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公开(公告)号：US08804778B2
公开(公告)日：2014-08-12
申请号：US12580523
申请日：2009-10-16
IPC分类号： H01S3/10
CPC分类号： H01S3/2316 , B82Y20/00 , G03F7/70033 , H01S3/0007 , H01S3/107 , H01S3/2232 , H01S3/235 , H01S5/02284 , H01S5/0654 , H01S5/06837 , H01S5/0687 , H01S5/141 , H01S5/3402 , H01S5/4012 , H01S5/4062 , H01S5/4087
摘要： An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus.
摘要翻译： 一种极紫外光源装置包括具有输出一个或多个纵模式激光灯的主振荡器的激光装置，具有分子气体的放大器作为放大器，放大其中包含波长的纵模式激光， 以及调节主振荡器的控制器，使得从主振荡器输出的纵模激光的波长包括在可放大线之一中，激光装置用作驱动激光器，其中激光装置照射 具有用于产生等离子体的激光的目标材料，并且从等离子体发射极紫外光并从极紫外光源装置输出。
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2.发明授权公开(公告)号：US08476609B2
公开(公告)日：2013-07-02
申请号：US13306358
申请日：2011-11-29
申请人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
发明人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B26/02
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译： 本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。 可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。 来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。 混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。 混合气体通过排气管道排出，并被送到热交换器。 由热交换器冷却的混合气体通过循环泵送回到SA气室。
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公开(公告)号：US08559099B2
公开(公告)日：2013-10-15
申请号：US12685246
申请日：2010-01-11
CPC分类号： H01S3/06758 , G03F7/70025 , G03F7/70033 , H01S3/005 , H01S3/0064 , H01S3/032 , H01S3/036 , H01S3/0387 , H01S3/041 , H01S3/0971 , H01S3/2232 , H01S3/2308 , H01S3/2325 , H01S3/2341
摘要： A laser beam amplifier with high optical axis stability is provided. The laser beam amplifier includes: a container for accommodating a laser medium; a pair of electrodes for performing discharge in the laser medium to form an amplification region for a laser beam in the laser medium; and an optical system for forming an optical path between a first point, upon which the laser beam is incident, and a second point, from which the laser beam is outputted, such that the amplification region is located in the optical path between the first point and the second point, wherein the first point and the second point are conjugate to each other, and the laser beam incident upon the first point is amplified while passing through the amplification region at least twice and then transferred to the second point.
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4.发明授权公开(公告)号：US08093571B2
公开(公告)日：2012-01-10
申请号：US12566865
申请日：2009-09-25
申请人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
发明人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
IPC分类号： G02B26/02
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译： 本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。 可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。 来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。 混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。 混合气体通过排气管道排出，并被送到热交换器。 由热交换器冷却的混合气体通过循环泵送回到SA气室。
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公开(公告)号：US20100195196A1
公开(公告)日：2010-08-05
申请号：US12685246
申请日：2010-01-11
IPC分类号： H01S3/09
CPC分类号： H01S3/06758 , G03F7/70025 , G03F7/70033 , H01S3/005 , H01S3/0064 , H01S3/032 , H01S3/036 , H01S3/0387 , H01S3/041 , H01S3/0971 , H01S3/2232 , H01S3/2308 , H01S3/2325 , H01S3/2341
摘要： A laser beam amplifier with high optical axis stability is provided. The laser beam amplifier includes: a container for accommodating a laser medium; a pair of electrodes for performing discharge in the laser medium to form an amplification region for a laser beam in the laser medium; and an optical system for forming an optical path between a first point, upon which the laser beam is incident, and a second point, from which the laser beam is outputted, such that the amplification region is located in the optical path between the first point and the second point, wherein the first point and the second point are conjugate to each other, and the laser beam incident upon the first point is amplified while passing through the amplification region at least twice and then transferred to the second point.
摘要翻译： 提供了具有高光轴稳定性的激光束放大器。 激光束放大器包括：用于容纳激光介质的容器; 一对电极，用于在激光介质中进行放电，以在激光介质中形成用于激光束的放大区域; 以及光学系统，用于在激光束入射的第一点和从其输出激光束的第二点之间形成光路，使得放大区域位于第一点之间的光路中 以及第二点，其中第一点和第二点彼此共轭，并且入射在第一点上的激光束在通过放大区域至少两次时被放大，然后被传送到第二点。
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6.发明申请LASER DEVICE, LASER SYSTEM, AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 审中-公开激光装置，激光系统和极光紫外线发光装置公开(公告)号：US20120012762A1
公开(公告)日：2012-01-19
申请号：US13121340
申请日：2011-03-02
CPC分类号： G02B27/1006 , B82Y20/00 , G02B27/1086 , G02B27/1093 , H01S3/2232 , H01S3/2316 , H01S3/235 , H01S3/2375 , H01S5/005 , H01S5/06216 , H01S5/3401 , H01S5/4012 , H01S5/4087 , H05G2/008
摘要： A laser device may include: a diffraction grating; and a plurality of semiconductor lasers disposed such that laser beams outputted therefrom are incident on the diffraction grating and at least one of diffraction beams of each laser beam travels in a predetermined direction.
摘要翻译： 激光装置可以包括：衍射光栅; 以及多个半导体激光器，其设置成使得从其输出的激光束入射到衍射光栅上，并且每个激光束的衍射光束中的至少一个沿预定方向行进。
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公开(公告)号：US20100193710A1
公开(公告)日：2010-08-05
申请号：US12580523
申请日：2009-10-16
IPC分类号： H05G2/00 , H01S3/10 , H01S3/22 , H01S3/0941
CPC分类号： H01S3/2316 , B82Y20/00 , G03F7/70033 , H01S3/0007 , H01S3/107 , H01S3/2232 , H01S3/235 , H01S5/02284 , H01S5/0654 , H01S5/06837 , H01S5/0687 , H01S5/141 , H01S5/3402 , H01S5/4012 , H01S5/4062 , H01S5/4087
摘要： An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus.
摘要翻译： 一种极紫外光源装置包括具有输出一个或多个纵模式激光灯的主振荡器的激光装置，具有分子气体的放大器作为放大器，放大其中包含波长的纵模式激光， 以及调节主振荡器的控制器，使得从主振荡器输出的纵模激光的波长包括在可放大线之一中，激光装置用作驱动激光器，其中激光装置照射 具有用于产生等离子体的激光的目标材料，并且从等离子体发射极紫外光并从极紫外光源装置输出。
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8.发明申请公开(公告)号：US20100078580A1
公开(公告)日：2010-04-01
申请号：US12566865
申请日：2009-09-25
申请人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
发明人： Akira Endo , Krzysztof Nowak , Hideo Hoshino , Tatsuya Ariga , Masato Moriya , Osamu Wakabayashi
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译： 本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。 可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。 来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。 混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。 混合气体通过排气管道排出，并被送到热交换器。 由热交换器冷却的混合气体通过循环泵送回到SA气室。
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9.发明授权Window unit, window device, laser apparatus, and extreme ultraviolet light generation system 有权窗单元，窗装置，激光装置和极紫外光发生系统公开(公告)号：US08742379B2
公开(公告)日：2014-06-03
申请号：US13636038
申请日：2011-07-05
IPC分类号： H01S3/04
CPC分类号： H01S3/0401 , G02B7/008 , H01S3/005 , H01S3/2316 , H05G2/008 , Y10T137/6851
摘要： A window unit may include: a window configured to allow a laser beam to be transmitted therethrough; and a holder for holding the window at a periphery thereof, the holder being provided with a flow channel thereinside configured to allow a fluid to flow.
摘要翻译： 窗口单元可以包括：被配置为允许激光束透过其中的窗口; 以及用于在其周边保持窗口的保持器，所述保持器设置有配置成允许流体流动的内部的流动通道。
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10.发明授权Chamber apparatus and extreme ultraviolet (EUV) light generation apparatus including the chamber apparatus 有权包括室装置的室内装置和极紫外（EUV）光发生装置公开(公告)号：US08698113B2
公开(公告)日：2014-04-15
申请号：US13696517
申请日：2011-12-13
申请人： Masato Moriya , Osamu Wakabayashi
发明人： Masato Moriya , Osamu Wakabayashi
IPC分类号： H05G2/00
CPC分类号： G03F7/708 , G03F7/70008 , G03F7/70808 , G03F7/70833
摘要： A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter.
摘要翻译： 与激光装置一起使用的室装置可以包括室，扩束光学系统和聚焦光学系统。 该室可以设置有至少一个入口，激光装置输出的激光束通过该入口被引入腔室。 扩束光学系统被配置为直径地扩大激光束。 聚焦光学系统被配置为聚焦已经扩大直径的激光束。
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