MULTILAYER FILM COMPRISING HIGHLY REFINED CELLULOSE FIBERS

    公开(公告)号:US20230151552A1

    公开(公告)日:2023-05-18

    申请号:US17995445

    申请日:2021-04-14

    Applicant: Stora Enso OYJ

    CPC classification number: D21H27/38 D21H11/18 D21F11/04 D21H21/26

    Abstract: The present invention relates to a method for manufacturing a multilayer film comprising highly refined cellulose fibers, the method comprising the steps of: a) forming a first wet web by applying a first pulp suspension comprising highly refined cellulose fibers on a first wire; b) partially dewatering the first wet web to obtain a first partially dewatered web; c) forming a second wet web by applying a second pulp suspension comprising highly refined cellulose fibers on a second wire; d) partially dewatering the second wet web to obtain a second partially dewatered web; e) joining the first and second partially dewatered web to obtain a multilayer web; and f) further dewatering, and optionally drying, the multilayer web to obtain a multilayer film comprising highly refined cellulose fibers.

    PROCESS FOR PRODUCTION OF NANO-COATED SUBSTRATE

    公开(公告)号:US20230132010A1

    公开(公告)日:2023-04-27

    申请号:US17996939

    申请日:2021-05-06

    Applicant: Stora Enso OYJ

    Abstract: The present invention is directed to a process for manufacturing a nano-coated pulp-based substrate comprising the steps of: a) providing a suspension comprising pulp, said pulp having Schopper Riegler value of at least 70°; b) using the suspension of step a) to form a wet web; c) dewatering and/or drying the wet web to form a substrate; d) adding a first layer of an acrylic monomer solution comprising less than 2 wt-% water to the surface of the substrate, followed by radiation curing the first layer; e) optionally adding a second layer comprising an acrylic monomer solution to the surface of the cured first layer and radiation curing the second layer; f) providing a nano-coating on the surface of the cured first or second layer such that a nano-coating having a thickness in the range of from 0.1 nm to 100 nm is provided on the substrate.

Patent Agency Ranking