Abstract:
A method for monitoring resistance welding is provided, which includes receiving an input of waveform data obtained by converting current or voltage applied to a transformer welding gun into a digital signal through a teaching group filter; comparing the input waveform data with acceptance waveform data of current or voltage that is accumulatively stored through a destructive test; determining acceptance of a quality of a corresponding welding product if the input waveform data and the acceptance waveform data are equal or similar to each other within a predetermined error range, and determining rejection of the quality of the corresponding welding product if the input waveform data and the acceptance waveform data are different from each other; and outputting an acceptance or rejection message depending on the result of the determination.
Abstract:
A filter unit may include a water permeable first electrode, a second electrode arranged so as to be spaced apart from and opposite to the first electrode, and a non-water permeable separator that is positioned between the first electrode and the second electrode. The first electrode may include a metal adsorbent (metal-adsorbing material) and thus may adsorb a metal included in the water. At least one of the first electrode and the second electrode may induce a water hydrolysis reaction to produce H+ ions to regenerate the metal adsorbent. The filter unit may further include a voltage applier to provide a filter system.
Abstract:
A filter device may include a filter unit including a first electrode and a second electrode that are arranged so as to be spaced apart and opposite to each other. At least one of the first and second electrodes may include an electrode material layer that is electrically conductive. The electrode material layer may include a metal-adsorbing material (metal adsorbent). A voltage applier for applying voltage to the first electrode and the second electrode for a desired amount of time based on the conditions after operation of the filter unit, and a method for driving the same.
Abstract:
Provided is an electrolytic disinfection system and method for purifying water. The electrolytic disinfection system includes; an electrolytic disinfection device which includes; a chamber, a first electrode disposed in the chamber, a second electrode disposed in the chamber and spaced apart from the first electrode, a water inlet part connected to the chamber, wherein the water inlet part allows influent water to be introduced to the chamber therethrough, and a water outlet part connected to the chamber, wherein the water outlet part allows the influent water to be discharged from the chamber therethrough, and an influent water heating device which is disposed upstream of the water inlet part and heats the influent water introduced to the chamber through the water inlet part.
Abstract:
This invention relates to a mutant Escherichia coli SS373 and the production of succinic acid by using the above strain. In detail, a novel E. coli SS373 (W3110 pta::Tn10 ldhA::Km) with the deficiency in the acetate and lactate forming pathways was constructed by genetic engineering technique. An aerobically grown SS373 was then cultured by means of the anaerobic condition shift during the succinate producing stage, which resulted in the efficient production of succinic acid with a higher yield.
Abstract:
A draw solute for forward osmosis may include a copolymer including a first structural unit, where a temperature-sensitive side chain is graft polymerized, and a second structural unit including a hydrophilic functional group. The temperature-sensitive side chain may include a structural unit for a side chain including a temperature-sensitive moiety. The temperature-sensitive moiety may be represented by Chemical Formula 1, Chemical Formula 2, or Chemical Formula 3: wherein R1 and R2 are each independently hydrogen or a linear or branched C3 to C5 alkyl group, provided that at least one of R1 and R2 is not hydrogen, R3 is a C3 to C5 alkylene group, and R4 is a linear or branched C3 to C5 alkyl group. The draw solute may be used to form an osmosis draw solution for use in a forward osmosis water treatment device and method.
Abstract:
In the quorum sensing antagonist blocking the communication in bacteria, the method for preventing biofilm formation using this quorum sensing antagonist and the method for reducing the bacterial contamination, the quorum sensing antagonist contains the homoserine lactone moiety and sulfanylethanoyl group, and has a similar chemical structure to that of the autoinducer which is produced by bacteria as a signal, whereby the quorum sensing antagonist can inhibit the formation of biofilm and reduce the bacterial contamination as well.
Abstract:
A draw solute for forward osmosis may include a temperature-sensitive oligomer compound including a structural unit including a temperature-sensitive moiety. The temperature-sensitive oligomer compound may further include a hydrophilic functional group at the terminal end of the main chain.
Abstract:
Provided is an electrolytic disinfection system and method for purifying water. The electrolytic disinfection system includes; an electrolytic disinfection device which includes; a chamber, a first electrode disposed in the chamber, a second electrode disposed in the chamber and spaced apart from the first electrode, a water inlet part connected to the chamber, wherein the water inlet part allows influent water to be introduced to the chamber therethrough, and a water outlet part connected to the chamber, wherein the water outlet part allows the influent water to be discharged from the chamber therethrough, and an influent water heating device which is disposed upstream of the water inlet part and heats the influent water introduced to the chamber through the water inlet part.
Abstract:
A photocatalyst according to example embodiments may include a porous metal oxide and an oxygen vacancy-inducing metal. A portion of the oxygen vacancy-inducing metal may be included in a lattice of the porous metal oxide, while another portion may be exposed at the surface of the porous metal oxide. The porous metal oxide may be a divalent or multivalent metal oxide. The oxidation number of the oxygen vacancy-inducing metal may be smaller than the oxidation number of the metal of the porous metal oxide.