公开(公告)号：US08953142B2

公开(公告)日：2015-02-10

申请号：US12543011

申请日：2009-08-18

申请人： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

发明人： Nicolaas Rudolf Kemper ,  Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Marcel Beckers ,  Marco Polizzi ,  Michel Riepen ,  Anthonie Kuijper ,  Koen Steffens ,  Adrianes Johannes Baeten ,  Anca Mihaela Antonevici

IPC分类号： G03B27/52 ,  G03B27/58 ,  G03B27/60 ,  G03F7/20

CPC分类号： G03F7/70866 ,  B01D19/0021 ,  G03B27/52 ,  G03F7/70341

摘要： An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.

摘要翻译： 描述了一种浸没式光刻设备，其中通过使富液体流优先沿着表面流动，将两相流分离成富含液体的富气流。

公开(公告)号：US20110149258A1

公开(公告)日：2011-06-23

申请号：US12969656

申请日：2010-12-16

申请人： Jeroen Gerard Gosen ,  Albert Johannes Maria Jansen ,  Nicolaas Ten Kate ,  Marco Koert Stavenga ,  Koen Steffens ,  Laurentius Johannes Adrianus Van Bokhoven ,  Henricus Jozef Castelijns ,  Koen Cuypers

发明人： Jeroen Gerard Gosen ,  Albert Johannes Maria Jansen ,  Nicolaas Ten Kate ,  Marco Koert Stavenga ,  Koen Steffens ,  Laurentius Johannes Adrianus Van Bokhoven ,  Henricus Jozef Castelijns ,  Koen Cuypers

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/7085

摘要： An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.

摘要翻译： 公开了一种浸没式光刻设备，其包括具有表面和传感器的表，或用于传感器的目标或两者，所述传感器和/或目标具有与浸没液体疏液的第一区域和亲液的第二区域 液体置换装置，其构造成将传感器和/或目标物上的液体置换，所述液体置换装置包括气体出口开口，所述气体出口开口构造成将气流引向所述第一和第二区域，其中， 被引导到第一区域的气流不同于指向第二区域的一部分气流的特性。

公开(公告)号：US20100277709A1

公开(公告)日：2010-11-04

申请号：US12721867

申请日：2010-03-11

申请人： Marco Koert STAVENGA ,  Sergei Shulepov ,  Koen Steffens ,  Matheus Anna Karel Van Lierop ,  Samuel Bertrand Dominique David ,  David Bessems

发明人： Marco Koert STAVENGA ,  Sergei Shulepov ,  Koen Steffens ,  Matheus Anna Karel Van Lierop ,  Samuel Bertrand Dominique David ,  David Bessems

IPC分类号： G03B27/32 ,  B23Q3/00

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70866 ,  H01L21/68 ,  H01L21/68735

摘要： A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

摘要翻译： 公开了一种用于浸没式光刻设备的衬底台，其具有构造成容纳给定尺寸的衬底的凹部和流体提取系统，其被配置为从衬底的边缘和凹部的边缘之间的间隙中提取流体， 流体提取系统被配置为使得从间隙的局部区域提取的流体的流速大于从间隙的另一部分提取的流体的流动速率。

公开(公告)号：US20100103391A1

公开(公告)日：2010-04-29

申请号：US12582919

申请日：2009-10-21

申请人： Clemens Johannes Gerardus VAN DEN DUNGEN ,  Danny Maria Hubertus PHILIPS ,  Koen STEFFENS ,  Tijmen Wilfred Mathijs GUNTHER ,  David BESSEMS

发明人： Clemens Johannes Gerardus VAN DEN DUNGEN ,  Danny Maria Hubertus PHILIPS ,  Koen STEFFENS ,  Tijmen Wilfred Mathijs GUNTHER ,  David BESSEMS

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： A fluid handling structure and lithographic apparatus is disclosed in which measures are taken, in particular to the dimensions and spacing of an array of openings in a bottom surface of the fluid handling structure, to deal with and/or prevent formation of bubbles in immersion liquid.

摘要翻译： 公开了一种流体处理结构和光刻设备，其中采取措施，特别是针对流体处理结构的底表面中的开口阵列的尺寸和间距来处理和/或防止在浸没液体中形成气泡 。

公开(公告)号：US20090073395A1

公开(公告)日：2009-03-19

申请号：US11898637

申请日：2007-09-13

申请人： Paul Petrus Joannes Berkvens ,  Roelof Frederik De Graaf ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul William Scholtes-Van Eijk ,  Gert-Jan Gerardus Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Spruytenburg ,  Joris Johan Verstraete

发明人： Paul Petrus Joannes Berkvens ,  Roelof Frederik De Graaf ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul William Scholtes-Van Eijk ,  Gert-Jan Gerardus Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Spruytenburg ,  Joris Johan Verstraete

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.

摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。

公开(公告)号：US09059228B2

公开(公告)日：2015-06-16

申请号：US12721867

申请日：2010-03-11

申请人： Marco Koert Stavenga ,  Sergei Shulepov ,  Koen Steffens ,  Matheus Anna Karel Van Lierop ,  Samuel Bertrand Dominique David ,  David Bessems

发明人： Marco Koert Stavenga ,  Sergei Shulepov ,  Koen Steffens ,  Matheus Anna Karel Van Lierop ,  Samuel Bertrand Dominique David ,  David Bessems

IPC分类号： G03B27/58 ,  G03B27/60 ,  H01L21/68 ,  G03F7/20 ,  H01L21/687

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70866 ,  H01L21/68 ,  H01L21/68735

摘要： A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

摘要翻译： 公开了一种用于浸没式光刻设备的衬底台，其具有构造成容纳给定尺寸的衬底的凹部和流体提取系统，其被配置为从衬底的边缘和凹部的边缘之间的间隙中提取流体， 流体提取系统被配置为使得从间隙的局部区域提取的流体的流速大于从间隙的另一部分提取的流体的流动速率。

公开(公告)号：US08755026B2

公开(公告)日：2014-06-17

申请号：US12969656

申请日：2010-12-16

申请人： Jeroen Gerard Gosen ,  Albert Johannes Maria Jansen ,  Nicolaas Ten Kate ,  Marco Koert Stavenga ,  Koen Steffens ,  Laurentius Johannes Adrianus Van Bokhoven ,  Henricus Jozef Castelijns ,  Koen Cuypers

发明人： Jeroen Gerard Gosen ,  Albert Johannes Maria Jansen ,  Nicolaas Ten Kate ,  Marco Koert Stavenga ,  Koen Steffens ,  Laurentius Johannes Adrianus Van Bokhoven ,  Henricus Jozef Castelijns ,  Koen Cuypers

IPC分类号： G03B27/52 ,  G03B27/58

CPC分类号： G03F7/70341 ,  G03F7/7085

摘要： An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.

摘要翻译： 公开了一种浸没式光刻设备，其包括具有表面和传感器的表，或用于传感器的目标或两者，所述传感器和/或目标具有与浸没液体疏液的第一区域和亲液的第二区域 液体置换装置，其构造成将传感器和/或目标物上的液体置换，所述液体置换装置包括气体出口开口，所述气体出口开口构造成将气流引向所述第一和第二区域，其中， 被引导到第一区域的气流不同于指向第二区域的一部分气流的特性。

公开(公告)号：US20110292357A1

公开(公告)日：2011-12-01

申请号：US13098830

申请日：2011-05-02

申请人： Ronald Van Der Ham ,  Martinus Hendrikus Antonius Leenders ,  Johannes Catharinus Hubertus Mulkens ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Koen Steffens ,  Jan Willem Cromwijk ,  Johanna Antoinette Maria Sondag-Huethorst ,  Marco Baragona ,  Robertus Leonardus Maria In 'T Groen ,  Ralph Theodorus Hubertus Maessen ,  Jacob Marinus Jan Den Toonder ,  Milica Kovacevic-Milivojevic

发明人： Ronald Van Der Ham ,  Martinus Hendrikus Antonius Leenders ,  Johannes Catharinus Hubertus Mulkens ,  Richard Moerman ,  Michel Riepen ,  Sergei Shulepov ,  Koen Steffens ,  Jan Willem Cromwijk ,  Johanna Antoinette Maria Sondag-Huethorst ,  Marco Baragona ,  Robertus Leonardus Maria In 'T Groen ,  Ralph Theodorus Hubertus Maessen ,  Jacob Marinus Jan Den Toonder ,  Milica Kovacevic-Milivojevic

IPC分类号： G03B27/52

CPC分类号： G03F7/70925 ,  G03F7/70 ,  G03F7/70341

摘要： A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.

摘要翻译： 公开了一种用于将浸没液体限制在投影系统和基板的面对表面之间的空间中的流体处理结构，用于支撑基板的台面或两者。 流体处理结构包括一个应答器，用于溶解浸入液体中的气泡中的至少一些气体或控制浸没液体中的气泡，使得其避免进入来自投影系统的光束的光路。

公开(公告)号：US20090279060A1

公开(公告)日：2009-11-12

申请号：US12436626

申请日：2009-05-06

申请人： Daniel Jozef Maria DIRECKS ,  Danny Maria Hubertus PHILIPS ,  Clemens Johannes Gerardus VAN DEN DUNGEN ,  Koen STEFFENS ,  Arnold Jan VAN PUTTEN

发明人： Daniel Jozef Maria DIRECKS ,  Danny Maria Hubertus PHILIPS ,  Clemens Johannes Gerardus VAN DEN DUNGEN ,  Koen STEFFENS ,  Arnold Jan VAN PUTTEN

IPC分类号： G03B27/52 ,  B23P17/00

CPC分类号： G03F7/70341 ,  Y10T29/49401 ,  Y10T137/8593

摘要： A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.

摘要翻译： 公开了一种流体处理结构，其中采取措施来提高发生弯月面破裂的速度。 措施包括多个流体提取开口的形状以及流体处理结构中的多个流体供应开口的形状和密度。

公开(公告)号：US20080316441A1

公开(公告)日：2008-12-25

申请号：US11812507

申请日：2007-06-19

申请人： Paulus Martinus Maria Liebregts ,  Menno Fien ,  Erik Roelof Loopstra ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens

发明人： Paulus Martinus Maria Liebregts ,  Menno Fien ,  Erik Roelof Loopstra ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens

IPC分类号： G03B27/42

CPC分类号： G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983

摘要： A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.

摘要翻译： 公开了一种光刻设备，其具有在设备的至少一部分上承载涂层的可移除的粘合剂膜。 在一个实施例中，公开了一种液体供应系统，其具有沿着投影系统和基板支撑件之间的空间的边界的至少一部分的边界延伸的液体限制结构，其中承载涂层的膜位于液体限制的至少一部分 结构体。