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    DUAL FOCUS SOLUTON FOR SEM METROLOGY TOOLS
    123.
    发明公开
    DUAL FOCUS SOLUTON FOR SEM METROLOGY TOOLS 审中-公开

    公开(公告)号：US20240071713A1

    公开(公告)日：2024-02-29

    申请号：US18270707

    申请日：2021-12-09

    Applicant: ASML Netherlands B.V.

    Inventor： Niels Johannes Maria BOSCH ,  Xu WANG ,  Peter Paul HEMPENIUS ,  Yongqiang WANG ,  Hans BUTLER ,  Youjin WANG ,  Jasper Hendrik GRASMAN ,  Jianzi SUI ,  Tianming CHEN ,  Aimin WU

    IPC: H01J37/20

    CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/20235

    Abstract: There is provided a charged particle apparatus comprising: a particle beam generator, optics, a first and a second positioning device, both configured for positioning the substrate relative to the particle beam generator along its optical axis, and a controller configured for switching between a first operational mode and a second operational mode. The apparatus is configured, when operating in the first operational mode, for irradiating the substrate by the particle beam at a first landing energy of the particle beam and, when operating in the second operational mode, for irradiating the substrate at a second, different landing energy. When operating in the first operational mode, the second positioning device is configured to position the substrate relative to the particle beam generator at a first focus position of the particle beam and in the second operational mode, to position the substrate at a second, different focus position.

    TRAINING MACHINE LEARNING MODELS BASED ON PARTIAL DATASETS FOR DEFECT LOCATION IDENTIFICATION
    124.
    发明公开
    TRAINING MACHINE LEARNING MODELS BASED ON PARTIAL DATASETS FOR DEFECT LOCATION IDENTIFICATION 审中-公开

    公开(公告)号：US20240069450A1

    公开(公告)日：2024-02-29

    申请号：US18267734

    申请日：2021-12-08

    Applicant: ASML Netherlands B.V.

    Inventor： Nabeel Noor MOIN ,  Chenxi LIN ,  Yi ZOU

    IPC: G03F7/00 ,  G06N20/20

    CPC classification number: G03F7/7065 ,  G03F7/706841 ,  G06N20/20

    Abstract: A method and apparatus for training a defect location prediction model to predict a defect for a substrate location is disclosed. A number of datasets having data regarding process-related parameters for each location on a set of substrates is received. Some of the locations have partial datasets in which data regarding one or more process-related parameters is absent. The datasets are processed to generate multiple parameter groups having data for different sets of process-related parameters. For each parameter group, a sub-model of the defect location prediction model is created based on the corresponding set of process-related parameters and trained using data from the parameter group. A trained sub-model(s) may be selected based on process-related parameters available in a candidate dataset and a defect prediction may be generated for a location associated with the candidate dataset using the selected sub-model.

    Enrichment and radioisotope production
    128.
    发明授权
    Enrichment and radioisotope production 有权

    公开(公告)号：US11908591B2

    公开(公告)日：2024-02-20

    申请号：US17283823

    申请日：2019-09-13

    Applicant: ASML Netherlands B.V.

    Inventor： Pieter Willem Herman De Jager ,  Antonius Theodorus Anna Maria Derksen

    IPC: G21G1/12 ,  B01D59/48

    CPC classification number: G21G1/12 ,  B01D59/48

    Abstract: A combined enrichment and radioisotope production apparatus comprising an electron source arranged to provide an electron beam, the electron source comprising an electron injector and an accelerator, an undulator configured to generate a radiation beam using the electron beam, a molecular stream generator configured to provide a stream of molecules which is intersected by the radiation beam, a receptacle configured to receive molecules or ions selectively received from the stream of molecules, and a target support structure configured to hold a target upon which the electron beam is incident in use.

    DUAL-USE READ-OUT CIRCUITRY IN CHARGED PARTICLE DETECTION SYSTEM
    129.
    发明公开
    DUAL-USE READ-OUT CIRCUITRY IN CHARGED PARTICLE DETECTION SYSTEM 审中-公开

    公开(公告)号：US20240055221A1

    公开(公告)日：2024-02-15

    申请号：US18257736

    申请日：2021-12-13

    Applicant: ASML Netherlands B.V.

    Inventor： Jan Louis SUNDERMEYER ,  Leonhard Martin KLEIN ,  Matthias OBERST ,  Harald Gert Helmut NEUBAUER

    IPC: H01J37/244

    CPC classification number: H01J37/244 ,  H01J2237/24495

    Abstract: An improved readout circuit for a charged particle detector and a method for operating the readout circuit are disclosed. An improved circuit comprises an amplifier configured to receive a signal representing an output of a sensor layer and comprising a first input terminal and an output terminal, a capacitor connected between the first input terminal and the output terminal, and a resistor connected in parallel with the capacitor between the first input terminal and the output terminal. The circuit can be configured to operate in a first mode and a second mode. The capacitor can be adjustable using a capacitance value of the capacitor to enable control of a gain of the circuit operating in the first mode and control of a bandwidth of the circuit operating in the second mode.

    MONOLITHIC DETECTOR
    130.
    发明公开
    MONOLITHIC DETECTOR 审中-公开

    公开(公告)号：US20240047173A1

    公开(公告)日：2024-02-08

    申请号：US18258522

    申请日：2021-12-10

    Applicant: ASML Netherlands B.V.

    Inventor： Matthias OBERST ,  Harald Gert Helmut NEUBAUER ,  Thomas SCHWEIGER

    IPC: H01J37/244

    CPC classification number: H01J37/244 ,  H01J2237/2441 ,  H01J2237/24495 ,  H01J2237/2446

    Abstract: A monolithic detector may be used in a charged particle beam apparatus. The detector may include a plurality of sensing elements formed on a first side of a semiconductor substrate, each of the sensing elements configured to receive charged particles emitted from a sample and to generate carriers in proportion to a first property of a received charged particle, and a plurality of signal processing components formed on a second side of the semiconductor substrate, the plurality of signal processing components being part of a system configured to determine a value that represents a second property of the received charged particle. The substrate may have a thickness in a range from about 10 to 30 μm. The substrate may include a region configured to insulate the plurality of sensing elements formed on the first side from the plurality of signal processing components formed on the second side.

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