摘要： A microlithographic illumination method for imaging a pattern arranged in an object plane of a projection lens onto an image plane of the projection lens, under which a special means for optically correcting the optical path lengths of s-polarized and p-polarized light such that light beams of both polarizations will either traverse essentially the same optical path length between the object plane and the image plane or any existing difference in their optical path lengths will be retained, largely independently of their angles of incidence on the image plane, which will allow avoiding contrast variations due to pattern orientation when imaging finely structured patterns, is disclosed. The contrast variations may be caused by uncorrected projection lenses due to their employment of materials that exhibit stress birefringence and/or coated optical components, such as deflecting mirrors, that are used at large angles of incidence.

摘要翻译： 一种用于将布置在投影透镜的物平面中的图案成像到投影透镜的图像平面上的微光刻照明方法，在该平面上用于光学校正s偏光和p偏振光的光路长度的特殊装置，使得光 两个极化的光束将在物平面和图像平面之间横穿基本上相同的光程长度，或者它们的光程长度中的任何存在的差异将被保留，这在很大程度上与其在图像平面上的入射角无关，这将允许避免 公开了当成像精细结构化图案时由于图案取向引起的对比度变化。 对比度变化可能由未矫正的投影透镜引起，因为它们使用呈现应力双折射的材料和/或以大的入射角度使用的涂覆的光学部件，例如偏转镜。

公开(公告)号：US06728043B2

公开(公告)日：2004-04-27

申请号：US10146915

申请日：2002-05-17

申请人： Toralf Gruner ,  Manfred Maul ,  Rudolf Von Buenau

发明人： Toralf Gruner ,  Manfred Maul ,  Rudolf Von Buenau

IPC分类号： G02B2714

CPC分类号： G03F7/70058 ,  G03F7/70225 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

摘要： A microlithographic illumination method for imaging a pattern arranged in an object plane of a projection lens onto an image plane of the projection lens, under which a special means for optically correcting the optical path lengths of s-polarized and p-polarized light such that light beams of both polarizations will either traverse essentially the same optical path length between the object plane and the image plane or any existing difference in their optical path lengths will be retained, largely independently of their angles of incidence on the image plane, which will allow avoiding contrast variations due to pattern orientation when imaging finely structured patterns, is disclosed. The contrast variations may be caused by uncorrected projection lenses due to their employment of materials that exhibit stress birefringence and/or coated optical components, such as deflecting mirrors, that are used at large angles of incidence.

摘要翻译： 一种用于将布置在投影透镜的物平面中的图案成像到投影透镜的图像平面上的微光刻照明方法，在该平面上用于光学校正s偏光和p偏振光的光路长度的特殊装置，使得光 两个极化的光束将在物平面和图像平面之间横穿基本上相同的光程长度，或者它们的光程长度中的任何存在的差异将被保留，这在很大程度上与其在图像平面上的入射角无关，这将允许避免 公开了当成像精细结构化图案时由于图案取向引起的对比度变化。 对比度变化可能由未矫正的投影透镜引起，因为它们使用呈现应力双折射的材料和/或以大的入射角度使用的涂覆的光学部件，例如偏转镜。

公开(公告)号：US10146137B2

公开(公告)日：2018-12-04

申请号：US13423344

申请日：2012-03-19

申请人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

发明人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

IPC分类号： G03F7/20 ,  G02B13/14 ,  G02B17/08

摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.