公开(公告)号：US5665133A

公开(公告)日：1997-09-09

申请号：US541467

申请日：1995-10-10

Applicant: Koichi Orii ,  Yukinobu Hara ,  Tomoyuki Akiyama ,  Koji Tsukuma ,  Yoshikazu Kikuchi

Inventor： Koichi Orii ,  Yukinobu Hara ,  Tomoyuki Akiyama ,  Koji Tsukuma ,  Yoshikazu Kikuchi

IPC: C03B8/00 ,  C03B19/06 ,  C03B20/00 ,  C03B32/02 ,  C03C3/06 ,  C03B19/00 ,  C03C15/00

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03B32/02 ,  C03B2201/03 ,  C03B2201/04 ,  C03C2201/23 ,  C03C2203/10

Abstract: Pure transparent quartz glass is provided by molding powdery amorphous silica into an article, converting the molded powdery amorphous silica into crystalline silica of high-temperature type cristobalite structure, and then fusing the crystalline silica, the quartz glass containing impurities respectively at a content of not higher than 1 ppm, and an OH group at a content of not higher than 20 ppm, and having a viscosity of 10.sup.12.0 poise or more at 1200.degree. C. The quartz glass is transparent and has high purity, and is excellent in high temperature viscosity characteristics. The quartz glass can be produced at a low cost.

Abstract translation: 通过将粉状无定形二氧化硅模制成制品，将成型的粉末状无定形二氧化硅转化为高温型方英石结构的结晶二氧化硅，然后将结晶二氧化硅，含有杂质的石英玻璃分别以不含量的含量 高于1ppm，OH基为20ppm以下，1200℃时粘度为1012.0泊以上。石英玻璃透明，纯度高，耐高温粘度优异 特点 石英玻璃可以低成本生产。

公开(公告)号：US5302556A

公开(公告)日：1994-04-12

申请号：US862799

申请日：1992-04-03

Applicant: Takaaki Shimizu ,  Masatoshi Takita

Inventor： Takaaki Shimizu ,  Masatoshi Takita

IPC: C03B8/02 ,  C03B19/06 ,  C03B19/10 ,  C03B19/12 ,  C03C1/00 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/066 ,  C03B19/1065 ,  C03B19/12 ,  C03B20/00 ,  C03C1/006 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03C2201/23 ,  C03C2203/26 ,  Y10S65/90 ,  Y10T428/131 ,  Y10T428/1314

Abstract: A synthetic silica glass article made by hydrolyzing an alkoxysilane and thermally sintering the resulting silica; this synthetic silica glass article has a viscosity of not lower than 10.sup.10 poise at 1400.degree. C., and contains, as metallic impurities, less than 1 ppm of Al, less than 0.2 ppm of Fe, less than 0.2 ppm of Na, less than 0.2 ppm of K, less than 0.01 ppm of Li, less than 0.2 ppm of Ca, less than 0.02 ppm of Ti, less than 0.01 ppm of B, less than 0.01 ppm of P, less than 0.01 ppm of As.

Abstract translation: 一种通过水解烷氧基硅烷并热烧结所得二氧化硅制成的合成二氧化硅玻璃制品; 该合成石英玻璃制品在1400℃下的粘度不低于1010泊，并且作为金属杂质含有少于1ppm的Al，小于0.2ppm的Fe，小于0.2ppm的Na，小于 0.2ppm的K，小于0.01ppm的Li，小于0.2ppm的Ca，小于0.02ppm的Ti，小于0.01ppm的B，小于0.01ppm的P，小于0.01ppm的As。

公开(公告)号：US4038370A

公开(公告)日：1977-07-26

申请号：US616077

申请日：1975-09-23

Applicant: Tadashi Tokimoto ,  Yoshinobu Hiraishi

Inventor： Tadashi Tokimoto ,  Yoshinobu Hiraishi

IPC: C03B37/018 ,  C01B33/18 ,  C03B8/04 ,  C03B19/14 ,  C03B20/00 ,  C03C3/06 ,  G02B6/00 ,  C01B33/12

CPC classification number: C01B33/183 ,  C03B19/1415 ,  C03B19/1453 ,  C03C3/06 ,  C01P2006/60 ,  C01P2006/80 ,  C03B2201/02 ,  C03B2201/04 ,  C03B2207/32 ,  C03B2207/36 ,  C03C2201/02 ,  C03C2201/20 ,  C03C2203/10 ,  C03C2203/20 ,  C03C2203/40

Abstract: A method of producing high-purity transparent vitreous silica by supplying to a burner a high-purity silane type gas, and an inert gas, hydrogen gas and oxygen gas to effect the flame hydrolysis, comprising growing highly pure transparent vitreous silica at a controlled atmosphere of said flame that may increase the oxygen defect concentration of the vitreous silica, and thereafter heat-treating said formed body.

公开(公告)号：US11981594B2

公开(公告)日：2024-05-14

申请号：US17422897

申请日：2020-12-09

Applicant: ZHONGTIAN TECHNOLOGY ADVANCED MATERIALS CO., LTD. ,  JIANGSU ZHONGTIAN TECHNOLOGY CO., LTD.

Inventor： Ming-Ming Tang ,  Meng-Fei Wang ,  Yi-Gang Qian ,  Jun-Yi Ma ,  Xian-Gen Zhang ,  Yi-Chun Shen ,  Ya-Li Chen

IPC: C03B19/06 ,  C03B19/14 ,  C03C1/02 ,  C03C3/06 ,  C03B25/00

CPC classification number: C03B19/066 ,  C03B19/1453 ,  C03C1/022 ,  C03C3/06 ,  C03B25/00 ,  C03B2201/04 ,  C03C2201/02 ,  C03C2203/10 ,  C03C2203/40 ,  C03C2204/00

Abstract: A method for preparing quartz glass with low content of hydroxyl and high purity, includes providing silica powders including hydroxyl groups. The silica powders are dehydroxylated, which includes drying the silica powders at a first temperature, heating the silica powders up to a second temperature and introducing a first oxidizing gas including halogen gas, thereby obtaining first dehydroxylated powders, and heating the first dehydroxylated powders up to a third temperature and introducing a second oxidizing gas including oxygen or ozone, thereby obtaining second dehydroxylated powders. The second dehydroxylated powders are heated up to a fourth temperature to obtain a vitrified body. The vitrified body is cooled to obtain the quartz glass with low content of hydroxyl and high purity. The quartz glass prepared by the above method has low content of hydroxyl and high purity. A quartz glass with low content of hydroxyl and high purity is also provided.

公开(公告)号：US11757075B2

公开(公告)日：2023-09-12

申请号：US17559031

申请日：2021-12-22

Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

Inventor： Akira Fujinoki ,  Hiroyuki Nishimura ,  Akira Sato ,  Yuya Yokosawa ,  Tatsuya Mori

IPC: H01L33/58 ,  C03B19/06 ,  H01L25/075 ,  H01L33/48 ,  C03C3/06 ,  C03C4/00 ,  H01L33/32

CPC classification number: H01L33/58 ,  C03B19/066 ,  C03C3/06 ,  C03C4/0085 ,  H01L25/0753 ,  H01L33/486 ,  C03B2201/04 ,  C03C2201/23 ,  H01L33/32 ,  H01L2933/0058

Abstract: Provided is a silica glass member for hermetic sealing of an ultraviolet SMD LED element to be suitably used for hermetic sealing of, and as a transmission window material for, a surface mount-type package (SMD) having an ultraviolet LED mounted thereon and configured to emit ultraviolet light in a wavelength range of from 200 nm to 350 nm. The silica glass member for hermetic sealing includes a silica glass substrate, which is homogeneously and integrally formed without an internal boundary, wherein the silica glass substrate has: a first surface on an inside opposed to an SMD LED element; and a second surface on an outside corresponding to the first surface, wherein an outer peripheral portion of the first surface has formed therein a substrate joining plain surface for joining to the container outer periphery joining plain surface, and wherein the second surface on the outside corresponding to the first surface has formed therein a lens-like convex portion configured to process emitted light from the ultraviolet SMD LED element.

公开(公告)号：US11708290B2

公开(公告)日：2023-07-25

申请号：US16984379

申请日：2020-08-04

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Matthias Otter ,  Walter Lehmann ,  Michael Hünermann ,  Nils Christian Nielsen ,  Nigel Robert Whippey ,  Boris Gromann ,  Abdoul-Gafar Kpebane ,  Matthias Söhn

IPC: C03B20/00 ,  C03B37/012 ,  C03C3/06 ,  C03B17/04 ,  C03B19/10 ,  C03C12/00 ,  C03C1/02 ,  C03B37/027

CPC classification number: C03B20/00 ,  C03B17/04 ,  C03B19/106 ,  C03B19/1095 ,  C03B37/01211 ,  C03B37/027 ,  C03C1/022 ,  C03C1/026 ,  C03C3/06 ,  C03C12/00 ,  C03B2201/04 ,  C03C2201/02 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/54 ,  C03C2203/10 ,  C03C2203/40 ,  C03C2203/44 ,  C03C2203/50

Abstract: One aspect relates to a process for the preparation of a quartz glass body, including providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m2/g, making a glass melt out of silicon dioxide granulate in an oven and making a quartz glass body out of at least part of the glass melt. The oven has at least a first and a further chamber connected to one another via a passage. The temperature in the first chamber is lower than the temperature in the further chambers. On aspect relates to a quartz glass body which is obtainable by this process. One aspect relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

公开(公告)号：US20160152504A1

公开(公告)日：2016-06-02

申请号：US15014359

申请日：2016-02-03

Applicant: ASAHI GLASS COMPANY, LIMITED

Inventor： Madoka ONO ,  Setsuro ITO ,  Osamu HONMA ,  Yousuke AMINO

IPC: C03B25/02 ,  C03C3/06

CPC classification number: C03B25/02 ,  C03B19/1453 ,  C03B32/005 ,  C03B37/02727 ,  C03B2201/04 ,  C03B2201/075 ,  C03B2201/31 ,  C03B2201/42 ,  C03B2205/56 ,  C03C3/06 ,  Y02P40/57

Abstract: To provide low scattering silica glass suitable as a material of an optical communication fiber.Silica glass, which has a fictive temperature of at least 1,000° C., and which has a void radius of at most 0.240 nm as measured by positron annihilation lifetime spectroscopy. A method for heat-treating silica glass, which comprises holding silica glass to be heat-treated in an atmosphere at a temperature of at least 1,200° C. and at most 2,000° C. under a pressure of at least 30 MPa, and cooling the silica glass at an average temperature-decreasing rate of at least 40° C./min during cooling within a temperature range of from 1,200° C. to 900° C. A method for heat-treating silica glass, which comprises holding silica glass to be heat-treated in an atmosphere at a temperature of at least 1,200° C. and at most 2,000° C. under a pressure of at least 140 MPa, and cooling the silica glass in an atmosphere under a pressure of at least 140 MPa during cooling within a temperature range of from 1,200° C. to 900° C.

Abstract translation: 提供适合作为光通信光纤的材料的低散射二氧化硅玻璃。 二氧化硅玻璃具有至少1000℃的假想温度，并且通过正电子湮没寿命光谱测定具有至多0.240nm的空隙半径。 一种用于热处理石英玻璃的方法，其包括在至少1200℃和至多2000℃的温度下在至少30MPa的压力下在保持在大气中进行热处理的石英玻璃，以及冷却 二氧化硅玻璃在1200℃〜900℃的温度范围内的冷却时的平均降温速度为40℃/分钟以上。一种石英玻璃的热处理方法，其包括保持石英玻璃 在至少1200℃和最多2000℃的温度的气氛中在至少140MPa的压力下进行热处理，并在气氛中在至少140MPa的压力下冷却石英玻璃 在1200℃〜900℃的温度范围内进行冷却。

公开(公告)号：US09290404B2

公开(公告)日：2016-03-22

申请号：US14155460

申请日：2014-01-15

Applicant: Michael Peter Winnen ,  Todd R. Springer

Inventor： Michael Peter Winnen ,  Todd R. Springer

IPC: C03B20/00 ,  C03B17/00 ,  C03B19/02 ,  C03C3/06 ,  C03C10/00

CPC classification number: C03B20/00 ,  C03B19/02 ,  C03B2201/04 ,  C03B2201/075 ,  C03C3/06 ,  C03C10/0009 ,  C03C2201/23 ,  Y02P40/57

Abstract: A method to form quartz glass ingots of ultra low contamination and defect levels by firing a high-purity quartz form as the feedstock, wherein the quartz glass ingot is free-formed on a platen rotating concentrically with the feedstock quartz article.

Abstract translation: 通过烧制高纯度石英形式作为原料来形成超低污染和缺陷水平的石英玻璃锭的方法，其中石英玻璃锭自由形成在与原料石英制品同心旋转的压板上。

公开(公告)号：US09036972B2

公开(公告)日：2015-05-19

申请号：US14127266

申请日：2012-11-16

Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.

Inventor： Yoshiaki Tamura ,  Tetsuya Haruna ,  Masaaki Hirano

IPC: G02B6/036 ,  B29B7/00 ,  C03B37/02 ,  C03B37/018 ,  C03B37/027 ,  C03B37/014 ,  C03C13/04

CPC classification number: G02B6/03622 ,  C03B37/01413 ,  C03B37/018 ,  C03B37/01807 ,  C03B37/01815 ,  C03B37/027 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2201/50 ,  C03B2203/22 ,  C03B2203/23 ,  C03B2203/34 ,  C03B2203/36 ,  C03C13/04 ,  C03C13/045 ,  C03C13/046 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2203/44 ,  C03C2203/46 ,  G02B6/02019 ,  G02B6/02242 ,  G02B6/02266 ,  G02B6/036 ,  G02B6/03611 ,  G02B6/03627 ,  G02B6/03694 ,  Y02P40/57 ,  Y10T428/2964

Abstract: An easily producible optical fiber preform which is drawn to an optical fiber having a core containing a sufficient concentration of alkali metal is provided. An optical fiber preform 10 is composed of silica-based glass and includes a core portion 20 and a cladding portion 30. The core portion 20 includes a first core portion 21 including a central axis and a second core portion 22 disposed on the perimeter of the first core portion 21. The cladding portion 30 includes a first cladding portion 31 disposed on the perimeter of the second core portion 22 and a second cladding portion 32 disposed on the perimeter of the first cladding portion 31. The core portion 20 contains an alkali metal at an average concentration of 5 atomic ppm or more. The concentration of the OH group in the perimeter portion of the first cladding portion 31 is 200 mol ppm or more.

Abstract translation: 提供了一种易于生产的光纤预制件，其被拉伸到具有含有足够浓度的碱金属的芯的光纤。 光纤预制件10由二氧化硅系玻璃构成，包括芯部20和包覆部30.芯部20具有包括中心轴的第一芯部21和配置在第二芯部22的周边的第二芯部22。 第一芯部21.包层部分30包括设置在第二芯部22的周边上的第一包层部分31和设置在第一包层部分31的周边上的第二包层部分32.芯部分20含有碱金属 平均浓度为5原子ppm以上。 第一包层部31的周缘部的OH基浓度为200摩尔ppm以上。

公开(公告)号：US20150098682A1

公开(公告)日：2015-04-09

申请号：US14569987

申请日：2014-12-15

Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.

Inventor： Yoshiaki TAMURA ,  Tetsuya HARUNA ,  Masaaki HIRANO

IPC: G02B6/036 ,  C03C13/04 ,  C03B37/027

CPC classification number: G02B6/03622 ,  C03B37/01413 ,  C03B37/018 ,  C03B37/01807 ,  C03B37/01815 ,  C03B37/027 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/23 ,  C03B2201/50 ,  C03B2203/22 ,  C03B2203/23 ,  C03B2203/34 ,  C03B2203/36 ,  C03C13/04 ,  C03C13/045 ,  C03C13/046 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2203/44 ,  C03C2203/46 ,  G02B6/02019 ,  G02B6/02242 ,  G02B6/02266 ,  G02B6/036 ,  G02B6/03611 ,  G02B6/03627 ,  G02B6/03694 ,  Y02P40/57 ,  Y10T428/2964

Abstract: An easily producible optical fiber preform which is drawn to an optical fiber having a core containing a sufficient concentration of alkali metal is provided. An optical fiber preform 10 is composed of silica-based glass and includes a core portion 20 and a cladding portion 30. The core portion 20 includes a first core portion 21 including a central axis and a second core portion 22 disposed on the perimeter of the first core portion 21. The cladding portion 30 includes a first cladding portion 31 disposed on the perimeter of the second core portion 22 and a second cladding portion 32 disposed on the perimeter of the first cladding portion 31. The core portion 20 contains an alkali metal at an average concentration of 5 atomic ppm or more. The concentration of the OH group in the perimeter portion of the first cladding portion 31 is 200 mol ppm or more.

Abstract translation: 提供了一种易于生产的光纤预制件，其被拉伸到具有含有足够浓度的碱金属的芯的光纤。 光纤预制件10由二氧化硅系玻璃构成，包括芯部20和包覆部30.芯部20具有包括中心轴的第一芯部21和配置在第二芯部22的周边的第二芯部22。 第一芯部21.包层部分30包括设置在第二芯部22的周边上的第一包层部分31和设置在第一包层部分31的周边上的第二包层部分32.芯部分20含有碱金属 平均浓度为5原子ppm以上。 第一包层部31的周缘部的OH基浓度为200摩尔ppm以上。