公开(公告)号：US07613538B2

公开(公告)日：2009-11-03

申请号：US11492365

申请日：2006-07-24

申请人： Wei Wu ,  Duncan Stewart ,  Shih-Yuan Wang ,  R. Stanley Williams

发明人： Wei Wu ,  Duncan Stewart ,  Shih-Yuan Wang ,  R. Stanley Williams

IPC分类号： G06F19/00 ,  G06F7/00 ,  G01R23/20 ,  H03K4/90 ,  G21K5/00 ,  G02F1/1335

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A method of contact lithography includes predicting distortions likely to occur in transferring a pattern from a mold to a substrate during a contact lithography process; and modifying the mold to compensate for the distortions. A contact lithography system includes a design subsystem configured to generate data describing a lithography pattern; an analysis subsystem configured to identify one or more distortions likely to occur when using a mold created from the data; and a mold modification subsystem configured to modify the data to compensate for the one or more distortions identified by the analysis subsystem.

摘要翻译： 接触光刻的方法包括预测在接触光刻工艺期间将图案从模具转移到衬底可能发生的变形; 并修改模具以补偿失真。 接触光刻系统包括设计子系统，被配置为产生描述光刻图案的数据; 分析子系统被配置为识别当使用从数据创建的模具时可能发生的一个或多个失真; 以及模具修改子系统，被配置为修改数据以补偿由分析子系统识别的一个或多个失真。

公开(公告)号：US07612882B2

公开(公告)日：2009-11-03

申请号：US11584461

申请日：2006-10-20

申请人： Wei Wu ,  Warren Robinett ,  Shih-Yuan Wang ,  Jun Gao ,  Zhaoning Yu

发明人： Wei Wu ,  Warren Robinett ,  Shih-Yuan Wang ,  Jun Gao ,  Zhaoning Yu

IPC分类号： G01B11/00 ,  G01B11/14

CPC分类号： G03F9/7049 ,  G03F9/7003

摘要： Lithography tools and substrates are aligned by generating geometric interference patterns using optical gratings associated with the lithography tools and substrates. In some embodiments, the relative position between a substrate and lithography tool is adjusted to cause at least one geometric shape to have a predetermined size or shape representing acceptable alignment. In additional embodiments, Moiré patterns that exhibit varying sensitivity are used to align substrates and lithography tools. Furthermore, lithography tools and substrates are aligned by causing radiation to interact with optical gratings positioned between the lithography tools and substrates. Lithography tools include an optical grating configured to generate a portion of an interference pattern that exhibits a sensitivity that increases as the relative position between the tools and a substrate moves towards a predetermined alignment position.

摘要翻译： 通过使用与光刻工具和衬底相关的光栅产生几何干涉图案来对准平版印刷工具和衬底。 在一些实施例中，调整衬底和光刻工具之间的相对位置以使得至少一个几何形状具有表示可接受对准的预定尺寸或形状。 在另外的实施例中，使用呈现不同灵敏度的莫尔图案来对准衬底和光刻工具。 此外，光刻工具和衬底通过使辐射与位于光刻工具和衬底之间的光栅相互作用来对准。 平版印刷工具包括光栅，其被配置为产生表现出灵敏度的一部分干涉图案，该灵敏度随着工具和基板之间的相对位置朝向预定对准位置移动而增加。

公开(公告)号：US07609377B2

公开(公告)日：2009-10-27

申请号：US11796455

申请日：2007-04-26

申请人： Wei Wu ,  Zhiyong Li ,  Shih-Yuan Wang ,  Zhaoning Yu ,  R. Stanley Williams

发明人： Wei Wu ,  Zhiyong Li ,  Shih-Yuan Wang ,  Zhaoning Yu ,  R. Stanley Williams

IPC分类号： G01J3/44

CPC分类号： G01N21/658

摘要： An apparatus and related methods for facilitating surface-enhanced Raman spectroscopy (SERS) is described. A SERS-active structure near which a plurality of analyte molecules is disposed is periodically deformed at an actuation frequency. A synchronous measuring device synchronized with the actuation frequency receives Raman radiation scattered from the analyte molecules and generates therefrom at least one Raman signal measurement.

摘要翻译： 描述了用于促进表面增强拉曼光谱（SERS）的装置和相关方法。 多个分析物分子附近的SERS-活性结构以致动频率周期性地变形。 与致动频率同步的同步测量装置接收从分析物分子散射的拉曼辐射，并由此产生至少一个拉曼信号测量。

公开(公告)号：US20090027763A1

公开(公告)日：2009-01-29

申请号：US11881076

申请日：2007-07-24

申请人： Wenhua Zhang ,  Wei Wu ,  Shih-Yuan Wang

发明人： Wenhua Zhang ,  Wei Wu ,  Shih-Yuan Wang

IPC分类号： G02F1/29 ,  H01L41/09 ,  H01L41/22

CPC分类号： G02B26/0841 ,  B81B3/0054 ,  B81B2203/0118

摘要： A microelectromechanical systems (MEMS) device and related methods are described. The MEMS device comprises a first member having a first surface and a second member having a second surface, the first and second surfaces being separated by a gap that is closable by a MEMS actuation force applied to at least one of the first and second members. A standoff layer is disposed on the first surface of the first member, the standoff layer providing standoff between the first and second surfaces upon a closing of the gap by the MEMS actuation force. The standoff layer comprises a plurality of nanowires that are anchored to the first surface of the first member and that extend outward therefrom.

摘要翻译： 描述了微机电系统（MEMS）装置及相关方法。 MEMS装置包括具有第一表面的第一构件和具有第二表面的第二构件，第一和第二表面被可由施加到第一和第二构件中的至少一个的MEMS致动力封闭的间隙分开。 隔离层设置在第一构件的第一表面上，间隔层通过MEMS致动力在间隙闭合时在第一和第二表面之间提供间隔。 隔离层包括锚定到第一构件的第一表面并从其向外延伸的多个纳米线。

公开(公告)号：US20090022448A1

公开(公告)日：2009-01-22

申请号：US11879242

申请日：2007-07-16

申请人： Wei Wu ,  David Fattal ,  Charles Santori ,  Robert N. Bicknell ,  Shih-Yuan Wang ,  R. Stanley Williams ,  Nathaniel J. Quitoriano

发明人： Wei Wu ,  David Fattal ,  Charles Santori ,  Robert N. Bicknell ,  Shih-Yuan Wang ,  R. Stanley Williams ,  Nathaniel J. Quitoriano

IPC分类号： G02F1/295 ,  G02B6/34

CPC分类号： G02B6/12007 ,  G02B6/124 ,  G02F1/0126 ,  G02F1/3515 ,  G02F2201/307

摘要： Optical devices including waveguide grating structures are described. In accordance with one embodiment, an optical device is provided comprising a horizontal waveguide grating structure having at least one waveguiding layer and at least one subwavelength periodic grating layer. The optical device further comprises upper and lower cladding layers immediately adjoining respective upper and lower surfaces of the waveguide grating structure and having refractive indices lower than a lowest-index one of the waveguiding layers, incident radiation propagating through one of the upper and lower cladding layers toward the waveguide grating structure. The waveguide grating structure is configured for peak reflection of the incident radiation at a peak reflection frequency. A cumulative thickness of the waveguiding layers is less than one tenth of a free space wavelength of the incident radiation at the peak reflection frequency divided by an average refractive index of the waveguiding layers.

公开(公告)号：US07474396B2

公开(公告)日：2009-01-06

申请号：US11257073

申请日：2006-01-17

申请人： Wei Wu ,  Zhiyong Li ,  Shih-Yuan Wang

发明人： Wei Wu ,  Zhiyong Li ,  Shih-Yuan Wang

IPC分类号： G01J3/44 ,  G01J3/00

CPC分类号： G01J3/44 ,  G01J3/02 ,  G01J3/0227 ,  G01J3/0256 ,  G01J3/18 ,  G01N21/65 ,  G01N21/658 ,  G02B5/1809

摘要： A Raman spectroscopy system is disclosed which includes a sub-wavelength resonant grating filter and a photodiode with integrated sub-wavelength resonant grating filter are disclosed. The resonant grating filter comprises an array of diffraction elements having a periodic spacing that is less than the wavelength of radiation to be filtered and which are formed over a waveguide layer. The filter, which can reject a specific wavelength of radiation, can be placed between a Raman sample and a Raman detector in order to filter radiation that is elastically scattered from the sample while transmitting other wavelengths. The wavelength rejected by the filter can be selected by tilting the filter with respect to the radiation incident upon the filter.

摘要翻译： 公开了一种拉曼光谱系统，其包括亚波长谐振光栅滤光器和具有集成子波长谐振光栅滤光器的光电二极管。 谐振光栅滤波器包括衍射元件的阵列，其具有小于待滤波的辐射的波长并且在波导层上形成的周期性间隔。 可以将能够抑制特定波长的辐射的滤光器放置在拉曼样品和拉曼检测器之间，以便过滤从样品弹性散射的辐射，同时传输其他波长。 可以通过使过滤器相对于入射到过滤器上的辐射倾斜来选择由过滤器拒绝的波长。

公开(公告)号：US20080193359A1

公开(公告)日：2008-08-14

申请号：US11707601

申请日：2007-02-13

申请人： Zhaoning Yu ,  Zhiyong Li ,  Wei Wu ,  Shih-Yuan Wang ,  R. Stanley Williams

发明人： Zhaoning Yu ,  Zhiyong Li ,  Wei Wu ,  Shih-Yuan Wang ,  R. Stanley Williams

IPC分类号： C01B21/068

CPC分类号： C30B29/10 ,  C30B29/60

摘要： Various embodiments of the present invention are directed to methods of forming single-crystal metal-silicide nanowires and resulting nanowire structures. In one embodiment of the present invention, a method of fabricating nanowires is disclosed. In the method, a number of nanowire-precursor members are formed. Each of the nanowire-precursor members includes a substantially single-crystal silicon region and a polycrystalline- metallic region. The substantially single-crystal silicon region and the polycrystalline-metallic region of each of the nanowire-precursor members is reacted to form corresponding substantially single-crystal metal-silicide nanowires. In another embodiment of the present invention, a nanowire structure is disclosed. The nanowire structure includes a substrate having an electrically insulating layer. A number of substantially single-crystal metal-silicide nanowires are positioned on the electrically insulating layer.

摘要翻译： 本发明的各种实施方案涉及形成单晶金属硅化物纳米线和所得纳米线结构的方法。 在本发明的一个实施例中，公开了一种制造纳米线的方法。 在该方法中，形成许多纳米线前体部件。 每个纳米线前体构件包括大致单晶硅区域和多晶金属区域。 每个纳米线前体部件的大致单晶硅区域和多晶金属区域反应形成对应的基本单晶金属硅化物纳米线。 在本发明的另一个实施方案中，公开了一种纳米线结构。 纳米线结构包括具有电绝缘层的衬底。 大量单晶金属硅化物纳米线位于电绝缘层上。

公开(公告)号：US20080108000A1

公开(公告)日：2008-05-08

申请号：US11584320

申请日：2006-10-20

申请人： Wei Wu ,  Shih-Yuan Wang ,  Alexandre M. Bratkovski

发明人： Wei Wu ,  Shih-Yuan Wang ,  Alexandre M. Bratkovski

IPC分类号： G03C5/26

CPC分类号： G02B1/00 ,  B82Y20/00 ,  G02B1/007 ,  G02F2202/30 ,  H01Q15/0086

摘要： Materials and methods for fabricating and using negative index materials are disclosed. A negative index material comprises a three-dimensional volume including a bulk solution and a plurality of unit cells disposed in the bulk solution in a substantially random pattern. Each unit cell comprises a periodic hole array pattern on a substrate or a resonator formed on a first surface of a substrate, and a thin wire pattern formed on a second surface of the substrate. The combination of the unit cells in the bulk solution produces a negative effective permeability and a negative effective permittivity over a frequency band of interest for the three-dimensional volume. The negative index material may be used to focus radiation by directing an incident radiation at the negative index material and generating a focused radiation by a negative refraction of the incident radiation in the negative index material.

摘要翻译： 公开了制造和使用负指数材料的材料和方法。 负指数材料包括三维体积，其包括本体溶液和以大致随机图案设置在本体溶液中的多个单元电池。 每个单元电池包括在衬底上形成的周期性孔阵列图案或形成在衬底的第一表面上的谐振器，以及形成在衬底的第二表面上的细线图案。 本体溶液中的单元电池的组合在三维体积的感兴趣频带上产生负的有效磁导率和负的有效介电常数。 负折射率材料可以用于通过在负指数材料处引入入射辐射来聚焦辐射，并通过负指数材料中的入射辐射的负折射产生聚焦辐射。

公开(公告)号：US20080021587A1

公开(公告)日：2008-01-24

申请号：US11492365

申请日：2006-07-24

申请人： Wei Wu ,  Duncan Stewart ,  Shih-Yuan Wang ,  R. Stanley Williams

发明人： Wei Wu ,  Duncan Stewart ,  Shih-Yuan Wang ,  R. Stanley Williams

IPC分类号： G06F17/50 ,  G06F19/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A method of contact lithography includes predicting distortions likely to occur in transferring a pattern from a mold to a substrate during a contact lithography process; and modifying the mold to compensate for the distortions. A contact lithography system includes a design subsystem configured to generate data describing a lithography pattern; an analysis subsystem configured to identify one or more distortions likely to occur when using a mold created from the data; and a mold modification subsystem configured to modify the data to compensate for the one or more distortions identified by the analysis subsystem.

摘要翻译： 接触光刻的方法包括预测在接触光刻工艺期间将图案从模具转移到衬底可能发生的变形; 并修改模具以补偿失真。 接触光刻系统包括设计子系统，被配置为产生描述光刻图案的数据; 分析子系统被配置为识别当使用从数据创建的模具时可能发生的一个或多个失真; 以及模具修改子系统，被配置为修改数据以补偿由分析子系统识别的一个或多个失真。

公开(公告)号：US20070165214A1

公开(公告)日：2007-07-19

申请号：US11257073

申请日：2006-01-17

申请人： Wei Wu ,  Zhiyong Li ,  Shih-Yuan Wang

发明人： Wei Wu ,  Zhiyong Li ,  Shih-Yuan Wang

IPC分类号： G01J3/44 ,  G01N21/65

CPC分类号： G01J3/44 ,  G01J3/02 ,  G01J3/0227 ,  G01J3/0256 ,  G01J3/18 ,  G01N21/65 ,  G01N21/658 ,  G02B5/1809

摘要： A Raman spectroscopy system is disclosed which includes a sub-wavelength resonant grating filter and a photodiode with integrated sub-wavelength resonant grating filter are disclosed. The resonant grating filter comprises an array of diffraction elements having a periodic spacing that is less than the wavelength of radiation to be filtered and which are formed over a waveguide layer. The filter, which can reject a specific wavelength of radiation, can be placed between a Raman sample and a Raman detector in order to filter radiation that is elastically scattered from the sample while transmitting other wavelengths. The wavelength rejected by the filter can be selected by tilting the filter with respect to the radiation incident upon the filter.

摘要翻译： 公开了一种拉曼光谱系统，其包括亚波长谐振光栅滤波器和具有集成子波长谐振光栅滤波器的光电二极管。 谐振光栅滤波器包括衍射元件的阵列，其具有小于待滤波的辐射的波长并且在波导层上形成的周期间隔。 可以将能够抑制特定波长的辐射的滤光器放置在拉曼样品和拉曼检测器之间，以便过滤从样品弹性散射的辐射，同时传输其他波长。 可以通过使过滤器相对于入射到过滤器上的辐射倾斜来选择由过滤器拒绝的波长。