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公开(公告)号:US06729453B2
公开(公告)日:2004-05-04
申请号:US10282064
申请日:2002-10-29
申请人: Hiroshi Uehara
发明人: Hiroshi Uehara
IPC分类号: F16H4502
CPC分类号: F16H45/02 , F16H2045/021 , F16H2045/0278
摘要: A lockup device 1 is disposed inside a fluid chamber between a front cover 3 and a turbine 4 and provided with a clutch-purpose friction plate 12, a pair of drive the plates 13 and 14, a driven plate 15, and coil springs 16. The friction plate 12 can be coupled with the front cover 3. An extended part 18 extends from one of the plates 13 and 14 toward the other and engages with the inside circumferential edge of the friction plate 12 such that the friction plate cannot rotate but can move in the axial direction relative to the extended part. The driven plate 15 is fixed to the turbine 4. The coil springs 16 are compressed between pair of drive the plates 13 and 14 and the driven plate 15 when the pair of drive plates and the driven plate rotate relative to each other.
摘要翻译: 锁止装置1设置在前盖3和涡轮4之间的流体室内,并设置有离合器用摩擦板12,一对驱动板13和14,从动板15和螺旋弹簧16。 摩擦板12可与前盖3连接。延伸部分18从板13和14中的一个向另一个延伸并与摩擦板12的内圆周边缘接合,使得摩擦板不能转动 相对于延伸部在轴向上移动。 从动板15固定在涡轮机4上。当一对驱动板和从动板相对旋转时,螺旋弹簧16被压在一对驱动板13和14与从动板15之间。
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公开(公告)号:US06676525B2
公开(公告)日:2004-01-13
申请号:US10131021
申请日:2002-04-25
申请人: Hiroshi Uehara
发明人: Hiroshi Uehara
IPC分类号: F16D352
CPC分类号: F16F1/128 , F16D13/686 , F16F1/025 , F16F3/10 , F16F15/12326 , F16F15/127
摘要: A damper mechanism having preferable torsion characteristics that exhibit different characteristics on positive and negative sides by way of a simplified structure is provided. In the damper mechanism, a hub 6 is rotatable with respect to plates 12 and 13. Coil springs 33 are compressed on positive and negative sides of torsion characteristics. Elastic members 36 are arranged to operate in a rotating direction in parallel with the coil springs 33. The elastic members 36 are compressed on the positive side of the torsion characteristics, but are not compressed on the negative side of the torsion characteristics until a torsion angle exceeds a predetermined value. The elastic members 36 generate a frictional resistance when being compressed in the rotating direction, but no other friction generating mechanism is employed.
摘要翻译: 提供了一种通过简化的结构,具有在正侧和负侧具有不同特性的优选扭转特性的阻尼机构。 在阻尼机构中,毂6可相对于板12和13旋转。线圈弹簧33在扭转特性的正侧和负侧被压缩。 弹性构件36布置成与螺旋弹簧33平行地沿旋转方向操作。弹性构件36在扭转特性的正侧被压缩,但是在扭转特性的负侧不被压缩,直到扭转角 超过预定值。 弹性构件36在沿旋转方向被压缩时产生摩擦阻力,但不使用其它摩擦发生机构。
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公开(公告)号:US06461243B1
公开(公告)日:2002-10-08
申请号:US09610882
申请日:2000-07-06
申请人: Hiroshi Uehara
发明人: Hiroshi Uehara
IPC分类号: F16D312
CPC分类号: F16F15/12326
摘要: Coil spring assemblies 9 are provided for a damper mechanism of a clutch disk assembly 1 that has an increased life span. The clutch disk assembly 1 includes an input rotary member 2, an output rotary member 3 and an elastic coupling portion 4. The elastic coupling portion 4 includes a plurality of the coil spring assemblies 9. The input rotary member 2 basically includes a clutch disk 11, a clutch plate 12 and a retaining plate 13. The output rotary member 3 basically includes a hub flange 6, a hub 7 and a low-rigidity damper 8. The coil spring assemblies 9 are configured to elastically couple plates 12 and 13 to the hub flange 6 in the rotating direction. Each coil spring assembly 9 includes a coil spring 41 and a pair of spring seats 42 and 43. The spring seats 42 and 43 are engaged with the wire end surfaces of the coil spring 41, respectively, such that the coil spring 41 cannot rotate around its central axis P—P. The coil spring assembly 9 is engaged with the plates 12 and 13 and the hub flange 6 such that the coil spring assembly 9 cannot rotate around the central axis P—P of the coil spring 41.
摘要翻译: 线圈弹簧组件9设置为具有增加的寿命的离合器盘组件1的阻尼机构。 离合器盘组件1包括输入旋转构件2,输出旋转构件3和弹性联接部分4.弹性联接部分4包括多个螺旋弹簧组件9.输入旋转构件2基本上包括离合器盘11 ,离合器板12和保持板13.输出旋转构件3基本上包括轮毂凸缘6,轮毂7和低刚性阻尼器8.螺旋弹簧组件9构造成将板12和13弹性地连接到 轮毂法兰6沿旋转方向。 每个螺旋弹簧组件9包括螺旋弹簧41和一对弹簧座42和43.弹簧座42和43分别与螺旋弹簧41的线端表面接合,使得螺旋弹簧41不能围绕 其中心轴PP。 螺旋弹簧组件9与板12和13以及轮毂凸缘6接合,使得螺旋弹簧组件9不能围绕螺旋弹簧41的中心轴线P-P旋转。
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公开(公告)号:US06304151B1
公开(公告)日:2001-10-16
申请号:US09651026
申请日:2000-08-30
申请人: Hiroshi Uehara , Toshikatsu Makuta , Seiji Oda , Tatsunobu Shibuya , Susumu Negishi , Xinglong Gong
发明人: Hiroshi Uehara , Toshikatsu Makuta , Seiji Oda , Tatsunobu Shibuya , Susumu Negishi , Xinglong Gong
IPC分类号: H03B104
CPC分类号: H03B5/32 , H01L2224/05568 , H01L2224/05573 , H01L2224/16225 , H01L2924/00014 , H01L2224/05599
摘要: There is provided a crystal oscillator including a vessel main body having a concave portion, a cover bonded to the vessel main body so as to form an encapsulated vessel together with the vessel main body, a crystal blank held within the vessel, an IC (integrated circuit) chip containing an oscillating circuit utilizing the crystal blank and having a plurality of IC terminals on a major surface thereof, a plurality of circuit terminals formed on a bottom surface of the concave portion of the vessel main body at positions corresponding to the positions of the IC terminals, respectively. The IC chip is fixed to the bottom surface of the concave portion of the vessel main body by effecting face down bonding so that the IC terminals are bonded to the circuit terminals through bumps. At least one of the IC terminals is a group-arranged terminal including a plurality of unit terminals commonly connected to one another, and the plurality of unit terminals are s connected to corresponding circuit terminals through respective bumps.
摘要翻译: 提供了一种晶体振荡器,其包括具有凹部的容器主体,与容器主体结合以形成与容器主体一起形成密封容器的盖,保持在容器内的晶体坯,IC(集成 电路)芯片,其包含利用晶体坯料的振荡电路,并且在其主表面上具有多个IC端子,多个电路端子形成在容器主体的凹部的底表面上的位置处 IC终端。 通过进行面朝下的接合,将IC芯片固定在容器主体的凹部的底面,使得IC端子通过凸块接合到电路端子。 IC端子中的至少一个是包括共同连接的多个单元端子的组排列端子,并且多个单元端子通过相应的凸块连接到相应的电路端子。
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公开(公告)号:US06283060B1
公开(公告)日:2001-09-04
申请号:US09069942
申请日:1998-04-30
申请人: Shunpei Yamazaki , Toru Takayama , Mitsunori Sakama , Hisashi Abe , Hiroshi Uehara , Mika Ishiwata
发明人: Shunpei Yamazaki , Toru Takayama , Mitsunori Sakama , Hisashi Abe , Hiroshi Uehara , Mika Ishiwata
IPC分类号: C23C16509
CPC分类号: H01J37/32477 , C23C16/4401 , C23C16/5096 , Y10S438/905
摘要: In a plasma CVD apparatus, unnecessary discharge such as arc discharge is prevented, the amount of particles due to peeling of films attached to a reaction chamber is reduced, and the percentage of a time contributing to production in hours of operation of the apparatus is increased while enlargement of the apparatus and easy workability are maintained. The plasma CVD apparatus is configured such that in a conductive reaction chamber 104 with a power source 113, a vacuum exhausting means 118, and a reaction gas introduction pipe 114, plasma 115 is generated in a space surrounded by an electrode 111, a substrate holder 112, and an insulator 120.
摘要翻译: 在等离子体CVD装置中,防止了不必要的放电,例如电弧放电,由于附着在反应室上的膜的剥离引起的颗粒的量减少,并且在该设备的工作时间内有助于生产的时间的百分比增加 同时保持设备的扩大和易于加工的性能。 等离子体CVD装置被构造成使得在具有电源113,真空排气装置118和反应气体引入管114的导电反应室104中,在由电极111围绕的空间中产生等离子体115,衬底保持器 112和绝缘体120。
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116.
公开(公告)号:US5866932A
公开(公告)日:1999-02-02
申请号:US734127
申请日:1996-10-21
IPC分类号: H01L21/316 , H01L27/01 , H01L29/76 , H01L29/94 , H01L31/062
CPC分类号: H01L21/02131 , H01L21/02126 , H01L21/02205 , H01L21/02216 , H01L21/02274 , H01L21/31612 , H01L21/31629
摘要: A silicon oxide film is formed to cover an island non-monocrystalline silicon region by plasma CVD using an organic silane having ethoxy groups (e.g., TEOS) and oxygen as raw materials, while hydrogen chloride or a chlorine-containing hydrocarbon (e.g., trichloroethylene) of a fluorine-containing gas is added to the plasma CVD atmosphere, preferably in an amount of from 0.01 to 1 mol % of the atmosphere so as to reduce the alkali elements from the silicon oxide film formed and to improve the reliability of the film. Prior to forming the silicon oxide film, the silicon region may be treated in a plasma atmosphere containing oxygen and hydrogen chloride or a chlorine-containing hydrocarbon. The silicon oxide film is obtained at low temperatures and this has high reliability usable as a gate-insulating film in a semiconductor device.
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公开(公告)号:US5837614A
公开(公告)日:1998-11-17
申请号:US781930
申请日:1997-01-07
IPC分类号: H01L21/316 , H01L21/31
CPC分类号: H01L21/02131 , H01L21/02126 , H01L21/02205 , H01L21/02216 , H01L21/02274 , H01L21/31612 , H01L21/31629
摘要: A silicon oxide film is formed to cover an island non-monocrystalline silicon region by plasma CVD using an organic silane having ethoxy groups (e.g., TEOS) and oxygen as raw materials, while hydrogen chloride or a chlorine-containing hydrocarbon (e.g., trichloroethylene) of a fluorine-containing gas is added to the plasma CVD atmosphere, preferably in an amount of from 0.01 to 1 mol % of the atmosphere so as to reduce the alkali elements from the silicon oxide film formed and to improve the reliability of the film. Prior to forming the silicon oxide film, the silicon region may be treated in a plasma atmosphere containing oxygen and hydrogen chloride or a chlorine-containing hydrocarbon. The silicon oxide film is obtained at low temperatures and this has high reliability usable as a gate-insulating film in a semiconductor device.
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公开(公告)号:US5690208A
公开(公告)日:1997-11-25
申请号:US777869
申请日:1996-12-31
申请人: Hiroshi Uehara
发明人: Hiroshi Uehara
IPC分类号: F16F15/123 , F16D13/64 , F16D3/14 , F16D3/66
CPC分类号: F16F15/123
摘要: A clutch disc assembly 1 includes a first disc member 2, second disc members 3, coil springs 11, a first coupling mechanism 4, a second coupling member 7 and a spline hub 6. The second disc members 3 are placed on sides of the first disc member 2, and they are provided in inner circumferential portions with spline teeth 3a laterally protruding. Coil springs 11 are disposed between the first disc member 2 and the second disc members 3 in circumferential directions so as to be elastically deformed. The spline hub 6 is provided in its outer circumference with outside spline teeth 6a which mesh with the spline teeth 3a. The second coupling member 7 includes a third friction washer 21 and a spring 20. The third friction washer 21 frictionally slides on one of the spline hub 6 and the second disc members 3. The spring 20 is placed between the spline hub 6 and the second disc members 3 so as to be elastically deformed and urges the third friction washer 21 against the adjacent second disc member 3.
摘要翻译: 离合器盘组件1包括第一盘构件2,第二盘构件3,螺旋弹簧11,第一联接机构4,第二联接构件7和花键轮毂6.第二盘构件3设置在第一 盘构件2,并且它们设置在内圆周部分中,花键齿3a横向突出。 线圈弹簧11沿圆周方向设置在第一盘构件2和第二盘构件3之间以便弹性变形。 花键轮毂6在其外周设置有与花键齿3a啮合的外花键齿6a。 第二联接构件7包括第三摩擦垫圈21和弹簧20.第三摩擦垫圈21在花键轮毂6和第二盘构件3中的一个上摩擦滑动。弹簧20设置在花键轮毂6和第二轮毂6之间。 盘构件3以便弹性变形并将第三摩擦垫圈21推靠在相邻的第二盘构件3上。
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公开(公告)号:US5400887A
公开(公告)日:1995-03-28
申请号:US103455
申请日:1993-08-06
申请人: Hiroshi Mizukami , Hiroshi Uehara , Shinichi Okada
发明人: Hiroshi Mizukami , Hiroshi Uehara , Shinichi Okada
CPC分类号: F16D13/58 , F16D13/585 , F16D13/71
摘要: The clutch cover assembly comprises a clutch cover, a pressure plate, a washer-type spring and a lever member. The clutch cover is fixed to a flywheel. The pressure plate is located within said clutch cover and is fashioned with a pressing surface for clamping facings against the flywheel. The washer-type spring engages the pressure plate to the flywheel. The lever member, supported by the clutch cover, is for engaging the pressure plate in combination with the washer-type spring to the flywheel and for releasing engaging loads of the washer-type spring from the pressure plate.
摘要翻译: 离合器盖组件包括离合器盖,压板,垫圈型弹簧和杠杆构件。 离合器盖固定在飞轮上。 压板位于所述离合器盖内,并且具有用于将面板夹紧在飞轮上的按压表面。 垫圈型弹簧将压板接合到飞轮。 由离合器盖支撑的杆构件用于将压板与垫圈型弹簧组合接合到飞轮上,并用于从压板释放垫圈型弹簧的接合载荷。
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公开(公告)号:US5265709A
公开(公告)日:1993-11-30
申请号:US849041
申请日:1992-04-24
申请人: Hiroshi Takeuchi , Hiroshi Uehara
发明人: Hiroshi Takeuchi , Hiroshi Uehara
CPC分类号: F16D13/585
摘要: In a pull-type clutch, a holder (10) is installed in an inner face of a clutch cover (4), which includes a diaphragm spring support supporting an outside fulcrum point (C1) of a diaphragm spring (5) and a coned spring support supporting an outer peripheral edge of a disc-like annular coned spring (8). The diaphragm spring (5) and the coned spring (8) are supported by the holder (10). By this structure, a load of the diaphragm spring (5) can be prevented from increasing more than necessary in the midway of use of clutch, and the coned spring (8) provided therefor can be assembled easily.
摘要翻译: PCT No.PCT / JP91 / 01260 Sec。 371日期:1992年4月24日 102(e)日期1992年4月24日PCT 1991年9月20日PCT公布。 出版物WO92 / 06312 日期:1992年4月16日。在拉式离合器中,保持器(10)安装在离合器盖(4)的内表面中,其包括支撑隔膜的外侧支点(C1)的膜片弹簧支撑件 弹簧(5)和支撑盘形环形锥形弹簧(8)的外周边缘的锥形弹簧支撑件。 膜片弹簧(5)和锥形弹簧(8)由保持器(10)支撑。 通过这种结构,可以防止隔膜弹簧(5)的负载在离合器的使用中途增加到超过必要的程度,并且可以容易地组装用于其的锥形弹簧(8)。
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