Apparatus and method for treating substrate

    公开(公告)号:US12222159B2

    公开(公告)日:2025-02-11

    申请号:US17408953

    申请日:2021-08-23

    Abstract: An apparatus for treating a substrate includes a body having an inner space in which the substrate is dried by a drying fluid in a supercritical state, a fluid supply unit that supplies the drying fluid into the inner space, a fluid exhaust unit that releases the drying fluid from the inner space, and a controller. The controller controls the fluid supply unit and the fluid exhaust unit to perform a pressure-raising step of raising pressure in the inner space to a set pressure and a flow step of generating a flow of the drying gas in the inner space by releasing, by the fluid exhaust unit, the drying fluid from the inner space while the fluid supply unit supplies the drying fluid into the inner space.

    OZONE WATER SUPPLYING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

    公开(公告)号:US20250041911A1

    公开(公告)日:2025-02-06

    申请号:US18791839

    申请日:2024-08-01

    Abstract: Disclosed is an ozone water supplying unit capable of maintaining a stable ozone concentration of ozone water supplied to a substrate, and a substrate treating apparatus including the same. The substrate treating apparatus includes: a chamber for liquid-treating a substrate loaded into a treating space with a liquid containing ozone water; and an ozone water supplying unit for supplying ozone water to the treating space, in which the ozone water supplying unit includes: an ozone water generator for generating ozone water; an ozone water supply line for supplying ozone water generated by the ozone water generator to the treating space; and a cooler provided in the ozone water supply line to cool the ozone water flowing through the ozone water supply line.

    Apparatus for treating substrate and method for treating a substrate

    公开(公告)号:US12211675B2

    公开(公告)日:2025-01-28

    申请号:US18050711

    申请日:2022-10-28

    Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing having a treating space for treating a substrate; a support unit configured to support the substrate at the treating space; and a plasma source for generating a plasma from a process gas supplied into the treating space; an exhaust line connecting to the housing and exhausting an atmosphere of the treating space; and a pressure adjusting unit positioned between the support unit and the exhaust line and configured to adjust an exhaust pressure exhausted from the exhaust line, and wherein the pressure adjusting unit includes: an opening/closing member for opening and closing the exhaust line; a lifting/lowering member for moving the opening/closing member in an up/down direction; and an elastic member for providing a restoring force to the lifting/lowering member.

    Apparatus and method for processing substrate

    公开(公告)号:US12198950B2

    公开(公告)日:2025-01-14

    申请号:US17943312

    申请日:2022-09-13

    Abstract: Embodiments of the inventive concept described herein relate to an apparatus and method for removing an adhesive exposed to the outside from an object being processed. The apparatus for removing the adhesive exposed to the outside from an edge region of the object being processed, in which the object has a patterned substrate and a support plate bonded together by the adhesive. The cover liquid nozzle dispenses the cover liquid onto a cover area of a top surface of the object other than the exposed area, and the controller controls the cover liquid dispensing member to adjust a flow rate of the cover liquid to cause a removal rate of the adhesive to remain constant.

    Interface apparatus and container transporting system with the apparatus

    公开(公告)号:US12191181B2

    公开(公告)日:2025-01-07

    申请号:US17490011

    申请日:2021-09-30

    Abstract: Provided are an interface apparatus for resolving congestion through a non-stop interface between a transporting device and a logistics automation storage device, and a container transporting system having the same. The interface apparatus includes a saddle for receiving a container from a container transporting device; and a circulating path for providing a route for transporting the container seated on the saddle to a container storage device, wherein the saddle receives the container while moving together with the container transporting device.

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

    公开(公告)号:US20250006513A1

    公开(公告)日:2025-01-02

    申请号:US18676894

    申请日:2024-05-29

    Abstract: Disclosed is an apparatus for processing a substrate, the apparatus including: a body providing a processing space; a first fluid supply line connected to the body and supplying treatment fluid to the processing space; a second fluid supply line connected to the body at a location different from the first fluid supply line and supplying treatment fluid to the processing space; a first supply valve installed in the first fluid supply line; and an air removal line having one end connected to the first fluid supply line in a lower stream than the first supply valve to allow air in the processing space that is introduced into the first fluid supply line to be removed from the first fluid supply line when the second fluid supply line supplies treatment fluid to the processing space.

    SUBSTRATE PROCESSING EQUIPMENT AND METHOD OF DRIVING SUBSTRATE PROCESSING EQUIPMENT

    公开(公告)号:US20240421566A1

    公开(公告)日:2024-12-19

    申请号:US18581653

    申请日:2024-02-20

    Abstract: Disclosed are a substrate processing equipment and a method of driving the substrate processing equipment, which automatically cut off power supplied to a main circuit breaker and a branch circuit breaker when an operator inspects a process chamber or a power supply system. The substrate processing equipment for processing a substrate includes: a process processing module including loads utilized in a process for processing a substrate; a branch circuit breaker installed on a periphery to the process processing module and electrically connected to the loads; a main circuit breaker electrically connected to the branch circuit breaker and supplying power to the branch circuit breaker; and a power distribution board in which the branch circuit breaker is mounted, and including a power distribution board door, in which the main circuit breaker cuts off power when the power distribution board door is opened.

    APPARATUS FOR CONTROLLING IMPEDANCE AND SYSTEM FOR TREATING SUBSTRATE WITH THE APPARATUS

    公开(公告)号:US20240420936A1

    公开(公告)日:2024-12-19

    申请号:US18818710

    申请日:2024-08-29

    Abstract: Provided are an impedance control apparatus for automatically compensating impedance by predicting the occurrence of wear on a ring assembly, and a substrate treating system having the same. The substrate treating system includes a housing for providing a space for treating a substrate, a substrate support member installed inside the housing and for supporting the substrate, a plasma generating unit for generating plasma inside the housing, a ring assembly disposed in circumference of the substrate, and an impedance control unit for controlling the impedance around the ring assembly and automatically compensating the impedance by predicting the occurrence of wear of the ring assembly.

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