公开(公告)号：US09411656B2

公开(公告)日：2016-08-09

申请号：US12489366

申请日：2009-06-22

Applicant: Avinash Jindal ,  Deepak Bansal ,  Sam Htin Moy ,  David Cheung ,  Bing Wang ,  Mani Kancherla ,  Sridhar Devarapalli

Inventor： Avinash Jindal ,  Deepak Bansal ,  Sam Htin Moy ,  David Cheung ,  Bing Wang ,  Mani Kancherla ,  Sridhar Devarapalli

IPC: G06F15/173 ,  G06F9/50

CPC classification number: G06F9/5083

Abstract: A network device includes a plurality of blades, each having a plurality of CPU cores that process requests received by the network device. Each blade further includes an accumulator circuit. Each accumulator circuit periodically aggregates the local counter values of the CPU cores of the corresponding blade. One accumulator circuit is designated as a master, and the other accumulator circuit(s) are designated as slave(s). The slave accumulator circuits transmit their aggregated local counter values to the master accumulator circuit. The master accumulator circuit aggregates the sets of aggregated local counter values to create a set of global counter values. The master accumulator circuit transmits the global counter values to a management processor (for display), to the CPU cores located on its corresponding blade, and to each of the slave accumulator circuits. Each slave accumulator circuit then transmits the global counter values to the CPU cores located on its corresponding blade.

Abstract translation: 网络设备包括多个刀片，每个刀片具有处理由网络设备接收的请求的多个CPU内核。 每个叶片还包括一个蓄电池电路。 每个累加器电路周期性地聚集相应刀片的CPU内核的本地计数器值。 一个累加器电路被指定为主机，另一个累加器电路被指定为从机。 从累加器电路将其聚合的本地计数器值发送到主累加器电路。 主累加器电路聚合本地计数器值集合以创建一组全局计数器值。 主累加器电路将全局计数器值发送到管理处理器（用于显示），发送到位于其相应刀片上的CPU核心以及从属累加器电路中的每一个。 然后，每个从属累加器电路将全局计数器值发送到位于其相应刀片上的CPU核心。

公开(公告)号：US09202059B2

公开(公告)日：2015-12-01

申请号：US13410282

申请日：2012-03-01

Applicant: Apurva M. Bhansali ,  Mehul R. Patel ,  Kamal M. Dhanani ,  Rajnish S. Chauhan ,  David Cheung

Inventor： Apurva M. Bhansali ,  Mehul R. Patel ,  Kamal M. Dhanani ,  Rajnish S. Chauhan ,  David Cheung

IPC: G06F21/00 ,  G06F21/57

CPC classification number: G06F21/602 ,  G06F9/4406 ,  G06F21/31 ,  G06F21/575 ,  G06F2221/033

Abstract: A system for use with a computer is provided, the computer including a self-encrypting drive (SED), the SED including a nominal space and a pre-boot region, wherein the nominal space can be locked to prevent access to the nominal space. The system includes SED management software configured to be loaded in the pre-boot region of the SED. The SED management software includes a pre-boot operating system (OS) and an unlocking program. The unlocking program is configured (a) to execute within the pre-boot OS, and (b) upon successful authentication of a user, to unlock the nominal space of the SED. Other embodiments are described and claimed.

Abstract translation: 提供了一种与计算机一起使用的系统，所述计算机包括自加密驱动器（SED），所述SED包括标称空间和预引导区域，其中所述标称空间可被锁定以防止访问所述标称空间。 该系统包括配置为加载到SED的预引导区域的SED管理软件。 SED管理软件包括一个预引导操作系统（OS）和一个解锁程序。 解锁程序被配置为（a）在预引导OS内执行，以及（b）成功认证用户后，解锁SED的标称空间。 描述和要求保护其他实施例。

公开(公告)号：US08721797B2

公开(公告)日：2014-05-13

申请号：US12963503

申请日：2010-12-08

Applicant: David Cheung ,  Haoquan Fang ,  Jack Kuo ,  Ilia Kalinovski ,  Ted Li ,  Andrew Yao

Inventor： David Cheung ,  Haoquan Fang ,  Jack Kuo ,  Ilia Kalinovski ,  Ted Li ,  Andrew Yao

IPC: B08B7/00

CPC classification number: H01L21/31138 ,  H01J37/32357 ,  H01L21/02057

Abstract: Improved methods and apparatus for stripping photoresist and removing ion implant related residues from a work piece surface are provided. According to various embodiments, the workpiece is exposed to a passivation plasma, allowed to cool for a period of time, and then exposed to an oxygen-based or hydrogen-based plasma to remove the photoresist and ion implant related residues. Aspects of the invention include reducing silicon loss, leaving little or no residue while maintaining an acceptable strip rate. In certain embodiments, methods and apparatus remove photoresist material after high-dose ion implantation processes.

Abstract translation: 提供了用于剥离光致抗蚀剂和从工件表面去除离子注入相关残留物的改进的方法和设备。 根据各种实施例，工件暴露于钝化等离子体，允许冷却一段时间，然后暴露于氧基或氢基等离子体以除去光致抗蚀剂和与离子注入相关的残余物。 本发明的方面包括减少硅损失，留下很少或没有残留物，同时保持可接受的剥离速率。 在某些实施方案中，方法和装置在高剂量离子注入工艺之后去除光致抗蚀剂材料。

公开(公告)号：USD698913S1

公开(公告)日：2014-02-04

申请号：US29464172

申请日：2013-08-13

Applicant: David Cheung

Designer： David Cheung

公开(公告)号：US08625977B2

公开(公告)日：2014-01-07

申请号：US13750054

申请日：2013-01-25

Applicant: David Cheung

Inventor： David Cheung

IPC: A61H33/06

CPC classification number: A61L9/03 ,  A61L9/037 ,  A61L9/14

Abstract: A fragrance emitting apparatus includes a casing having an interior region, a USB connector attached to the casing and configured for connection to a USB port, and a heating element positioned in the interior region of the casing and electrically connected to the USB connector. The heating element generates heat when the USB connector is connected to a USB port. The fragrance emitting apparatus includes a fragrance cartridge slidably and removably attached to the casing. The fragrance cartridge has a fragrance member that provides a fragrance, scent or aroma when the fragrance member is heated. The fragrance member is positioned near the heating element when the fragrance cartridge is slidably attached to the casing.

Abstract translation: 香料发光装置包括具有内部区域的壳体，附接到壳体并被配置为连接到USB端口的USB连接器，以及定位在壳体的内部区域中并电连接到USB连接器的加热元件。 当USB连接器连接到USB端口时，加热元件会发热。 香味发射装置包括可滑动和可移除地附接到壳体的香味盒。 香味盒具有香味成分，当香料成分被加热时，香气成分提供香味，气味或香气。 当香料盒可滑动地附接到壳体时，香料构件定位在加热元件附近。

公开(公告)号：US08591661B2

公开(公告)日：2013-11-26

申请号：US12636601

申请日：2009-12-11

Applicant: David Cheung ,  Ted Li ,  Anirban Guha ,  Kirk Ostrowski

Inventor： David Cheung ,  Ted Li ,  Anirban Guha ,  Kirk Ostrowski

IPC: B08B5/00

CPC classification number: H01L21/31058 ,  G03F7/427 ,  H01L21/67207

Abstract: Improved methods for stripping photoresist and removing etch-related residues from dielectric materials are provided. In one aspect of the invention, methods involve removing material from a dielectric layer using a hydrogen-based etch process employing a weak oxidizing agent and fluorine-containing compound. Substrate temperature is maintained at a level of about 160° C. or less, e.g., less than about 90° C.

Abstract translation: 提供了用于剥离光致抗蚀剂和从介电材料中去除蚀刻相关残留物的改进方法。 在本发明的一个方面，方法包括使用采用弱氧化剂和含氟化合物的氢基蚀刻方法从介电层去除材料。 底物温度保持在约160℃或更低，例如小于约90℃的水平。

公开(公告)号：US08353967B2

公开(公告)日：2013-01-15

申请号：US12853793

申请日：2010-08-10

Applicant: Jay Malmquist ,  David Cheung ,  William Knox

Inventor： Jay Malmquist ,  David Cheung ,  William Knox

IPC: A61F2/36

CPC classification number: A61F2/2846 ,  A61F2/2803 ,  A61F2002/30062 ,  A61F2002/30772 ,  A61F2002/30957 ,  A61F2210/0004 ,  A61F2310/00365

Abstract: A biocompatible, self-supporting, curved, collagen membrane adapted to be secured by bone tacks or bone screws over exposed bone at a desired bone graft site in the alveolar ridge of a patient such that the membrane defines a space having a predetermined height and width over the exposed bone, in which the membrane maintains its structural integrity for at least 4 months after implantation at the bone graft site and then naturally breaks down and is resorbed by the patient's body, a method of making such a membrane, and a method of using such a membrane for vertical augmentation of the alveolar ridge of the patient.

Abstract translation: 一种生物相容的，自支撑的，弯曲的胶原膜，其适于通过骨钉或骨螺钉固定在患者的肺泡脊中的期望的骨移植部位的暴露的骨上，使得膜限定具有预定高度和宽度的空间 在暴露的骨上，其中膜在植入后在骨移植部位保持其结构完整性至少4个月，然后自然分解并被患者的身体吸收，制备这种膜的方法和方法 使用这种膜来垂直增加患者的牙槽嵴。

公开(公告)号：US08335884B2

公开(公告)日：2012-12-18

申请号：US12501389

申请日：2009-07-10

Applicant: Mehrdad Hamadani ,  Deepak Bansal ,  Sam Htin Moy ,  Sreenivasulu Malli ,  David Cheung ,  Mani Kancherla ,  Sridhar Devarapalli

Inventor： Mehrdad Hamadani ,  Deepak Bansal ,  Sam Htin Moy ,  Sreenivasulu Malli ,  David Cheung ,  Mani Kancherla ,  Sridhar Devarapalli

IPC: G06F13/00

CPC classification number: G06F13/4022 ,  G06F2213/0026 ,  Y02D10/14 ,  Y02D10/151

Abstract: A multi-processor architecture for a network device that includes a plurality of barrel cards, each including: a plurality of processors, a PCIe switch coupled to each of the plurality of processors, and packet processing logic coupled to the PCIe switch. The PCIe switch on each barrel card provides high speed flexible data paths for the transmission of incoming/outgoing packets to/from the processors on the barrel card. An external PCIe switch is commonly coupled to the PCIe switches on the barrel cards, as well as to a management processor, thereby providing high speed connections between processors on separate barrel cards, and between the management processor and the processors on the barrel cards.

Abstract translation: 一种用于网络设备的多处理器架构，其包括多个桶卡，每个桶卡包括：多个处理器，耦合到所述多个处理器中的每一个的PCIe开关，以及耦合到所述PCIe开关的分组处理逻辑。 每个机架卡上的PCIe开关提供了高速灵活的数据路径，用于向/从桶卡上的处理器传输输入/输出分组。 外部PCIe交换机通常耦合到桶卡上的PCIe交换机以及管理处理器，从而在单独的桶卡上的处理器之间以及管理处理器和桶卡上的处理器之间提供高速连接。

公开(公告)号：US20120247674A1

公开(公告)日：2012-10-04

申请号：US13493655

申请日：2012-06-11

Applicant: James A. Fair ,  Vincent Decaux ,  Anirban Guha ,  David Cheung ,  John Keller ,  Peter Jagusch

Inventor： James A. Fair ,  Vincent Decaux ,  Anirban Guha ,  David Cheung ,  John Keller ,  Peter Jagusch

IPC: C23F1/08

CPC classification number: H01J37/32449 ,  H01J37/321 ,  H01J37/3244 ,  H01J37/32458 ,  H01J37/32467 ,  H01J37/32633 ,  H01J37/32651 ,  H01J2237/335

Abstract: Embodiments of a plasma generator apparatus for ashing a work piece are provided. The apparatus includes a container adapted for continuous gas flow there through from an inlet end to an outlet end thereof. The container is fabricated of a dielectric material and adapted for ionization therein of a portion of at least one component of gas flowing therethrough. A gas flow distributor is configured to direct gas flow to a region within the container and a coil surrounds at least a portion of side walls of the container adjacent the region of the container to which the gas flow distributor directs gas flow. A radio frequency generator is coupled to the coil.

Abstract translation: 提供了用于灰化工件的等离子体发生器装置的实施例。 该装置包括适于在其中从其入口端到其出口端的连续气体流动的容器。 容器由电介质材料制成并且适于其中流过其中的至少一种气体成分的一部分进行电离。 气流分配器构造成将气流引导到容器内的区域，并且线圈围绕容器的与气流分配器引导气体流动的区域相邻的容器侧壁的至少一部分。 射频发生器耦合到线圈。

公开(公告)号：US08110068B2

公开(公告)日：2012-02-07

申请号：US12052401

申请日：2008-03-20

Applicant: Huatan Qiu ,  Woody Chung ,  Anirban Guha ,  David Cheung

Inventor： Huatan Qiu ,  Woody Chung ,  Anirban Guha ,  David Cheung

IPC: H01L21/3065 ,  C23C16/00 ,  C23C16/455

CPC classification number: H01J37/3244 ,  C23C16/45519 ,  H01J37/32449 ,  H01L21/31138

Abstract: Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.

Abstract translation: 提供了用于等离子体剥离的系统，系统组件和方法。 在一个实施例中，气流分配容座可以具有圆形部分，该圆形部分包括限定接收腔的内表面，形成封闭端的外表面和外表面上的中心点，其具有延伸穿过其中的纵向轴线并且通过接收腔 。 第一和第二开口环提供与等离子体室的流动连通。 所述第二开口环设置在所述第一环和所述中心点之间，并且所述第二开口环的每个开口在所述内表面和所述外表面之间以相对于所述纵向轴线的第二角度延伸，所述纵向轴线小于所述第一角度并具有 直径基本上与相邻开口的直径相同，并且小于第一开口环的开口的直径。