公开(公告)号：US08294129B2

公开(公告)日：2012-10-23

申请号：US13081899

申请日：2011-04-07

申请人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光产生室内的激光束聚焦光学元件中的光学元件的劣化。 该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器 一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

公开(公告)号：US08288743B2

公开(公告)日：2012-10-16

申请号：US12406388

申请日：2009-03-18

申请人： Yoshifumi Ueno ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Akira Sumitani ,  Hideo Hoshino ,  Akira Endo ,  Georg Soumagne

发明人： Yoshifumi Ueno ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Akira Sumitani ,  Hideo Hoshino ,  Akira Endo ,  Georg Soumagne

IPC分类号： B01D59/44

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/093 ,  G21K2201/00 ,  H05G2/005 ,  H05G2/008

摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.

摘要翻译： 一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子， 其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

公开(公告)号：US20120229889A1

公开(公告)日：2012-09-13

申请号：US13121319

申请日：2011-03-07

申请人： Takashi Suganuma ,  Krzysztof Nowak ,  Osamu Wakabayashi

发明人： Takashi Suganuma ,  Krzysztof Nowak ,  Osamu Wakabayashi

IPC分类号： H01S5/00 ,  H01S3/105

CPC分类号： H01S3/05 ,  B82Y20/00 ,  H01S3/0315 ,  H01S3/08031 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2232 ,  H01S3/2325 ,  H01S3/235 ,  H01S3/2366 ,  H01S3/2375 ,  H01S5/042 ,  H01S5/06 ,  H01S5/14 ,  H01S5/3401

摘要： A regenerative amplifier according to one aspect of this disclosure is used in combination with a laser device, and the regenerative amplifier may include: a pair of resonator mirrors constituting an optical resonator; a slab amplifier provided between the pair of the resonator mirrors for amplifying a laser beam with a predetermined wavelength outputted from the laser device; and an optical system disposed to configure a multipass optical path along which the laser beam is reciprocated inside the slab amplifier, the optical system transferring an optical image of the laser beam at a first position as an optical image of the laser beam at a second position.

摘要翻译： 根据本公开的一个方面的再生放大器与激光装置组合使用，再生放大器可以包括：构成光谐振器的一对谐振器镜; 设置在所述一对所述谐振器镜之间用于放大从所述激光装置输出的预定波长的激光束的平板放大器; 以及光学系统，被配置为配置多个光路，激光束沿着该光路在所述平板放大器内部往复运动，所述光学系统将所述激光束的光学图像在第一位置处作为所述激光束的光学图像在第二位置 。

公开(公告)号：US20120228525A1

公开(公告)日：2012-09-13

申请号：US13402277

申请日：2012-02-22

申请人： Masato MORIYA ,  Hideyuki Hayashi ,  Osamu Wakabayashi

发明人： Masato MORIYA ,  Hideyuki Hayashi ,  Osamu Wakabayashi

IPC分类号： H05G2/00

CPC分类号： H05G2/008 ,  H05G2/003 ,  H05G2/006

摘要： Systems and methods are provided in which an extreme ultraviolet (EUV) light generation apparatus used with a laser apparatus is configured to detect an image of a laser beam by which a target has been irradiated. The EUV light generation apparatus may also be configured to control the position at which a laser beam is to be focused and the position of a target, based on the detection result.

摘要翻译： 提供了一种系统和方法，其中与激光装置一起使用的极紫外（EUV）光产生装置被配置为检测已经照射靶的激光束的图像。 EUV光发生装置还可以被配置为基于检测结果来控制激光束被聚焦的位置和目标的位置。

公开(公告)号：US20120146507A1

公开(公告)日：2012-06-14

申请号：US13126671

申请日：2011-03-25

申请人： Tatsuya Yanagida ,  Osamu Wakabayashi

发明人： Tatsuya Yanagida ,  Osamu Wakabayashi

IPC分类号： H05H1/00 ,  F21V9/14 ,  H01J17/26

CPC分类号： H01S3/10061 ,  H01S3/08054 ,  H01S3/08059 ,  H01S3/2308 ,  H01S3/2383 ,  H01S2301/20 ,  H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam.

摘要翻译： 可以提供与激光装置一起使用的极紫外光发生系统，并且极紫外光发生系统可以包括：包括至少一个用于至少一个激光束的窗口的室，以及用于将目标材料供应到 房间 以及设置在激光束路径上的至少一个偏振控制单元，用于控制至少一个激光束的偏振状态。

公开(公告)号：US08173984B2

公开(公告)日：2012-05-08

申请号：US12382964

申请日：2009-03-27

申请人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Tamotsu Abe ,  Takashi Suganuma ,  Hiroshi Someya ,  Takayuki Yabu ,  Akira Sumitani ,  Osamu Wakabayashi

IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

公开(公告)号：US08093571B2

公开(公告)日：2012-01-10

申请号：US12566865

申请日：2009-09-25

申请人： Akira Endo ,  Krzysztof Nowak ,  Hideo Hoshino ,  Tatsuya Ariga ,  Masato Moriya ,  Osamu Wakabayashi

发明人： Akira Endo ,  Krzysztof Nowak ,  Hideo Hoshino ,  Tatsuya Ariga ,  Masato Moriya ,  Osamu Wakabayashi

IPC分类号： G02B26/02

CPC分类号： H05G2/003 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/2316 ,  H05G2/008

摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.

摘要翻译： 本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。 可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。 来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。 混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。 混合气体通过排气管道排出，并被送到热交换器。 由热交换器冷却的混合气体通过循环泵送回到SA气室。

公开(公告)号：US20100220756A1

公开(公告)日：2010-09-02

申请号：US12713874

申请日：2010-02-26

申请人： Nowak Krzysztof ,  Takeshi Ohta ,  Osamu Wakabayashi

发明人： Nowak Krzysztof ,  Takeshi Ohta ,  Osamu Wakabayashi

IPC分类号： H01S3/10 ,  H01S5/50

CPC分类号： H01S3/235 ,  G03F7/70033 ,  H01S3/005 ,  H01S3/08031 ,  H01S3/1307 ,  H01S3/2232 ,  H01S3/2375 ,  H01S3/2383 ,  H01S5/0654 ,  H01S5/0687 ,  H01S5/141 ,  H01S5/4012 ,  H01S5/4025

摘要： A laser apparatus comprises an amplifier including at least one of a MOPA and a MOPO each of which amplifies a single-longitudinal or multiple-longitudinal mode laser light, an amplifiable agent of the amplifier being a molecular gas, a master oscillator constructed from a semiconductor laser being able to oscillate a single-longitudinal or multiple-longitudinal mode laser light of which wavelength is within one or more amplification lines of the amplifier; and a controller executing a wave shape control adjusting a pulse shape and/or a pulse output timing of a single-longitudinal or multiple-longitudinal mode laser light outputted from the master oscillator.

摘要翻译： 激光装置包括放大器，该放大器包括MOPA和MOPO中的至少一个，每个MOPA和MOPO均放大单纵向或多纵模激光，放大器的可分解剂是分子气体，由半导体构成的主振荡器 激光器能够振荡波长在放大器的一个或多个放大线内的单纵向或多纵模激光; 以及执行调整从主振荡器输出的单纵向或多纵模激光的脉冲形状和/或脉冲输出定时的波形控制的控制器。

公开(公告)号：US20100195196A1

公开(公告)日：2010-08-05

申请号：US12685246

申请日：2010-01-11

申请人： Krzysztof Nowak ,  Masato Moriya ,  Osamu Wakabayashi

发明人： Krzysztof Nowak ,  Masato Moriya ,  Osamu Wakabayashi

IPC分类号： H01S3/09

CPC分类号： H01S3/06758 ,  G03F7/70025 ,  G03F7/70033 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/032 ,  H01S3/036 ,  H01S3/0387 ,  H01S3/041 ,  H01S3/0971 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2325 ,  H01S3/2341

摘要： A laser beam amplifier with high optical axis stability is provided. The laser beam amplifier includes: a container for accommodating a laser medium; a pair of electrodes for performing discharge in the laser medium to form an amplification region for a laser beam in the laser medium; and an optical system for forming an optical path between a first point, upon which the laser beam is incident, and a second point, from which the laser beam is outputted, such that the amplification region is located in the optical path between the first point and the second point, wherein the first point and the second point are conjugate to each other, and the laser beam incident upon the first point is amplified while passing through the amplification region at least twice and then transferred to the second point.

摘要翻译： 提供了具有高光轴稳定性的激光束放大器。 激光束放大器包括：用于容纳激光介质的容器; 一对电极，用于在激光介质中进行放电，以在激光介质中形成用于激光束的放大区域; 以及光学系统，用于在激光束入射的第一点和从其输出激光束的第二点之间形成光路，使得放大区域位于第一点之间的光路中 以及第二点，其中第一点和第二点彼此共轭，并且入射在第一点上的激光束在通过放大区域至少两次时被放大，然后被传送到第二点。

公开(公告)号：US20100193711A1

公开(公告)日：2010-08-05

申请号：US12685835

申请日：2010-01-12

申请人： Yukio WATANABE ,  Osamu Wakabayashi ,  Junichi Fujimoto ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Hideo Hoshino

发明人： Yukio WATANABE ,  Osamu Wakabayashi ,  Junichi Fujimoto ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Hideo Hoshino

IPC分类号： G21K5/02

CPC分类号： G03F7/70975 ,  G03F7/70033

摘要： An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.

摘要翻译： EUV光源装置的一部分能够容易地更换的极紫外（EUV）光源系统。 该系统包括：（i）具有产生极紫外光的室的极紫外光源装置，用于将目标材料供应到室中的目标供给单元，用于照射由目标供给源提供的目标材料的驱动激光 具有激光束以产生等离子体的单元，以及用于收集从等离子体辐射的极紫外光的收集器镜，以允许极紫外光进入曝光设备的投影光学器件; 以及（ii）提升装置，其设置为提升和移动作为极紫外光源装置的一部分的替换部件。